CN203976397U - The filtration unit of super clean, high purified hydrofluoric acid - Google Patents
The filtration unit of super clean, high purified hydrofluoric acid Download PDFInfo
- Publication number
- CN203976397U CN203976397U CN201420369068.2U CN201420369068U CN203976397U CN 203976397 U CN203976397 U CN 203976397U CN 201420369068 U CN201420369068 U CN 201420369068U CN 203976397 U CN203976397 U CN 203976397U
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- filter body
- hydrofluoric acid
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- filtration unit
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Abstract
The utility model provides the filtration unit of super clean, high purified hydrofluoric acid, comprise filter body, it is characterized in that: described filter body bottom is provided with purified water inlet and blowdown outlet, described blowdown outlet is other is nitrogen inlet, described material inlet is positioned at blowdown outlet top, described filter body top is provided with tail gas outlet, material outlet is located at the top of filter body, described tensimeter is connected with material inlet, filter body be provided with liquid level tube, filter body inside is provided with removable filter core.The utility model provide a kind of can be safely the filtration unit of the super clean, high purified hydrofluoric acid of renew cartridge more, simple in structure, easy to maintenance, reduce the generation of security incident, improved the quality of super clean, high purified hydrofluoric acid simultaneously.
Description
Technical field
The utility model relates to superhigh-purity reagent purification techniques, is specifically related to the filtration unit of super clean, high purified hydrofluoric acid.
Technical background
Super clean hydrofluoric acid is that strongly-acid cleans, etching reagent, can configure and use with nitric acid, Glacial acetic acid, hydrogen peroxide and ammonium hydroxide etc., it is one of indispensable key basic chemical industry raw material during electronic applications microfabrication is made, be mainly used in cleaning and the etching of chip, also can be used as assay kit and prepare highly purified fluorine-containing chemical, at present, be substantially used for microelectronic industry as etching agent and clean-out system at home, other aspect consumptions are less.
At present, the production technique of super clean, high purified hydrofluoric acid is generally: by industrial anhydrous hydrofluoric acid after Chemical Pretreatment, enter rectifying tower and pass through distillation operation, the hydrogen fluoride gas obtaining is after cooling, in absorption tower, absorb with ultrapure water, and adopt methods such as controlling specific liquid rate, vapour-liquid ratio that electronic-stage hydrofluoric acid is further purified, with after through the following ultrafiltration operation of 0.2 μ m, finally under airtight clean environment condition, (below hundred grades) carry out the filling the finished product that obtain---super clean, high purified hydrofluoric acid.Use anhydrous hydrogen fluoride raw material to have a large amount of dust residual because producing electronic-stage hydrofluoric acid, seriously restrict quality when super clean, high purified hydrofluoric acid is produced, can adopt micro-filtration method principle, particulate matter in adsorption filtration hydrogen fluoride, because hydrogen fluoride is deep-etching and hypertoxicity chemical, boiling point is low 19.6 DEG C, strainer routinely, more renew cartridge, easily causes security incident.
Utility model content
The utility model aims to provide a kind of device that can filter hydrofluoric acid, more renew cartridge that can be safe and reliable.
In order to address the above problem, the utility model provides the filtration unit of super clean, high purified hydrofluoric acid, comprise filter body, it is characterized in that: described filter body bottom is provided with purified water inlet and blowdown outlet, described blowdown outlet is other is nitrogen inlet, described material inlet is positioned at blowdown outlet top, described filter body top is provided with tail gas outlet, material outlet is located at the top of filter body, described tensimeter is connected with material inlet, filter body be provided with liquid level tube, filter body inside is provided with removable filter core.
Wherein: filter body material inside and material for core are corrosion resistant polytetrafluoroethylene (PTFE) high temperature material.
The utility model provide a kind of can be safely the filtration unit of the super clean, high purified hydrofluoric acid of renew cartridge more, simple in structure, easy to maintenance, reduce the generation of security incident, improved the quality of super clean, high purified hydrofluoric acid simultaneously.
Brief description of the drawings
Fig. 1 is structural representation of the present utility model.
Wherein: 1. filter body; 2. purified water inlet; 3. blowdown outlet; 4. nitrogen inlet; 5. material inlet; 6. tail gas outlet; 7. material outlet; 8. tensimeter; 9. liquid level tube; 10. filter core.
Embodiment
Below in conjunction with accompanying drawing, the utility model is described further.
As shown in Figure 1, the utility model provides the filtration unit of super clean, high purified hydrofluoric acid, comprise filter body 1, it is characterized in that: described filter body 1 bottom is provided with purified water inlet 2 and blowdown outlet 3, described blowdown outlet 3 is other is nitrogen inlet 4, described material inlet 5 is positioned at blowdown and exports 3 tops, described filter body 1 top is provided with tail gas outlet 6, material outlet 7 is located at the top of filter body 1, described tensimeter 8 is connected with material inlet 1, filter body 1 is provided with liquid level tube 9, filter body 1 inside is provided with removable filter core 10.
Inner 1 material of filter body and filter core 10 materials are corrosion resistant polytetrafluoroethylene (PTFE) high temperature material.
When super clean, high purified hydrofluoric acid filtration unit uses, open material inlet 5 and material outlet 7, close nitrogen inlet 4, tail gas outlet 6, purified water inlet 2 and blowdown outlet 3.Longer duration of service when super clean, high purified hydrofluoric acid filtration unit, tensimeter 8 registrations when larger, illustrate that obstruction has occurred the inner filter core 10 of filtration unit, needs more renew cartridge 10.More when renew cartridge 10, first stop filtering, close material inlet 5 and material outlet 7, then open nitrogen inlet 4 and tail gas outlet 6, be filled with nitrogen and fully blow off the hydrogen fluoride gas in filtration unit; Then close nitrogen inlet 4 and tail gas outlet 6, open purified water inlet 2, allow pure water fully enter strainer, absorb residual hydrogen fluoride in flush filter, then open sewage outlet, reclaim waste water and process rear discharge, after repeatedly rinsing, hydrogen fluoride in strainer absorbs to be processed totally, now can open strainer, changes filter core 10 wherein.
The beneficial effects of the utility model are: super clean, high purified hydrofluoric acid filtration unit a kind of simple in structure, easy to maintenance is provided, and more renew cartridge is safe and reliable, has reduced the danger of Acid of Hydrofluoric Acid Production, has improved the quality of super clean, high purified hydrofluoric acid simultaneously.
Claims (3)
1. the filtration unit of super clean, high purified hydrofluoric acid, comprise filter body, it is characterized in that: described filter body bottom is provided with purified water inlet and blowdown outlet, described blowdown outlet is other is nitrogen inlet, described material inlet is positioned at blowdown outlet top, described filter body top is provided with tail gas outlet, material outlet is located at the top of filter body, described tensimeter is connected with material inlet, filter body be provided with liquid level tube, filter body inside is provided with removable filter core.
2. the filtration unit of super clean, high purified hydrofluoric acid according to claim 1, is characterized in that: described filter body material inside is corrosion resistant polytetrafluoroethylene (PTFE) high temperature material.
3. the filtration unit of super clean, high purified hydrofluoric acid according to claim 1, is characterized in that: described material for core is corrosion resistant polytetrafluoroethylene (PTFE) high temperature material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420369068.2U CN203976397U (en) | 2014-07-07 | 2014-07-07 | The filtration unit of super clean, high purified hydrofluoric acid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420369068.2U CN203976397U (en) | 2014-07-07 | 2014-07-07 | The filtration unit of super clean, high purified hydrofluoric acid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203976397U true CN203976397U (en) | 2014-12-03 |
Family
ID=51973861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420369068.2U Expired - Fee Related CN203976397U (en) | 2014-07-07 | 2014-07-07 | The filtration unit of super clean, high purified hydrofluoric acid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203976397U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105413325A (en) * | 2015-11-19 | 2016-03-23 | 新疆中泰化学股份有限公司 | Device for filtering iron impurities of carbon steel pipeline |
-
2014
- 2014-07-07 CN CN201420369068.2U patent/CN203976397U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105413325A (en) * | 2015-11-19 | 2016-03-23 | 新疆中泰化学股份有限公司 | Device for filtering iron impurities of carbon steel pipeline |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20141203 Termination date: 20160707 |