CN204366286U - Semiconductor components and devices tunnel welding furnace - Google Patents
Semiconductor components and devices tunnel welding furnace Download PDFInfo
- Publication number
- CN204366286U CN204366286U CN201420849993.5U CN201420849993U CN204366286U CN 204366286 U CN204366286 U CN 204366286U CN 201420849993 U CN201420849993 U CN 201420849993U CN 204366286 U CN204366286 U CN 204366286U
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Abstract
The utility model relates to a kind of semiconductor components and devices tunnel welding furnace, comprise frame, body of heater and conveyer belt, described body of heater is horizontally set in frame, described conveyer belt level is located in body of heater, the charging aperture of described body of heater and discharge outlet are respectively equipped with feeding platform and outfeed platforms, this body of heater is divided into feed zone by charging aperture successively to discharging opening, first thermal treatment zone, second thermal treatment zone, 3rd thermal treatment zone, 4th thermal treatment zone, first cooling zone and the second cooling zone, it is waste gas path above body of heater, described first thermal treatment zone, second thermal treatment zone, the burner hearth sidewall of the 3rd thermal treatment zone and the 4th thermal treatment zone is provided with thermocouple, and three furnace wall is respectively equipped with the nitrogen inlet be communicated with burner hearth, described second rear, cooling zone is provided with the conveying belt adjusting device be fixed in frame.The utility model can strengthen water circulation effect, shortens the cool time of components and parts, accelerates cooling effectiveness, improves the quality of products, and structure is simple, reasonable in design, is easy to make.
Description
Technical field
The utility model relates to a kind of tunnel welding furnace, particularly a kind of semiconductor components and devices tunnel welding furnace.
Background technology
Tunnel welding furnace can to the different parts such as stainless steel, oxygen-free copper, metallized ceramic part carry out non-oxidation soldering, annealing and to film, thick film, mixed film integrated circuit etc. under the protection of oxygen, nitrogen or hydrogen and oxygen gas mixture; work is welded; encapsulation and sintering etc., be mainly used in vacuum, Aero-Space, power electronics etc.But existing tunnel welding furnace is used in semiconductor manufacturing industry, and because rate of temperature fall is lower, cooling rate is slower, directly affects the quality of semiconductor vigour part, the semiconductor welding pulling force produced is inadequate, is easy to just be fractureed, reduces non-defective unit productivity ratio.
Summary of the invention
The deficiency that the utility model exists for prior art and defect, provide a kind of semiconductor components and devices tunnel welding furnace.
For achieving the above object, the technical scheme that the utility model adopts is: a kind of semiconductor components and devices tunnel welding furnace, comprise frame, body of heater and conveyer belt, described body of heater is horizontally set in frame, described conveyer belt level is located in body of heater, the charging aperture of described body of heater and discharge outlet are respectively equipped with feeding platform and outfeed platforms, this body of heater is divided into feed zone by charging aperture successively to discharging opening, first thermal treatment zone, second thermal treatment zone, 3rd thermal treatment zone, 4th thermal treatment zone, first cooling zone and the second cooling zone, it is waste gas path above body of heater, described first thermal treatment zone, second thermal treatment zone, the burner hearth sidewall of the 3rd thermal treatment zone and the 4th thermal treatment zone is provided with thermocouple, and three furnace wall is respectively equipped with the nitrogen inlet be communicated with burner hearth, described second rear, cooling zone is provided with the conveying belt adjusting device be fixed in frame.
The furnace wall of the first described thermal treatment zone, second thermal treatment zone, the 3rd thermal treatment zone and the 4th thermal treatment zone all adopts High-temperature resistant ceramic fiber plate to make.
Described conveyer belt is chain type conveyor belt.
Described conveying belt adjusting device comprises adjusting bolt, adjustment seat and regulating wheel, regulating wheel is arranged on adjustment seat by bearing, bearings mounted bearing block bottom surface is provided with and holds out against spring, and its upper surface is compressed by adjusting bolt, and bearing block is arranged in chute that adjustment seat is offered.
The beneficial effects of the utility model are:
The utility model can strengthen water circulation effect, shortens the cool time of components and parts, accelerates cooling effectiveness, improves the quality of products, and structure is simple, reasonable in design, is easy to make.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
The meaning of number in the figure representative is: 1, feeding platform, 2, conveyer belt, 3, waste gas path, 4, first thermal treatment zone, 5, second thermal treatment zone, 6, thermocouple, 7, nitrogen inlet, the 8, the 3rd thermal treatment zone, 9, the 4th thermal treatment zone, 10, the first cooling zone, the 11, second cooling zone, 12, conveying belt adjusting device.
Detailed description of the invention
Below in conjunction with the drawings and the specific embodiments, the utility model is described in further detail:
Embodiment 1: see Fig. 1, a kind of semiconductor components and devices tunnel welding furnace, comprise frame, body of heater and conveyer belt 2, described body of heater is horizontally set in frame, described conveyer belt 2 level is located in body of heater, the charging aperture of described body of heater and discharge outlet are respectively equipped with feeding platform 1 and outfeed platforms, this body of heater is divided into feed zone by charging aperture successively to discharging opening, first thermal treatment zone 4, second thermal treatment zone 5, 3rd thermal treatment zone 8, 4th thermal treatment zone 9, first cooling zone 10 and the second cooling zone 11, it is waste gas path 3 above body of heater, described first thermal treatment zone, second thermal treatment zone, the burner hearth sidewall of the 3rd thermal treatment zone and the 4th thermal treatment zone is provided with thermocouple 6, and three furnace wall is respectively equipped with the nitrogen inlet 7 be communicated with burner hearth, described second rear, cooling zone is provided with the conveying belt adjusting device 12 be fixed in frame.
The furnace wall of the first described thermal treatment zone, second thermal treatment zone, the 3rd thermal treatment zone and the 4th thermal treatment zone all adopts High-temperature resistant ceramic fiber plate to make.
Described conveyer belt 2 is chain type conveyor belt.
Described conveying belt adjusting device 12 comprises adjusting bolt, adjustment seat and regulating wheel, regulating wheel is arranged on adjustment seat by bearing, bearings mounted bearing block bottom surface is provided with and holds out against spring, and its upper surface is compressed by adjusting bolt, and bearing block is arranged in chute that adjustment seat is offered.
Claims (5)
1. a semiconductor components and devices tunnel welding furnace, comprise frame, body of heater and conveyer belt, described body of heater is horizontally set in frame, described conveyer belt level is located in body of heater, it is characterized in that: the charging aperture of described body of heater and discharge outlet are respectively equipped with feeding platform and outfeed platforms, this body of heater is divided into feed zone by charging aperture successively to discharging opening, first thermal treatment zone, second thermal treatment zone, 3rd thermal treatment zone, 4th thermal treatment zone, first cooling zone and the second cooling zone, it is waste gas path above body of heater, described first thermal treatment zone, second thermal treatment zone, the burner hearth sidewall of the 3rd thermal treatment zone and the 4th thermal treatment zone is provided with thermocouple, and three furnace wall is respectively equipped with the nitrogen inlet be communicated with burner hearth, described second rear, cooling zone is provided with the conveying belt adjusting device be fixed in frame.
2. semiconductor components and devices tunnel welding furnace according to claim 1, is characterized in that: the furnace wall of the first described thermal treatment zone, second thermal treatment zone, the 3rd thermal treatment zone and the 4th thermal treatment zone all adopts High-temperature resistant ceramic fiber plate to make.
3. semiconductor components and devices tunnel welding furnace according to claim 1, is characterized in that: described conveyer belt is chain type conveyor belt.
4. semiconductor components and devices tunnel welding furnace according to claim 1, it is characterized in that: described conveying belt adjusting device comprises adjusting bolt, adjustment seat and regulating wheel, regulating wheel is arranged on adjustment seat by bearing, bearings mounted bearing block bottom surface is provided with and holds out against spring, its upper surface is compressed by adjusting bolt, and bearing block is arranged in chute that adjustment seat is offered.
5. semiconductor components and devices tunnel welding furnace according to claim 1, is characterized in that: the first described cooling zone and the water inlet pipe of the first cooling zone are respectively equipped with booster pump.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420849993.5U CN204366286U (en) | 2014-12-30 | 2014-12-30 | Semiconductor components and devices tunnel welding furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420849993.5U CN204366286U (en) | 2014-12-30 | 2014-12-30 | Semiconductor components and devices tunnel welding furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204366286U true CN204366286U (en) | 2015-06-03 |
Family
ID=53322534
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420849993.5U Expired - Fee Related CN204366286U (en) | 2014-12-30 | 2014-12-30 | Semiconductor components and devices tunnel welding furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204366286U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107855623A (en) * | 2017-12-29 | 2018-03-30 | 山东才聚电子科技有限公司 | A kind of vacuum welding furnace control system and its control method |
| CN108155109A (en) * | 2017-12-29 | 2018-06-12 | 山东才聚电子科技有限公司 | A kind of pin welding method of chip |
| CN111822291A (en) * | 2020-08-04 | 2020-10-27 | 浙江德清盛泉涂装设备有限公司 | Powder curing system |
-
2014
- 2014-12-30 CN CN201420849993.5U patent/CN204366286U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107855623A (en) * | 2017-12-29 | 2018-03-30 | 山东才聚电子科技有限公司 | A kind of vacuum welding furnace control system and its control method |
| CN108155109A (en) * | 2017-12-29 | 2018-06-12 | 山东才聚电子科技有限公司 | A kind of pin welding method of chip |
| CN107855623B (en) * | 2017-12-29 | 2023-07-18 | 山东才聚电子科技有限公司 | Vacuum welding furnace control system and control method thereof |
| CN111822291A (en) * | 2020-08-04 | 2020-10-27 | 浙江德清盛泉涂装设备有限公司 | Powder curing system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 453000, 16 km north of Yanjin County, Xinxiang City, Henan Province, north of the road Patentee after: Henan crown electronic Polytron Technologies Inc Address before: 453000, 16 km north of Yanjin County, Xinxiang City, Henan Province, north of the road Patentee before: Champion Electronics (Xinxiang) semiconductor industry Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150603 Termination date: 20201230 |