CN105224116A - A kind of contact panel - Google Patents

A kind of contact panel Download PDF

Info

Publication number
CN105224116A
CN105224116A CN201410260596.9A CN201410260596A CN105224116A CN 105224116 A CN105224116 A CN 105224116A CN 201410260596 A CN201410260596 A CN 201410260596A CN 105224116 A CN105224116 A CN 105224116A
Authority
CN
China
Prior art keywords
nano
silver thread
cabling
electrode
contact panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410260596.9A
Other languages
Chinese (zh)
Inventor
梁威康
连少芳
袁琼
陈艺琴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TPK Touch Solutions Xiamen Inc
Original Assignee
TPK Touch Solutions Xiamen Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TPK Touch Solutions Xiamen Inc filed Critical TPK Touch Solutions Xiamen Inc
Priority to CN201410260596.9A priority Critical patent/CN105224116A/en
Publication of CN105224116A publication Critical patent/CN105224116A/en
Pending legal-status Critical Current

Links

Landscapes

  • Position Input By Displaying (AREA)

Abstract

The present invention relates to a kind of contact panel, it comprises many nano-silver thread electrodes and many nano-silver thread electrode cablings for connecting these many nano-silver thread electrode to external drive control circuits, nano-silver thread electrode cabling comprises nano-silver thread first limit electrode cabling and/or nano-silver thread Second Edge electrode cabling, and this nano-silver thread first limit electrode cabling connects a wherein end of this nano-silver thread electrode; This nano-silver thread Second Edge electrode cabling connects relative the other end of this nano-silver thread electrode.When the present invention adopts bilateral cabling, due to cabling and electrode material be nano-silver thread therefore electrode and cabling can together with processing procedure complete, in addition owing to adopting bilateral cabling, therefore when another side breaks, another side still can ensure Signal transmissions, and the touch-control sensitivity of contact panel can be improved, again because nano-silver thread has good light transmission, make contact panel be achieved Rimless design.

Description

A kind of contact panel
[technical field]
The present invention relates to technical field of touch control, a kind of especially contact panel.
[background technology]
Touch control device is subject to the favor of telecommunications industry gradually because of advantages such as its convenient operation, imaging are effective, function diversification, and is widely used on the products such as information system equipment, home appliance, communication apparatus, personal portable.
With contact panel in recent years in the rapid emergence of communications industry, flourish particularly in mobile communication industry, contact panel becomes the first-selected product of imaging display apparatus now at one stroke.Contact panel mainly electric resistance touch-control panel and the capacitance type touch-control panel that utilization rate is the highest, but user is for controllability, the consideration of ease for use and appearance, and capacitance type touch-control panel mostly can be selected as its best preferred unit.
At traditional intelligence mobile phone, as in the capacitance type touch-control panel of iphone etc., the material of touch control electrode is generally tin indium oxide (referred to as ITO).The transmittance of ITO is very high, and electric conductivity is better.But ITO is expensive, ITO is more crisp, pliability is poor, easily rupture time bending and cause dysfunction, even if be destroyed bending being also very easy to running into less physical stress, ITO conductance is generally greater than 70 ohm/sheet resistance, along with the progressively increase of contact panel size, when being particularly applied to the panel of more than 15 cun, the defect of ITO is more and more outstanding, wherein the most obvious defect is exactly that the surface resistance of ITO is excessive, ITO cannot meet the requirement of current touch-control product for resistivity, the electric conductivity that large touch panel is good and enough sensitivity cannot be ensured, also the development trend of the continuous low priceization of electronic product cannot be applicable to.
In addition, in manufacture method, ITO originally needs vacuum chamber, higher depositing temperature and/or high annealing temperature to obtain high conductance, causes the integral manufacturing cost of ITO very expensive.In processing procedure, ITO generally adopts sputter and gold-tinted light blockage coating, exposure, development, etching, stripping, numerous and diverse operation such as high-temperature baking, the high and length consuming time of cost.
Traditional ITO contact panel adopts metal routing usually, and therefore touch control electrode and metal routing will complete by a point twice processing procedure, so processing procedure is complicated and cost is higher; When panel size increases, track lengths need increase with the size of panel, and then causes trace resistances to become large, makes touch-control sensitivity decrease; Exist in addition and cause signal interruption, so new improvement design will be very necessary when fracture appears in part cabling.
[summary of the invention]
In order to overcome when existing ITO mixes metal routing as conductive layer simultaneously, production cost is high, processing procedure is complicated, and the problems such as broken string easily appear in monolateral cabling, the invention provides one and not easily occur broken string, ensure the contact panel of touch accuracy.
The present invention is that the technical scheme solved the problems of the technologies described above is to provide a kind of contact panel, it comprises many nano-silver thread electrodes and many nano-silver thread electrode cablings for connecting these many nano-silver thread electrode to external drive control circuits, nano-silver thread electrode cabling comprises nano-silver thread first limit electrode cabling and/or nano-silver thread Second Edge electrode cabling, and this nano-silver thread first limit electrode cabling connects a wherein end of this nano-silver thread electrode; This nano-silver thread Second Edge electrode cabling connects relative the other end of this nano-silver thread electrode.
Preferably, the width of described nano-silver thread electrode cabling is 15um-30um, and walking distance between centers of tracks is 15um-30um.
Preferably, described nano-silver thread electrode, the thickness of nano-silver thread electrode cabling is 20nm-1 μm, and refractive index is 1.3-2.5.
Preferably, described nano-silver thread first limit electrode cabling and nano-silver thread Second Edge electrode cabling are connected to each other, and form primary Ioops.
Preferably, described nano-silver thread first limit electrode cabling is at least a Rotating fields; Described nano-silver thread Second Edge electrode cabling is at least a Rotating fields.
Preferably, described nano-silver thread first limit electrode cabling is two-layer or sandwich construction; Described nano-silver thread Second Edge electrode cabling is two-layer or sandwich construction.
Preferably, an insulation course is comprised further between the described each layer of nano-silver thread first limit electrode cabling, on insulation course, one end of corresponding nano-silver thread first limit electrode cabling arranges through hole, and described nano-silver thread first limit electrode cabling should be connected by the nano-silver thread electrode pair of through hole with part; An insulation course is comprised further between the described each layer of nano-silver thread Second Edge electrode cabling, on insulation course, one end of corresponding nano-silver thread Second Edge electrode cabling arranges through hole, and described nano-silver thread Second Edge electrode cabling should be connected by the nano-silver thread electrode pair of through hole with part.
Preferably, described nano-silver thread electrode and nano-silver thread electrode cabling include a matrix and are distributed in many nano-silver threads in described matrix, described many nano-silver threads overlap formation conductive network mutually, the line length of described every bar nano-silver thread is between 20-50 μm, wire diameter is less than 50nm, and length breadth ratio is greater than 400.
Preferably, described nano-silver thread electrode arranges a levelling blanket further, and described levelling blanket and matrix realize mutual embedding in a thickness direction, and described nano-silver thread is contained in levelling blanket at least partly.
Preferably, comprise a shielding line further, be arranged at outside this nano-silver thread distribution of electrodes region, surround this nano-silver thread electrode cabling.
Compared with prior art, first, first conductive layer and/or second conductive layer of contact panel of the present invention by adopting nano-silver thread conductive layer to be made into contact panel, due to nanometer silver wire material itself, to have resistivity low, light transmission rate is more than 85%, and sheet resistance 12-120ohm/sq, makes contact panel of the present invention have the features such as good electric conductivity, ensure that the touch-control of contact panel is highly sensitive, especially in particularly evident to the lifting of sensitivity in the middle of large-sized contact panel.Meanwhile, because nano-silver thread has good light permeability, and trace width and spacing little, make the non-touch-control region of contact panel narrow especially, thus Rimless contact panel be achieved.Rimless contact panel makes user visually openr, and adding users is experienced.Secondly, the invention provides a kind of contact panel, and can increase by a levelling blanket in this contact panel layer structure, this levelling blanket makes the overlap joint between nano-silver thread become good, thus conductance is effectively ensured, and make contact panel, surface smoothness be greatly improved.
Again, contact panel of the present invention can adopt bilateral cabling to improve the first conductive electrode cabling and the second conductive electrode cabling material when adopting nano-silver thread or other conductive metal material because make, use or the reason such as other improper operation and the cabling that is easy to produce overlaps bad situation, thus reinforcement signal transmission, one side open circuit of cabling makes signal cannot be transferred to situation on touch-control IC to prevent contact panel from may occur in signals transmission, improves the touch-control sensitivity of contact panel.In addition, due to the size effect of its Nano grade, make it have excellent light transmission and flexible resistance, therefore be more suitable for the design needs for the more hommization products in present market, as wearable type products such as motion bracelets.On processing procedure, owing to adopting nano-silver thread as cabling material, can make the first conductive electrode and corresponding cabling thereof like this, the second conductive electrode and corresponding cabling thereof complete in processing procedure, simplify manufacture craft, and consuming time few, cost is low.In addition, the first conductive electrode cabling and the second conductive electrode cabling are divided into multiple routing layer, the cabling quantity of each routing layer is reduced relatively, can save the area in the non-touch-control region shared by lead-in wire, realize the object of narrow frame design.And, in limited frame region, because the conductive electrode number of leads of each routing layer can reduce relatively, therefore suitably can strengthen the width between contact conductor and spacing, be convenient to arrangement and the making of conductive electrode lead-in wire, increase fine ratio of product.
[accompanying drawing explanation]
Fig. 1 is the cross section structure schematic diagram of nano-silver thread film of the present invention.
Fig. 2 is the floor map of nano-silver thread film of the present invention.
Fig. 3 is first embodiment of the invention contact panel cutting structural representation.
Fig. 4 is the planar structure schematic diagram of the first conductive layer in contact panel shown in Fig. 3.
Fig. 5 is the planar structure schematic diagram of the second conductive layer in contact panel shown in Fig. 3.
Fig. 6 is the vertical view of contact panel shown in Fig. 3.
Fig. 7 is second embodiment of the invention contact panel method for making process flow diagram.
Fig. 8 is third embodiment of the invention contact panel method for making process flow diagram.
Fig. 9 is the planar structure schematic diagram of fourth embodiment of the invention contact panel.
Figure 10 is the planar structure schematic diagram of fifth embodiment of the invention contact panel.
Figure 11 is the planar structure schematic diagram of sixth embodiment of the invention contact panel.
Figure 12 is the multilayer cabling schematic diagram of seventh embodiment of the invention contact panel.
Figure 13 is eighth embodiment of the invention contact panel cutting structural representation.
Figure 14 is the display device cutting plane structural drawing that the present invention adopts contact panel shown in Fig. 3 to make.
[embodiment]
In order to make object of the present invention, technical scheme and advantage are clearly understood, below in conjunction with accompanying drawing and embodiment, are further elaborated to the present invention.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
Refer to Fig. 1 and Fig. 2, it is the cutting structural representation of nano-silver thread conductive film 800, nano-silver thread conductive layer is generally produced on substrate 807, comprise the many nano-silver threads 801 be embedded in matrix 803, substrate 807 is generally transparent insulation material, and nano-silver thread arrangement wherein mutually overlaps and forms conductive network.Because the wire diameter of nano-silver thread is larger, its resistivity is less, but its surface area can increase, and therefore can increase the mist degree of nano-silver thread conductive film; The length of nano-silver thread is longer in addition, more easily overlaps, but the resistivity of nano-silver thread will increase, and therefore needs adjustment nano-silver thread line length and line width values, the problem of balance mist degree and resistance.Nano-silver thread 801 (silvernanowires, be called for short SNW) line length be 10-300 μm, preferred 20-100 μm, preferably its length 20-50 μm, the wire diameter of nano-silver thread 801 is less than 500nm or is less than 200nm, 100nm, preferably be less than 50nm, and its length breadth ratio ratio of wire diameter (line length with) is greater than 10, is preferably greater than 50, more preferably greater than 400.
Silver is silvery white metal under general state, and is opaque material, and electric conductivity is splendid.And when silver makes nano-silver thread, nano-silver thread has good transmittance and splendid electric conductivity, can be good at the touch control electrode applying to contact panel.
Matrix 803 refers to that the solution containing nano-silver thread is being arranged on substrate 807 through methods such as coatings, after heating, drying makes volatile material volatilize, stays the non-nano silver line material on substrate 807.Nano-silver thread 801 scatters or embeds wherein, forms conductive network, and part nano-silver thread 801 is outstanding from matrix 803 material.Nano-silver thread 801 relies on matrix 803 to form nano-silver thread conductive layer 805, and matrix 803 can protect nano-silver thread 801 from the impact of the external environments such as burn into wearing and tearing.
The thickness of nano-silver thread conductive layer is about 10nm-5 μm, and be preferably 20nm-1 μm, more excellent is 50nm-200nm.In certain embodiments, the refractive index of transparency conducting layer 805 is 1.3-2.5, and more excellent is 1.35-1.8.
Solution containing nano-silver thread 801 refers to, nano-silver thread 801 disperses the aaerosol solution formed in specific solvent, and this solvent can be water, aqueous solution, solion, saline solns, supercritical fluid, oil or its potpourri etc.Also can other adjuvant be contained, as spreading agent, surfactant, crosslinking chemical, stabilizing agent, wetting agent or thickening agent, but not as limit in this solvent.
In addition, by selecting suitable matrix 803 material to adjust the optical characteristics of nano-silver thread conductive layer, particularly haze issues is solved.Such as, matrix 803 can be adjusted to refractive index, component and certain thickness with expectation, can effectively reduce reflection loss, glare effects, mist degree.
Mist degree refers to the outward appearance of cloud because nano-silver thread 801 surface light diffusion in nano-silver thread conductive layer causes or muddiness.The haze issues of screen can cause when outdoor scene light irradiates, and screen reflection light intensity is strong, and user can be made time serious not see screen.
The transmittance of nano-silver thread conductive layer or sharpness can limiting by following parameter quantitative: transmittance and mist degree.Transmittance refers to the number percent of the incident light by medium transmission, and the transmittance of nano-silver thread conductive layer is at least 85%, even can up to 90%.Mist degree is light diffusing index, and mist degree refers in incident light to be separated and the number percent of light of scattering in the process of transmission.Mist degree more than 5%, even can not can reach and be no more than 3%-1.5% in an embodiment of the present invention.
Refer to Fig. 3 and Fig. 4, first embodiment of the present invention contact panel 10 comprises first substrate 101 from top to bottom, the first conductive layer 103, bonding coat 109, the second conductive layer 105, second substrate 107.The lower surface of first substrate 101 lays the first conductive layer 103, second substrate 107 upper surface lays the second conductive layer 105 (in all embodiments, the position determiners such as upper and lower, left and right are only limitted to the relative position in given view, but not absolute position).Bonding coat 109 is between the first conductive layer 103 and the second conductive layer 105.This contact panel 10 defines touch area 133 and a non-touch-control region 131 in the plane of this second substrate 107 and first substrate 101, and this non-touch-control region 131 surrounds the surrounding of this touch area 133.Certainly, in other embodiments, first conductive layer 103 can be laid in upper surface or the lower surface of first substrate 101, second conductive layer 105 also can be laid in upper surface or the lower surface of second substrate 107, and the present embodiment is laid in first substrate 101 lower surface and the second conductive layer 105 for the first conductive layer 103 and is laid in second substrate 107 upper surface and illustrates.
What first substrate 101 adopted is glass, tempered glass, sapphire glass.Wherein said tempered glass comprises the functional layer with anti-dazzle, sclerosis, anti-reflection or atomizing functions.Wherein, have functional layer that is anti-dazzle or atomizing functions, formed by the applying coating with anti-dazzle or atomizing functions, coating comprises metal oxide particle; The functional layer with sclerosis function is applied by the high-molecular coating with sclerosis function and is formed or directly hardened by chemistry or physical method; The functional layer with anti-reflection function is titania coating, magnesium fluoride coating or calcium fluoride coating.
As distortion, first substrate 101 also can be made for flexible material, as selected having mercy on property flexible material to make, referring to and industrially has some strength and have certain flexual substrate.Include but not limited to PI (polyimide), PC (polycarbonate), polyethersulfone (PES), polymethylmethacrylate (PMMA), acryl, acrylic nitrile-butadiene-styrene (ABS), polyamide (PA), polybenzimidazoles polybutylene (PB), polybutylene terephthalate (PBT), polyester (PE), polyetheretherketone (PEEK), polyetherimide (PEI), polyetherimide, tygon (PE), polyethylene terephthalate (PET), polystyrene (PS), teflon (PTFE), polyurethane (PU), the combination in any of any one or above-mentioned material of Polyvinylchloride (PVC).
First substrate 101 upper surface is touch operation surface, and even first substrate 101 can be understood as the cover plate often stated.
Second substrate 107 can select the material of above-mentioned first substrate 101.Second substrate 107 is away from human eye, and the attachment of its lower surface shows module.
Bonding coat 109 is for being bonded as one by the first conductive layer 103 and the second conductive layer 105, bonding coat 109 is insulating material.Bonding coat 109 can select Optical transparent adhesive, and (OpticalClearAdhesive is called for short OCA glue.
First conductive layer 103 comprises the first conductive electrode 121 of multiple parallel equidistant arrangement in a first direction, and multiple first conductive electrode first limit cabling 161.Wherein the plurality of first conductive electrode first limit cabling 161 respectively with the first conductive electrode 121 one_to_one corresponding of the plurality of equidistant arrangement, first cabling 161 one end, conductive electrode first limit is electrically connected with the first corresponding conductive electrode 121 respectively, the other end is connected to the correspondence position in the binding region 135 at this first conductive layer 103 1 side respectively, and this binding region 135 is for being connected to external drive control circuit by flexible PCB (figure does not indicate).
This first conductive electrode first limit cabling 161 is for connecting this first conductive electrode 121 to one Drive and Control Circuit.
Wherein, the plurality of first conductive electrode 121 is arranged in above-mentioned touch area 133, and the plurality of first conductive electrode first limit cabling 161 is arranged in above-mentioned non-touch-control region 131, is positioned at this side, touch area 133.
Refer to Fig. 5, this second conductive layer 105 comprises the second conductive electrode 123 of multiple parallel equidistant arrangement in a second direction, multiple second conductive electrode first limit cabling 165 and the second conductive electrode Second Edge cabling 167.The second wherein the plurality of conductive electrode first limit cabling 165 and the second conductive electrode 123 one_to_one corresponding of the second conductive electrode Second Edge cabling 167 and the plurality of equidistant arrangement, each second conductive electrode 123 two ends connects the second conductive electrode first limit cabling 165 and one second conductive electrode Second Edge cabling 167 of a correspondence respectively.The other end of this second conductive electrode first limit cabling 165 and the second conductive electrode Second Edge cabling 167 is electrically connected with the corresponding binding region 135 at this second electrode lay 105 1 side respectively, and binding region 135 is for being connected to external drive control circuit by flexible PCB (figure does not indicate).The plurality of second conductive electrode 123 is arranged in above-mentioned touch area 133, and the plurality of second conductive electrode first limit cabling 165 and the second conductive electrode Second Edge cabling 167 correspond to above-mentioned non-touch-control region 131, are divided into the both sides of this touch area 133.
Non-touch-control region 131 is provided with shielding line 199 near the edge of contact panel 10, and this shielding line 199 ground connection (figure does not indicate), this shielding line 199 is for shielding undesired signal.
This first conductive layer 103 and the second conductive layer 105 at least one deck are formed by nano-silver thread conductive layer 805.The material of this cabling 161, second conductive electrode first limit, the first conductive electrode first limit cabling 165 and the second conductive electrode first limit cabling 167 is also formed by nano-silver thread conductive layer 805.
Refer to Fig. 6, in the present embodiment, this the first conductive electrode first limit cabling 161, during the material selection nano-silver thread conductive layer 805 of the second conductive electrode first limit cabling 165 and the second conductive electrode first limit cabling 167, it is 5um-50um that processing procedure due to nano-silver thread conductive layer 805 can realize trace width, even 15-30um can be reached, walking distance between centers of tracks is 5um-50um, even 15-30um can be reached, therefore cabling width and to walk distance between centers of tracks all smaller, cabling 161, 165, region shared by 167 can be very little, non-touch-control region 131 can be realized like this reduce, when contact panel 10 area is constant, touch area 133 area is made to increase by adopting nano-silver thread conductive layer 805 to form cabling by patterning, because nano-silver thread conductive layer 805 is that light transmission is good, so at least shielding layer 168 can not be done in both sides, realize the design of contact panel 10 Rimless.
Compared with prior art, first the advantages such as, first embodiment of the invention contact panel 10, first conductive electrode 121 and the second conductive electrode 123 adopt nano-silver thread 801 to be made, and have price low, resistance is low, frivolous, and flexibility is good; Secondly, when nano-silver thread 801 is as cabling material, contact panel adopts nano-silver thread conductive layer 805 to form cabling by patterning, because nano-silver thread conductive layer 805 light transmission is good, therefore, contact panel 10 at least both sides can not do shielding layer, realizes the design of contact panel 10 Rimless.Again, adopt nano-silver thread 801 as cabling and electrode material, realize the first conductive electrode 121 and cabling thereof, the second conductive electrode 123 and cabling thereof complete in people having a common goal's processing procedure, simplify manufacture craft, and consuming time few, cost is low.And, the cabling of the second conductive electrode 123 comprises the second conductive electrode first limit cabling 165 and the second conductive electrode Second Edge cabling 167 i.e. bilateral cabling design, signal transmission can be strengthened, the open circuit on one side of the cabling that prevents contact panel 10 from may occur in signals transmission makes signal cannot be transferred to situation on touch-control IC, improves the touch-control sensitivity of contact panel 10.
Referring to Fig. 7, is second embodiment of the invention, there is disclosed the first embodiment contact panel 10 manufacture method, comprises the following steps: S11, provide a first substrate 101; S12, first substrate 101 is formed the first conductive electrode 121; S13, first substrate 101 is formed the first conductive electrode first limit cabling 161; S14, provides a second substrate 107; S15, second substrate 107 is formed the second conductive electrode 123; S16, second substrate 107 is formed the second conductive electrode first limit cabling 165 and the second conductive electrode Second Edge cabling 167; S17, is pasted together first substrate 101 and second substrate 107; And S18 pressing one flexible PCB is to first substrate 101.
In step s 11: the first substrate 101 that a transparent insulation is provided.Described first substrate 101 adopts rigid material or flexible material to make, and first substrate 101 can as cover plate, the upper surface of first substrate 101 as touch surface, for human body touch-control medium contact.
In step s 12, one deck ITO layer is coated with in the touch area 133 of described first substrate 101 lower surface, and this ITO layer is done expose etch processes further, form the first conductive electrode 121 of anticipation, can wet etching be adopted, exposure, development, stripping, oxide etch, laser etches, the engraving methods such as electric arc high-frequency induction etching.
In step s 13, the non-touch-control region 131 of described first substrate 101 is coated with one deck SNW solution, forms one deck nano-silver thread conductive layer 805, and etching formation first conductive electrode first limit cabling 161 is carried out to this nanometer money conductive layer 805.In this step, also can complete the connection of binding region 135 and external drive control circuit simultaneously.
In step S14, provide the second substrate 107 of a transparent insulation.Described second substrate 107 adopts having mercy on property flexible material to make.Second substrate 107 is away from the touch surface of contact panel 10.
In step S15, be coated with a nano-silver thread conductive layer 805 at described second substrate 107 upper surface, and the second conductive electrode 123 by being formed this nano-silver thread conductive layer 805 patterning.
This coating process comprises: ink-jet, broadcasts sowing, intaglio printing, letterpress, flexo, nano impression, serigraphy, scraper for coating, or rotary coating.
The method of this patterning comprises wet etching, exposure etching, development etching, stripping oxide etch, or laser etching.Wherein the conductive region of anticipation covers by this stripping oxide etch system, is placed in moisture oxygen enrichment and H 2in S environment, the nano-silver thread of non-conducting areas is oxidized to non-conductive metal oxide.Laser etching system adopt laser by radium-shine for non-conducting areas nano-silver thread fall, formed nonconductive regions.Electric arc high-frequency induction etching system adopts hf electric arc bombardment non-conducting areas nano-silver thread, silver-colored line is gasified and forms non-conducting areas.
In step S16: form the second conductive electrode first limit cabling 165 and the second conductive electrode Second Edge cabling 167 on described second substrate 107, this first limit cabling 165 and this Second Edge cabling 167 lay respectively at the both sides of this second conductive electrode 123.
In step S17: fit corresponding with this second substrate 107 for this first substrate 101 with bonding coat 109, make first substrate 101, the first conductive layer 103 that second substrate 107 is arranged and the second conductive layer 105 are pasted together.The OCA glue characteristic of bonding coat 109 and characteristic select reason substantially identical with above-described embodiment.Bonding coat 109 adopts OCA glue to fit, and when fitting, being laminating comprehensively, being different from existing only in the mode that the frame of non-touch-control region 131 correspondence is fitted during laminating.The fitting area of OCA glue is 120% of the first conductive layer 103 surface area or the second conductive layer 105, or 80%-90%, minimumly be not less than 50%, herein fitting area with the first conductive layer 103 or the second conductive layer 105 surface area for benchmark, namely when the first conductive layer 103 is less than or equal to the second conductive layer 105, fitting area is 120% of the second conductive layer 105, or 80%-90%, is minimumly not less than 50%; When the first conductive layer 103 is greater than the second conductive layer 105, in order to the stickup realizing the second conductive layer 105 is fixed, the fitting area of OCA glue is 120% of the second conductive layer 105, or 80%-90%, is minimumly not less than 50%.The reason that coating surface area is chosen is, the material of nano-silver thread 801 own has haze issues and affects visual effect.So, herein OCA glue-line is fitted into the optical cement layer with certain refractive index, the refractive index of this optical cement layer is 1.52-1.79, and mist degree can be reduced to less than 3% to make to be fitted in after on the second conductive layer 105 that nano-silver thread makes, the best can be reduced to less than 1.5%.
In S18: pressing (Bonding) flexible PCB.Utilize ACF (full name: AnisotropicConductiveFilm, Chinese: anisotropic conductive film) that flexible PCB and binding region 135 are carried out pressing, make touching signals be transferred to touch chip.
In above-mentioned steps, S12 and step S13, S14 there is no sequencing.Namely first can complete on second substrate 107 and form the second conductive layer 105, also first can complete forming the first conductive layer 103 on first substrate 101, or the two carry out simultaneously.
Refer to Fig. 8, third embodiment of the invention, there is disclosed contact panel 10 the second manufacture method, it comprises the following steps:
In the step s 21: the first substrate 101 that a transparent insulation is provided.Described first substrate 101 adopts rigid material to make or flexible material, and first substrate 101 can as cover plate.
In step S22: the first conductive layer 103 made at described first substrate 101 lower surface formation nano-silver thread conductive layer 805 material, and make nano-silver thread first conductive electrode 121 and the nano-silver thread first conductive electrode first limit cabling 161 of predetermined pattern in processing procedure, the patterned manner of the second embodiment can be adopted.
In step S23: the second substrate 107 that a transparent insulation is provided.Described second substrate 107 adopts rigid material or flexible material to make, and wherein rigid material or flexible material are as hereinbefore.
In step s 24 which: on described second substrate 107 upper surface, be coated with formation one nano-silver thread conductive layer 805, and patterning forms the second conductive electrode 123, second conductive electrode first limit cabling 165 and the second conductive electrode Second Edge cabling 167, thus form the second conductive layer 105.
In step s 25: on the second conductive layer 105, be coated with one deck OCA glue, this bonding coat 109 is formed after leaving standstill a schedule time, and this first substrate 101 is aimed at laminating to this second substrate 107, realize this first conductive layer 103 and be pasted together by bonding coat 109 with this second conductive layer 105.
In step S26: pressing (Bonding) flexible PCB.Utilize ACF (full name: AnisotropicConductiveFilm, Chinese: anisotropic conductive film) that flexible PCB and binding region 135 are carried out pressing, make touching signals be transferred to touch chip.
Compared with prior art, the manufacturing approach craft of third embodiment of the invention contact panel is simple, consuming time few, save cost, namely it achieve the first in technological process once, the second electrode lay 103,105 shaping, this each electrode layer 103,105 comprises the cabling of conductive electrode and correspondence respectively.
Refer to Fig. 9, it is the structural representation of fourth embodiment of the invention contact panel 40, this contact panel 40 is substantially identical with the structure of the first embodiment, its difference is only: the first conductive electrode 421 adopts bilateral cabling to design, and its cabling comprises the first conductive electrode first limit cabling 461 and the first conductive electrode Second Edge cabling 463.One end of this each the first conductive electrode 421 realizes the electrical connection with binding region 435 by the first conductive electrode first limit cabling 461 of a correspondence, and the other end is electrically connected with binding region 435 by the first conductive electrode Second Edge cabling 463 of a correspondence.
One end of this each the second conductive electrode 423 realizes the electrical connection with binding region 435 by the second conductive electrode first limit cabling 465 of a correspondence, and the other end is electrically connected with binding region 435 by the second conductive electrode Second Edge cabling 467 of a correspondence.
The distributed areas of the plurality of first conductive electrode 421 and the second conductive electrode 423 are touch area 433.Multiple first cabling 461, first conductive electrode Second Edge cabling 463, second conductive electrode first limit, conductive electrode first limit cabling 465 and the second conductive electrode Second Edge cabling 467 correspond to non-touch-control region 431, are divided into this touch area 433 around.
Non-touch-control region 431 is provided with shielding line 499 near the edge of contact panel 40, and this shielding line 499 of shielding line 499 ground connection (figure does not indicate) is for shielding undesired signal.
Compared to prior art, by to first, second conductive electrode 421,423 frame modes configuring bilateral cabling respectively, it further can ensure the stability of this contact panel 40, can not only because part cabling be because transport, use or occur fracture in processing procedure process and produce bad screen and maybe can not use, having ensured serviceable life and the functional stabilization of product.
Refer to Figure 10, for the floor map of fifth embodiment of the invention contact panel, this contact panel 50 is substantially identical with the structure of the 4th embodiment, its difference is only: the two ends electrical connection of the first conductive electrode 521 that the two ends of the first conductive electrode first limit cabling 561 and the first conductive electrode Second Edge cabling 563 are corresponding with respectively, the the first conductive electrode first limit cabling 561 and the first conductive electrode Second Edge cabling 563 that are connected to each first conductive electrode 521 two ends extend to bind in region 535, and formation one closed-loop path (closedloop) that is connected with each other in binding district.In other words, any point on this first conductive electrode first limit cabling 561 is as starting point, the first conductive electrode 521 along the first conductive electrode first limit cabling 561 and correspondence is advanced, the last starting point still getting back to this first conductive electrode first limit cabling 561, therefore this structure can be claimed to be a closed-loop path.In like manner, second conductive electrode 523 also adopts above-mentioned cabling to design, be connected to binding region 535 by the second conductive electrode first limit cabling 565 and the second conductive electrode Second Edge cabling 567 to be electrically connected with external drive control circuit (not shown), therefore each substrate of contact panel 50 only needs to arrange a binding region 535 namely can be electrically connected (this mode also can be described as one singly go out pin design) with external drive control circuit, thus reach simplification joint technology.In addition, because each first conductive electrode first limit cabling 561 is electrically connected to the first corresponding conductive electrode 521 two ends simultaneously, so the first conductive electrode first limit cabling 561 structure can be considered a bilateral cabling design, by adopting nano-silver thread conductive layer as bilateral cabling material, namely processing procedure can be simplified, improve the stability of Signal transmissions, accelerate transmission speed, the Rimless design at least both sides can be realized again.
The distributed areas of the plurality of first conductive electrode 521 and the second conductive electrode 523 are touch area 533.Multiple first cabling 561, first conductive electrode Second Edge cabling 563, second conductive electrode first limit, conductive electrode first limit cabling 565 and the second conductive electrode Second Edge cabling 567 correspond to non-touch-control region 531, are divided into this touch area 533 around.
Non-touch-control region 531 is provided with shielding line 599 near the edge of contact panel 50, and this shielding line 599 ground connection (figure does not indicate), this shielding line 599 is for shielding undesired signal.
Refer to Figure 11, be the planar structure schematic diagram of sixth embodiment of the invention contact panel, this touch panel 90 is substantially identical with the structure of embodiment one, and difference is only: this first conductive electrode 921 and the second conductive electrode 923 are formed on the same layer.
First conductive electrode 921 comprises multiple first sensing unit 935, first sensing unit 935 is rhombus, realize series connection by multiple first wire-connecting 936 between first sensing unit 935, between the first adjacent between two sensing unit 935, comprise multiple first vacancy section (non-label).Correspondingly, it is rhombus that the second conductive electrode 923 comprises multiple second sensing unit 938, second sensing unit 938, realizes series connection between the second sensing unit 938 by multiple second wire-connecting 939.First sensing unit 935 and the projection of the second sensing unit 938 respectively on contact panel 90 front without overlapping region,
That is, second sensing unit 938 be arranged in the first vacancy section, best, complementary between first sensing unit 935 and the second sensing unit 938, the material making light pass contact panel 90 like this maintains unanimously as far as possible, optical effect is best, overcomes the light brought because of material refractive index difference uneven, appears the shortcomings such as electrode pattern layer in one's mind.There is an overlapping region in the first wire-connecting 936 and the second wire-connecting 939, first wire-connecting 936 is positioned at below the second wire-connecting 939, in order to make the first wire-connecting 936 and the second wire-connecting 939 at this overlapping region mutually insulated, we need to adopt bridge-type design usually: namely between the first wire-connecting 936 and the second wire-connecting 939, add an insulation course 932, make this mutually insulated between the two.First limit cabling 965 and Second Edge cabling 967 are provided with a circle shielding line 999, and this this shielding line 999 of shielding line 999 ground connection (figure does not indicate) can prevent external signal from disturbing.This contact panel 90 also comprises the cabling of connection touch control electrode and external drive control circuit and binds region, cabling comprises the first conductive electrode first limit cabling 961, first conductive electrode Second Edge cabling 963, second conductive electrode first limit cabling 965 and the second conductive electrode Second Edge cabling 967, binding region comprises the first binding region 985 and second and binds region 987.This the first conductive electrode first limit cabling 961 is bound region 985 with this second conductive electrode Second Edge cabling 967 by first and is connected to external drive control circuit, this the first conductive electrode Second Edge cabling 963 and the second conductive electrode first limit cabling 965 are bound region 987 by second and are connected to external drive control circuit, like this, first conductive electrode first limit cabling 961, first conductive electrode Second Edge cabling 963, second conductive electrode first limit cabling 965 and the second conductive electrode Second Edge cabling 967 form bilateral cabling, it strengthens signal transmission, attenuated signal is decayed, even if there is broken string phenomenon in part cabling, contact panel 90 still can keep normal work.
This first conductive electrode first limit cabling 961, first conductive electrode Second Edge cabling 963, second conductive electrode first limit cabling 965 and the second conductive electrode Second Edge cabling 967 are arranged in non-touch-control region 931, its material adopts transparent conductive material such as nano-silver thread conductive layer 805 grade, now contact panel 90 at least can make Rimless design in both sides, obtains Rimless contact panel.
Refer to Figure 12, for the perspective view of seventh embodiment of the invention contact panel, this contact panel 60 is substantially identical with the structure of the first embodiment, and its difference is only: the cabling of the first conductive electrode 621 and/or the second conductive electrode cabling adopt Multi-layer design.The present embodiment illustrates for the annexation of the first conductive electrode 621.This contact panel 60 comprises one first electrode layer 603, one first insulation course 6252, one first routing layer 6272, one second insulation course 6254, and one second routing layer 6274, this first electrode layer 603, one first insulation course 6252, first routing layer 6272, second insulation course 6254 and the second routing layer 6274, is cascading from top to bottom.This first insulation course 6252, on the position of its corresponding first conductive electrode 621 one end, multiple through hole 671 is provided with the first routing layer 6272, second insulation course 6254 and the second routing layer 6274 are provided with multiple through hole 671 on the position of its corresponding first conductive electrode 621 one end, and the through hole 671 wherein on this second routing layer 6274 is simultaneously corresponding with the through hole 671 on this first routing layer 6272.This through hole 671 pours into conductive material or at through hole 671 inner ring plating, this conductive material is nano-silver thread, conductive silver paste, and copper is starched, or other conducting metals slurry.
This first electrode layer 603 comprises the first conductive electrode 621 of multiple parallel interval arrangement, many the first conductive electrode first limit cablings 661 and many first conductive electrode Second Edge cablings 663, these many first conductive electrode first limit cablings 661 and many first conductive electrode Second Edge cablings 663 are connected the two ends of Part I first conductive electrode 621 corresponding with it respectively, and stretch out.
This first routing layer 6272 comprises many first conductive electrode first limit cablings 6612 and many first conductive electrode Second Edge cablings 6632, these many first conductive electrode first limit cablings 6612 and many first conductive electrode Second Edge cablings 6632 are connected the two ends of Part II first conductive electrode 621 corresponding with it respectively by the through hole 671 of multiple correspondences, and extend to external drive control circuit.
This second routing layer 6274 comprises many first conductive electrode first limit cablings 6614 and many first conductive electrode Second Edge cablings 6634, these many first conductive electrode first limit cablings 6614 and many first conductive electrode Second Edge cablings 6634 are connected the two ends of Part III first conductive electrode 621 corresponding with it respectively by the through hole 671 of multiple correspondences, and extend external drive control circuit.Compared with prior art, the contact panel 60 of the present embodiment adopts multilayer cabling to design, and the cabling of part divides and is located at different routing layers 6272, on 6274, facilitates the arrangement of cabling, realizes the narrow frame design of contact panel 60.
Refer to Figure 13, for the schematic perspective view of eighth embodiment of the invention contact panel 70, this contact panel 70 is substantially identical with the structure of the first embodiment, difference is only: arrange a levelling blanket 715 at the second conductive layer 705 upper surface, certainly, also levelling blanket 715 can be set at the first conductive layer 703 lower surface.
Levelling blanket 715 is positioned at the second conductive layer 705 upper surface, or preferably, the second conductive layer 705 is partially submerged in levelling blanket 715 in a thickness direction.Nano-silver thread conductive layer 805 is coated on second substrate 707 upper surface and forms the second conductive layer 705.Nano-silver thread 801 can not tile equably and overlap more preferably, makes poor flatness, simultaneously due to phenomenon that the harmful effect nano-silver thread 801 that laps one another between nano-silver thread 801 is upturned.By applying levelling blanket 715 on the second conductive layer 705, and after certain PROCESS FOR TREATMENT, the overlap joint area between nano-silver thread 801 can be made to increase thus improve the conductance of nano-silver thread 801 and reach good surface smoothness.
Thus, contact panel 70 rhythmo structure from top to bottom of the present embodiment is followed successively by first substrate 701, the first conductive layer 703, bonding coat 709, levelling blanket 715, the second conductive layer 705 and second substrate 707.
The material of levelling blanket 715 can be selected from high molecular polymer, insulating material, resin, transparent optical cement, oxide, class photoresistance, transparent inks etc. include but not limited to: polyacetylene, polyaniline, polyarylene, polythiophene, Graphene, pentacene, poly-(phenylenevinylene) (PPE), poly-(phenylene ethylene) (PPV), poly-(3, the fen of 4-ethylidene dioxy) (PEDOT), poly-(styrene sulfonic acid) (PSS), poly-(3-hexyl thiophene), (P3HT), poly-(3-octyl thiophene) (P3OT), poly-(aryl ether sulfone), poly-[2-methoxyl-5-(2 '-ethyl-own oxygen base)-1, 4-phenylene ethylene] (MEH-PPV), silicon nitride, silicon dioxide, titanium dioxide, zinc paste, silicon oxynitride, aluminium nitride, the materials such as polyamides or their combination in any.
Levelling blanket 715 is coated in above the second conductive layer 705 by the form of fluid, and described fluid can comprise: water, ion or comprise the solution of ion, organic solvent, inorganic solvent or their combination in any.In the specific implementation, after arranging second substrate 707, coated with nano silver line conductive layer 805 on second substrate 707 after placing 60-80s, with the method for sputter by levelling blanket 715 Material coating on the second wet conductive layer 705, adjust the temperature to 140 DEG C, the second conductive layer 705 film to nano-silver thread 801 is dried, and carries out roll extrusion with roller to above gained film, finally by the film cooling of the second conductive layer 705 and levelling blanket 715 that are coated with nano-silver thread 801.In like manner, with nano-silver thread 801 as after conductive electrode material, nano-silver thread 801 is upturned and has an impact to contact panel 70 surface smoothness, intermolecular force is only relied on to realize overlap joint between nano-silver thread 801, have overlap joint bad thus affect the problem of conductance, by providing levelling blanket 715 and carrying out certain PROCESS FOR TREATMENT, make the overlap joint between nano-silver thread 801 become good, thus conductance is effectively ensured, and the surface smoothness of contact panel 70 is greatly improved.
Refer to Figure 14, contact panel 10,40,50,60,70 and 90 of the present invention can be used as touch sensible element in multiple device, is made into display device 80.Such as, when being used in LCD display by first embodiment of the invention contact panel 10, be disposed with polaroid 811 in the below of contact panel 10, upper substrate 813, liquid crystal layer 815, infrabasal plate 817, lower polaroid 819.Upper outside except being used in LCD display herein, can also be used on plasma display, on color flat panel display, on optoelectronic device and similar products.Wherein, wherein one deck electrode of this contact panel 10,40,50,60,70 and 90 can be formed in polaroid 811 or lower polaroid 819, or upper substrate 813, or on infrabasal plate 817.
Compared with prior art, first, first conductive layer 103 and/or second conductive layer 105 of contact panel 10 of the present invention by adopting nano-silver thread conductive layer 805 to be made into contact panel 10, due to nano-silver thread 801 material itself, to have resistivity low, light transmission rate is more than 85%, sheet resistance 12-120ohm/sq, contact panel 10 of the present invention is made to have the features such as good electric conductivity, ensure that the touch-control of contact panel 10 is highly sensitive, especially in particularly evident to the lifting of sensitivity in the middle of large-sized contact panel.Meanwhile, because nano-silver thread 801 has good light permeability, and trace width and spacing little, make the non-touch-control region 131 of contact panel 10 narrow especially, thus Rimless contact panel 10 be achieved.Rimless contact panel 10 makes user visually openr, and adding users is experienced.Secondly, the invention provides a kind of contact panel 10, and can increase by a levelling blanket in this contact panel layer structure, this levelling blanket makes the overlap joint between nano-silver thread 801 become good, thus conductance is effectively ensured, and the surface smoothness of contact panel 10 is greatly improved.
Again, contact panel 10 of the present invention can adopt bilateral cabling to improve the first conductive electrode cabling and the second conductive electrode cabling material when adopting nano-silver thread or other conductive metal material because make, use or the reason such as other improper operation and the cabling that is easy to produce overlaps bad situation, thus reinforcement signal transmission, one side open circuit of cabling makes signal cannot be transferred to situation on touch-control IC to prevent contact panel 10 from may occur in signals transmission, improves the touch-control sensitivity of contact panel.In addition, due to the size effect of its Nano grade, make it have excellent light transmission and flexible resistance, therefore be more suitable for the design needs for the more hommization products in present market, as wearable type products such as motion bracelets.On processing procedure, owing to adopting nano-silver thread 801 as cabling material, the first conductive electrode 121 and corresponding cabling 161 thereof can be made like this, 163, second conductive electrode 123 and corresponding cabling 165,167 thereof complete in processing procedure, simplify manufacture craft, consuming time few, cost is low.In addition, the first conductive electrode cabling 161,163 and the second conductive electrode cabling 165,167 are divided into multiple routing layer, the cabling quantity of each routing layer is reduced relatively, the area in the non-touch-control region shared by lead-in wire can be saved, realize the object of narrow frame design.And, in limited frame region, because the conductive electrode number of leads of each routing layer can reduce relatively, therefore suitably can strengthen the width between contact conductor and spacing, be convenient to arrangement and the making of conductive electrode lead-in wire, increase fine ratio of product.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within principle of the present invention, equivalent replacement and improvement etc. all should comprise within protection scope of the present invention.

Claims (10)

1. a contact panel, it is characterized in that: it comprises many nano-silver thread electrodes and many nano-silver thread electrode cablings for connecting these many nano-silver thread electrode to external drive control circuits, nano-silver thread electrode cabling comprises nano-silver thread first limit electrode cabling and/or nano-silver thread Second Edge electrode cabling, and this nano-silver thread first limit electrode cabling connects a wherein end of this nano-silver thread electrode; This nano-silver thread Second Edge electrode cabling connects relative the other end of this nano-silver thread electrode.
2. contact panel as claimed in claim 1, it is characterized in that: the width of described nano-silver thread electrode cabling is 15um-30um, walking distance between centers of tracks is 15um-30um.
3. contact panel as claimed in claim 1, it is characterized in that: described nano-silver thread electrode, the thickness of nano-silver thread electrode cabling is 20nm-1 μm, and refractive index is 1.3-2.5.
4. contact panel as claimed in claim 1, is characterized in that: described nano-silver thread first limit electrode cabling and nano-silver thread Second Edge electrode cabling are connected to each other, and forms primary Ioops.
5. contact panel as claimed in claim 1, is characterized in that: described nano-silver thread first limit electrode cabling is at least a Rotating fields; Described nano-silver thread Second Edge electrode cabling is at least a Rotating fields.
6. contact panel as claimed in claim 1, is characterized in that: described nano-silver thread first limit electrode cabling is two-layer or sandwich construction; Described nano-silver thread Second Edge electrode cabling is two-layer or sandwich construction.
7. contact panel as claimed in claim 6, it is characterized in that: between the described each layer of nano-silver thread first limit electrode cabling, comprise an insulation course further, on insulation course, one end of corresponding nano-silver thread first limit electrode cabling arranges through hole, and described nano-silver thread first limit electrode cabling should be connected by the nano-silver thread electrode pair of through hole with part; An insulation course is comprised further between the described each layer of nano-silver thread Second Edge electrode cabling, on insulation course, one end of corresponding nano-silver thread Second Edge electrode cabling arranges through hole, and described nano-silver thread Second Edge electrode cabling should be connected by the nano-silver thread electrode pair of through hole with part.
8. contact panel as claimed in claim 1, it is characterized in that: described nano-silver thread electrode and nano-silver thread electrode cabling include a matrix and be distributed in many nano-silver threads in described matrix, described many nano-silver threads overlap formation conductive network mutually, the line length of described every bar nano-silver thread is between 20-50 μm, wire diameter is less than 50nm, and length breadth ratio is greater than 400.
9. contact panel as claimed in claim 8, is characterized in that: described nano-silver thread electrode arranges a levelling blanket further, and described levelling blanket and matrix realize mutual embedding in a thickness direction, and described nano-silver thread is contained in levelling blanket at least partly.
10. contact panel as claimed in claim 1, is characterized in that: comprise a shielding line further, is arranged at outside this nano-silver thread distribution of electrodes region, surround this nano-silver thread electrode cabling.
CN201410260596.9A 2014-06-12 2014-06-12 A kind of contact panel Pending CN105224116A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410260596.9A CN105224116A (en) 2014-06-12 2014-06-12 A kind of contact panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410260596.9A CN105224116A (en) 2014-06-12 2014-06-12 A kind of contact panel

Publications (1)

Publication Number Publication Date
CN105224116A true CN105224116A (en) 2016-01-06

Family

ID=54993136

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410260596.9A Pending CN105224116A (en) 2014-06-12 2014-06-12 A kind of contact panel

Country Status (1)

Country Link
CN (1) CN105224116A (en)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106293210A (en) * 2016-08-01 2017-01-04 京东方科技集团股份有限公司 A kind of touch base plate and preparation method thereof, contact panel, touch control display apparatus
CN106293203A (en) * 2016-07-29 2017-01-04 京东方科技集团股份有限公司 Touch electrode structure, its open circuit short circuit test method, touch screen and display device
CN106502466A (en) * 2016-10-28 2017-03-15 上海天马有机发光显示技术有限公司 A kind of contactor control device, electronic equipment and manufacture method
CN106847097A (en) * 2017-04-21 2017-06-13 京东方科技集团股份有限公司 A kind of flexible display substrates and display device
CN106971671A (en) * 2017-04-28 2017-07-21 京东方科技集团股份有限公司 Wiring structure, display base plate and display device
CN107203296A (en) * 2017-05-25 2017-09-26 上海天马微电子有限公司 A kind of display panel and its manufacture method, display device
CN107300998A (en) * 2017-06-15 2017-10-27 昆山龙腾光电有限公司 Contact panel
CN107340941A (en) * 2017-06-28 2017-11-10 昆山国显光电有限公司 A kind of capacitive touch screen and preparation method thereof
WO2018032997A1 (en) * 2016-08-19 2018-02-22 京东方科技集团股份有限公司 Touch substrate and touch display device
CN108073324A (en) * 2016-11-11 2018-05-25 株式会社日本显示器 Touch detecting apparatus and the display device for possessing touch detecting apparatus
CN108170314A (en) * 2017-12-29 2018-06-15 业成科技(成都)有限公司 Touch panel, touch control conductive film and touch control conductive film production method
WO2018152923A1 (en) * 2017-02-23 2018-08-30 武汉华星光电技术有限公司 Touch control panel and manufacturing method therefor, and touch control display screen
CN109448555A (en) * 2018-12-04 2019-03-08 武汉华星光电半导体显示技术有限公司 A kind of flexible display panels and preparation method thereof
CN110045879A (en) * 2019-05-20 2019-07-23 广州视源电子科技股份有限公司 Anti- electric field damage touch control film and touch-control input device
CN110415865A (en) * 2019-07-29 2019-11-05 北京华纳高科科技有限公司 Optically consistent transparent conductive film and preparation method thereof
WO2020062157A1 (en) * 2018-09-26 2020-04-02 深圳市华科创智技术有限公司 Foldable touch module, touch screen and terminal device
CN110955357A (en) * 2019-12-17 2020-04-03 京东方科技集团股份有限公司 Touch substrate, preparation method thereof and touch device
CN111796711A (en) * 2020-06-02 2020-10-20 南昌欧菲显示科技有限公司 Touch structure, touch screen and electronic equipment
TWI736943B (en) * 2019-04-10 2021-08-21 奇景光電股份有限公司 Touch panel and touch display apparatus

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102527621A (en) * 2011-12-27 2012-07-04 浙江科创新材料科技有限公司 Preparation method for haze-adjustable flexible transparent conductive film
CN102799313A (en) * 2012-05-07 2012-11-28 友达光电股份有限公司 Touch panel, touch display panel and touch display device
CN103092394A (en) * 2011-10-27 2013-05-08 乐金显示有限公司 Touch sensor for display device
CN103135863A (en) * 2011-11-23 2013-06-05 比亚迪股份有限公司 Capacitive touch screen and manufacture method of capacitive touch screen
CN202975551U (en) * 2012-12-26 2013-06-05 北京京东方光电科技有限公司 Array substrate and display device
CN103197798A (en) * 2013-04-02 2013-07-10 深圳欧菲光科技股份有限公司 Touch screen
KR20130116584A (en) * 2012-04-16 2013-10-24 엘지이노텍 주식회사 Touch panel
CN103389819A (en) * 2012-05-11 2013-11-13 群康科技(深圳)有限公司 Touch panel and display applying same
CN203311375U (en) * 2013-06-03 2013-11-27 南昌欧菲光科技有限公司 Touch screen lead structure
CN103632752A (en) * 2012-08-22 2014-03-12 E和H有限公司 Metal nanowire film and method for fabricating the same
CN203552211U (en) * 2013-08-20 2014-04-16 信利光电股份有限公司 Touch screen with narrow frame
CN103809828A (en) * 2014-02-25 2014-05-21 福建科创光电有限公司 Double-color-layer narrow frame one-chip type capacitive sensing touch screen and manufacturing method thereof
CN203930738U (en) * 2014-06-12 2014-11-05 宸鸿科技(厦门)有限公司 A kind of contact panel

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103092394A (en) * 2011-10-27 2013-05-08 乐金显示有限公司 Touch sensor for display device
CN103135863A (en) * 2011-11-23 2013-06-05 比亚迪股份有限公司 Capacitive touch screen and manufacture method of capacitive touch screen
CN102527621A (en) * 2011-12-27 2012-07-04 浙江科创新材料科技有限公司 Preparation method for haze-adjustable flexible transparent conductive film
KR20130116584A (en) * 2012-04-16 2013-10-24 엘지이노텍 주식회사 Touch panel
CN102799313A (en) * 2012-05-07 2012-11-28 友达光电股份有限公司 Touch panel, touch display panel and touch display device
CN103389819A (en) * 2012-05-11 2013-11-13 群康科技(深圳)有限公司 Touch panel and display applying same
CN103632752A (en) * 2012-08-22 2014-03-12 E和H有限公司 Metal nanowire film and method for fabricating the same
CN202975551U (en) * 2012-12-26 2013-06-05 北京京东方光电科技有限公司 Array substrate and display device
CN103197798A (en) * 2013-04-02 2013-07-10 深圳欧菲光科技股份有限公司 Touch screen
CN203311375U (en) * 2013-06-03 2013-11-27 南昌欧菲光科技有限公司 Touch screen lead structure
CN203552211U (en) * 2013-08-20 2014-04-16 信利光电股份有限公司 Touch screen with narrow frame
CN103809828A (en) * 2014-02-25 2014-05-21 福建科创光电有限公司 Double-color-layer narrow frame one-chip type capacitive sensing touch screen and manufacturing method thereof
CN203930738U (en) * 2014-06-12 2014-11-05 宸鸿科技(厦门)有限公司 A kind of contact panel

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106293203A (en) * 2016-07-29 2017-01-04 京东方科技集团股份有限公司 Touch electrode structure, its open circuit short circuit test method, touch screen and display device
CN106293210A (en) * 2016-08-01 2017-01-04 京东方科技集团股份有限公司 A kind of touch base plate and preparation method thereof, contact panel, touch control display apparatus
US10558285B2 (en) 2016-08-19 2020-02-11 Boe Technology Group Co., Ltd. Touch substrate and touch display device
WO2018032997A1 (en) * 2016-08-19 2018-02-22 京东方科技集团股份有限公司 Touch substrate and touch display device
CN106502466A (en) * 2016-10-28 2017-03-15 上海天马有机发光显示技术有限公司 A kind of contactor control device, electronic equipment and manufacture method
US10649589B2 (en) 2016-10-28 2020-05-12 Shanghai Tianma AM-OLED Co., Ltd. Touch apparatus, electronic device and preparing method
CN108073324B (en) * 2016-11-11 2022-12-27 株式会社日本显示器 Touch detection device and display device provided with same
CN108073324A (en) * 2016-11-11 2018-05-25 株式会社日本显示器 Touch detecting apparatus and the display device for possessing touch detecting apparatus
WO2018152923A1 (en) * 2017-02-23 2018-08-30 武汉华星光电技术有限公司 Touch control panel and manufacturing method therefor, and touch control display screen
US10318055B2 (en) 2017-02-23 2019-06-11 Wuhan China Star Optoelectronics Technology Co., Ltd Touch control panel and fabricating method for the same, touch control display screen
US20180308872A1 (en) * 2017-04-21 2018-10-25 Boe Technology Group Co., Ltd. Flexible display substrate and display device
CN106847097B (en) * 2017-04-21 2019-03-19 京东方科技集团股份有限公司 A kind of flexible display substrates and display device
CN106847097A (en) * 2017-04-21 2017-06-13 京东方科技集团股份有限公司 A kind of flexible display substrates and display device
US10453870B2 (en) 2017-04-21 2019-10-22 Boe Technology Group Co., Ltd. Flexible display substrate and display device
CN106971671A (en) * 2017-04-28 2017-07-21 京东方科技集团股份有限公司 Wiring structure, display base plate and display device
US11226526B2 (en) 2017-04-28 2022-01-18 Boe Technology Group Co., Ltd. Wiring structure, display substrate and display device
CN107203296A (en) * 2017-05-25 2017-09-26 上海天马微电子有限公司 A kind of display panel and its manufacture method, display device
CN107300998A (en) * 2017-06-15 2017-10-27 昆山龙腾光电有限公司 Contact panel
CN107300998B (en) * 2017-06-15 2020-04-24 昆山龙腾光电股份有限公司 Touch panel
CN107340941A (en) * 2017-06-28 2017-11-10 昆山国显光电有限公司 A kind of capacitive touch screen and preparation method thereof
CN108170314A (en) * 2017-12-29 2018-06-15 业成科技(成都)有限公司 Touch panel, touch control conductive film and touch control conductive film production method
CN108170314B (en) * 2017-12-29 2020-12-15 业成科技(成都)有限公司 Touch panel, touch conductive film and manufacturing method of touch conductive film
WO2020062157A1 (en) * 2018-09-26 2020-04-02 深圳市华科创智技术有限公司 Foldable touch module, touch screen and terminal device
CN109448555A (en) * 2018-12-04 2019-03-08 武汉华星光电半导体显示技术有限公司 A kind of flexible display panels and preparation method thereof
CN109448555B (en) * 2018-12-04 2020-11-06 武汉华星光电半导体显示技术有限公司 Flexible display panel and preparation method thereof
US11249587B2 (en) 2019-04-10 2022-02-15 Himax Technologies Limited Touch panel and touch display apparatus
TWI736943B (en) * 2019-04-10 2021-08-21 奇景光電股份有限公司 Touch panel and touch display apparatus
CN110045879A (en) * 2019-05-20 2019-07-23 广州视源电子科技股份有限公司 Anti- electric field damage touch control film and touch-control input device
CN110415865A (en) * 2019-07-29 2019-11-05 北京华纳高科科技有限公司 Optically consistent transparent conductive film and preparation method thereof
CN110955357A (en) * 2019-12-17 2020-04-03 京东方科技集团股份有限公司 Touch substrate, preparation method thereof and touch device
CN110955357B (en) * 2019-12-17 2024-06-11 京东方科技集团股份有限公司 Touch substrate, preparation method thereof and touch device
CN111796711A (en) * 2020-06-02 2020-10-20 南昌欧菲显示科技有限公司 Touch structure, touch screen and electronic equipment

Similar Documents

Publication Publication Date Title
CN105224116A (en) A kind of contact panel
CN203930738U (en) A kind of contact panel
CN105183246B (en) Capacitance type touch-control panel
CN203930739U (en) A kind of touch-control shows module
CN105224115B (en) Curved surface touch panel and wearable device
US9226411B2 (en) Making multi-layer micro-wire structure
CN105224151B (en) Nano-silver thread conductive laminate structure and capacitance type touch-control panel
CN105446555B (en) Nano-silver thread conductive laminate structure and touch panel
CN203930769U (en) Capacitance type touch-control panel
CN103257748A (en) Touch panel and manufacturing method thereof
CN107239162A (en) Touch sensor and preparation method thereof
CN203930765U (en) Capacitance type touch-control panel
CN203930740U (en) Curved surface touch-control shows module and wearable device
CN105204674B (en) A kind of touch-control display module
KR20140055351A (en) Transparent conductive film of nanowire and method of manufacturing the same and array substrate, organic light emitting diode device and touch panel having the same
CN203930775U (en) A kind of large touch panel
CN105426025A (en) Touch panel
CN204155256U (en) A kind of capacitance type touch-control panel
CN105204694A (en) Silver nanowire touch panel
CN203930768U (en) Contact panel
CN203930764U (en) Nano-silver thread conductive laminate structure and contact panel
US8921704B2 (en) Patterned conductive polymer with dielectric patch
CN203930741U (en) Curved surface contact panel and wearable device
CN203930770U (en) Contact panel
CN105242799B (en) Curved surface touch-control display module and wearable device

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20160106

WD01 Invention patent application deemed withdrawn after publication