CN203834006U - Crystal film coating device - Google Patents
Crystal film coating device Download PDFInfo
- Publication number
- CN203834006U CN203834006U CN201420235222.7U CN201420235222U CN203834006U CN 203834006 U CN203834006 U CN 203834006U CN 201420235222 U CN201420235222 U CN 201420235222U CN 203834006 U CN203834006 U CN 203834006U
- Authority
- CN
- China
- Prior art keywords
- substrate
- enclosed housing
- evaporation source
- temperature sensor
- filming equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a crystal film coating device which comprises a seal chamber with an opening, a light source test component positioned on the bottom of the seal chamber and a substrate fixing mount arranged on the top of the seal chamber, wherein the seal chamber is connected with a vacuum component; an evaporation source and an ion source are arranged in the seal chamber; and the evaporation source is a lanthanide evaporation source, and comprises a thermal evaporation source supporting rod arranged on the bottom of the seal chamber, an electric heating board and an evaporation source temperature sensor which are fixed to the upper end of the thermal evaporation source supporting rod, and a lanthanide material arranged on the electric heating board. By using lanthanide as the target on the glass substrate and adopting electrical resistance heating evaporation to perform coating, the surface scratch resistance of the glass can be enhanced to 8H above, so that the glass surface hardness reaches the natural gemstone level, thereby prolonging the service life of the product, overcoming the defects of low flexibility and high breaking tendency in the sapphire, and greatly lowering the cost.
Description
Technical field
The utility model relates to a kind of filming equipment, more particularly refers to a kind of filming equipment for glass substrate.
Background technology
At present, the eyeglass majority that face glass industry adopts is common Na.Ca.Si glass, surface hardness 6H, and not scratch resistance, the life-span is short.Produce market class, added value are lower.For improving outward appearance table mirror class, increase added value of product, raising is surperficial scratch resistance ability, the natural sapphires that adopt on market more, surface hardness 9H, but high, the expensive suppleness of cutting of cost is low, and easily broken.
Utility model content
The purpose of this utility model is to overcome the defect of prior art, and a kind of filming equipment that bores epitaxial is provided.
For achieving the above object, the utility model is by the following technical solutions:
Bore the filming equipment of epitaxial, comprise the enclosed housing with opening, described enclosed housing is connected with vacuum subassembly, is also provided with evaporation source and ion source in described enclosed housing, and is positioned at the test of light source assembly and the substrate holder of being located at enclosed housing top of enclosed housing bottom; Described evaporation source is lanthanide evaporation source, comprises thermal evaporation sources pole, the hot plate that is fixed on thermal evaporation sources pole upper end and the evaporation source temperature sensor of being located at enclosed housing bottom, and is located at the lanthanide material on hot plate.
Its further technical scheme is: also comprise substrate heating assembly, described substrate heating assembly comprises the adjustable heated holder of being located at enclosed housing bottom, described heated holder upper end is provided with heating unit and Heating temperature sensor, and described heating unit surrounding is provided with reflector.
Its further technical scheme is: described substrate holder connects with the rotary-top formula of enclosed housing, and the top of enclosed housing is also provided with the substrate rotary power assembly of drive substrate anchor rotation; Described adjustable heated holder is positioned at the below at substrate holder edge, when plated film, and the thermally equivalent above adjustable heated holder of the substrate in rotation.
Its further technical scheme is: described substrate heating assembly also comprises the nut-screw pair that regulates motor and connect with adjusting motor-driven.
Its further technical scheme is: described substrate holder is black support, and is provided with substrate temperature sensor.
Its further technical scheme is: also comprise pilot circuit, described pilot circuit is electrically connected with hot plate, evaporation source temperature sensor, heating unit, Heating temperature sensor, substrate rotary power assembly, adjusting motor, substrate temperature sensor.
Its further technical scheme is: the bottom of described enclosed housing is provided with the electron beam gun as evaporation source; Described electron beam gun is two; Described enclosed housing is cylinder, comprise casing ontology and with casing ontology be actively coupled dodge gate, described dodge gate is positioned at outside and forms described opening; The inner side of casing ontology is provided with vacuum suction mouth, and described vacuum suction mouth connects with described vacuum subassembly; In described enclosed housing, be provided with work area, and for separating the partition component of vacuum suction mouth and work area, described top, work area is provided with described substrate holder; Described partition component is dividing plate, and described dividing plate is provided with several ventilating pits or air channel.
The utility model beneficial effect is compared with prior art: the utility model adopts lanthanide as target on glass substrate, and adopt resistance-type heating evaporation to carry out plated film, can improve glass surface scratch resistance ability to more than 8H, make glass hard (HRC65Yi Shang) reach natural gemstone rank, not only improved product life.And made up again sapphire suppleness not high, hold breakable defect, and cost has great reduction.
Below in conjunction with the drawings and specific embodiments, the utility model is further described.
Brief description of the drawings
Fig. 1 is the schema that the utility model bores the film coating method specific embodiment of the filming equipment of epitaxial;
Fig. 2 is the floor map that the utility model bores the filming equipment specific embodiment of epitaxial;
Fig. 3 is the top cross-sectional view that the utility model bores the filming equipment specific embodiment of epitaxial;
Fig. 4 is the electrical control skeleton diagram that the utility model bores the filming equipment specific embodiment of epitaxial.
Reference numeral
10 enclosed housing 100 work areas
11 casing ontology 12 dodge gates
17 electron beam gun 18 dividing plates
181 air channel 19 vacuum pumps
20 lanthanide evaporation source 21 thermal evaporation sources poles
22 hot plate 23 evaporation source temperature sensors
24 lanthanide material 30 ion sources
40 test of light source assembly 50 substrate holder
51 substrate rotary power assembly 59 substrate temperature sensors
60 substrate heating assembly 61 heated holder
62 heating unit 63 Heating temperature sensors
64 reflector 67 nutplate
68 screw rods 69 regulate motor
80 pilot circuit 90 substrates
81 vacuum transducer 82 electron beam gun temperature sensors
Embodiment
In order to more fully understand technology contents of the present utility model, below in conjunction with specific embodiment, the technical solution of the utility model is further introduced and explanation, but be not limited to this.
As shown in Figure 1, the utility model bores the working method of the filming equipment of epitaxial (also can be called super hard nano film), comprises the following steps:
1. substrate cleans;
2. open the working bin of filming equipment, substrate is clamped in the film plating frame of filming equipment;
3. close working bin, vacuumize;
4. pair target preheats, and is preheated to 300-500 DEG C, and be 1-2 minute warm up time;
5. enable ion source, substrate is carried out to Ion Cleaning, scavenging period is 3-5 minute;
6. pair substrate carries out plated film; Target is heated to 1400-1600 DEG C (depending on target), and the plated film time is 3-5 minute, and the coating film thickness of substrate is 40-60nm, and the surface temperature of substrate is 200-260 DEG C, and vacuum tightness is 0.002Pa-0.005Pa;
7. the temperature of working bin is cooled to 60 DEG C naturally, discharges vacuum, opens working bin, takes off substrate.
Wherein, target is lanthanide, and lanthanide is lanthanum trioxide, Lanthanum trichloride, lanthanum fluoride, lanthanum nitrate, Phosbloc, lanthanum acetate, lanthanum trichloride or lanthanum hydroxide; The thickness of substrate is 0.1-5mm, and substrate is unorganic glass.When Ion Cleaning, vacuum is to 0.005Pa (error of permission is positive and negative 10), then is filled with argon gas to 0.02Pa (error of permission is positive and negative 10), and the temperature of substrate surface is 150-250 DEG C.
As shown in Figures 2 to 4, the utility model bores the filming equipment of epitaxial, it comprises that the enclosed housing 10 with opening is (in the present embodiment, its entirety is cylindrical), enclosed housing 10 is connected with vacuum subassembly, in enclosed housing 10, be also provided with evaporation source and ion source 30, and be positioned at the test of light source assembly 40 (for detection of the thickness of plated film) of enclosed housing 10 bottoms and be located at the substrate holder 50 at enclosed housing 10 tops; Evaporation source comprises that the lanthanide evaporation source 20 of electric resistor heating type is (in the present embodiment, what adopt is the tungsten boat structure of sheet, be easy to heating evaporation lanthanide), comprise thermal evaporation sources pole 21, the hot plate 22 that is fixed on thermal evaporation sources pole 21 upper ends and the evaporation source temperature sensor 23 of being located at enclosed housing bottom, and be located at the lanthanide material 24 on hot plate 22.
Also comprise substrate heating assembly 60, substrate heating assembly 60 comprises the adjustable heated holder 61 of being located at enclosed housing 10 bottoms, heated holder 61 upper ends are provided with heating unit 62 and Heating temperature sensor 63, heating unit 62 surroundings are provided with reflector 64, like this can be by reflection, concentrate as substrate provides heat, improve heat transfer efficiency, make to be fixed on the glass substrate temperature-stable in substrate holder.
Substrate holder 50 connects with the rotary-top formula of enclosed housing 10, and the top of enclosed housing 10 is also provided with the substrate rotary power assembly 51 that drive substrate anchor 50 rotates; Adjustable heated holder 61 is positioned at the below at substrate holder 50 edges, when plated film, and the thermally equivalent above adjustable heated holder 61 of the substrate 90 in rotation.
Substrate heating assembly 60 also comprises adjusting motor 69 and the nut-screw pair (screw rod 68 and adjusting motor 69 driving coupling, nut is located at adjustable heated holder 61 in the nutplate 67 of downward-extension) with adjusting motor 69 driving coupling.Substrate holder 50 is black support (be beneficial to absorption heat, contribute to temperature stable of substrate surface), and is provided with substrate temperature sensor 59.Also comprise pilot circuit 80, pilot circuit 80 is electrically connected with hot plate 22, evaporation source temperature sensor 23, heating unit 62, Heating temperature sensor 63, substrate rotary power assembly 51, adjusting motor 69, substrate temperature sensor 59.The bottom of enclosed housing 10 is provided with the electron beam gun 17 as evaporation source; Electron beam gun is two, can be used as the evaporation source (heating target) under different situations; In the present embodiment, enclosed housing 10 is cylinder, comprise casing ontology 11 and with casing ontology 11 be actively coupled dodge gate 12, dodge gate 12 is positioned at outside and forms described opening; The inner side of casing ontology is provided with vacuum suction mouth, and vacuum suction mouth connects with vacuum subassembly (being vacuum pump 19); In enclosed housing 10, be provided with work area 100, and for separating the partition component of vacuum suction mouth and work area, top, work area is provided with aforesaid substrate holder; Partition component is semicircular dividing plate 18 (being drawn to inoperative region below for the article of work area), and dividing plate 18 is provided with several air channels 181.
Because the temperature of evaporation source is far away higher than the temperature of substrate surface, therefore, for the control of substrate surface temperature, in prior art, all exist unstablely, inhomogeneous, and be difficult to reach the object of accurate control.So adjusting motor of the present utility model can be realized the adjusting of distance between heating component and substrate holder, to meet the heating of substrate of different thickness, different area, to ensure that substrate is a more stable temperature range.Heating unit 62 is wherein for being quartz heating-pipe.Also comprise the electron beam gun temperature sensor 82 and the vacuum transducer 81 that connect with pilot circuit 80.
In other embodiment, also comprise the transmission rig for driving reflector, can make reflector and heating unit become different deflection angles, when making distance between heating unit and substrate holder different, deflection angle also changes, so that heat concentrated radiation is to the substrate in substrate holder, be beneficial to the control of substrate surface temperature.This transmission rig comprises the transmission rod that upper end is connected with reflector, and the lower end of transmission rod is connected with gusset plate, and gusset plate connects with the angular adjustment motor-driven of below, enclosed housing bottom by nut-screw transmission pair.
In other embodiment, thermal evaporation sources pole also can adopt adjustable structure, to carry out the adjusting of height up and down, can be applicable to so wider super hard nano plated film, also can regulate by the lifting motor of nut-screw transmission pair and below, enclosed housing bottom.
In sum, the utility model adopts lanthanide as target on glass substrate, and adopt resistance-type heating evaporation to carry out plated film, by the accurate control of temperature, can improve the hardness of coatings, can improve glass surface scratch resistance ability to more than 8H, make the scratch resistant ability hardness of glass surface reach natural gemstone rank, not only improved product life, and made up sapphire suppleness not high, hold breakable defect.And cost has great reduction.
Above-mentionedly only further illustrate technology contents of the present utility model with embodiment; so that reader is easier to understand; but do not represent that embodiment of the present utility model only limits to this, any technology of doing according to the utility model is extended or recreation, is all subject to protection of the present utility model.Protection domain of the present utility model is as the criterion with claims.
Claims (7)
1. bore the filming equipment of epitaxial, comprise the enclosed housing with opening, described enclosed housing is connected with vacuum subassembly, is also provided with evaporation source and ion source in described enclosed housing, and is positioned at the test of light source assembly and the substrate holder of being located at enclosed housing top of enclosed housing bottom; It is characterized in that described evaporation source is lanthanide evaporation source, comprise thermal evaporation sources pole, the hot plate that is fixed on thermal evaporation sources pole upper end and the evaporation source temperature sensor of being located at enclosed housing bottom, and be located at the lanthanide material on hot plate.
2. the filming equipment of brill epitaxial according to claim 1, characterized by further comprising substrate heating assembly, described substrate heating assembly comprises the adjustable heated holder of being located at enclosed housing bottom, described heated holder upper end is provided with heating unit and Heating temperature sensor, and described heating unit surrounding is provided with reflector.
3. the filming equipment of brill epitaxial according to claim 2, is characterized in that described substrate holder connects with the rotary-top formula of enclosed housing, and the top of enclosed housing is also provided with the substrate rotary power assembly of drive substrate anchor rotation; Described adjustable heated holder is positioned at the below at substrate holder edge, when plated film, and the thermally equivalent above adjustable heated holder of the substrate in rotation.
4. the filming equipment of brill epitaxial according to claim 2, is characterized in that described substrate heating assembly also comprises the nut-screw pair that regulates motor and connect with adjusting motor-driven.
5. the filming equipment of brill epitaxial according to claim 2, is characterized in that described substrate holder is black support, and is provided with substrate temperature sensor.
6. the filming equipment of brill epitaxial according to claim 5, characterized by further comprising pilot circuit, described pilot circuit is electrically connected with hot plate, evaporation source temperature sensor, heating unit, Heating temperature sensor, substrate rotary power assembly, adjusting motor, substrate temperature sensor.
7. the filming equipment of brill epitaxial according to claim 1, is characterized in that the bottom of described enclosed housing is provided with the electron beam gun as evaporation source; Described electron beam gun is two; Described enclosed housing is cylinder, comprise casing ontology and with casing ontology be actively coupled dodge gate, described dodge gate is positioned at outside and forms described opening; The inner side of casing ontology is provided with vacuum suction mouth, and described vacuum suction mouth connects with described vacuum subassembly; In described enclosed housing, be provided with work area, and for separating the partition component of vacuum suction mouth and work area, described top, work area is provided with described substrate holder; Described partition component is dividing plate, and described dividing plate is provided with several ventilating pits or air channel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420235222.7U CN203834006U (en) | 2014-05-08 | 2014-05-08 | Crystal film coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420235222.7U CN203834006U (en) | 2014-05-08 | 2014-05-08 | Crystal film coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203834006U true CN203834006U (en) | 2014-09-17 |
Family
ID=51511873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420235222.7U Expired - Fee Related CN203834006U (en) | 2014-05-08 | 2014-05-08 | Crystal film coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203834006U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103938163A (en) * | 2014-05-08 | 2014-07-23 | 深圳市深新隆实业有限公司 | Coating method and equipment of diamond crystal film |
-
2014
- 2014-05-08 CN CN201420235222.7U patent/CN203834006U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103938163A (en) * | 2014-05-08 | 2014-07-23 | 深圳市深新隆实业有限公司 | Coating method and equipment of diamond crystal film |
| WO2015168975A1 (en) * | 2014-05-08 | 2015-11-12 | 深圳市深新隆实业有限公司 | Method for coating diamond crystal film and equipment therefor |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| FR3012133B1 (en) | PROCESS FOR OBTAINING A SUBSTRATE COATED BY A STACK CONTAINING A TRANSPARENT CONDUCTIVE OXIDE LAYER | |
| WO2018086537A1 (en) | Cell incubator and operating method thereof | |
| CN103938163A (en) | Coating method and equipment of diamond crystal film | |
| CN203834006U (en) | Crystal film coating device | |
| CN103353590B (en) | A kind of hermetically sealed Integrative Radar | |
| CN109246860A (en) | In situ, dynamic observation material high temperature service under the microscope can be achieved | |
| CN201305624Y (en) | Film preparation device | |
| CN107144130A (en) | A kind of negative electrode visualization microwave sintering apparatus | |
| CN105624611B (en) | A kind of rotary organic material vaporising device | |
| CN204053234U (en) | A kind of multi-angle laser soldering device | |
| CN204466139U (en) | A kind of hermetically sealed reinforcing on-Line UPS cabinet | |
| CN204548106U (en) | High ferro motor-car pantograph camera head | |
| CN103884725A (en) | X-ray absorption spectrum in-situ heating apparatus | |
| CN207379895U (en) | A kind of medicine stability test case | |
| CN104313647B (en) | Test-type electrolytic zinc device | |
| CN105176809A (en) | Integrated microorganism culture device | |
| CN204943207U (en) | Depending on lamp and use this interior electric heating barbecue device looking lamp in the heat radiation of lamp bracket hollow | |
| CN211538427U (en) | Novel automatic spin-coating heating equipment | |
| CN205974546U (en) | Electrothermal constant -temperature incubator | |
| CN215586530U (en) | Rotary evaporator water-oil bath structure convenient for temperature control | |
| CN217032765U (en) | Mounting structure of high leakproofness infrared window | |
| CN105500723A (en) | 3D printer capable of regulating temperature of working bin | |
| CN201074031Y (en) | Film hot-sealing device | |
| CN105034352A (en) | Hot-melting nail burying machine | |
| CN212834014U (en) | Evaporation plating voltage stabilizing device for optical lens coating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| PP01 | Preservation of patent right | ||
| PP01 | Preservation of patent right |
Effective date of registration: 20190124 Granted publication date: 20140917 |
|
| PD01 | Discharge of preservation of patent | ||
| PD01 | Discharge of preservation of patent |
Date of cancellation: 20210124 Granted publication date: 20140917 |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140917 Termination date: 20190508 |