CN203739352U - Film-plated glass with low radiation - Google Patents
Film-plated glass with low radiation Download PDFInfo
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- CN203739352U CN203739352U CN201320389587.0U CN201320389587U CN203739352U CN 203739352 U CN203739352 U CN 203739352U CN 201320389587 U CN201320389587 U CN 201320389587U CN 203739352 U CN203739352 U CN 203739352U
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Abstract
The utility model provides film-plated glass with low radiation. The film-plated glass comprises a glass substrate and a film-plated layer, wherein the film-plated layer consists of a Si3N4 layer, a ZnOx layer, a Ag layer, a Cu layer, a NiCr layer, a ZnAlOx layer, a Si3N4 layer, a ZnOx layer, a Ag layer, a NiCr layer, a ZnALOx layer and a Si3N4 layer which are sequentially arranged outwards from the glass substrate. The film-plated layer has a multilayer structure and a double-layer silver film layer structure, so that the glass has good optical and thermal properties and can meet and improve the requirements for the existing market on architectural film-plated glass.
Description
Technical field
The utility model belongs to field of glass production technology, relates in particular to a kind of low radiation coated glass.
Background technology
Low radiation coated glass refers at glass surface and plates and have the metal of extremely low emissivity or a kind of functional glass of the multi-layer nano level rete that other chemical reagent form, and is mainly used to improve energy-saving effect and the comfortable for living of building.This of coated glass kind of performance is except outside the Pass having with self low-E, also relevant with thickness and the number of plies of film plating layer.But be subject to the restriction of preparation technology and preparation condition, the film plating layer of common low radiation coated glass mostly is 3-5 layer, as patent CN201424436Y just provides a kind of the low-reflection plating glass with four layers of oxide membranous layer structure, patent CN10195532A provides a kind of low radiation coated glass with eight tunic structures, comprises three layers of dielectric layer, two-layer barrier layer, layer of copper rete and one deck silver film.In addition, the functional layer of low radiation coated glass is mainly silver layer, silver layer is especially easily oxidized, glass all can significantly reduce at long-term rear its optical property and the thermal property of using, especially along with the quickening of current economy and urban development process, in city top-grade building thing, solar energy photoelectric curtain wall and high-grade glass furniture, the optics of the glass curtain wall of installing and using and thermal property are required progressively to increase, the light thermal properties such as the light reflectivity of conventional monolayers silver coating glass, permeability more and more can not meet the demand of existing market to building coated glass.
Summary of the invention
The utility model provides for solving the technical problem existing in known technology that a kind of radiance is low, optics and thermal property is stable, the obvious low radiation coated glass of energy-saving effect.
The technical scheme that the utility model is taked for the technical problem existing in solution known technology is:
A low radiation coated glass, comprises glass substrate and film plating layer, and described film plating layer is positioned at glass substrate upper surface, it is characterized in that described film plating layer is outwards followed successively by from glass substrate: Si
3n
4layer, ZnOx layer, Ag layer, Cu layer, NiCr layer, ZnAlOx layer, Si
3n
4layer, ZnOx layer, Ag layer, NiCr layer, ZnALOx layer, Si
3n
4layer.
Described each film plating layer thickness is: Si
3n
4layer is that 22.5-23.5nm, ZnOx layer are that 5.3-7.3nm, Ag layer are that 8.3-10.3nm, Cu layer are that 7.6-9.6nm, NiCr layer are that 1.4-3.4nm, ZnAlOx layer are 12.2-14.2nm, Si
3n
4layer is that 32.7-34.7nm, ZnOx layer are that 8.9-10.9nm, Ag layer are that 8.5-10.5nm, NiCr layer are that 0.4-2.4nm, ZnALOx layer are 4.7-6.7nm, Si
3n
4layer is 36.8-38.8nm.
It is golden yellow that described low radiation coated glass surface is.
Described glass substrate can be laminated glass, colored glazed glass, safety glass or coloured glass.
The thickness of described glass substrate is 4-19 ㎜.
The beneficial effects of the utility model are: compared with prior art, the utility model coated glass is by increasing to film plating layer 12 layers, make coated glass there is good appearance color, and the in the situation that of identical visible light transmissivity, adopt multicoating layer can access lower outdoor visible reflectance, reflection and pure through color, permeability is strong, percent of pass reaches 20%-50%, radiance 3%, therefore there is good optics, thermal property, can meet and promote the demand of existing market to building coated glass; Double silver rete arranges the anti-oxidation function that has strengthened glass, and rete difficult drop-off can be applied in laminated glass or double glazing production, even long distance transportation, quality is also unaffected.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
In figure: 1-Si
3n
4layer, 2-ZnOx layer, 3-Ag layer, 4-Cu layer, 5-NiCr layer, 6-ZnAlOx layer, 7-Si
3n
4layer, 8-ZnOx layer, 9-Ag layer, 10-NiCr layer, 11-ZnALOx layer, 12-Si
3n
4layer, 13-glass substrate.
The specific embodiment
For further understanding the utility model content, Characteristic, hereby exemplify following examples, be described as follows:
Embodiment 1: selecting laminated glass is glass substrate 13, and the thickness of glass substrate 13 is 4 ㎜, and film plating layer is positioned at glass substrate 13 upper surfaces, and film plating layer is outwards followed successively by from glass substrate 13: Si
3n
4layer 1, ZnOx layer 2, Ag layer 3, Cu layer 4, NiCr layer 5, ZnAlOx layer 6, Si
3n
4layer 7, ZnOx layer 8, Ag layer 9, NiCr layer 10, ZnALOx layer 11, Si
3n
4layer 12.The design parameter specification of above-mentioned each layer of film plating layer is followed successively by: Si
3n
4layer is that 23.5nm, ZnOx layer are that 6.3nm, Ag layer are that 9.3nm, Cu layer are that 8.6nm, NiCr layer are that 2.4nm, ZnAlOx layer are 13.2nm, Si
3n
4layer is that 33.7nm, ZnOx layer are that 9.9nm, Ag layer are that 9.5nm, NiCr layer are that 1.4nm, ZnALOx layer are 5.7nm, Si
3n
4layer is 37.8nm, and it is golden yellow that coated glass surface is.
In the present embodiment, the preparation process of low radiation coated glass is as follows: clean glass substrate 13, after being dried, glass is placed in to magnetron sputtering area.Intermediate frequency power supply adds rotating cathode sputtering sedimentation ground floor Si
3n
4layer 1, second layer ZnOx layer 2, layer 6 ZnAlOx layer 6, layer 7 Si
3n
47, the 8th layers of ZnOx layer 8 of layer, eleventh floor ZnALOx layer 11, Floor 12 Si
3n
4layer 12, wherein ground floor Si
3n
4layer 1, layer 7 Si
3n
4layer 7, Floor 12 Si
3n
4the sputter area atmosphere of layer 12 is: working gas is Ar, and volume flow is 500sccm, and reacting gas is N
2, volume flow is 1000sccm, the sputter area atmosphere of second layer ZnOx layer 2, layer 6 ZnAlOx layer 6, the 8th layer of ZnOx layer 8 and eleventh floor ZnALOx layer 11 is: working gas is Ar, and volume flow is 500sccm, and reacting gas is O
2, volume flow is 1000sccm; Dc source adds the 3rd layer of Ag layer 3 of pulse sputtering sedimentation, the 4th layer of Cu layer 4, layer 5 NiCr layer 5, the 9th layer of Ag layer 9, the tenth layer of NiCr layer 10, and its sputter area atmosphere is: working gas is Ar, and volume flow is 500sccm.
Embodiment 2: selecting safety glass is glass substrate 13, and the thickness of glass substrate 13 is 10 ㎜, and film plating layer is positioned at glass substrate 13 upper surfaces, and film plating layer is outwards followed successively by from glass substrate 13: Si
3n
4layer 1, ZnOx layer 2, Ag layer 3, Cu layer 4, NiCr layer 5, ZnAlOx layer 6, Si
3n
4layer 7, ZnOx layer 8, Ag layer 9, NiCr layer 10, ZnALOx layer 11, Si
3n
4layer 12.The design parameter specification of above-mentioned each layer of film plating layer is followed successively by: Si
3n
4layer is that 23.0nm, ZnOx layer are that 7.3nm, Ag layer are that 10.3nm, Cu layer are that 9.6nm, NiCr layer are that 3.4nm, ZnAlOx layer are 14.2nm, Si
3n
4layer is that 34.7nm, ZnOx layer are that 10.9nm, Ag layer are that 10.5nm, NiCr layer are that 2.4nm, ZnALOx layer are 6.7nm, Si
3n
4layer is 38.8nm, and it is golden yellow that coated glass surface is.
In the present embodiment, the preparation process of low radiation coated glass is as follows: clean glass substrate 13, after being dried, glass is placed in to magnetron sputtering area.Intermediate frequency power supply adds rotating cathode sputtering sedimentation ground floor Si
3n
4layer 1, second layer ZnOx layer 2, layer 6 ZnAlOx layer 6, layer 7 Si
3n
47, the 8th layers of ZnOx layer 8 of layer, eleventh floor ZnALOx layer 11, Floor 12 Si
3n
4layer 12, wherein ground floor Si
3n
4layer 1, layer 7 Si
3n
4layer 7, Floor 12 Si
3n
4the sputter area atmosphere of layer 12 is: working gas is Ar, and volume flow is 400sccm, and reacting gas is N
2, volume flow is 1200sccm, the sputter area atmosphere of second layer ZnOx layer 2, layer 6 ZnAlOx layer 6, the 8th layer of ZnOx layer 8 and eleventh floor ZnALOx layer 11 is: working gas is Ar, and volume flow is 400sccm, and reacting gas is O
2, volume flow is 1200sccm; Dc source adds the 3rd layer of Ag layer 3 of pulse sputtering sedimentation, the 4th layer of Cu layer 4, layer 5 NiCr layer 5, the 9th layer of Ag layer 9, the tenth layer of NiCr layer 10, and its sputter area atmosphere is: working gas is Ar, and volume flow is 600sccm.
Embodiment 3: selecting colored glazed glass is glass substrate 13, and the thickness of glass substrate 13 is 19 ㎜, and film plating layer is positioned at glass substrate 13 upper surfaces, and film plating layer is outwards followed successively by from glass substrate 13: Si
3n
4layer 1, ZnOx layer 2, Ag layer 3, Cu layer 4, NiCr layer 5, ZnAlOx layer 6, Si
3n
4layer 7, ZnOx layer 8, Ag layer 9, NiCr layer 10, ZnALOx layer 11, Si
3n
4layer 12.The design parameter specification of above-mentioned each layer of film plating layer is followed successively by: Si
3n
4layer is that 22.5nm, ZnOx layer are that 5.3nm, Ag layer are that 8.3nm, Cu layer are that 7.6nm, NiCr layer are that 1.4nm, ZnAlOx layer are 12.2nm, Si
3n
4layer is that 32.7nm, ZnOx layer are that 8.9nm, Ag layer are that 8.5nm, NiCr layer are that 0.4nm, ZnALOx layer are 4.7nm, Si
3n
4layer is 36.8nm, and it is golden yellow that coated glass surface is.
In the present embodiment, the preparation process of low radiation coated glass is as follows: clean glass substrate 13, after being dried, glass is placed in to magnetron sputtering area.Intermediate frequency power supply adds rotating cathode sputtering sedimentation ground floor Si
3n
4layer 1, second layer ZnOx layer 2, layer 6 ZnAlOx layer 6, layer 7 Si
3n
47, the 8th layers of ZnOx layer 8 of layer, eleventh floor ZnALOx layer 11, Floor 12 Si
3n
4layer 12, wherein ground floor Si
3n
4layer 1, layer 7 Si
3n
4layer 7, Floor 12 Si
3n
4the sputter area atmosphere of layer 12 is: working gas is Ar, and volume flow is 600sccm, and reacting gas is N
2, volume flow is 900sccm, the sputter area atmosphere of second layer ZnOx layer 2, layer 6 ZnAlOx layer 6, the 8th layer of ZnOx layer 8 and eleventh floor ZnALOx layer 11 is: working gas is Ar, and volume flow is 600sccm, and reacting gas is O
2, volume flow is 900sccm; Dc source adds the 3rd layer of Ag layer 3 of pulse sputtering sedimentation, the 4th layer of Cu layer 4, layer 5 NiCr layer 5, the 9th layer of Ag layer 9, the tenth layer of NiCr layer 10, and its sputter area atmosphere is: working gas is Ar, and volume flow is 400sccm.
Above embodiment of the present utility model is had been described in detail, but described content is only preferred embodiment of the present utility model, can not be considered to for limiting practical range of the present utility model.All equalization variations of doing according to the utility model application range and improvement etc., within all should still belonging to patent covering scope of the present utility model.
Claims (3)
1. a low radiation coated glass, comprises glass substrate (13) and film plating layer, and described film plating layer is positioned at glass substrate upper surface, it is characterized in that described film plating layer is outwards followed successively by from glass substrate: Si
3n
4layer (1), ZnOx layer (2), Ag layer (3), Cu layer (4), NiCr layer (5), ZnAlOx layer (6), Si
3n
4layer (7), ZnOx layer (8), Ag layer (9), NiCr layer (10), ZnALOx layer (11), Si
3n
4layer (12);
Described glass substrate (13) is laminated glass, colored glazed glass, safety glass or coloured glass.
2. a kind of low radiation coated glass as claimed in claim 1, is characterized in that described each film plating layer thickness is: Si
3n
4layer (1) is that 22.5-23.5nm, ZnOx layer (2) are that 5.3-7.3nm, Ag layer (3) are that 8.3-10.3nm, Cu layer (4) are that 7.6-9.6nm, NiCr layer (5) are that 1.4-3.4nm, ZnAlOx layer (6) are 12.2-14.2nm, Si
3n
4layer (7) is that 32.7-34.7nm, ZnOx layer (8) are that 8.9-10.9nm, Ag layer (9) are that 8.5-10.5nm, NiCr layer (10) are that 0.4-2.4nm, ZnALOx layer (11) are 4.7-6.7nm, Si
3n
4layer (12) is 36.8-38.8nm.
3. a kind of low radiation coated glass as claimed in claim 1, the thickness that it is characterized in that described glass substrate (13) is 4-19 ㎜.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320389587.0U CN203739352U (en) | 2013-07-02 | 2013-07-02 | Film-plated glass with low radiation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320389587.0U CN203739352U (en) | 2013-07-02 | 2013-07-02 | Film-plated glass with low radiation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203739352U true CN203739352U (en) | 2014-07-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320389587.0U Expired - Lifetime CN203739352U (en) | 2013-07-02 | 2013-07-02 | Film-plated glass with low radiation |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103692728A (en) * | 2013-07-02 | 2014-04-02 | 中国南玻集团股份有限公司 | Low-emissivity coated glass and preparation process thereof |
-
2013
- 2013-07-02 CN CN201320389587.0U patent/CN203739352U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103692728A (en) * | 2013-07-02 | 2014-04-02 | 中国南玻集团股份有限公司 | Low-emissivity coated glass and preparation process thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20160203 Address after: Six industrial intersection, Shekou Industrial Zone, Guangdong, Shenzhen, 518067 Patentee after: CSG HOLDING Co.,Ltd. Patentee after: TIANJIN CSG ENERGY-SAVING GLASS Co.,Ltd. Address before: Six industrial intersection, Shekou Industrial Zone, Guangdong, Shenzhen, 518067 Patentee before: CSG HOLDING Co.,Ltd. Patentee before: Tianjin CSG Architectural Glass Co.,Ltd. Patentee before: TIANJIN CSG ENERGY-SAVING GLASS Co.,Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20140730 |
|
| CX01 | Expiry of patent term |