CN203917241U - A kind of wafer cleaning machine - Google Patents
A kind of wafer cleaning machine Download PDFInfo
- Publication number
- CN203917241U CN203917241U CN201420102841.9U CN201420102841U CN203917241U CN 203917241 U CN203917241 U CN 203917241U CN 201420102841 U CN201420102841 U CN 201420102841U CN 203917241 U CN203917241 U CN 203917241U
- Authority
- CN
- China
- Prior art keywords
- rotating shaft
- rinse bath
- riser
- vertical plate
- cleaning machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 62
- 238000005406 washing Methods 0.000 claims abstract description 17
- 239000012530 fluid Substances 0.000 claims abstract description 10
- 230000005540 biological transmission Effects 0.000 claims description 26
- 238000005096 rolling process Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
The utility model discloses a kind of wafer cleaning machine, comprise support body, at least one rinse bath, described rinse bath position is arranged on support body, on rinse bath, be connected with cleaning device, described cleaning device comprises cleaning device body, and cleaning device body is provided with rotating shaft, on rotating shaft, be fixed with washing barrel, rotating shaft is connected with drive unit, realizes rotating shaft rotate along its axle center by drive unit, and described washing barrel is provided with the hole for cleaning fluid circulation.The utlity model has the efficient feature of cleaning.
Description
Technical field
The utility model relates to a kind of cleaning device, relates in particular to a kind of wafer cleaning machine.
Background technology
The chemical agent that wafer attaches in processing procedure or impurity must be cleaned via cleaning machine in good time.During the cleaning of existing cleaning machine, conventionally wafer is placed in basketry, by up and down or the form of left and right shake basketry is moved in cleaning fluid, this cleaning way exists and cleans inhomogeneously, cleaning speed is slow, cleans halfway problem.
Utility model content
For the deficiencies in the prior art, the purpose of this utility model is to provide a kind of wafer cleaning machine that can high-efficiency washing.
The technical solution adopted in the utility model is: a kind of wafer cleaning machine, comprise support body, at least one rinse bath, and described rinse bath is arranged on support body; On rinse bath, be connected with cleaning device, described cleaning device comprises cleaning device body, cleaning device body is provided with rotating shaft, on rotating shaft, be fixed with washing barrel, rotating shaft is connected with drive unit, by drive unit, realize rotating shaft and rotate along its axle center, described washing barrel is provided with the hole for cleaning fluid circulation.
Further, cleaning device body is provided with cross bar; Rinse bath is provided with location structure, and described cross bar is connected on rinse bath by location structure.
Further, described location structure is the location-plate being positioned on one group of relative edge of the rinse bath end face on operating platform, and location-plate is provided with groove, by the two ends of cross bar being snapped in to described groove, realizes being flexibly connected of cleaning device and rinse bath.
Further, on described location-plate, be also provided with the lockplate for further fixed transverse rod.
Further, described drive unit comprises drive motors, and described drive motors is arranged on support body; The output shaft of drive motors is provided with power output wheel, and the front end of rotating shaft is provided with moving runner, and described power output wheel is connected with moving runner by transmission device.
Further, described cleaning device body comprises front vertical plate, back vertical plate, left riser, right riser, and described front vertical plate, right riser, back vertical plate, left riser join end to end, and front vertical plate and back vertical plate are parallel to each other, left riser and right riser are parallel to each other, and front vertical plate is mutually vertical with left riser; The height of front vertical plate, back vertical plate is less than the height of left riser, right riser; Described cross bar has two, between cross bar, is parallel to each other; Cross bar is through left riser, right riser; Between described left riser, right riser, by rolling bearing, be connected with rotating shaft, described rotating shaft is parallel with cross bar, and described rotating shaft is positioned at the below of cross bar.
Further, described moving runner is positioned on the position of the left surface of being close to right riser on rotating shaft, and the lateral surface of described moving runner is provided with tooth; Described right riser is provided with the rolling bearing through right riser, is fixed with power transmission shaft on rolling bearing, and described power transmission shaft is parallel to rotating shaft; The two ends of described power transmission shaft are fixed with drive, and the drive that is positioned at power transmission shaft left end is provided with tooth and meshes with the tooth on moving runner, and the drive that is positioned at power transmission shaft right-hand member is connected with the power output wheel on drive motors.
Further, the lateral surface of power output wheel is provided with tooth, be positioned on the lateral surface of drive of power transmission shaft right-hand member, be also provided with power output wheel on the tooth that adapts of tooth, the tooth on power output wheel and the tooth engagement being positioned on the drive of power transmission shaft right-hand member.
Further, described cylinder is provided with door that can opening/closing; Described support body is provided with extractor fan, and the suction opeing of described extractor fan is located at, the top of described rinse bath end face.
Further, the bottom surface of described rinse bath is the arc surface adapting with washing barrel shape.
The beneficial effects of the utility model are: because washing barrel can rotate in rinse bath, the wafer in washing barrel is ceaselessly rolled at washing barrel, reaches the object of high-efficiency washing.Available technology adopting up and down or the jolt mode of basketry of left and right clean, because wafer is sheet in irregular shape, this cleaning way is not easy wafer effectively to stir, in scheme described in the utility model, wafer can by effectively, constantly rolling, therefore clean more even.Be provided with extractor fan, can effectively the gas that can send in cleaning fluid be siphoned away, optimized operating environment.Owing to not adopting up and down or the mode of left and right vibrations basketry, the cleaning fluid quantity of using in the situation that guaranteeing equally submergence wafer is at work few, and the cleaning fluid quantity of volatilizing in use procedure is also few, has effectively reduced cost.
Accompanying drawing explanation
Fig. 1 is this structural representation that uses a novel preferred embodiment.
Fig. 2 is the front view of Fig. 1.
Fig. 3 is that Fig. 2 is along the vertical cross section of A-A direction.
Fig. 4 is that Fig. 2 is along the horizon-slice map of B-B direction.
Fig. 5 is the structural representation of cleaning device.
Wherein: 1-support body; 2-location-plate; 3-lockplate; 4-extractor fan; 5-extractor fan; 6-drive motors; 7-rinse bath; 8-cross bar; 9-drive; 10-drive; 11-rotating shaft; 12-washing barrel; 13-moving runner; 14-power output wheel; The left riser of 15-; 16-front vertical plate; 17-back vertical plate; The right riser of 18-; 19-power transmission shaft; 20-operating platform; 21-cleaning device body.
The specific embodiment
Below, in conjunction with the accompanying drawings and embodiments the utility model is described further.
If Fig. 1 is to as shown in Fig. 5, a kind of wafer cleaning machine, comprise support body 1, five rinse baths 7,7 of described rinse baths are arranged on the operating platform 20 of support body 1: on rinse bath 7, be connected with cleaning device, described cleaning device comprises cleaning device body 21, cleaning device body 21 is provided with rotating shaft 11, on rotating shaft 11, be fixed with washing barrel 12, rotating shaft 11 is connected with drive unit, by drive unit, realize rotating shaft 11 and rotate along its axle center, described washing barrel 12 is provided with the hole for cleaning fluid circulation.In described rinse bath, the cleaning fluid of part circulation is acid solution, and the cleaning fluid of part circulation is water.
Cleaning device body 21 is provided with cross bar 8; Rinse bath 7 is provided with location structure, and described cross bar 8 is connected on rinse bath 7 by location structure.
Described location structure is the location-plate 2 being positioned on one group of relative edge of the rinse bath end face on operating platform 20, and location-plate 2 is provided with groove, by the two ends of cross bar 8 being snapped in to described groove, realizes being connected of cleaning device and rinse bath 7.On described location-plate 2, be also provided with the lockplate 3 for further fixed transverse rod 8.
Described drive unit comprises drive motors 6, and described drive motors arranges 6 on support body 1; The output shaft of drive motors 6 is provided with power output wheel 14, and the front end of rotating shaft is provided with moving runner 13, and described power output wheel 12 is connected with moving runner 13 by transmission device.
Described cleaning device body comprises front vertical plate 16, back vertical plate 17, left riser 15, right riser 18, described front vertical plate 16, right riser 18, back vertical plate 17, left riser 15 join end to end, front vertical plate 16 is parallel to each other with back vertical plate 17, left riser 15 is parallel to each other with right riser 18, and front vertical plate 16 is mutually vertical with left riser 15; The height of front vertical plate 16, back vertical plate 17 is less than the height of left riser 15, right riser 18; Described cross bar 8 has two, between cross bar 8, is parallel to each other; Cross bar 8 is through left riser 15, right riser 18; Between described left riser 15, right riser 18, be connected with by rolling bearing and be connected with rotating shaft 11, described rotating shaft 11 is parallel with cross bar 8, and described rotating shaft 11 is positioned at the below of cross bar 8.
Described moving runner 13 is positioned on the position of the left surface of being close to right riser 18 on rotating shaft 11, and the lateral surface of described moving runner 13 is provided with tooth; Described right riser 18 is provided with the rolling bearing through right riser 18, is fixed with power transmission shaft 19 on rolling bearing, and described power transmission shaft 19 is parallel to rotating shaft 11; The two ends of described power transmission shaft 19 are fixed with drive 10,9, the drive 9 that is positioned at power transmission shaft 19 left ends is provided with tooth and meshes with the tooth on moving runner 13, and the drive 10 that is positioned at power transmission shaft 19 right-hand members is connected with the power output wheel 14 on drive motors 6 by transmission device.
The lateral surface of power output wheel 14 is provided with tooth, on the lateral surface of the described drive 10 that is positioned at power transmission shaft 19 right-hand members, be also provided with power output wheel 14 on the tooth that adapts of tooth, the tooth on power output wheel 14 and the tooth engagement being positioned on the drive 10 of power transmission shaft 19 right-hand members.
Described cylinder 12 is provided with door that can opening/closing; Described support body 1 is provided with extractor fan 5, and the suction opeing of described extractor fan is located on described rinse bath 7 sides and the position higher than rinse bath 7 end faces.The bottom surface of described rinse bath 7 is the arc surface adapting with washing barrel 12 shapes.
The foregoing is only preferred embodiment of the present utility model, be not limited to the utility model, although the utility model is had been described in detail with reference to previous embodiment, for a person skilled in the art, its technical scheme that still can record aforementioned each embodiment is modified, or part technical characterictic is wherein equal to replacement.All within spirit of the present utility model and principle, any modification of doing, be equal to replacement, improvement etc., within all should being included in protection domain of the present utility model.
Claims (10)
1. a wafer cleaning machine, comprise support body (1), at least one rinse bath (7), described rinse bath (7) is arranged on support body (1), it is characterized in that: rinse bath is connected with cleaning device on (7), described cleaning device comprises cleaning device body (21), cleaning device body (21) is provided with rotating shaft (11), on rotating shaft (11), be fixed with washing barrel (12), rotating shaft (11) is connected with drive unit, by drive unit, realizing rotating shaft (11) rotates along its axle center, described washing barrel (12) is provided with the hole for cleaning fluid circulation.
2. a kind of wafer cleaning machine as claimed in claim 1, is characterized in that: cleaning device body (21) is provided with cross bar (8); Rinse bath (7) is provided with location structure, and described cross bar (8) is connected on rinse bath (7) by location structure.
3. a kind of wafer cleaning machine as claimed in claim 2, it is characterized in that: described location structure is for being positioned at the location-plate (2) on one group of relative edge of the rinse bath end face on operating platform (20), location-plate (2) is provided with groove, by the two ends of cross bar (8) being snapped in to described groove, realizes being flexibly connected of cleaning device and rinse bath (7).
4. a kind of wafer cleaning machine as claimed in claim 3, is characterized in that: on described location-plate (2), be also provided with the lockplate (3) for further fixed transverse rod (8).
5. a kind of wafer cleaning machine as described in a claim as any in claim 2 to 4, is characterized in that: described drive unit comprises drive motors (6), and described drive motors (6) is arranged on support body (1); The output shaft of drive motors (6) is provided with power output wheel (14), and the front end of rotating shaft is provided with moving runner (13), and described power output wheel (12) is connected with moving runner (13) by transmission device.
6. a kind of wafer cleaning machine as claimed in claim 5, it is characterized in that: described cleaning device body comprises front vertical plate (16), back vertical plate (17), left riser (15), right riser (18), described front vertical plate (16), right riser (18), back vertical plate (17), left riser (15) join end to end, front vertical plate (16) is parallel to each other with back vertical plate (17), left riser (15) is parallel to each other with right riser (18), and front vertical plate (16) is mutually vertical with left riser (15); The height of front vertical plate (16), back vertical plate (17) is less than the height of left riser (15), right riser (18); Described cross bar (8) has two, and cross bar is parallel to each other between (8); Cross bar (8) is through left riser (15), right riser (18); Between described left riser (15), right riser (18), by rolling bearing, be connected with rotating shaft (11), described rotating shaft (11) is parallel with cross bar (8), and described rotating shaft (11) is positioned at the below of cross bar (8).
7. a kind of wafer cleaning machine as claimed in claim 6, is characterized in that: described moving runner (13) is positioned on the position of the left surface of being close to right riser (18) on rotating shaft (11), and the lateral surface of described moving runner (13) is provided with tooth; Described right riser (18) is provided with the rolling bearing through right riser (18), is fixed with power transmission shaft (19) on rolling bearing, and described power transmission shaft (19) is parallel to rotating shaft (11); The two ends of described power transmission shaft (19) are fixed with drive (10,9), the drive (9) that is positioned at power transmission shaft (19) left end is provided with tooth and meshes with the tooth on moving runner (13), and the drive (10) that is positioned at power transmission shaft (19) right-hand member is connected with the power output wheel (14) on drive motors (6).
8. a kind of wafer cleaning machine as claimed in claim 7, it is characterized in that: the lateral surface of power output wheel (14) is provided with tooth, be positioned on the lateral surface of drive (10) of power transmission shaft (19) right-hand member, be also provided with power output wheel (14) on the tooth that adapts of tooth, the tooth on power output wheel (14) and the tooth engagement being positioned on the drive (10) of power transmission shaft (19) right-hand member.
9. a kind of wafer cleaning machine as claimed in claim 1, is characterized in that: described cylinder (12) is provided with door that can opening/closing; Described support body (1) is provided with extractor fan (5), and the suction opeing of described extractor fan is located on described rinse bath (7) side and the position higher than rinse bath (7) end face.
10. a kind of wafer cleaning machine as claimed in claim 1, is characterized in that: the bottom surface of described rinse bath (7) is the arc surface adapting with washing barrel (12) shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420102841.9U CN203917241U (en) | 2014-03-08 | 2014-03-08 | A kind of wafer cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420102841.9U CN203917241U (en) | 2014-03-08 | 2014-03-08 | A kind of wafer cleaning machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203917241U true CN203917241U (en) | 2014-11-05 |
Family
ID=51813122
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420102841.9U Expired - Lifetime CN203917241U (en) | 2014-03-08 | 2014-03-08 | A kind of wafer cleaning machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203917241U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104550076A (en) * | 2015-01-14 | 2015-04-29 | 黄少平 | Cleaning machine and using method thereof |
| CN105921458A (en) * | 2016-06-14 | 2016-09-07 | 苏州泰拓精密清洗设备有限公司 | Modular cleaning machine |
| CN106024674A (en) * | 2016-05-11 | 2016-10-12 | 中国电子科技集团公司第四十五研究所 | Multi-station rotating stand device for washing and drying equipment and method for cleaning wafer |
-
2014
- 2014-03-08 CN CN201420102841.9U patent/CN203917241U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104550076A (en) * | 2015-01-14 | 2015-04-29 | 黄少平 | Cleaning machine and using method thereof |
| CN104550076B (en) * | 2015-01-14 | 2016-08-17 | 黄少平 | Cleaning machine |
| CN106024674A (en) * | 2016-05-11 | 2016-10-12 | 中国电子科技集团公司第四十五研究所 | Multi-station rotating stand device for washing and drying equipment and method for cleaning wafer |
| CN106024674B (en) * | 2016-05-11 | 2019-02-22 | 中国电子科技集团公司第四十五研究所 | A method of it rinsing the dedicated multistation rotary frame device of drying equipment and cleans chip |
| CN105921458A (en) * | 2016-06-14 | 2016-09-07 | 苏州泰拓精密清洗设备有限公司 | Modular cleaning machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104587751B (en) | A kind of air-conditioning filter net cleaning device | |
| CN203917241U (en) | A kind of wafer cleaning machine | |
| CN204520551U (en) | Automatic updating type mop device | |
| CN109201679B (en) | Environment-friendly automatic cleaning system for medicament bottles | |
| CN108843062A (en) | A kind of multifunctional swimming pool | |
| CN204137903U (en) | A kind of dipping lacquer vibratory feed | |
| CN109078950B (en) | Environment-friendly automatic cleaning robot for medicament bottles | |
| CN203955623U (en) | The cleaning machine of throwing mechanism is installed in a kind of side | |
| CN102697434B (en) | A kind of electrodynamic type intelligent controls to wipe ground machine | |
| CN208449961U (en) | A kind of computer display automatic flushing device | |
| CN208627937U (en) | A kind of cleaning device for bearing | |
| CN203944597U (en) | Sheet material double face cleaning device | |
| CN207939598U (en) | A kind of monitoring camera with dust reduction capability | |
| CN213826001U (en) | Structure is cleaned with deposition to overhead traveling crane dolly track roof beam | |
| CN206253373U (en) | A kind of electric machine casing cleaning device for outer walls | |
| CN105417368A (en) | Inclining and rotating device for crane | |
| CN209651697U (en) | A kind of elevator door gap removing incidental device | |
| CN202097821U (en) | Base plate cleaning device for aerated concrete blank | |
| CN205394221U (en) | Derusting machine | |
| CN210614503U (en) | Rinsing tank | |
| CN205096520U (en) | Foundry goods sand removal machine of easily taking | |
| CN210593084U (en) | Stainless steel bar displacement storage device | |
| CN202492602U (en) | Equipment for metal surface treatment | |
| CN203344515U (en) | Conduction band cleaning device for digital calico printing machine | |
| CN205821501U (en) | A kind of hard chrome axle plating bath arrangement |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20180607 Address after: 252800 Gaotang County Economic and Technological Development Zone, Liaocheng, Shandong Province Patentee after: SHANDONG LIANSHENG ELECTRONIC EQUIPMENT Co.,Ltd. Address before: 252800 Gaotang County Economic Development Zone, Liaocheng, Shandong Province Patentee before: SHANDONG GAOTANG JIESHENG SEMICONDUCTOR TECHNOLOGY Co.,Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20141105 |