CN204422970U - A kind of proximity intermittent exposure work stage of litho machine - Google Patents
A kind of proximity intermittent exposure work stage of litho machine Download PDFInfo
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- CN204422970U CN204422970U CN201520092861.7U CN201520092861U CN204422970U CN 204422970 U CN204422970 U CN 204422970U CN 201520092861 U CN201520092861 U CN 201520092861U CN 204422970 U CN204422970 U CN 204422970U
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- litho machine
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Abstract
The utility model discloses a kind of proximity intermittent exposure work stage of litho machine, this work stage is used for the proximity printing realizing print and mask plate in litho machine.This work stage with mask holder and mask plate for horizontal reference, lift drive mechanism is utilized to drive three point elasticity supporting mechanisms, wafer-supporting platform, substrate to rise, after contacting leveling by three equal diameter steel balls of auto-extending with reference mask plate, three point elasticity supporting mechanisms locked by pneumatic and control gear, lift drive mechanism stops rising simultaneously, now realizes and keeps print parallel with mask plate; Then lift drive mechanism declines certain specifically apart from rear stop motion, three steel balls shrink and return, last lift drive mechanism moves upward again, until stop rising when print and mask plate gap are a certain required value, realizes print and mask plate proximity intermittent exposure.This work stage can automatically all-rush and mask plate leveling and keep certain exposing clearance, extend the serviceable life of mask plate.
Description
Technical field
The utility model relates to microelectronics specialized equipment technical field, is specifically related to a kind of proximity intermittent exposure work stage of litho machine.
Background technology
In contact photolithography equipment, mask plate directly contacts with photoresist layer, and exposure figure is out suitable with the graphics resolution on mask plate, and simply, contact tightr, resolution is higher for equipment.But easily damage mask plate because mask contacts with the substrate being coated with glue, thus cause the serviceable life of mask plate shorter (5 ~ 25 times can only be used).And cause exposure figure accumulation defect.What contact in addition is tightr, and the damage of mask and material is larger.
Utility model content
Directly contact with mask plate in order to avoid print and cause mask plate to damage, realize the mask plate life-span long, graphic defects is few, the purpose of this utility model is to provide and is a set ofly applied to proximity intermittent exposure work stage after proximity gap litho machine print and mask plate leveling, and namely mask plate and photoresist basalis retain a small gap.
The technical solution adopted in the utility model is: a kind of proximity intermittent exposure work stage of litho machine, comprises mask holder, mask plate, rotation copper band, slide block, steel ball, print, wafer-supporting platform, flexible hinge, three point elasticity supporting constructions, cylinder, lifting drives structure, positive pressure input port, negative pressure input end, electric control valve, Drive and Control Circuit plate, master controller and stop means;
Described mask plate to be positioned at above mask holder and affixed; Described mask holder upper surface is by vacuum tank, and for sucking mask plate, inner chamber is provided with slider guide groove, for slider guide; Described slide block, steel ball and rotation copper band are embedded in mask holder inner chamber, and steel ball is embedded in slide block end, rotate on copper band and are provided with 3 place's chutes, rotate the motion of copper band rotational movement slide block radial expansion; Described wafer-supporting platform is provided with vacuum tank, for holding print; Described three point elasticity supporting constructions are connected by flexible hinge with wafer-supporting platform, for print leveling; Described cylinder comprises driving cylinder and locking cylinder, rotates copper band and locking three point elasticity supporting constructions for driving; Described lift drive mechanism is provided with stop means, moves for stopping lift drive mechanism; Described malleation output terminal by electric control valve respectively with locking cylinder and drive cylinder to be connected; Described negative pressure input end is connected with wafer-supporting platform respectively at mask holder by electric control valve; Described drived control plate is connected with electric control valve and master controller respectively.
Wherein, described mask holder is level reference, is fixed on above mask holder by negative pressure by mask plate; Be uniformly distributed with 120 ° of angles between three place's radial slider gathering sills in mask holder inner chamber.
Wherein, be uniformly distributed with 120 ° of angles between described rotation copper band 3 place chute.
Wherein, one end that described slide block end studs with steel ball has the ability of certain recovery elastic deformation, three steel ball equal diameters, and steel ball the top is 0.5mm with the distance of mask plane.
Described wafer-supporting platform upper surface is provided with vacuum tank, is fixed on above wafer-supporting platform by print by negative pressure.
Wherein, the optional motor of described lift drive mechanism, cylinder or other there is the driving mechanism of identity function; The action of described electric control valve, driving cylinder, locking cylinder, lift drive mechanism is all controlled by Host Controller Driver.
Wherein, described controller can select microcontroller, single-chip microcomputer or other there is the control module of identity function.
The utility model has following beneficial effect:
1, during proximity intermittent exposure work stage work described in the utility model, print does not contact with mask, print effectively can be avoided to damage mask plate, thus decrease the probability of exposure figure defect.
2, during proximity intermittent exposure work stage work described in the utility model, only cylinder synchronous driving three slide block stretching motions are simultaneously driven, system compact conformation with one.
3, during proximity intermittent exposure work stage work described in the utility model, can realize automatic all-rush and mask plate noncontact leveling, and make the exposing clearance r keeping requirement between print and mask plate, the work efficiency of system is high.
Accompanying drawing explanation
Fig. 1 is structure principle chart of the present utility model;
Fig. 2 is the structural representation of mask frame inside;
In figure, 1-mask plate; 2-mask holder; 3-slide block; 4-rotates copper band; 5-steel ball; 6-print; 7-wafer-supporting platform; 8-tri-point elasticity supporting mechanism; 9-locking cylinder; 10-lift drive mechanism; 11-master controller; 12-control circuit board; 13-positive pressure input port; 14-negative pressure input end; 15-electric control valve; 16-position-limit mechanism; 17-drives cylinder;
Embodiment
The utility model is described further by embodiment below in conjunction with accompanying drawing.
As shown in Figure 1, a proximity intermittent exposure work stage for litho machine, it comprises mask plate 1, mask holder 2, slide block 3, rotation copper band 4, steel ball 5, print 6, wafer-supporting platform 7, three point elasticity supporting mechanism 8, locking cylinder 9, lift drive mechanism 10, master controller 11, control circuit board 12, positive pressure input port 13, negative pressure input end 14, electric control valve 15, position-limit mechanism 16, drives cylinder 17.The optional motor of lift drive mechanism 10, cylinder or other there is the driving mechanism of identity function, master controller 11 can select microcontroller, single-chip microcomputer or other there is the control module of identity function.
Described mask plate 1 to be positioned at above mask holder 2 and affixed; Described mask holder 2 upper surface is by vacuum tank, and for sucking mask 1, inner chamber is provided with slide block 3 gathering sill, leads for slide block 3; Described slide block 3, steel ball 5 and rotation copper band 4 are embedded in mask holder 2 inner chamber, and steel ball 5 is embedded in slide block 3 end, rotating on copper band 4 and are provided with 3 place's chutes, moving for being with movable slider 3; Described wafer-supporting platform 7 is provided with vacuum tank, for sucking print 6; Described three point elasticity supporting constructions 8 are connected by flexible hinge with wafer-supporting platform 7, for print 6 leveling; Described cylinder comprises driving cylinder 17 and locking cylinder 9, rotates copper band 4 and locking three point elasticity supporting constructions 8 for driving; Described lift drive mechanism 10 is provided with position-limit mechanism 16, moves for stopping lift drive mechanism 10; Described positive pressure input port 13 by electric control valve 15 respectively with locking cylinder 9 with drive cylinder 17 to be connected; Described negative pressure input end 14 is connected with wafer-supporting platform 7 respectively at mask holder 2 by electric control valve 15; Described drived control plate 12 is connected with electric control valve 15 and master controller 11 respectively;
Described mask holder 2 is level reference, is fixed on above mask holder 2 by negative pressure by mask plate 1; Be uniformly distributed with 120 ° of angles between the sliding radial block gathering sill in three places in mask holder 2 inner chamber.Described rotation copper band 4 the selection of material copper or other wear-resisting materials, be uniformly distributed with 120 ° of angles between 3 place's chutes.One end that described slide block 3 end studs with steel ball has the ability of certain recovery elastic deformation, can adopt beryllium-bronze or other there is certain elasticity and wear-resisting material replace, three steel ball 5 equal diameters, steel ball 5 the top is 0.5mm or other values in regime of elastic deformation with the distance of mask plane.Described wafer-supporting platform 7 upper surface is provided with vacuum tank, is connected, is fixed on above wafer-supporting platform 7 by print 6 by negative pressure with negative pressure input end 14.The optional motor of described lift drive mechanism 10, cylinder or other there is the driving mechanism of identity function.The action of described electric control valve 15, driving cylinder 17, locking cylinder 9, lift drive mechanism 10 is all by primary controller 11 drived control.Described master controller 11 can select microcontroller, single-chip microcomputer or other there is the control module of identity function.
Proximity intermittent exposure work stage described in the utility model work is achieved in that
First mask plate 1 is placed on above mask holder 2, by negative pressure 14, mask plate 1 is fixed on mask holder 2; By negative pressure 14, print 6 is fixed on wafer-supporting platform 7 after putting print 6 well, starting lift drive mechanism 10 by control panel 12 drives print 6 to rise, meanwhile electric control valve 15 is opened, drive cylinder 17 to drive and rotate copper band 4 rotary motion, three slide blocks 3 studding with steel ball 5 are driven synchronously to do to stretch out along slider guide groove radial direction and move, make three steel balls 5 between print 6 and mask plate 1, but be positioned at outside mask plate 1 active graphical scope; Print 6 rises and contacts with three steel balls 5, the copper sheet elastic deformation of slide block 3 end, print 6 continues rising causes 3 steel balls 5 and mask 1 three point contact, print 6 leveling subsequently, then position-limit mechanism 16 sends position signalling to master controller 11, lift drive mechanism 10 stop motion, electric control valve 15 is opened simultaneously, and the malleation that positive pressure input port 12 exports causes locking cylinder 9 that three point elasticity supporting mechanisms 8 are compressed locking; Lift drive mechanism 10 declines stop motion after certain distance h subsequently, drives cylinder 17 reverse drive to cause and rotates copper band 4 counter rotational movement, drive three slide blocks 3 studding with steel ball 5 to do retraction movement along gathering sill radial direction; Last lift drive mechanism 10 climb S, thus realize print 6 and mask plate 1 close to intermittent exposure.Wherein S=h+d (steel ball size)-r (exposing clearance).
The utility model does not elaborate the known technology that part belongs to this area.
Claims (8)
1. a proximity intermittent exposure work stage for litho machine, is characterized in that: comprise mask plate (1), mask holder (2), slide block (3), rotate copper band (4), steel ball (5), print (6), wafer-supporting platform (7), three point elasticity supporting mechanisms (8), locking cylinder (9), lift drive mechanism (10), master controller (11), control circuit board (12), positive pressure input port (13), negative pressure input end (14), electric control valve (15), position-limit mechanism (16) and drive cylinder (17);
Described mask plate (1) be positioned at mask holder (2) top and affixed; Described mask holder (2) upper surface has vacuum tank, and for sucking mask plate (1), inner chamber is provided with the radially-directed groove of slide block (3), leads for slide block (3); Described slide block (3), steel ball (5) and rotation copper band (4) are embedded in mask holder (2) inner chamber, steel ball (5) is embedded in slide block (3) end, rotate on copper band (4) and be provided with 3 place's chutes, rotate the motion of copper band (4) rotational movement slide block (3) radial expansion; Described wafer-supporting platform (7) is provided with vacuum tank, for adsorbing fixing print (6); Described three point elasticity supporting constructions (8) are connected by flexible hinge with wafer-supporting platform (7), for print (6) leveling; Described cylinder comprises driving cylinder (17) and locking cylinder (9), rotates and locking three point elasticity supporting constructions (8) for driving copper band (4); Described lift drive mechanism (10) is provided with position-limit mechanism (16), moves for stopping lift drive mechanism (10); Described positive pressure input port (13) by electric control valve (15) respectively with locking cylinder (9) with drive cylinder (17) to be connected; Described negative pressure input end (14) is connected with wafer-supporting platform (7) respectively at mask holder (2) by electric control valve (15); Described drived control plate (12) is connected with electric control valve (15) and master controller (11) respectively.
2. the proximity intermittent exposure work stage of a kind of litho machine according to claim 1, it is characterized in that: described mask holder (2) is level reference, upper surface has vacuum tank, by negative pressure, mask plate (1) is fixed on mask holder (2) top.
3. a kind of proximity intermittent exposure work stage of litho machine according to claim 1 or 2, is characterized in that: be radially uniformly distributed with 120 ° of angles between three place's slider guide grooves in described mask holder (2) inner chamber.
4. the proximity intermittent exposure work stage of a kind of litho machine according to claim 1, is characterized in that: described rotation copper band (4) the selection of material copper or other wear-resisting materials, is uniformly distributed between 3 place's chutes with 120 ° of angles.
5. the proximity intermittent exposure work stage of a kind of litho machine according to claim 1, it is characterized in that: one end that described slide block (3) end studs with steel ball has the ability of certain recovery elastic deformation, can adopt beryllium-bronze or other there is certain elasticity and wear-resisting material replace, three steel ball (5) equal diameters, steel ball (5) the top is 0.5mm or other values in regime of elastic deformation with the distance of mask plane.
6. the proximity intermittent exposure work stage of a kind of litho machine according to claim 1, it is characterized in that: described wafer-supporting platform (7) upper surface is provided with vacuum tank, be connected with negative pressure input end (14), by negative pressure, print (6) be fixed on wafer-supporting platform (7) top.
7. the proximity intermittent exposure work stage of a kind of litho machine according to claim 1, is characterized in that: described lift drive mechanism (10) optional motor, cylinder or other there is the driving mechanism of identity function; The action of described electric control valve (15), driving cylinder (17), locking cylinder (9), lift drive mechanism (10) is all by master controller (11) drived control.
8. the proximity intermittent exposure work stage of a kind of litho machine according to claim 1, is characterized in that: described master controller (11) can select microcontroller, single-chip microcomputer or other there is the control module of identity function.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520092861.7U CN204422970U (en) | 2015-02-10 | 2015-02-10 | A kind of proximity intermittent exposure work stage of litho machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520092861.7U CN204422970U (en) | 2015-02-10 | 2015-02-10 | A kind of proximity intermittent exposure work stage of litho machine |
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| CN204422970U true CN204422970U (en) | 2015-06-24 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201520092861.7U Withdrawn - After Issue CN204422970U (en) | 2015-02-10 | 2015-02-10 | A kind of proximity intermittent exposure work stage of litho machine |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104570622A (en) * | 2015-02-10 | 2015-04-29 | 中国科学院光电技术研究所 | Proximity-type interval exposure workpiece table of photoetching machine |
| CN107817654A (en) * | 2017-12-12 | 2018-03-20 | 中国科学院光电技术研究所 | Vacuum surface plasma light engraving device |
| CN108089408A (en) * | 2017-12-12 | 2018-05-29 | 中国科学院光电技术研究所 | A kind of passive type leveling retaining mechanism applied to lithographic equipment |
| CN111352318A (en) * | 2020-04-29 | 2020-06-30 | 中国科学院光电技术研究所 | Alignment detection and control super-resolution photoetching device based on dark field moire fringes |
-
2015
- 2015-02-10 CN CN201520092861.7U patent/CN204422970U/en not_active Withdrawn - After Issue
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104570622A (en) * | 2015-02-10 | 2015-04-29 | 中国科学院光电技术研究所 | Proximity-type interval exposure workpiece table of photoetching machine |
| CN107817654A (en) * | 2017-12-12 | 2018-03-20 | 中国科学院光电技术研究所 | Vacuum surface plasma light engraving device |
| CN108089408A (en) * | 2017-12-12 | 2018-05-29 | 中国科学院光电技术研究所 | A kind of passive type leveling retaining mechanism applied to lithographic equipment |
| CN107817654B (en) * | 2017-12-12 | 2020-03-20 | 中国科学院光电技术研究所 | Vacuum surface plasma photoetching device |
| CN108089408B (en) * | 2017-12-12 | 2020-03-20 | 中国科学院光电技术研究所 | Passive leveling and locking mechanism applied to photoetching device |
| CN111352318A (en) * | 2020-04-29 | 2020-06-30 | 中国科学院光电技术研究所 | Alignment detection and control super-resolution photoetching device based on dark field moire fringes |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20150624 Effective date of abandoning: 20161012 |
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| AV01 | Patent right actively abandoned |
Granted publication date: 20150624 Effective date of abandoning: 20161012 |
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| C25 | Abandonment of patent right or utility model to avoid double patenting |