CN203890430U - Low-voltage high-current arc discharge power supply device for plasma film coating - Google Patents
Low-voltage high-current arc discharge power supply device for plasma film coating Download PDFInfo
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- CN203890430U CN203890430U CN201420280896.9U CN201420280896U CN203890430U CN 203890430 U CN203890430 U CN 203890430U CN 201420280896 U CN201420280896 U CN 201420280896U CN 203890430 U CN203890430 U CN 203890430U
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- power supply
- current
- film coating
- circuit
- plasma film
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Abstract
The utility model discloses a low-voltage high-current arc discharge power supply device for plasma film coating. The device comprises an input magnetic switch, wherein the input magnetic switch is respectively connected with an over-voltage protection circuit, an over-current trip circuit and a power-on buffer circuit; the power-on buffer circuit is connected with a power pulse generation circuit; the output end of the power pulse generation circuit is connected with a plasma film coating load. By adopting the power supply device, the problem of large charge current impact of a large-capacity filter capacitor in power on is solved, slow start in power on is achieved, and the phenomenon that the current of a power supply is too high as the surge boost voltage is too high and elements after a three-phase rectifier are abnormal is also solved, so that the power supply and the elements are effectively protected, the stability of the power supply device is improved, and the service life of the power supply device is prolonged.
Description
Technical field
The invention belongs to field of power supplies, particularly a kind of plasma film coating discharge power supply device.
Background technology
The principle of arc coating deposition, arc ion plating is based on the self-holding vacuum arc discharge theory of cold cathode.In arc source ion plating, using Coating Materials as the target utmost point (negative electrode), by drawing lonely device, make target surface produce arc discharge, adopt low voltage, large electric current, arc-discharge technique, utilize geseous discharge or by evaporated material partial ionization, and at gaseous ion or under by evaporated material ion bombardment, will be deposited on substrate by evaporated material or its reaction product.It is a kind of self-evaporatint n. self ionizing formula solid vaporizer.This evaporation source can evaporation metal material, alloy material; also can carry out reactive ion plating; as TiN, TiC, (TiAl) N, ZrN, etc. superhard film, Al, Ag, the high low temperature Corrosion Resistant Film of Cu, stainless steel, brass, nickel chromium triangle, (TiAl) N, Ti, Cr etc. decorate protective membrane etc.
In these many methods such as arc coating deposition, hollow cathode plated film, magnetron sputtering, ion beam deposition, arc coating deposition is considered to have marketable value most.He has used plasma body vacuum plating principle, by electric arc coating technology and magnetic controlled ion plating technological incorporation one, realizes the object of multifunctional film-coating.
The low-voltage high-current power source adopting in plasma device for coating must be guaranteed high stable high reliability, but the power supply adopting in existing plasma device for coating often occurs powering on and causes expensive IGBT to puncture, or the electric cabinet tripping operation of powering, or three-phase rectifier such as punctures at the fault, faults frequent, its reason is:
1, the thousands of uF of the filter capacitor of three phase rectifier, KA in the charging current powering on, moment impact electric current is large;
2, when voltage of supply is too high, can not get protection;
3, the components and parts after three-phase rectifier are not normal causes excessive can not get of electric current to protect.
Utility model content
The purpose of this utility model is to provide a kind of plasma film coating low-voltage, high-current arc discharge supply unit; the large charging current shock problem of large capacity filter capacitor while powering on to solve; realization powers on and starts slowly; also solved power supply because of surge mutation voltage is too high and three-phase rectifier after the not normal electric current of components and parts excessive phenomenon; thereby power supply and components and parts are effectively protected, have improved stability and the work-ing life of supply unit.
The technical scheme that the utility model adopted is for achieving the above object: low-voltage, high-current arc discharge supply unit for a kind of plasma film coating; it is characterized in that: comprise input magnetic switch; described input magnetic switch is connected with overvoltage crowbar, overcurrent tripping circuit and the buffer circuit that powers on respectively; the buffer circuit that powers on is connected with output pulses circuit for generating, and output pulses circuit for generating output terminal connects plasma film coating load.
Described overvoltage crowbar is linked in sequence to "+" by "-" by least one Zener diode, then connects with relay J V-N coil, and after series connection, "-" of Zener diode connects "+" output of three-phase rectifier, and rly. meets NDG.
Described Zener diode is 2-10.
Described overcurrent tripping circuit connects amplifier by the signal output part of DC current transformer, and the direct current of amplifier is exported through diode and relay1 coil ground connection.
The described buffer circuit that powers on is connected current-limiting resistance after three phase rectifier by civil power, current-limiting resistance is in parallel with relay normally open contact, be connected in series again two filter condensers, the power supply of relay1 coil J1-N is from the VCC of accessory power supply E3, the input circuit of accessory power supply E3 has been connected for the auxiliary normally opened contact CJ-F1 of electric contactor CJ, and the VCC of PWM is obtained through the normally opened contact J1-2 of relay J 1 by accessory power supply E3.
A kind of plasma film coating low-voltage, high-current arc discharge supply unit that the utility model provides, this beneficial effect of the invention is:
1, in power up, limit the charging current to filter capacitor by current-limiting resistance, slowly charge at described filter capacitor >=collapse 80% time and be connected to the relay normally open contact adhesive on described current-limiting resistance, realization powers on and starts slowly, and while having avoided powering on, the large charging current of large capacity filter capacitor is impacted;
2, adopt the Zener diode of series connection to be parallel to the output terminal of three phase rectifier, exceed electric contactor in voltage relay action tripping, avoid voltage excessive;
3, series direct current current transformer in three phase rectifier output current loop, exceedes the upper electric contactor described in the instant tripping of electric current, avoids the not normal electric current that causes of components and parts excessive.
Brief description of the drawings
Below in conjunction with the drawings and specific embodiments, the invention will be further described.
Fig. 1 is a kind of plasma film coating low-voltage, high-current arc discharge power device structure schematic diagram.
Fig. 2 is a kind of plasma film coating low-voltage, high-current arc discharge supply unit schematic circuit diagram.
In figure: 1, input magnetic switch, 2, overvoltage crowbar, 3, overcurrent tripping circuit, 4, the buffer circuit that powers on, 5, output pulses circuit for generating, 6, plasma film coating load.
Embodiment
Below in conjunction with accompanying drawing, the present invention will be further described, but the present invention is not limited to following examples.
Embodiment
Low-voltage, high-current arc discharge supply unit for a kind of plasma film coating as shown in Figure 1; comprise input magnetic switch 1; input magnetic switch 1 is connected with overvoltage crowbar 2, overcurrent tripping circuit 3 and the buffer circuit 4 that powers on respectively; the buffer circuit 4 that powers on is connected with output pulses circuit for generating 5, and output pulses circuit for generating output terminal connects plasma film coating load 6.
A low-voltage, high-current arc discharge supply unit schematic circuit for plasma film coating, comprises AC three-phase supply, three phase rectifier filtering circuit, DC/DC change-over circuit, half-bridge topology circuit, the rectification of pulse unipolarity, current sample, voltage sampling circuit, mutual deviation comparer as shown in Figure 2.
Overvoltage crowbar 2 is linked in sequence to "+" by "-" by 4 Zener diodes, then connects with relay J V-N coil, and after series connection, "-" of Zener diode connects "+" output of three-phase rectifier, and rly. meets NDG.
Overcurrent tripping circuit 3 connects amplifier by the signal output part of DC current transformer, and the direct current of amplifier is exported through diode and relay1 coil ground connection.
The buffer circuit 4 that powers on is connected current-limiting resistance after three phase rectifier by civil power, current-limiting resistance is in parallel with relay normally open contact, be connected in series again two filter condensers, the power supply of relay1 coil J1-N is from the VCC of accessory power supply E3, the input circuit of accessory power supply E3 has been connected for the auxiliary normally opened contact CJ-F1 of electric contactor CJ, and the VCC of PWM is obtained through the normally opened contact J1-2 of relay J 1 by accessory power supply E3.
This supply unit does not have while powering on that the components and parts after the too high and three-phase rectifier of heavy current impact, power supply input surge voltage are not normal causes that electric current is excessive to be protected immediately.
Claims (5)
1. a low-voltage, high-current arc discharge supply unit for plasma film coating; it is characterized in that: comprise input magnetic switch (1); described input magnetic switch (1) is connected with overvoltage crowbar (2), overcurrent tripping circuit (3) and the buffer circuit that powers on (4) respectively; the buffer circuit (4) that powers on is connected with output pulses circuit for generating (5), and output pulses circuit for generating output terminal connects plasma film coating load (6).
2. low-voltage, high-current arc discharge supply unit for a kind of plasma film coating according to claim 1; it is characterized in that: described overvoltage crowbar (2) is linked in sequence to "+" by "-" by least one Zener diode; connect with relay J V-N coil again; after series connection, "-" of Zener diode connects "+" output of three-phase rectifier, and rly. meets NDG.
3. low-voltage, high-current arc discharge supply unit for a kind of plasma film coating according to claim 2, is characterized in that: described Zener diode is 2-10.
4. low-voltage, high-current arc discharge supply unit for a kind of plasma film coating according to claim 1, it is characterized in that: described overcurrent tripping circuit (3) connects amplifier by the signal output part of DC current transformer, and the direct current of amplifier is exported through diode and relay1 coil ground connection.
5. low-voltage, high-current arc discharge supply unit for a kind of plasma film coating according to claim 1, it is characterized in that: described in the buffer circuit (4) that powers on after three phase rectifier, connected current-limiting resistance by civil power, current-limiting resistance is in parallel with relay normally open contact, be connected in series again two filter condensers, the power supply of relay1 coil J1-N is from the VCC of accessory power supply E3, the input circuit of accessory power supply E3 has been connected for the auxiliary normally opened contact CJ-F1 of electric contactor CJ, and the VCC of PWM is obtained through the normally opened contact J1-2 of relay J 1 by accessory power supply E3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420280896.9U CN203890430U (en) | 2014-05-28 | 2014-05-28 | Low-voltage high-current arc discharge power supply device for plasma film coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420280896.9U CN203890430U (en) | 2014-05-28 | 2014-05-28 | Low-voltage high-current arc discharge power supply device for plasma film coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203890430U true CN203890430U (en) | 2014-10-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420280896.9U Withdrawn - After Issue CN203890430U (en) | 2014-05-28 | 2014-05-28 | Low-voltage high-current arc discharge power supply device for plasma film coating |
Country Status (1)
| Country | Link |
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| CN (1) | CN203890430U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103981492A (en) * | 2014-05-28 | 2014-08-13 | 大连理工常州研究院有限公司 | Low-voltage and high-current arc discharge power supply device for plasma film plating |
-
2014
- 2014-05-28 CN CN201420280896.9U patent/CN203890430U/en not_active Withdrawn - After Issue
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103981492A (en) * | 2014-05-28 | 2014-08-13 | 大连理工常州研究院有限公司 | Low-voltage and high-current arc discharge power supply device for plasma film plating |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20141022 Effective date of abandoning: 20160427 |
|
| C25 | Abandonment of patent right or utility model to avoid double patenting |