CN204173921U - Polysilicon directional purification stove - Google Patents
Polysilicon directional purification stove Download PDFInfo
- Publication number
- CN204173921U CN204173921U CN201420600484.9U CN201420600484U CN204173921U CN 204173921 U CN204173921 U CN 204173921U CN 201420600484 U CN201420600484 U CN 201420600484U CN 204173921 U CN204173921 U CN 204173921U
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- vacuum
- heater
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- polysilicon
- strainer
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Abstract
The utility model discloses a kind of polysilicon directional purification stove, belong to the purification field of polysilicon, in order to solve high-temperature volatile impurity in polycrystalline silicon smelting process to polysilicon directional purification stove, the hurtful problem of vacuum pump group.The utility model comprises body of heater and vacuum suction device, described vacuum suction device comprises vacuum-lines, be arranged on proportional valve on vacuum-lines and slide valve pump, vacuum-lines is arranged interchanger and strainer, interchanger, strainer, proportional valve and slide valve pump set gradually according to gas discharge direction in body of heater.Which solve high-temperature volatile impurity high temperature in body of heater, deposition thus hurtful problem to body of heater, extend the work-ing life of whole equipment.
Description
Technical field
The utility model relates to the purification field of polysilicon, specifically, relates to a kind of polysilicon directional purification stove.
Background technology
Metallurgy-prepared polysilicon adopts Physical to carry out the modes such as slag making, refining, pickling (hydrometallurgy), directional freeze to the silicon of metallurgical grade, by the high purity polycrystalline silicon obtained after Impurity removal, be the base mateiral of photovoltaic conversion, be with a wide range of applications.The purifying technique of metallurgy-prepared polysilicon is various, wherein uses polysilicon vacuum smelting furnace directional freeze impurity removing technology to be modal in polysilicon preparation, one of effective means the most.
Polysilicon vacuum smelting furnace is one melting polysilicon under vacuum or atmospheric condition, and removes the equipment of volatilize impurities in silicon.There is a large amount of volatile impunty to exist in low borosilicate after industrial silicon or slag making, after melting industrial silicon, equipment inner wall can adhere to a surface sediments, be difficult to cleaning.In existing device for purifying polysilicon; many in vacuum-lines, place wire netting or the steel wire group method as dust or particle deposition; but the method effectively can not remove volatilize impurities; Impurity deposition is on furnace wall or be dissolved in inside pump oil; more be difficult to cleaning; even cause vacuum pump mechanical part to wear and tear and occur leakage of oil or machine halt trouble, reduce the work-ing life of whole equipment.
Utility model content
For solving the problem, the utility model provides a kind of polysilicon directional purification stove reducing cleaning, extend maintenance intervals.
Polysilicon directional purification stove described in the utility model, comprise body of heater and vacuum suction device, described vacuum suction device comprises vacuum-lines, be arranged on proportional valve on vacuum-lines and slide valve pump, vacuum-lines is arranged interchanger and strainer, interchanger, strainer, proportional valve and slide valve pump set gradually according to gas discharge direction in body of heater.
The impurity volatilized in body of heater is similar to high-temperature smoke, strainer can fall from this contaminant filter, and then can prevent this Impurity deposition on the inwall of vacuum suction device, prevent from impurity from producing vacuum pump oil to pollute, before the impurity volatilized enters strainer, through the cooling effect of interchanger, high temperature impurity can be cooled, prevent impurity from producing destruction to the filter core of strainer, the filter core of filter interior can realize repeatedly utilizing, and as regulating the proportional valve of pipeline opening and closing, also without the need to clearing up again, extend the maintenance intervals of whole equipment.
Further, be provided with gas barrier between described body of heater and vacuum suction device, gas barrier comprises vapor pipe and water cooling plant, and vapor pipe one end is connected with vacuum-lines, and furnace interior is goed deep in one end.
The high-temperature flue gas that body of heater produces is transferred to vacuum suction device by the vapor pipe in gas barrier, be equivalent to the space of high-temperature flue gas one buffering, water cooling plant in gas barrier, the flue gas of discharging from vapor pipe can be carried out a cooling effect in advance, the destruction of high-temperature flue gas to vacuum-lines can be reduced, extend the life cycle of whole equipment.
Preferably, be provided with quartz crucible in described body of heater, quartz crucible is arranged in the back up pad of bottom of furnace body, and quartz crucible outside is provided with insulated tank, and insulated tank is placed in back up pad, and insulated tank top is provided with insulation cover, and insulation cover is provided with venting conduit inlet.
Compared with prior art, the beneficial effects of the utility model are: (1) the utility model is applicable to industrial silicon and purifies and the purification of polysilicon after slag making, solve high-temperature volatile impurity high temperature in body of heater, deposition thus hurtful problem to body of heater; (2) can effective cleaning body of heater by the filteration of strainer, prevent vacuum oil pump from being polluted; (3) work-ing life of the proportional valve on vacuum-lines and slide valve pump extends, and in use, proportional valve is without the need to periodic cleaning again; (4) cooling effect of water cooling plant in interchanger and gas barrier, the filter core in strainer can repeatedly use, and work-ing life can extend to one month.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
Wherein, 1-body of heater; 2-insulation cover; 3-quartz crucible; 4-melt silicon material; 5-insulated tank; 6-back up pad; 7-water cooling plant; 8-vacuum-lines; 9-vapor pipe; 10-interchanger; 11-water coolant; 12-strainer; 13-proportional valve; 14-slide valve pump.
Embodiment
Below in conjunction with embodiment and accompanying drawing, the utility model is further explained.
A kind of polysilicon directional purification stove, comprise body of heater 1 and vacuum suction device, described vacuum suction device comprises vacuum-lines 8, be arranged on proportional valve 13 on vacuum-lines 8 and slide valve pump 14, vacuum-lines 8 is arranged interchanger 10 and strainer 12, interchanger 10, strainer 12, proportional valve 13 and slide valve pump 14 set gradually according to gas discharge direction in body of heater.
Body of heater 1 inside is provided with back up pad 6, and back up pad 6 is positioned at the bottom of body of heater 1, back up pad 6 is arranged insulated tank 5, and insulated tank 5 top is provided with insulation cover 2, and quartz crucible 3 is placed in insulated tank 5, and insulation cover 2 is provided with aperture.
Be provided with gas barrier between body of heater 1 and vacuum suction device, gas barrier comprises vapor pipe 9 and water cooling plant 7, and vapor pipe 9 one end is connected with vacuum-lines 8, and it is inner that insulated tank 5 is goed deep into by the aperture on insulation cover 2 in one end.
In the directed stove of polysilicon during melting industrial silicon, high-temperature flue gas impurity can be produced, this impurity enters into vacuum suction device by vapor pipe 9, then undertaken cooling, falling through strainer 12 filtering high temperature flue gas contaminant filter by the interchanger 10 on vacuum-lines 8 successively, and then can prevent impurity from entering in proportional valve 13 and slide valve pump 14, prevent comparative example valve 13 and slide valve pump 14 from causing damage, polluting pump oil.When not using the utility model, the proportional valve 13 on vacuum-lines 8, each production cycle needs cleaning once, and after a procedure, proportional valve 13 does not need cleaning, and the filter core simultaneously in strainer can realize repeatedly using, and work-ing life can extend to one month.
Claims (5)
1. a polysilicon directional purification stove, comprise body of heater (1) and vacuum suction device, described vacuum suction device comprises vacuum-lines (8), be arranged on proportional valve (13) on vacuum-lines (8) and slide valve pump (14), it is characterized in that, vacuum-lines (8) is arranged interchanger (10) and strainer (12), interchanger (10), strainer (12), proportional valve (13) and slide valve pump (14) set gradually according to gas discharge direction in body of heater.
2. polysilicon directional purification stove according to claim 1, it is characterized in that, gas barrier is provided with between described body of heater (1) and vacuum suction device, gas barrier comprises vapor pipe (9) and water cooling plant, vapor pipe (9) one end is connected with vacuum-lines (8), and it is inner that body of heater (1) is goed deep in one end.
3. polysilicon directional purification stove according to claim 1 and 2, is characterized in that, is provided with quartz crucible (3) in described body of heater (1).
4. polysilicon directional purification stove according to claim 3, is characterized in that, described quartz crucible (3) is arranged in the back up pad (6) of body of heater (1) bottom.
5. polysilicon directional purification stove according to claim 4, it is characterized in that, described quartz crucible (3) outside is provided with insulated tank (5), insulated tank (5) is placed in back up pad (6), insulated tank (5) top is provided with insulation cover (2), and insulation cover (2) is provided with venting conduit inlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420600484.9U CN204173921U (en) | 2014-10-17 | 2014-10-17 | Polysilicon directional purification stove |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420600484.9U CN204173921U (en) | 2014-10-17 | 2014-10-17 | Polysilicon directional purification stove |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204173921U true CN204173921U (en) | 2015-02-25 |
Family
ID=52562749
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420600484.9U Expired - Fee Related CN204173921U (en) | 2014-10-17 | 2014-10-17 | Polysilicon directional purification stove |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204173921U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110697720A (en) * | 2019-11-19 | 2020-01-17 | 云南永昌硅业股份有限公司 | Device for large industrial silicon rapid directional solidification |
| CN112047346A (en) * | 2020-09-10 | 2020-12-08 | 王丽 | High-purity polycrystalline silicon purification device for solar cell |
-
2014
- 2014-10-17 CN CN201420600484.9U patent/CN204173921U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110697720A (en) * | 2019-11-19 | 2020-01-17 | 云南永昌硅业股份有限公司 | Device for large industrial silicon rapid directional solidification |
| CN110697720B (en) * | 2019-11-19 | 2022-12-09 | 云南永昌硅业股份有限公司 | Device for large industrial silicon rapid directional solidification |
| CN112047346A (en) * | 2020-09-10 | 2020-12-08 | 王丽 | High-purity polycrystalline silicon purification device for solar cell |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20171228 Address after: Miao road Laoshan District 266000 Shandong city of Qingdao Province, No. 52 906 Patentee after: QINGDAO NESI DESIGN & RESEARCH INSTITUTE CO.,LTD. Address before: 1 road 266000 in Shandong province Qingdao city Laoshan District No. 1 Keyuan latitude B block 7 layer B4-2 Patentee before: Qingdao Changsheng Dongfang Industry Group Co.,Ltd. Effective date of registration: 20171228 Address after: 1 road 266000 in Shandong province Qingdao city Laoshan District No. 1 Keyuan latitude B block 7 layer B4-2 Patentee after: Qingdao Changsheng Dongfang Industry Group Co.,Ltd. Address before: Pudong solar energy industry base in Jimo city of Shandong Province, Qingdao City, 266200 Patentee before: QINGDAO LONGSHENG CRYSTALLINE SILICON TECHNOLOGY Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150225 Termination date: 20191017 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |