CN204233872U - A kind of cleaning device of ceramic wafer - Google Patents
A kind of cleaning device of ceramic wafer Download PDFInfo
- Publication number
- CN204233872U CN204233872U CN201420640705.5U CN201420640705U CN204233872U CN 204233872 U CN204233872 U CN 204233872U CN 201420640705 U CN201420640705 U CN 201420640705U CN 204233872 U CN204233872 U CN 204233872U
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- nitric acid
- ceramic wafer
- air hose
- service sink
- acid cleaning
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Abstract
A kind of cleaning device of ceramic wafer, comprise service sink, nitric acid make-up tank, nitric acid cleaning liquid pump, it is characterized in that being connected to air hose bottom described service sink, air hose there is interface, air hose connects with buoyance chamber, described nitric acid make-up tank is connected to nitric acid cleaning liquid pump, and nitric acid cleaning liquid pump connects service sink.To treat during use that soaking and washing ceramic wafer is vertically positioned in service sink by interface on air hose, open nitric acid cleaning liquid pump, be delivered in service sink by nitric acid cleaning fluid, open valve on air hose, air passes into bubbling in ceramic wafer; Make ceramic wafer nitric acid cleaning fluid soak and air bubbling effect under constantly clean.The utility model structure is simple, and low cost of manufacture is easy to install, can solve ceramic wafer regeneration issues.The utility model is applicable to the cleaning field of ceramic filter.
Description
Technical field
The utility model relates to material filtering isolation technics, particularly relates to a kind of cleaning device of ceramic wafer.
Background technology
Ceramic filter is used for vacuum dehydration and the filtration of material, and ceramic wafer relates to the crucial portion of filter efficiency
One of part.For obtaining the lower phosphorus concentrate of moisture, ceramic filter is adopted to carry out processed to phosphorus concentrate slurry.The ceramic wafer of ceramic filter often runs 7 hours and will clean the time being not less than 1 hour.Enter in ceramic wafer with the nitric acid cleaning fluid that nitric acid hybrid technique water after measuring pump pumps of about 40% is 5% during prior art cleaning and discharged by blowback with sucking after ore deposit or impurity react, thus make the unimpeded driving entering next circulation of ceramic wafer inner capillary tube net, to improve equipment capacity.Because phosphorus concentrate particle is thin, ceramic wafer regeneration effect after the above-mentioned cleaning of employing is poor, and namely occur not inhaling the phenomenons such as ore pulp, blockage of the micro orifice be serious after ceramic filter long-play, finally directly cause yielding poorly, energy consumption is high.
Adopt a ceramic filter to use the method for two cover ceramic wafers to carry out the process of phosphorus essence mine dehydration, two cover ceramic wafers carry out production after being used alternatingly the nitric acid cleaning fluid immersion of 5% and can partly solve the problem.But finding in actual production process, cleaning performance or not obvious, still there is large area stopping state in ceramic wafer.
For solving the problem, inventor, through repetition test, investigated a kind of device and cleaning method of ceramic wafer soaking and washing.
Summary of the invention
It is poor that the utility model is intended to for ceramic wafer regeneration effect in phosphorus essence mine dehydration processing procedure, and life cycle is short
Situation, a kind of device of ceramic wafer soaking and washing is provided; Ceramic wafer regeneration can be realized preferably.
The technical solution of the utility model is as follows:
A kind of device of ceramic wafer soaking and washing, comprise service sink, nitric acid make-up tank, nitric acid cleaning liquid pump, it is characterized in that being connected to air hose bottom described service sink, air hose there is interface, air hose connects with buoyance chamber, described nitric acid make-up tank is connected to nitric acid cleaning liquid pump, and described nitric acid cleaning liquid pump connects service sink.
Ceramic wafer can vertically be placed in service sink by air hose interface, and this service sink can meet the needs of a ceramic filter ceramic wafer soaking and washing.
Use the cleaning method of the device of this ceramic wafer soaking and washing:
1, will treat that soaking and washing ceramic wafer is vertically positioned in service sink by interface on air hose, and fixing;
2, nitric acid in nitric acid make-up tank is formulated as the nitric acid cleaning fluid that concentration is 5%;
3, open nitric acid cleaning liquid pump, nitric acid cleaning fluid is delivered in service sink, ensures that cleaning fluid floods whole ceramic wafer in pond;
4, opening valve on air hose, is 0.5 m by flow
3/ min ~ 1m
3/ min, pressure are that the air of 0.3Mpa ~ 0.5 Mpa passes into bubbling in ceramic wafer; Make ceramic wafer nitric acid cleaning fluid soak and air bubbling effect under constantly clean, and constantly adjust air inflow;
Whether have dirty block go out, and whether observe ceramic wafer micropore gas output even if 5, constantly observing ceramic wafer top in cleaning process;
6, when ceramic wafer top is gone out without dirty block, after ceramic wafer micropore gas output is even, show that ceramic wafer cleans up; Taking out ceramic wafer after closing valve on air hose, emptying nitric acid cleaning fluid can be for the production of.
Operation principle of the present utility model utilizes the phosphorus concentrate in low concentration nitric acid and ceramic wafer and other impurity to react, and generates the material being soluble in salpeter solution, and blown out under the air effect of certain pressure, thus better realize ceramic wafer regeneration.
By above-mentioned soaking and washing, solve the regeneration issues of ceramic wafer, improve the product of ceramic filter
Can, reduce consumption.
The utility model structure is simple, and low cost of manufacture is easy to install, can solve ceramic wafer regeneration issues.
The utility model is applicable to the cleaning field of ceramic filter.
Accompanying drawing explanation
Fig. 1 is the apparatus structure schematic diagram of the utility model ceramic wafer soaking and washing;
In accompanying drawing: 1, nitric acid cleaning liquid pump; 2, ceramic wafer; 3, service sink; 4, air hose; 5, buoyance chamber; 6, nitric acid accumulator tank; 7, nitric acid make-up tank.
Detailed description of the invention
Below in conjunction with accompanying drawing and embodiment, the utility model is described in further detail.
embodiment:
As shown in Figure 1, one of the utility model embodiment, a kind of device of ceramic wafer soaking and washing, comprise service sink 3, nitric acid make-up tank 7, nitric acid cleaning liquid pump 1, it is characterized in that being connected to air hose 4 bottom described service sink 3, air hose 4 has interface, and air hose 4 connects with buoyance chamber 5, described nitric acid make-up tank 7 connects nitric acid cleaning liquid pump 1, and described nitric acid cleaning liquid pump 1 connects service sink 3.
During use, the serious ceramic wafer 2 of blocking is vertically positioned in service sink 3 by air hose 4 interface, ensures that ceramic wafer 2 interface direction is positioned at bottom; After whole placement, pumped into by the nitric acid cleaning fluid of prepared 5% until ceramic wafer 2 all floods by cleaning fluid in service sink 3, liquid level is apart from 5 centimetres, ceramic wafer 2 top; Then opening the valve of air hose 4, is 0.5 m by flow
3/ min ~ 1m
3/ min, pressure are that the air of 0.3Mpa ~ 0.5 Mpa passes into bubbling in ceramic wafer 2, and constantly adjust air inflow; Ceramic wafer 2 to be soaked and the situation of the continuous bubbling of air is cleaned at nitric acid cleaning fluid, and in cleaning process, constantly whether observation ceramic wafer top has dirty block to go out, and whether observe ceramic wafer micropore gas output even; When ceramic wafer top is gone out without dirty block, after ceramic wafer micropore gas output is even, show that ceramic wafer 2 cleans up; Close the valve on air hose 4, nitric acid cleaning fluid is drained into nitric acid accumulator tank 6, then take out ceramic wafer 2, realize the good regeneration of ceramic wafer 2.
The present embodiment uses in subordinate phosphate fertilizer plant of certain group, solves the regeneration issues of ceramic wafer, improves the production capacity of ceramic filter.
Claims (1)
1. the cleaning device of a ceramic wafer, comprise service sink (3), nitric acid make-up tank (7), nitric acid cleaning liquid pump (1), what it is characterized in that described service sink (3) bottom is connected to air hose (4), (4) have interface to air hose, air hose (4) connects with buoyance chamber (5), described nitric acid make-up tank (7) connects nitric acid cleaning liquid pump (1), and described nitric acid cleaning liquid pump (1) connects service sink (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420640705.5U CN204233872U (en) | 2014-10-31 | 2014-10-31 | A kind of cleaning device of ceramic wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420640705.5U CN204233872U (en) | 2014-10-31 | 2014-10-31 | A kind of cleaning device of ceramic wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204233872U true CN204233872U (en) | 2015-04-01 |
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ID=52763428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420640705.5U Active CN204233872U (en) | 2014-10-31 | 2014-10-31 | A kind of cleaning device of ceramic wafer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204233872U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104324551A (en) * | 2014-10-31 | 2015-02-04 | 瓮福（集团）有限责任公司 | Device and method for cleaning ceramic plates |
| CN114288757A (en) * | 2021-12-13 | 2022-04-08 | 肃北县金鹰黄金有限责任公司 | Ceramic plate pulse cleaning device of ceramic filter |
-
2014
- 2014-10-31 CN CN201420640705.5U patent/CN204233872U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104324551A (en) * | 2014-10-31 | 2015-02-04 | 瓮福（集团）有限责任公司 | Device and method for cleaning ceramic plates |
| CN114288757A (en) * | 2021-12-13 | 2022-04-08 | 肃北县金鹰黄金有限责任公司 | Ceramic plate pulse cleaning device of ceramic filter |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |