CN204039497U - A kind of system of vapour deposition cleaning planetary plate - Google Patents
A kind of system of vapour deposition cleaning planetary plate Download PDFInfo
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- CN204039497U CN204039497U CN201420516651.1U CN201420516651U CN204039497U CN 204039497 U CN204039497 U CN 204039497U CN 201420516651 U CN201420516651 U CN 201420516651U CN 204039497 U CN204039497 U CN 204039497U
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- planetary plate
- bell jar
- vapour deposition
- track
- tripod
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Abstract
The utility model discloses the system of a kind of vapour deposition cleaning planetary plate, belong to chip tooling device field.Comprise evaporation board, cold pump, mechanical pump, high pressure tank and brilliant control instrument, described evaporation board comprises bell jar, tripod, track, planetary plate, drying lamp and electron beam gun are enclosed in bell jar inside and form cavity by described bell jar, and the cavity of bell jar inside is connected with outside helium compressor, cold pump, mechanical pump and high pressure tank.Use dynamo-electric machine system in systems in which, use the track of circumferential.In rotary course, carry out vapour deposition to planetary plate, deposition surface is uniform and smooth.Use the CVD (Chemical Vapor Deposition) method of physical method, use nickel and aluminium to carry out vapour deposition, on environment without impact, environment friendly and pollution-free, the long service life of instrument, consuming time short, efficiency is high.
Description
Technical field
The present invention relates to chipset field, more particularly, relate to the system of a kind of vapour deposition cleaning planetary plate.
Background technology
Along with making rapid progress of microelectronics, it is current main flow that evaporation board carries out explained hereafter, and that just inevitably occurs the problem that the regular cleaning of the frock clamp evaporating board is clean.The method of current cleaning mainly contains following several:
1. chemical solution infusion method.Use sulfuric acid, hydrochloric acid, hydrogen peroxide etc. to be configured solution according to certain ratio, then planetary plate is placed and soak about one week in the solution, then carry out surface cleaning.It is many that this method uses at present, need two cover frocks, cycle is long, the solvent configuration used is stricter, amount is large, and have corrosive nature to the end face of the mounted substrate of planetary plate, work-ing life is shorter, configuration solution is large to environmental influence, needs the air exhausting device and the liquid waste treating apparatus that arrange specialty.
2. the direct removal method of physics.Use hammer and chisel, directly remove the inside deposition metal of planetary plate, Measures compare is rough, when not having additive method and planetary plate for subsequent use, in order to put into production as early as possible, can only use this method.The injury of this method to planetary plate is larger, easily produces deformation, and work-ing life is shorter.The working strength of simultaneously clearing up personnel is very large, and a set of planetary plate three, 6 operators need the process of cleaning 4 ~ 6 hours ability clean.
Chemistry in sum and physical method, long to the clearance time of frock clamp, the intensity of cleaning personnel is large, and cleaning easily causes apparatus damage, has greater environmental impacts.
Summary of the invention
1. the technical problem that will solve
For large, the consuming time length of frock clamp cleaning difficulty existed in prior art, easily cause instrument infringement, the problem large to environmental influence, the invention provides the system of a kind of vapour deposition cleaning planetary plate.It can be implemented in the metal object easily removed in the short period of time and frock clamp deposits, and does not injure frock clamp, little to environmental influence.
2. technical scheme
A kind of system of vapour deposition cleaning planetary plate, comprise evaporation board, cold pump, mechanical pump, high pressure tank and brilliant control instrument, evaporation board comprises bell jar, tripod, track, planetary plate, drying lamp and electron beam gun are enclosed in bell jar inside and form cavity by described bell jar, cavity bottom is provided with sealing-ring, described bell jar is connected with tripod, tripod is connected with track, planetary plate is connected with tripod by cantilever, the edge of planetary plate is connected with track is tangent, track upper surface is provided with drying lamp, is provided with electron beam gun immediately below track.
The cavity of bell jar inside is connected with high pressure tank with outside cold pump, mechanical pump, helium compressor and vacuum meter are connected with cold pump respectively, bell jar top is provided with rotating machine, the test probe of brilliant control instrument is arranged at bell jar top, and brilliant control instrument is connected by the test probe of data line with bell jar top.
Further, the rotating shaft of described rotating machine is provided with gear, and gear is connected with follow-up pulley, follow-up pulley is installed pot cover, and pot cover is connected with tripod by dialling hook.
Further, the cavity of bell jar inside is connected with mechanical pump by pipeline, and pipeline is provided with valve.
Further, track is circumferential.
Further, be provided with two crucibles in electron beam gun, above crucible, be provided with baffle plate, in crucible, be placed with the metal needing evaporation.
Further, in electron beam gun, the metal of crucible evaporation is nickel and aluminium.
Adopt vapour deposition to clear up a purging method for the cleaned system planetary plate of planetary plate, the steps include:
A () chooses planetary plate, observe internal surface smooth finish, any surface finish is then new planetary plate, carries out the protective treatment of the vapour deposition of subsequent step straight; If surface is not bright and clean, is used planetary plate, needs first to carry out pre-treatment, install polished section with angle grinding machine and carry out clean and polishing to planetary plate internal surface, clean and polishing is carried out successively, makes metal plating planetary plate not have remain;
B the planetary plate cleared up is put on the tripod of evaporation board by (), the nickel metal of 50 ~ 80 grams is put in a crucible of electron beam gun, the aluminum metal of 40 ~ 60 grams is put in another crucible, cover bell jar, use helium compressor, cold pump, mechanical pump vacuumizes until vacuum meter is shown as 4 × 10
-6torr, stops vacuumizing;
C () is opened rotating machine and is made planetary plate carry out circumferential along track in the cavity of vacuum tangentially to rotate, open drying lamp, drying lamp heats the cavity of bell jar vacuum and planetary plate, steam in cavity distributes, the steam distributed is absorbed by cold pump, when temperature is raised to 200 DEG C, keeps 10 minutes, vacuumize arrival 2 × 10
-6torr, remains on 120 DEG C by temperature;
D () opens high pressure control cabinet switch, electron beam gun is used to carry out nickel pot evaporation to the crucible being placed with nickel, melt is carried out to nickel metal, after the nickel metal of crucible inside all melts, open plate washer, the internal surface of planetary plate is carried out to the vapour deposition of nickel, the vapor deposition rate keeping the display of brilliant control instrument is 15%, when crystalline substance control instrument display thickness is at 10KA, stop nickel plating; Then evaporation is carried out to the crucible containing aluminium, melt is carried out to aluminum metal, after the aluminum metal of crucible inside all melts, open plate washer, the internal surface of planetary plate is carried out to the vapour deposition of aluminium, the vapor deposition rate keeping the display of brilliant control instrument is 20%, when crystalline substance control instrument display thickness is at 3KA, stopping is aluminized, and waiting temperature is down to 50 DEG C;
E () temperature is reduced to 50 DEG C after, close mechanical pump and bell jar vacuum cavity valve, nitrogen is filled with in bell jar vacuum cavity, when being malleation Deng cavity internal gas pressure, the sealing-ring of cavity bottom is without sealing effectiveness, and cavity starts outside exhaust, open bell jar, take out planetary plate, whether smoothly observe planetary plate surface, namely smooth surface completes the cleaning to planetary plate.
Further, the planetary plate thickness carrying out clearing up is needed to be 1.5 ~ 2mm in step (a).
Further, clean in step (a) and polishing needs two kinds of polished section, clean use 120# polished section, the polished section of polishing use W14.
3. beneficial effect
Compared to prior art, the invention has the advantages that:
(1) use the CVD (Chemical Vapor Deposition) method of physical method, use nickel and aluminium to carry out vapour deposition, avoid use chemical substance, on environment without impact, environment friendly and pollution-free; Avoid chemical immersion method and direct removal method can cause frock clamp to damage, effectively protect frock clamp, make the long service life of instrument;
(2) form separating layer on frock clamp surface, decrease operation, relative to direct removal method, labour intensity reduces greatly; With the length consuming time of chemical immersion method, need compared with 4 ~ 6 hours consuming time with traditional method, present method is consuming time only needs 1 hour, and efficiency improves greatly;
(3) use dynamo-electric machine system in systems in which, use circumferential track, in rotary course, carry out vapour deposition to planetary plate, deposition surface is even, smooth, and compare with direct removal method with common chemical immersion method, its excellent result, treatment effect is good.
Accompanying drawing explanation
Fig. 1 is evaporating and coating equipment schematic diagram.
Number in the figure illustrates:
1, bell jar; 2, tripod; 3, track; 4, planetary plate; 5, drying lamp; 6, electron beam gun; 7, vacuum meter; 8, helium compressor; 9, cold pump; 10, mechanical pump; 11, brilliant control instrument; 12, high pressure tank.
Embodiment
Below in conjunction with Figure of description and specific embodiment, invention is described in detail.
Embodiment
As shown in Figure 1, a kind of system of vapour deposition cleaning planetary plate, comprise evaporation board, cold pump 9, mechanical pump 10, high pressure tank 12 and brilliant control instrument 11, evaporation board comprises bell jar 1, and tripod 2, track 3, planetary plate 4, drying lamp 5 and electron beam gun 6 are enclosed in bell jar 1 inside and form cavity by bell jar 1.Bell jar 1 is can vacuum cavity, and cavity bottom is provided with sealing-ring.Bell jar 1 is connected with tripod 2, tripod 2 is connected with track 3, planetary plate 4 is connected with tripod 2 by cantilever, the edge of planetary plate 4 is connected with track 3 is tangent, track 3 upper surface is provided with drying lamp 5, drying lamp 5 is conducive to the evaporation of the steam in planetary plate 4 and chamber, make planetary plate 4 vapour deposition more reliable, electron beam gun 6 is provided with immediately below track 3, two crucibles are provided with in electron beam gun 6, baffle plate is provided with above crucible, the metal needing evaporation is placed with in crucible, two crucibles place nickel and aluminium respectively, track 3 is circumferential, be tangential on track 3 when clearing up for planetary plate 4 and do circumference operation,
Chamber vacuum relies on mechanical pump 10 to be evacuated down to rough vacuum, then helium compressor 8 is used to provide refrigeration source to cold pump 9, under the effect of cold pump 9, make to form high vacuum in chamber, under acting in conjunction, vacuum state is formed to cavity, for planetary plate 4 vapour deposition provides vacuum condition, meet the condition of metal evaporation.The cavity of bell jar 1 inside is connected with high pressure tank 12 with outside cold pump 9, mechanical pump 10, and the cavity of bell jar 1 inside is connected with mechanical pump 10 by pipeline, and pipeline is provided with valve.Helium compressor 8 and vacuum meter 7 are connected with cold pump 9 respectively, and bell jar 1 top is provided with rotating machine, and the test probe of brilliant control instrument 11 is arranged at bell jar 1 top, and brilliant control instrument 11 is connected by the test probe of data line with bell jar 1 top.
Bell jar 1 top is provided with rotating machine, the rotating shaft of rotating machine is provided with gear, gear is connected with follow-up pulley, follow-up pulley is installed pot cover, pot cover is connected with tripod 2 by dialling hook, and drive the rotation of tripod 2, planetary plate 4 is placed on tripod 2, by the outstanding back of the body allow planetary plate 4 circumferentially shape track 3 do tangential rotary motion, be conducive to planetary plate 4 like this and ensure its surface uniform when vapour deposition.
Adopt vapour deposition to clear up a purging method for planetary plate cleaned system planetary plate, the steps include:
A () chooses planetary plate 4, observe internal surface smooth finish, observes planetary plate 4 service condition, thickness, generally when 1.5 ~ 2mm, needs clear chamber once, if too thick meeting not too easily tilting, pulling force too between flash plating is too little, all can increase cleaning difficulty, and its surface is not bright and clean.When planetary plate 4 thickness is too high, can use straight screwdriver before cleaning, insert along crannied place, planetary plate 4 edge, firmly outwards dial, look for several repetition outwards to dial, inner coating can entirety split away off more; Clear up again, to guarantee that cleaning time ratio is easier to.This time need planetary plate 4 thickness carrying out clearing up to be 2mm, be used planetary plate 4, need first to carry out pre-treatment, install polished section with angle grinding machine and carry out clean and polishing to planetary plate 4 internal surface, polissoir comprises angle grinding machine, abrasive segments.Polished finish is carried out to planetary plate 4, the peeling effect being conducive to metal deposit is formed, clean and polishing is carried out successively, angle grinding machine is installed 120# polished section and is cleaned planetary plate 4 internal surface, the polished section finally re-using W14 carries out polishing, guarantees planetary plate 4 does not have residual metal plating;
B the planetary plate 4 cleared up is put on the tripod 2 of evaporation board by (), the nickel metal of 60 grams is put in a crucible of electron beam gun 6, the aluminum metal of 50 grams is put in another crucible, cover bell jar 1, use helium compressor 8, cold pump 9, mechanical pump 10 vacuumizes until vacuum meter 7 is shown as 4 × 10
-6torr, stops vacuumizing;
C () is opened rotating machine and is made planetary plate 4 carry out circumferential along track 3 in the cavity of vacuum tangentially to rotate, open drying lamp 5, cavity and the planetary plate 4 of drying lamp 5 pairs of bell jar 1 vacuum heat, steam in cavity distributes, the steam distributed is absorbed by cold pump 9, when temperature is raised to 200 DEG C, keeps 10 minutes, vacuumize arrival 2 × 10
-6torr, remains on 120 DEG C by temperature;
D () metal evaporation is under the condition of high vacuum, electron emission energy is provided to make melting of metal to electron beam gun 6 by high pressure tank 12, form free metal atom, running into the lower frock of temperature will be adsorbed on forming metal layer on surface, and its thickness is then controlled by crystalline substance control instrument 11.Open high pressure tank 12 switch, electron beam gun 6 is used to carry out nickel pot evaporation to the crucible being placed with nickel, melt is carried out to nickel metal, after the nickel metal of crucible inside all melts, open plate washer, the internal surface of planetary plate 4 is carried out to the vapour deposition of nickel, the vapor deposition rate keeping brilliant control instrument 11 to show is 15%, when crystalline substance control instrument 11 shows thickness at 10KA, stop nickel plating; Then evaporation is carried out to the crucible containing aluminium, melt is carried out to aluminum metal, after the aluminum metal of crucible inside all melts, open plate washer, the internal surface of planetary plate 4 is carried out to the vapour deposition of aluminium, the vapor deposition rate keeping brilliant control instrument 11 to show is 20%, when crystalline substance control instrument 11 shows thickness at 3KA, stopping is aluminized, and waiting temperature is down to 50 DEG C;
E () temperature is reduced to 50 DEG C after, close mechanical pump 10 and bell jar 1 vacuum cavity valve, be filled with nitrogen in bell jar 1 vacuum cavity, when waiting cavity internal gas pressure to be malleation, the sealing-ring of cavity bottom is without sealing effectiveness, cavity starts outside exhaust, opens bell jar 1, takes out planetary plate 4, whether smoothly observe planetary plate 4 surface, observe surface and whether stick up skin situation, smooth surface, namely smooth surface completes the cleaning to planetary plate 4.
The CVD (Chemical Vapor Deposition) method of present method physical method; nickel and aluminium is used to carry out vapour deposition; avoid use chemical substance; on environment without impact; environment friendly and pollution-free; avoid chemical immersion method and direct removal method can cause frock clamp to damage, effectively protect frock clamp, make the long service life of instrument.Form separating layer on frock clamp surface, decrease operation, relative to direct removal method, labour intensity reduces greatly; With the length consuming time of chemical immersion method, need compared with 4 ~ 6 hours consuming time with traditional method, present method is consuming time only needs 1 hour, and efficiency improves greatly;
Below be schematically described the invention and embodiment thereof, this description does not have restricted, and one of embodiment of the also just the invention shown in accompanying drawing, actual structure is not limited thereto.So, if those of ordinary skill in the art enlightens by it, when not departing from this creation aim, designing the frame mode similar to this technical scheme and embodiment without creationary, the protection domain of this patent all should be belonged to.
Claims (6)
1. the system of a vapour deposition cleaning planetary plate, it is characterized in that: comprise evaporation board, cold pump (9), mechanical pump (10), high pressure tank (12) and brilliant control instrument (11), evaporation board comprises bell jar (1), described bell jar (1) is by tripod (2), track (3), planetary plate (4), drying lamp (5) and electron beam gun (6) are enclosed in bell jar (1) inside and form cavity, cavity bottom is provided with sealing-ring, described bell jar (1) is connected with tripod (2), tripod (2) is connected with track (3), planetary plate (4) is connected with tripod (2) by cantilever, the edge of planetary plate (4) is connected with track (3) is tangent, track (3) upper surface is provided with drying lamp (5), electron beam gun (6) is provided with immediately below track (3),
The cavity of bell jar (1) inside is connected with high pressure tank (12) with outside cold pump (9), mechanical pump (10), helium compressor (8) is connected with cold pump (9) respectively with vacuum meter (7), bell jar (1) top is provided with rotating machine, the test probe of brilliant control instrument (11) is arranged at bell jar (1) top, and brilliant control instrument (11) is connected by the test probe of data line with bell jar (1) top.
2. the system of a kind of vapour deposition cleaning planetary plate according to claim 1, it is characterized in that: the rotating shaft of described rotating machine is provided with gear, gear is connected with follow-up pulley, follow-up pulley is installed pot cover, and pot cover is connected with tripod (2) by dialling hook.
3. the system of a kind of vapour deposition cleaning planetary plate according to claim 2, is characterized in that: the cavity of bell jar (1) inside is connected with mechanical pump (10) by pipeline, and pipeline is provided with valve.
4. the system of a kind of vapour deposition cleaning planetary plate according to claim 1, is characterized in that: described track (3) is circumferential.
5. the system of a kind of vapour deposition cleaning planetary plate according to claim 1 or 4, is characterized in that: be provided with two crucibles in described electron beam gun (6), be provided with baffle plate, be placed with the metal needing evaporation in crucible above crucible.
6. the system of a kind of vapour deposition cleaning planetary plate according to claim 5, is characterized in that: the metal of the described interior crucible evaporation of electron beam gun (6) is nickel and aluminium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201420516651.1U CN204039497U (en) | 2014-09-09 | 2014-09-09 | A kind of system of vapour deposition cleaning planetary plate |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201420516651.1U CN204039497U (en) | 2014-09-09 | 2014-09-09 | A kind of system of vapour deposition cleaning planetary plate |
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| CN204039497U true CN204039497U (en) | 2014-12-24 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104195524A (en) * | 2014-09-09 | 2014-12-10 | 桑德斯微电子器件（南京）有限公司 | System for cleaning planetary plate by vapor deposition method and cleaning method thereof |
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2014
- 2014-09-09 CN CN201420516651.1U patent/CN204039497U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104195524A (en) * | 2014-09-09 | 2014-12-10 | 桑德斯微电子器件（南京）有限公司 | System for cleaning planetary plate by vapor deposition method and cleaning method thereof |
| CN104195524B (en) * | 2014-09-09 | 2016-12-14 | 桑德斯微电子器件（南京）有限公司 | The system of a kind of vapour deposition cleaning planetary plate and cleaning method thereof |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20141224 Termination date: 20160909 |
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| CF01 | Termination of patent right due to non-payment of annual fee |