CN203930737U

CN203930737U - Contact panel

Info

Publication number: CN203930737U
Application number: CN201420312030.1U
Authority: CN
Inventors: 黄松建; 何加友; 郑太狮; 张凡忠
Original assignee: TPK Touch Solutions Xiamen Inc
Current assignee: TPK Touch Solutions Xiamen Inc
Priority date: 2014-06-12
Filing date: 2014-06-12
Publication date: 2014-11-05
Anticipated expiration: 2024-06-12

Abstract

The utility model relates to touch technology field, particularly a kind of contact panel.This contact panel comprises: a cover plate, and it comprises first surface and second surface, described first surface is touch surface; One first electrode layer and a second electrode lay; Described the first electrode layer is between second surface and the second electrode lay, and described the second electrode lay is nano-silver thread electrode layer.

Description

Contact panel

[technical field]

The utility model relates to touch technology field, particularly a kind of contact panel.

[background technology]

Touch control device is subject to the favor of telecommunications industry gradually because of advantages such as its convenient operation, imaging are effective, function diversification, and is widely used on the products such as information system equipment, home appliance, communication apparatus, personal portable.

Follow in recent years contact panel in the rapid emergence of communications industry, flourish in mobile communication industry particularly, contact panel replaces physical keyboard at one stroke becomes the first-selected product of mobile phone man-machine interaction now.The contact panel that utilization rate is the highest is mainly electric resistance touch-control panel and capacitance type touch-control panel, but user for controllability, the consideration of ease for use and appearance, can select capacitance type touch-control panel as its best preferred unit mostly.

At traditional intelligence mobile phone, in the capacitance type touch-control panel of iphone etc., the material of touch-control electrode is generally tin indium oxide (referred to as ITO).The transmittance of ITO is very high, and electric conductivity is better.But the progressively increase along with contact panel size, while being particularly applied to 15 cun of above panels, the defect of ITO is more and more outstanding, wherein the most obvious defect is exactly that the surface resistance of ITO is excessive, expensive, cannot guarantee electric conductivity that large touch panel is good and enough sensitivity, also cannot be applicable to the constantly development trend of low priceization of electronic product.

In addition, in manufacture method, ITO originally needs vacuum chamber, higher depositing temperature and/or high annealing temperature to obtain high conductance, causes the integral manufacturing cost of ITO very expensive.And, a little less than ito thin film is highly brittle, even also very easy destroyed in the bending that runs into less physical stress, under the tide of the emerging produce market therefore emerging gradually at wearable device, ITO material can not have been dealt with the demand in market as conductive material and be eliminated gradually.

Just because of this, industrial community is being devoted to develop the equivalent material of ITO always.

Nano-silver thread is a kind of of the current maturation the most of many ITO equivalent material.Nano-silver thread has the good electric conductivity of silver, due to the size effect of its Nano grade, makes it have excellent light transmission and flexible resistance simultaneously, therefore can be used as and preferably substitutes ITO as the material of touch-control electrode.

Yet because the reflecting rate of nano-silver thread is higher, while adopting nano-silver thread conducting film as touch-control electrode, contact panel visually there will be white mist phenomenon, nano-silver thread from human eye more close to, reflective more obvious, mist degree problem is also just more outstanding.Particularly, in two-layer electrode structure, when two-layer electrode material is SNW, this mist degree problem can be even more serious.

Generally speaking, how can more directly use nano-silver thread to substitute ITO material as conductive layer, and without the input of too many production cost, the update of too many making apparatus; The mist degree problem that is difficult to overcome in the time of simultaneously can solving again nano-silver thread as conductive layer be present stage touch-control manufacturer be badly in need of now a difficult problem of breaking away from.

[utility model content]

For overcoming existing nano-silver thread, substitute ITO as many difficult problems of new conductive material, the utility model provides a kind of new-type contact panel.

The scheme of the utility model technical solution problem is to provide a kind of contact panel, and it comprises: a cover plate, comprise first surface and second surface, and described first surface is touch surface; One first electrode layer and a second electrode lay; Described the first electrode layer is between second surface and the second electrode lay, and described the second electrode lay is nano-silver thread electrode layer.

Preferably, this first electrode layer is tin indium oxide, tin-antiomony oxide, and indium zinc oxide, zinc oxide aluminum, Graphene, any one material or its combination in metal grill or carbon nano-tube are made.

Preferably, the transmittance of described nano-silver thread electrode layer is at least 90%, mist degree is no more than 5%, thickness is 50nm-200nm, and refractive index is 1.35-1.8, and described nano-silver thread electrode layer comprises a matrix and is distributed in many nano-silver threads in described matrix, described many nano-silver threads overlap formation conductive network mutually, the line length of described every nano-silver thread is between 20-50 μ m, and wire diameter is less than 50nm, and length breadth ratio is greater than 400.

Preferably, also comprise a high refractive index layer, the refractive index of described high refractive index layer is 1.52-1.79.

Preferably, the coated area of described high refractive index layer is not less than 50% at the coating rate of the first electrode layer or the second electrode lay.

Preferably, also comprise a substrate, described nano-silver thread electrode layer is arranged at described substrate, and wherein a surface is upper, and the first electrode layer is arranged on another surface of described substrate.

Preferably, also comprise a substrate; Described nano-silver thread electrode layer is arranged on arbitrary surface of described substrate; One first electrode base material, between described substrate and described cover plate; Described the first electrode layer is arranged on arbitrary surface of described the first electrode base material.

Preferably, also comprise an adhesion promoting layer, be arranged on described nano-silver thread electrode layer, the expansion coefficient of described adhesion promoting layer is less than the expansion coefficient of described substrate.

Preferably, also comprise a levelling blanket, be arranged on nano-silver thread electrode layer, nano-silver thread electrode layer is partially submerged in levelling blanket on thickness direction.

Preferably, also comprise optical match layer, be arranged on described nano-silver thread conductive layer and/or under, its refractive index is 1.1-1.6.

Compared with prior art, contact panel of the present utility model adopts the first electrode layer of ITO near touch surface on upper strata, away from touch surface, adopt nano-silver thread electrode layer.So can be better that conductive effect is better, in the touching technique field that the better nano-silver thread of outward appearance visual effect updates up till now.

By the first electrode layer of ITO on upper strata near touch surface, nano-silver thread is made in lower floor away from touch surface, is because nano-silver thread can solve the mist degree problem of nano-silver thread after away from touch surface to a certain extent.One deck ITO like this, one deck nano-silver thread, one on the other, effectively solves a nano-silver thread mist degree difficult problem in use.

In order further to solve the mist degree problem of nano-silver thread electrode layer, the utility model selects high refractive index layer-OCA glue to come first electrode layer on bonding upper strata and the nano-silver thread electrode layer of lower floor, high refractive index layer is positioned on nano-silver thread electrode layer, can effectively reduce the reflection of nano-silver thread electrode layer, solve the obvious problem of nano-silver thread mist degree.Meanwhile, with the OCA glue of high index of refraction, without the extra high index of refraction lamination that increases, be also conducive to reduce the thickness of touch-control rhythmo structure, obtain lightening effect.

The utility model also provides the distortion of multiple rhythmo structure, and when selecting one deck ITO, one deck nano-silver thread, after arranging one on the other, then in conjunction with G1F or GFF structure, is conducive to reduce the thickness of contact panel more.

[accompanying drawing explanation]

Fig. 1 is the cross section structure schematic diagram of the utility model nano-silver thread film.

Fig. 2 is the floor map of the utility model nano-silver thread film.

Fig. 3 is the structural representation of the utility model contact panel the first embodiment.

Fig. 4 is the planar structure schematic diagram of grid conducting channel in the utility model contact panel.

Fig. 5 is the blast structural drawing of the utility model contact panel the first embodiment.

Fig. 6 is the floor map that in grid conducting channel, the second electrode and the first electrode Orthogonal Composite form.

Fig. 7 is the method for making process flow diagram of the utility model the second embodiment contact panel.

Fig. 8 is the method for making process flow diagram of the utility model the 3rd embodiment contact panel structure.

Fig. 9 is the blast structural drawing of the utility model contact panel the 4th embodiment, between substrate and nano-silver thread electrode layer, increases by an adhesion promoting layer.

Figure 10 is the blast structural drawing of the utility model laminated structure of touch panel the 5th embodiment, between substrate and nano-silver thread electrode layer, increases by an adhesion promoting layer, increases by a levelling blanket between nano-silver thread electrode layer and high refractive index layer.

Figure 11 is the blast structural drawing of the utility model contact panel the 6th embodiment, between substrate and nano-silver thread electrode layer, increase by an adhesion promoting layer, between nano-silver thread electrode layer and high refractive index layer, increase by a levelling blanket, between nano-silver thread electrode layer and high refractive index layer, increase by an optical match layer.

Figure 12 is the blast structural drawing of the utility model contact panel the 7th embodiment.

Figure 13 is a kind of distortion blast structural drawing of the utility model contact panel the 7th embodiment.

Figure 14 is the blast structural drawing of the utility model contact panel the 8th embodiment.

[embodiment]

In order to make the purpose of this utility model, technical scheme and advantage are clearer, below in conjunction with accompanying drawing and embodiment, the utility model are further elaborated.Should be appreciated that specific embodiment described herein is only in order to explain the utility model, and be not used in restriction the utility model.

Refer to Fig. 1 and Fig. 2, it is the structural representation that dissects of nano-silver thread conductive film 800, transparency conducting layer 805 is generally produced on substrate 807, comprises the many nano-silver threads 801 that are embedded in matrix 803, and nano-silver thread 801 is arranged in matrix 803 and mutually overlaps and form conductive network.Nano-silver thread 801 (silvernano wires, abbreviation SNW) line length is 10-300 μ m, preferred 20-100 μ m, preferably its length is 20-50 μ m, the wire diameter of nano-silver thread 801 (or live width) is less than 500nm or is less than 200nm, 100nm, be preferably and be less than 50nm, and its length breadth ratio ratio of wire diameter (line length with) is greater than 10, be preferably greater than 50, more preferably greater than 100, be greater than 400.

Substrate 807 is generally transparent insulation material, can be glass, polyimide (Polyimide, PI), polymethylmethacrylate (PMMA), polycarbonate (PC), polyethylene terephthalate (PET) etc., but not as limit.

Silver is silvery white metal under general state, and is opaque material, and electric conductivity is splendid.And when silver is made nano-silver thread 801, nano-silver thread 801 has good transmittance and splendid electric conductivity, can be good at applying to the touch-control electrode of touch-screen.

Matrix 803 refers to that the solution containing nano-silver thread 801 is being arranged on substrate 807 through methods such as coatings, after heating, drying makes volatile material volatilization, stays non-nano silver line 801 materials on substrate 807.Nano-silver thread 801 scatters or embeds wherein, forms conductive network, and part nano-silver thread 801 is outstanding from matrix 803 materials.Nano-silver thread 801 relies on matrix 803 to form transparency conducting layer 805, and matrix 803 can protect nano-silver thread 801 to avoid the impact of the external environments such as burn into wearing and tearing.

The thickness of transparency conducting layer 805 is about 10nm-5 μ m, is preferably 20nm-1 μ m, and more excellent is 50nm-200nm.In certain embodiments, the refractive index of transparency conducting layer 805 is 1.3-2.5, and more excellent is 1.35-1.8.

Containing the solution of nano-silver thread 801, refer to, nano-silver thread 801 is dispersed in specific solvent and the aaerosol solution forming, and this solvent can be water, aqueous solution, solion, saline solns, supercritical fluid, oil or its potpourri etc.In this solvent, also can contain other adjuvant, as spreading agent, surfactant, crosslinking chemical, stabilizing agent, wetting agent or thickening agent, but not as limit.

In addition, can, by selecting suitable matrix 803 materials to adjust the optical characteristics of transparency conducting layer 805, particularly solve mist degree problem.For example, matrix 803 can be adjusted into refractive index, component and certain thickness with expectation, can effectively reduce reflection loss, dazzle impact, mist degree.

Mist degree refers to cloud or the muddy outward appearance causing due to nano-silver thread 801 surface light diffusion in transparency conducting layer 805.The mist degree problem of screen can cause in the situation that outdoor scene light irradiates, and screen reflection light intensity is strong, can make user not see screen in the time of serious.

The transmittance of transparency conducting layer 805 or sharpness can limiting by following parameter quantitative: transmittance and mist degree.Transmittance refers to that, by the number percent of the incident light of medium transmission, the transmittance of transparency conducting layer 805 is at least 90%, even can be up to 95%-97%.Mist degree is light diffusing index, and mist degree refers to be separated in incident light and the quantity number percent of the light of scattering in the process of transmission.In embodiment of the present utility model, mist degree can not surpass 5%, even can reach and be no more than 3%-1.5%.

Refer to Fig. 3, the contact panel 10 of the first embodiment of the present utility model comprises substrate 101, nano-silver thread electrode layer 103, and high refractive index layer 105, the first electrode layers 107 and cover plate 109, its cover plate 109 contacts with touch object (finger or pointer).Cover plate 109 comprise cover plate upper surface 1091 and cover plate lower surface 1093 (herein and described later " on " or D score be relative position, it is not absolute definition, can be understood as simultaneously and when upper surface is put upside down, also become lower surface), cover plate upper surface 1091 is touch objects contact level, and cover plate lower surface 1093 can be used as attachment surface direct forming the first electrode layer 107.Substrate 101 comprises upper surface of base plate 1011 and base lower surface 1013, and in the present embodiment, upper surface of base plate 1011 can be used as attachment surface direct forming nano-silver thread electrode layer 103.Base lower surface 1013 is for depending on demonstration module.Can not doubt ground, as a kind of distortion, nano-silver thread electrode layer 103 also can direct forming on base lower surface 1013.

Described high refractive index layer 105 is for being bonded as one by the first electrode layer 107 and nano-silver thread electrode layer 103, when insulating layer structures without other between the first described electrode layer 107 and nano-silver thread electrode layer 103 except high refractive index layer 105, high refractive index layer 105 also has dielectricity, by the setting of insulating of the first electrode layer 107 and nano-silver thread electrode layer 103.High refractive index layer 105 can be selected OCA (optical lens gelatin, Optical Clear Adhesive) or LOCA (liquid optical lens gelatin, Liquid Optical Clear Adhesive).

In capacitance type touch-control panel, the first electrode layer 107 is general near touch face, and 103 of nano-silver thread electrode layers are relatively away from touch face.Nano-silver thread electrode layer 103 and the first electrode layer 107 detect the capacitance variations of touch panel 10 when touched, with touch sensitive region or position of touch.

Between the first electrode layer 107 and nano-silver thread electrode layer 103, form mutual capacitance.When touch action occurs on contact panel 10 surfaces, the mutual capacitance value of touching central area can change, and described touch action is converted into electric signal, through just obtaining the coordinate data of touch action center to the processing of capacitance variation area data.

Refer to Fig. 4, on the first electrode layer 107, have the parallel and equally spaced setting in first axial (X-axis) of a plurality of the first separate electrodes 1071; On nano-silver thread electrode layer 103, there is the second electrode 1031 parallel and equally spaced setting in second axial (Y-axis) of a plurality of separate settings.Wherein the first electrode 1071 and the second electrode 1031 are diamond shaped structure, vertical interlaced is arranged and is formed grid conducting channel 108 mutually, the regular figure of grid conducting channel 108 for being evenly arranged, mesh lines spacing equates can make contact panel 10 printing opacities even on the one hand, the square resistance of grid conducting channel 108 (abbreviation sheet resistance) is evenly distributed on the other hand, resistance deviation is little, and the setting without by revisal resistance deviation, makes imaging even.The shape of the first electrode 1071 and the second electrode 1031 can be regular figure, and for example triangle, rhombus or regular polygon, can be also irregular geometric figures.

In the present embodiment, the first electrode layer 107 and nano-silver thread electrode layer 103 are in different ways, different materials and different process be made.

Specifically, refer to Fig. 5, the first electrode layer 107 adopts tin indium oxide (Indium Tin Oxide, ITO), tin-antiomony oxide (Antimony Doped TinOxide, ATO), indium zinc oxide (IndiumZinc Oxide, IZO), any one material in zinc oxide aluminum (Aluminum Zinc Oxide, AZO), Graphene, metal grill or carbon nano-tube is made.

In the present embodiment, the first electrode layer 107 is molded on the first electrode base material 1073, and the first electrode base material 1073 sticks on the lower surface of cover plate 109, and cover plate 109 is made for rigid material, as tempered glass or reinforced plastic plate.Wherein said tempered glass comprise there is anti-dazzle, sclerosis, the functional layer of anti-reflection or atomizing functions.Wherein, have the functional layer of anti-dazzle or atomizing functions, by the applying coating with anti-dazzle or atomizing functions, formed, coating comprises metal oxide particle; The functional layer with sclerosis function is formed or directly by chemistry or physical method, is hardened by the high-molecular coating coating with sclerosis function; The functional layer with anti-reflection function is titania coating, magnesium fluoride coating or calcium fluoride coating.Be appreciated that and adopt the good plastic plate of transmittance also can process and make rigid cover plate 109 described in the utility model as above-mentioned tempered glass mode.

As distortion, the first electrode base material 1073 can be made for flexible material, as selects pliability flexible material to make, and refers to industrial and has some strength and have certain flexual base material.Comprise PI (polyimide), PC (polycarbonate), polyethersulfone (PES), polymethylmethacrylate (PMMA), acryl, acrylic nitrile-butadiene-styrene (ABS), polyamide (PA), polybenzimidazoles polybutylene (PB), polybutylene terephthalate (PBT), polyester (PE), polyetheretherketone (PEEK), polyetherimide (PEI), polyetherimide, tygon (PE), polyethylene terephthalate (PET), polystyrene (PS), teflon (PTFE), polyurethane (PU), any one of Polyvinylchloride (PVC).

Be necessary explanation, because described the first electrode base material 1073 is made for flexible material, therefore, in mobile or handling process, unavoidably there is deformation or bending in flexible material, therefore adopts the first electrode layer 107 that embeds or imbed more reliable.

In the present embodiment, the first electrode layer 107 is preferably ITO material.Because, the contact panel field that is applied in that present stage ITO material is very ripe, its manufacture craft is also very perfect simultaneously, adopts etching, photoetching, gold-tinted technique that the first electrode layer 107 of ITO is more easily formed to conductive pattern on flexible material.

Nano-silver thread electrode layer 103 adopts nano-silver thread 801 materials to make.Nano-silver thread electrode layer 103 is Fig. 1, and during transparency conducting layer 805 shown in Fig. 2, nano-silver thread 801 embeds or be embedded in substrate 101 upper, and substrate 101 can be Fig. 1, substrate 807 materials shown in Fig. 2.

The mode that forms conductive pattern at nano-silver thread electrode layer 103 has multiple.Wherein a kind of preferred mode be exactly first by the solution coat that contains nano-silver thread 801 on substrate 101, or directly utilize the transparency conducting layer 805 of coated nano-silver thread 801, utilize the techniques such as photoetching, etching, gold-tinted processing procedure, impression on transparency conducting layer 805, to cut into the conductive pattern of first axial (Y-direction).Or by etching, gold-tinted processing procedure, on the first electrode layer 107, forming the conductive pattern of second axial (directions X), the first axial conductive pattern and the second axial conductive pattern cross arrangement, forms the grid conducting channel 108 shown in Fig. 4.In the present embodiment, owing to being provided with the first electrode layer 107 and the two-layer electrode structure of nano-silver thread electrode layer 103, only need on the first electrode layer 107 and nano-silver thread electrode layer 103, respectively lay the conductive pattern of a direction (X or Y).

Substrate 101 embeds fine nano-silver thread 801 owing to will brushing, being coated with, so be preferably flexible base material, various pliability flexible materials are as previously described made.

Refer to Fig. 6, the utility model the pattern of grid conducting channel 108.The first electrode 1071 of grid conducting channel 108 comprises a plurality of the first electrode arrays 1082, and this first electrode array 1082 is (hereinafter to be referred as directions X) equidistantly array setting in a first direction.The shortcoming that easily causes contact panel to scrap because of the fracture of the first electrode array 1082 local lines in order to overcome existing contact panel, in the present embodiment, the first electrode array 1082 comprises and between 1083, two the first inductor electrode arrays 1083 of two the first inductor electrode arrays, be arranged in parallel and at least form electricity connection end in one end at two the first inductor electrode arrays 1083.So far, even if the first electrode array 1082 there is the situation of rupture of line in a first inductor electrode array 1083 wherein time, do not affect the normal work of grid conducting channel 108 yet.The first inductor electrode array 1083 comprises a plurality of the first sensing units 1084, the first sensing unit 1084 is rhombus, between the first sensing unit 1084, by a plurality of the first wire-connectings 1085, realize series connection, between the first adjacent between two sensing unit 1082, comprise one first vacancy section 1086.

The second electrode 1031 is same comprises a plurality of the two the first electrode arrays 1062, the the two the first electrode arrays 1062 are (hereinafter to be referred as Y-direction) equidistantly array setting in second direction, comprising of the two the first electrode arrays 1062 be arranged in parallel between 1063, two the second inductor electrode arrays 1063 of two the second inductor electrode arrays and forms electricity connection ends two second inductor electrode array 1063 one end.The second inductor electrode array 1063 comprises a plurality of the second sensing units 1064, the second sensing unit 1064 is rhombus, between the second sensing unit 1064, by a plurality of the second wire-connectings 1065, realize series connection, between the second adjacent between two sensing unit 1064, comprise one second vacancy section 1066.

From the front of grid conducting channel 108, look over, the second sensing unit 1064 zero lap regions on the first sensing unit 1084 on the first electrode 1081 and the second electrode 1061, that is to say, the first sensing unit 1084 is arranged in the second hollow out region 1066, the position of the second sensing unit 1064 is just positioned at the first hollow out region 1086, best, complementary between the first sensing unit 1084 on the first electrode 1081 and the second sensing unit 1064 on the second electrode 1061.Certainly, between the first sensing unit 1084 and the second sensing unit, 1064 also can be set to into the situation that comprises overlapping region.X and Y-direction can be selected arbitrarily, and the best optimal way in the present embodiment is X and Y-direction quadrature.

Refer to Fig. 7, the utility model the second embodiment provides a kind of manufacture method of contact panel 10, and the method comprises the following steps:

S11: the substrate 101 that a transparent insulation is provided.Described substrate 101 adopts pliability flexible material to make, and refers to industrial and has some strength and have certain flexual base material.Substrate 101 is the touch surface to contact panel 10 away from human body.

S12: form nano-silver thread electrode layer 103 on a wherein surface of described substrate 101.

S13: one first electrode base material 1073 is provided, and the first described electrode base material 1073 adopts pliability flexible material to make, and refers to industrial and has some strength and have certain flexual base material.

S14: the first electrode layer 107 that forms ITO material on the first described electrode base material 1073.

S15: described substrate 101 and described the first electrode base material 1073 are pasted together by high refractive index layer 105.High refractive index layer 105 adopts OCA glue to apply, and when applying, can be coated in nano-silver thread electrode layer 103 or the first electrode layer 107 surfaces, is to apply during coating comprehensively, is different from existing mode that needs frame to apply.The coated area of OCA glue is 100% of the first electrode layer 107 surface areas or nano-silver thread electrode layer 103, or 80%-90%, minimumly be not less than 50%, to take nano-silver thread electrode layer 103 surface areas be benchmark to coated area herein, when the first electrode layer 107 is less than or equal to nano-silver thread electrode layer 103, coated area is 100% of nano-silver thread electrode layer 103, or 80%-90%, is minimumly not less than 50%; When the first electrode layer 107 is greater than nano-silver thread electrode layer 103, in order to realize the stickup of the first electrode layer 107, to fix, the coated area of OCA glue is 100% of the first electrode layer 107, or 80%-90%, is minimumly not less than 50%.The reason that coating surface area is chosen is, when nano-silver thread electrode layer 103 is positioned on substrate 101, the material of nano-silver thread 801 own has mist degree problem and affects visual effect.So, herein OCA glue-line being applied into high refractive index layer 105, the refractive index of this high refractive index layer 105 is 1.52-1.79, so that mist degree can be reduced to below 5% after being coated on nano-silver thread electrode layer 103, the best can be reduced to 3%, 2%, 1.5%.

Because OCA glue is when generally commonly using as cohesive action, its refractive index is 1.52 left and right, as being promoted to, having the more OCA glue of high index of refraction need to do special processing in technique, and higher with induced refractive index, technology difficulty is larger, and cost of manufacture is higher.

The refractive index of high refractive index layer 105 is 1.52-1.79, is preferably 1.7.While choosing, first can consider according to the manufacture craft of OCA glue, 1.52 o'clock is the refractive index of common OCA glue, minimum in cost of manufacture.If further promote its refractive index, difficulty can strengthen gradually, and when being increased to 1.79, continuing up to improve its difficulty will be very large, so comprehensive manufacture difficulty and input cost, 1.79 are the scope that the limit is large.

Be preferably at 1.7 o'clock, except with manufacture craft difficulty and cost mutually outside the Pass, also can be according to the density dependent of nano-silver thread 801 on nano-silver thread electrode layer 103, when nano-silver thread 801 density are when large, the refractive index optimum value of high refractive index layer 105 is just larger, is minimumly not less than 1.52.

In addition, also can be relevant to the material of substrate 101, when the substrate 101 of glass baseplate has high reflection characteristic, the refractive index optimum value of high refractive index layer 105 is just larger, is minimumly not less than 1.52.

In above-mentioned steps, S11-S12 and step S13 mono-S14 there is no sequencing.Can first complete on the first electrode base material 1073 and form the first electrode layer 107, also can first complete and on substrate 101, form nano-silver thread electrode layer 103, or the two carry out simultaneously.

S16: the cover plate 109 that a transparent insulation is provided.Covering is positioned at the first electrode base material 1073 under it and the nano-silver thread electrode layer 103 on the first electrode layer 107, substrate 101 and substrate 101 on the first electrode base material 1073.Described cover plate 109 adopts rigidity transparent insulation material, and wherein rigidity transparent insulation material can adopt tempered glass and pliability transparent panel.More particularly, glass or transparent plastic board that the process intensive treatment that described rigid material adopts is crossed, be called for short tempered glass or reinforced plastic plate.Wherein said tempered glass comprise there is anti-dazzle, sclerosis, the functional layer of anti-reflection or atomizing functions.Wherein, have the functional layer of anti-dazzle or atomizing functions, by the applying coating with anti-dazzle or atomizing functions, formed, coating comprises metal oxide particle; The functional layer with sclerosis function is formed or directly by chemistry or physical method, is hardened by the high-molecular coating coating with sclerosis function; The functional layer with anti-reflection function is titania coating, magnesium fluoride coating or calcium fluoride coating.Be appreciated that and adopt the good plastic plate of transmittance also can process and make rigidity transparent insulation substrate described in the utility model as above-mentioned tempered glass mode.Cover plate upper surface 1093 and human body touch-control medium contact.

Refer to Fig. 8, the utility model the 3rd embodiment provides the another manufacture method of contact panel 10, comprises the following steps:

S21: the substrate 101 that a transparent insulation is provided.Described substrate 101 adopts having mercy on property flexible material to make, and refers to industrial and has some strength and have certain flexual substrate 101.Concrete material as hereinbefore.The touch surface that substrate 101 contacts with contact panel 10 away from touch-control medium.

S22: the cover plate 109 that a transparent insulation is provided.Described cover plate 109 adopts rigidity transparent insulation material, and wherein rigidity transparent insulation material as hereinbefore.Cover plate upper surface 1093 and human body touch-control medium contact.

S23: the first electrode layer 107 that forms ITO material at described upper surface of base plate 1011.

S24: form nano-silver thread electrode layer 103 on described base lower surface 1013.

S25: described substrate 101 and described cover plate 109 are pasted together by high refractive index layer 105.The OCA glue characteristic of high refractive index layer 105 and characteristic select reason basic identical with above-described embodiment.

Refer to Fig. 9, the contact panel 20 of the utility model the 4th embodiment, nano-silver thread electrode layer 203 is attached on substrate 201, and substrate 201 is having mercy on property flexible base, board, substrate 201 allows on the wherein surface that comprehensively covers substrate 201 that nano-silver thread electrode layer 203 cannot be good owing to being heated or producing deformation during temperature variation, can between nano-silver thread electrode layer 203 and substrate 201, apply one deck adhesion promoting layer 202 especially, the coated area of adhesion promoting layer 202 is 100% of nano-silver thread electrode layer 203 surface areas, or 80%-90%, minimumly be not less than 50%, to take nano-silver thread electrode layer 203 surface areas that nano-silver thread 801 is shaped be benchmark to coated area herein, when nano-silver thread electrode layer 203 is greater than, while being less than or equal to substrate 201 surface area, coated area is 100% of nano-silver thread electrode layer 203 surface areas, or 80%-90%, minimumly be not less than 50%.

The expansion coefficient of described adhesion promoting layer 202 is less than the expansion coefficient of flexible base plate 201.Owing to being often accompanied by the variation of temperature in film forming manufacturing process; and have larger expansion coefficient during for flexible base plate when substrate 201; in the process that heats up, lowers the temperature, often have significant volume change; thereby the warpage or the distortion that make flexible base plate 201 produce the second bending direction; and then cause and expose or the problem of poor focusing; the existence of described adhesion promoting layer 202, can be good at addressing the above problem.

The material of described adhesion promoting layer 202 can be selected from high molecular polymer, insulating material, resin, transparent optical cement, oxide, class photoresistance etc., include but not limited to: polyacetylene, polyaniline, polyarylene, polythiophene, Graphene, pentacene, polyhenylene ether (PPE), polyparaphenylene's acetylene (PPV), poly-3, 4-ethylidene dioxy fen (PEDOT), polystyrolsulfon acid (PSS), poly-3-hexyl thiophene (P3HT), poly-3-octyl group thiophene (P3OT), polyether sulphone, poly-C-61-butyric acid-methyl esters (PCBM), poly-[2-methoxyl-5-(2-ethyl-own oxygen base)-1, 4-phenylene ethylene] (MEH-PPV), silicon nitride, the materials such as silicon dioxide or their combination in any.

Described adhesion promoting layer 202 is coated in substrate 201 tops with the form of fluid, and described fluid can be: water, aqueous solution, solion, supercritical fluid, plasma, oil or their combination in any.Include but not limited to: water, acetone, ethyl acetate, ethanol, butyl acetate, amylalcohol, phenolics, alkyd resin, NaOH, isopropyl ether (i-propyl ether), isopropyl alcohol, methyl ethyl ketone (or MEK), methyl formate, methyl n-butyric acie ester, normal butyl alcohol, octane, sherwood oil, propyl alcohol or their combination in any.Surfactant, spreading agent, stabilizing agent or bonding agent also can be included in fluid.

The method that described adhesion promoting layer 202 fluids are coated in substrate 201 tops comprises: sputter, electrostatic spraying, reverse roll coating, groove type coating, slit type coating, impression, hot transfer printing, (meyer rod) coating of Meyer rod, spin coating, serigraphy, photogravure, offset printing, hectographic printing, ink jet printing, intaglio printing, or their combination in any.

When concrete enforcement applies, first arrange after substrate 201, apply up adhesion promoting layer 202, regulate temperature, dry adhesion promoting layer 202, after adhesion promoting layer 202 semi-solid preparations, nano-silver thread 801 solution are coated to adhesion promoting layer 202 upper surfaces, after placing 60-80s, adjust the temperature to 140 ℃, to 203 oven dry of nano-silver thread electrode layer, and with roller, above gained film is carried out to roll extrusion, then cooling.

In another embodiment, the material of adhesion promoting layer 202 itself is the form of solid film.202 of adhesion promoting layers can be by being directly covered in substrate 201 tops to the form of solid film heating roll extrusion, and at this moment the material of adhesion promoting layer 202 includes but not limited to: polyvinyl butyral (PVB), polyvinyl alcohol (PVA) (PVA), polycarbonate (PC), polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), viscose paper etc.

Thus, the touch-control of the 4th embodiment shows that module 20 rhythmo structure from top to bottom comprises successively, cover plate 209, the first electrode base material 2073, the first electrode layers 207, the layer 205 of high index of refraction, nano-silver thread electrode layer 203, adhesion promoting layer 202 and substrate 201.

Between nano-silver thread 801, simply by virtue of intermolecular force, overlap, easily slippage occurs deflecting under effect, provide adhesion promoting layer 202 to make the adhesion between nano-silver thread electrode layer 203 and substrate 201 good.Conventionally nano-silver thread 801 is more firm with adhering to of substrate 201, and the overlap joint between nano-silver thread 801 is more good, thereby good conductance is provided.Generally speaking; film forming manufacturing process is when carrying out; often can accompany variation with temperature; and flexible base plate 101 has larger expansion coefficient; in the middle of the process of cooling that heats up, often have significant volume change; during film forming manufacturing process; Chang Yinwei is adhered to the expansion of the flexible base plate 201 on hard substrate or contraction and the warpage or the distortion that make flexible base plate 201 produce the second bending directions; and then cause exposure or the burnt poly-problem such as bad, by adhesion promoting layer 202, solved the series of problems that expansion or contraction because of flexible base plate 201 cause.

Refer to Figure 10, the contact panel 30 of the utility model the 5th embodiment comprises substrate 301, nano-silver thread electrode layer 303 and levelling blanket 304, described levelling blanket 304 is positioned at above nano-silver thread electrode layer 303, or preferred, nano-silver thread electrode layer 303 is partially submerged in levelling blanket 304 on thickness direction.Nano-silver thread electrode layer 303 is coated on after upper surface of base plate 3011, nano-silver thread 801 can not tile equably and overlap more preferably, make poor flatness, simultaneously owing to overlapping each other the phenomenon that harmful effect nano-silver thread 801 is upturned between nano-silver thread 801.By apply levelling blanket 304 on nano-silver thread electrode layer 303, and after certain PROCESS FOR TREATMENT, thereby can make the overlap joint area between nano-silver thread 801 increase the conductance of raising nano-silver thread electrode layer 303 and reach good surface smoothness.

The material of described levelling blanket 304 can be selected from high molecular polymer, insulating material, resin, transparent optical cement, oxide, class photoresistance etc., include but not limited to: polyacetylene, polyaniline, polyarylene, polythiophene, Graphene, pentacene, polyhenylene acetylene (PPE), polyphenylene ethylene (PPV), poly-3, 4-ethylidene dioxy fen (PEDOT), polystyrolsulfon acid (PSS), poly-3-hexyl thiophene, (P3HT), poly-3-octyl group thiophene (P3OT), poly-(aryl ether sulfone), poly-C-61-butyric acid-methyl esters (PCBM), poly-[2-methoxyl-5-(2-ethyl-own oxygen base)-1, 4-phenylene ethylene] (MEH-PPV), silicon nitride, silicon dioxide, Deng material or their combination in any.

Described levelling blanket 304 can be coated in by the form of fluid nano-silver thread electrode layer 303 tops, and described fluid can comprise: water, aqueous solution, solion, supercritical fluid, plasma, oil or their combination in any.Include but not limited to: water, acetone, ethyl acetate, ethanol, butyl acetate, amylalcohol, phenolics, alkyd resin, NaOH, isopropyl ether (i-propyl ether), isopropyl alcohol, methyl ethyl ketone (or MEK), methyl formate, methyl n-butyric acie ester, normal butyl alcohol, octane, sherwood oil, propyl alcohol or their combination in any.Surfactant, spreading agent, stabilizing agent or bonding agent also can be included in fluid.Method and adhesion promoting layer 302 that described levelling blanket 304 is coated in nano-silver thread electrode layer 303 tops with fluid form are basic identical.

In the specific implementation, arrange after substrate 301, on substrate 301, coated with nano silver line electrode layer 303 is placed after 60-80s, by the method for sputter, levelling blanket 304 materials are coated on wet nano-silver thread electrode layer 303, adjust the temperature to 140 ℃, to the 303 films oven dry of nano-silver thread electrode layer, and with roller, above gained film is carried out to roll extrusion, finally by the film cooling of nano-silver thread electrode layer 303 and levelling blanket 304.

In another distortion embodiment, the material of levelling blanket 304 itself is the form by solid film.304 of levelling blankets can be by being directly covered in nano-silver thread electrode layer 303 tops to the form of solid film heating roll extrusion, and at this moment the material of levelling blanket 304 includes but not limited to: polyvinyl butyral (PVB), polyvinyl alcohol (PVA) (PVA), polycarbonate (PC), polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), viscose paper etc.

The contact panel 30 of the present embodiment also comprises adhesion promoting layer 302.Wherein, described substrate 301 and nano-silver thread electrode layer 303 are identical with nano-silver thread electrode layer 103 with the substrate 101 of the first embodiment, and described adhesion promoting layer 302 is identical with the adhesion promoting layer 202 of the second embodiment, and described levelling blanket 304 is above-mentioned levelling blanket 304.Described adhesion promoting layer 302 is coated on substrate 301 tops, coated with nano silver line electrode layer 303 on adhesion promoting layer 302 again, then in nano-silver thread electrode layer 303 tops, apply levelling blanket 304, form the layer structure of substrate 301, adhesion promoting layer 302, nano-silver thread electrode layer 303 and levelling blanket 304.Under perfect condition, nano-silver thread electrode layer 303 belows are partially submerged in adhesion promoting layer 302 on thickness direction, top is partially submerged in levelling blanket 304 on thickness direction.Above levelling blanket 304, be also respectively arranged with high refractive index layer 305 and cover plate 309 and be arranged on the first electrode layer 307 on the first electrode base material 3073.

With nano-silver thread 801 as after conductive electrode material, nano-silver thread 801 is upturned contact panel 300 surface smoothnesss is exerted an influence, between nano-silver thread 801, only rely on intermolecular force to realize overlap joint, thereby have the bad problem that affects conductance of overlap joint, by levelling blanket 304 being provided and carrying out certain PROCESS FOR TREATMENT, overlap joint between nano-silver thread 801 is become well, thereby conductance is effectively guaranteed, and the surface smoothness of contact panel 30 is greatly improved.

Refer to Figure 11, the contact panel 40 of the utility model the 6th embodiment comprises substrate 401, nano-silver thread electrode layer 403 and optical match layer 406, described optical match layer 406 is the blooming of one deck low-refraction, described optical match layer 406 is positioned on nano-silver thread electrode layer 403, under the first electrode layer 407.

The water droplet angle of described substrate 401 is 0-30 degree, is preferably less than 10 degree.

Described low-refraction is that refractive index is less than 1.6, preferably 1.1～1.6.Optical match layer 406 can be organism or inorganics, or organic and inorganic mixed coating.Si oxide for example, chloro-fluoride, magnesium fluoride, silicon dioxide, lithium fluoride, sodium fluoride, magnesium oxide, silicate, polyurethane, PMMA, PVA, PVP, organosilicon, fluoropolymer, acryl resin, acryl resin+silicon stone nano particle.Preferred refractive index is 1.1,1.25,1.32,1.38,1.46,1.50,1.52.

The optical film thickness of described optical match layer 406 is for being less than or equal to 1/4 wavelength odd-multiple.

The generation type of described optical match layer 406 can be physical deposition, chemogenic deposit, vacuum coating, printing, spraying, flexo, nano impression, serigraphy, scraper for coating, rotary coating, bar-shaped coating, cylinder coating, the coating of line rod, any mode such as dip coated.

Because nano-silver thread electrode layer 403 mist degree problems need to overcome, therefore increase in the present embodiment after an optical match layer 406, the mist degree of described nano-silver thread electrode layer 403 can be reduced to 5% left and right, is preferably less than 3%, 2%, 1.5%.

In another embodiment, optical layers matching layer 406 and nano-silver thread electrode layer 403 positions can exchange.When optical match layer 406 is above nano-silver thread electrode layer 403, can be used as protective seam simultaneously, prevent nano-silver thread 801 oxidations, corrosion etc. is directly exposed to outer series of problems.

The present embodiment also comprises adhesion promoting layer 402 and levelling blanket 404, optical match layer 406 can be between substrate 401 and adhesion promoting layer 402, between adhesion promoting layer 402 and nano-silver thread electrode layer 403, between nano-silver thread electrode layer 403 and levelling blanket 404, between levelling blanket 404 and high refractive index layer 405, between high refractive index layer 405 and the first electrode layer 407, between the first electrode layer 407 and cover plate 409, arrange arbitrarily, in addition adhesion promoting layer 402 and/or levelling blanket 404 can be also optical match layers 406, have characteristic and the effect of optical match layer 406.

The adjusting realizing contact panel 40 mist degrees by optical match layer 406, and flexible and changeable for the status requirement of optical match layer 406, realize flexibly and effectively the reduction to nano-silver thread 801 mist degrees.

Refer to Figure 12, the contact panel 50 of the 7th variant embodiment is structurally with the difference of the contact panel 10 of the first embodiment: after the one side of illustrated the first electrode base material 5073 is attached on cover plate lower surface 5093, described ITO the first electrode layer 507 of the same face shaping at the first electrode base material 5073, make grid conducting channel, between cover plate lower surface 5093 and the first electrode base material 5073, the first electrode layer 507 is set, and the first electrode layer 507 is molded on the first electrode base material 5073.And described nano-silver thread electrode layer 503 forms on flexible substrate 501.Afterwards, substrate 501 is pasted fixedly shaping contact panel 50 with cover plate 509 by high refractive index layer 505.Substantially identical with the processing procedure shown in Fig. 7 or Fig. 8 on processing procedure.

Refer to Figure 13, if nano-silver thread electrode layer 503 is not to be embedded in completely in substrate 501, on substrate 501, form in the step of nano-silver thread electrode layer 503 and can divide two kinds of distortion: nano-silver thread electrode layer 503 is positioned at substrate 501 tops, and nano-silver thread electrode layer 503 is positioned at substrate 501 belows.

Combination by above-mentioned distortion embodiment can draw four kinds of distressed structures, the first distortion is followed successively by cover plate 509, the first electrode base materials 5073, the first electrode layer 507 of ITO material from top to down, the high refractive index layer 505 of OCA glue, nano-silver thread electrode layer 503 and substrate 501.

The second distortion is followed successively by cover plate 509, the first electrode layer 507, the first electrode base materials 5073 of ITO material, the high refractive index layer 505 of OCA glue, nano-silver thread electrode layer 503 and substrate 501 from top to down.

The third distortion is followed successively by cover plate 509, the first electrode base materials 5073, the first electrode layer 507 of ITO material, the high refractive index layer 505 of OCA glue, substrate 501 and nano-silver thread electrode layer 503 from top to down.

The 4th kind of distortion is followed successively by cover plate 509 from top to down, the first electrode layer 507, the first electrode base materials 5073 of ITO material, the high refractive index layer 505 of OCA glue, nano-silver thread electrode layer 503 and substrate 501.

Refer to Figure 14, the contact panel 60 of the utility model the 8th embodiment is structurally with the difference of contact panel 10 shown in the first embodiment: illustrated the first electrode layer 607 is directly molded on cover plate 609, without increasing again the first electrode base material 1073 shown in embodiment mono-, so contact panel 60 can reduce the thickness of one deck, and product is more frivolous.And described nano-silver thread electrode layer 603 still forms on flexible substrate 601.Afterwards, substrate 601 is pasted fixedly shaping contact panel 60 with cover plate 609 by high refractive index layer 605.On processing procedure, a cover plate 609 is first provided, then the first electrode layer 607 of ITO can adopt the process formings such as gold-tinted processing procedure, etching, photoetching on cover plate 609.According to the step described in Fig. 7, Fig. 8, nano-silver thread electrode layer 603 is formed on substrate 601 afterwards, substrate 601 is bonded together by high refractive index layer 605 with cover plate 609.

If nano-silver thread electrode layer 603 is not to be embedded in completely in substrate 601, on substrate 601, form in the step of nano-silver thread electrode layer 603 and can divide two kinds of distortion: nano-silver thread electrode layer 603 is positioned at substrate 601 tops, and nano-silver thread electrode layer 603 is positioned at substrate 601 belows.

Compared with prior art, contact panel 10 of the present utility model adopts the first electrode layer 107 of ITO near touch surface on upper strata, away from touch surface, adopt nano-silver thread electrode layer 103.So can be better that conductive effect is better, in the touching technique field that the better nano-silver thread 801 of outward appearance visual effect updates up till now.

By the first electrode layer 107 of ITO on upper strata near touch surface, nano-silver thread 801 is made in lower floor away from touch surface, be because nano-silver thread 801 away from solving to a certain extent the mist degree problem of nano-silver thread 801 after touch surface.One deck ITO like this, one deck nano-silver thread 801, one on the other, effectively solves a nano-silver thread 801 mist degree difficult problem in use.

In order further to solve the mist degree problem of nano-silver thread electrode layer 103, the utility model selects high refractive index layer 105-OCA glue to carry out the nano-silver thread electrode layer 103 of the first electrode layer 107He lower floor on bonding upper strata, high refractive index layer 105 is positioned on nano-silver thread electrode layer 103, can effectively reduce the reflection of nano-silver thread electrode layer 103, solve the obvious problem of nano-silver thread 801 mist degree.Meanwhile, with the OCA glue of high index of refraction, without the extra high index of refraction lamination that increases, be also conducive to reduce the thickness of touch-control rhythmo structure, obtain lightening effect.

The utility model also provides the distortion of multiple rhythmo structure, and when selecting one deck ITO, one deck nano-silver thread 801, after arranging one on the other, then in conjunction with G1F or GFF structure, is conducive to reduce the thickness of contact panel 10 more.

The foregoing is only preferred embodiment of the present utility model, not in order to limit the utility model, all any modifications of doing within principle of the present utility model, are equal to and replace and within improvement etc. all should comprise protection domain of the present utility model.

Claims

1. a contact panel, is characterized in that, comprising:

Cover plate, comprises first surface and second surface, and described first surface is touch surface;

One first electrode layer and a second electrode lay;

Described the first electrode layer is between second surface and the second electrode lay, and described the second electrode lay is nano-silver thread electrode layer.

2. contact panel as claimed in claim 1, is characterized in that: the first electrode layer is tin indium oxide, tin-antiomony oxide, and indium zinc oxide, zinc oxide aluminum, Graphene, any one material or its combination in metal grill or carbon nano-tube are made.

3. contact panel as claimed in claim 1, it is characterized in that: the transmittance of described nano-silver thread electrode layer is at least 90%, mist degree is no more than 5%, thickness is 50nm-200nm, and refractive index is 1.35-1.8, and described nano-silver thread electrode layer comprises a matrix and is distributed in many nano-silver threads in described matrix, described many nano-silver threads overlap formation conductive network mutually, the line length of described every nano-silver thread is between 20-50 μ m, and wire diameter is less than 50nm, and length breadth ratio is greater than 400.

4. contact panel as claimed in claim 1, is characterized in that: also comprise a high refractive index layer, the refractive index of described high refractive index layer is 1.52-1.79.

5. contact panel as claimed in claim 4, is characterized in that: the coated area of described high refractive index layer is not less than 50% at the coating rate of the first electrode layer or the second electrode lay.

6. contact panel as claimed in claim 1, is characterized in that: also comprise a substrate, described nano-silver thread electrode layer is arranged at described substrate, and wherein a surface is upper, and the first electrode layer is arranged on another surface of described substrate.

7. contact panel as claimed in claim 1, is characterized in that, also comprises:

One substrate;

Described nano-silver thread electrode layer is arranged on arbitrary surface of described substrate;

One first electrode base material, between described substrate and described cover plate;

Described the first electrode layer is arranged on arbitrary surface of described the first electrode base material.

8. the contact panel as described in claim 6 or 7, is characterized in that: also comprise an adhesion promoting layer, be arranged on described nano-silver thread electrode layer, the expansion coefficient of described adhesion promoting layer is less than the expansion coefficient of described substrate.

9. the contact panel as described in claim 6 or 7, is characterized in that: also comprise a levelling blanket, be arranged on nano-silver thread electrode layer, nano-silver thread electrode layer is partially submerged in levelling blanket on thickness direction.

10. the contact panel as described in claim 6 or 7, is characterized in that: also comprise optical match layer, be arranged on described nano-silver thread conductive layer and/or under, its refractive index is 1.1-1.6.