CN203739035U - Device for cutting semiconductor thermoelectric materials - Google Patents

Device for cutting semiconductor thermoelectric materials Download PDF

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Publication number
CN203739035U
CN203739035U CN201420130147.8U CN201420130147U CN203739035U CN 203739035 U CN203739035 U CN 203739035U CN 201420130147 U CN201420130147 U CN 201420130147U CN 203739035 U CN203739035 U CN 203739035U
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CN
China
Prior art keywords
cutter sweep
cutting
fretsaws
machine table
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN201420130147.8U
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Chinese (zh)
Inventor
周创举
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
P&n Technology Xiamen Co ltd
Original Assignee
Peng Nan Electronic Technology (xiamen) Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Peng Nan Electronic Technology (xiamen) Co Ltd filed Critical Peng Nan Electronic Technology (xiamen) Co Ltd
Priority to CN201420130147.8U priority Critical patent/CN203739035U/en
Application granted granted Critical
Publication of CN203739035U publication Critical patent/CN203739035U/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

The utility model discloses a device for cutting semiconductor thermoelectric materials. The cutting device comprises three rotating tools, multiple fretsaws and a lifting processing table. The three rotating tools are located right above the lifting processing table and distributed in a triangular mode, the multiple fretsaws are arranged on the three rotating tools in parallel in a sleeved mode and can be driven by the three rotating tools to perform reciprocating movement, and then cutting is achieved; the fretsaws are metal fretsaws, and diamond particles are electroplated on the fretsaws. According to the device, the diamond particles are electroplated on existing metal fretsaws, the cutting strength of the fretsaws is according and effectively improved, the production efficiency is accordingly improved, and cost is accordingly reduced.

Description

A kind of semi-conductor thermoelectric material cutter sweep
Technical field
The utility model relates to a kind of semi-conductor thermoelectric material cutter sweep, divides and belongs to thermoelectricity material cutting processing to be cut technical field by International Patent Classification (IPC) (IPC).
Background technology
The raw material of existing semiconductor thermoelectric material to be cut is mostly column, if but want to use processing first to use through the rectangular particle of cutting process, and at the existing rotational workpieces that drives scroll saw to move back and forth that comprises for semiconductor thermoelectric material installation to be cut, carry out line cutting and this rotational workpieces coordinates with lifting machine table and then realize the raw material being positioned on lifting processing table top, the line cutting of this kind of structure is that the mortar spray mixing with cutting oil with green silicon carbide sand grains drops on the gauze of steel wire composition, move back and forth by left and right, make wire drive the carborundum sand grains in mortar to treat cutting material generation dissection, and the cooling fluid being used in conjunction with this cutting equipment is the mortar that carborundum sand grains mixes with cutting oil, and wherein carborundum sand grains is recyclable and then reduce costs, but because scrap in cutting engineering all falls into cooling fluid, cannot realize and reclaiming or expensive recovery, and then raise the cost, utilize 200~400 ms/min of the speed of said structure wire (being scroll saw), cutting gap 0.24 ~ 0.27mm.
Thus, the inventor considers existing thermoelectricity material cutting equipment to be cut to improve, and this case produces thus.
Utility model content
For the deficiencies in the prior art, the utility model provides a kind of semi-conductor thermoelectric material cutter sweep, and thereby it, effectively to increase its cutting intensity is enhanced productivity at the existing metal scroll saw plating diamond particles that powers on, and reduces costs.
For achieving the above object, the utility model is achieved through the following technical solutions:
A kind of semi-conductor thermoelectric material cutter sweep, this cutter sweep comprises three rotary toolings, many scroll saws and lifting machine table; Described three rotary toolings are positioned at directly over lifting machine table and distribution triangular in shape, are sheathed on three rotary toolings and can drive scroll saws move back and forth by three rotary toolings, and then realize cutting and many scroll saws are parallel to each other; Described every scroll saw is the metal scroll saw that is electroplate with diamond particles.
Further, the described metal scroll saw with electroplated diamond is the scroll saw of high rigidity, high-wearing feature being realized to line cutting, this diamond abrasive grain by electroplate mode securely being held on steel wire matrix, the gauze of steel wire scroll saw composition, by left and right reciprocating motion at a high speed, treat cutting material and produce dissection.
Further, described rotational workpieces is cylindric that can be driven by multiple rotating power source, and described power source can be motor etc. realizes the parts of spinfunction.
Further, directly over described lifting machine table, be provided with coolant nozzle, this coolant nozzle periphery is surrounded by three rotary toolings, on this jet pipe downside and end face, offers multiple squit holes.
Further, described coolant nozzle downside extends to form cooling fluid deflector downwards, the suitable formation cooling fluid ejection of the squit hole passage of this cooling fluid deflector and coolant nozzle below; In described coolant pipe, the cooling fluid of ejection is water-soluble metalworking liquid.
Further, the described valency machine table that rises is the processing platform that a below has elevating mechanism, places material to be processed in its platform plane.
Further, described elevating mechanism can be realized lifting by drive processing platforms such as hydraulic cylinder, cylinder and hand-operated rocker arm liftings.
Compared with prior art, advantage of the present utility model:
1, on the basis of existing equipment, steel wire scroll saw is improved to and is electroplate with adamantine scroll saw, and then obtain the line cutting scroll saw of high rigidity, high-wearing feature;
2, on the basis of 1 improvement, original cooling fluid is improved to water-soluble metalworking liquid, thereby liquid is lubricated, chip removal and cooling, realizes the object that cooling fluid reclaims completely.
Brief description of the drawings
Fig. 1 is the utility model structural representation;
Fig. 2 is scroll saw structural representation in the utility model.
Detailed description of the invention
Below in conjunction with accompanying drawing, the utility model is described in further detail:
Embodiment: refer to shown in Fig. 1 to Fig. 2, a kind of semi-conductor thermoelectric material cutter sweep, this cutter sweep comprises three rotary toolings 1, many scroll saws 2 and lifting machine table 3, described three rotary toolings 1 are fixed on frame A, and driving its rotation by the power source being positioned at after frame A, described frame A is a hollow rectangle body.
Refer to shown in Fig. 1 to Fig. 2, three rotational workpieces 1 are positioned at directly over lifting machine table 3 and distribution triangular in shape, each rotational workpieces 1 is cylindric, and many scroll saws 2 are parallel to each other and adjacent scroll saw 2 between gapped this three rotational workpieces 1 that are sheathed on of tool, and drive scroll saw 2 by left and right reciprocating motion at a high speed by these three rotational workpieces 1, treat cutting material B and produce dissection.
Refer to shown in Fig. 1 to Fig. 2, every scroll saw 2 is for being plated on diamond particles C the line cutting scroll saw that forms high rigidity, high-wearing feature on metal scroll saw; Described every scroll saw 2 is all positioned at three lip-deep corresponding separate slots of rotational workpieces 1, forms scroll saw location structure.
Refer to shown in Fig. 1 to Fig. 2, be provided with coolant nozzle 4 directly over lifting machine table 3, these coolant nozzle 4 peripheries are surrounded by three rotary toolings 1, on these jet pipe 4 downsides and end face, offer multiple squit holes.Described coolant nozzle 4 downsides extend to form cooling fluid deflector 41 downwards, and this cooling fluid deflector 41 sprays passage with the suitable formation cooling fluid of squit hole of coolant nozzle below; The cooling fluid of described coolant pipe 4 interior ejections is water-soluble metalworking liquid.The described valency machine table 3 that rises is the processing platform that a below has elevating mechanism, places material to be processed in its platform plane, and described elevating mechanism can be realized lifting by drive processing platforms such as hydraulic cylinder, cylinder and hand-operated rocker arm liftings.
In the utility model, adjacent two scroll saw separate slots are apart from being 0.34~5.14mm, and scroll saw feed speed is 0.5~40m/ minute, and the workbench speed of moving is 0.18~1.0mm/ minute; Electroplated diamond line tension is 20~60N, and Trace speed is 280~600m/ minute, adopts that water miscible cutting fluid is lubricated, chip removal and cooling simultaneously.Can realize thermoelectricity material wafers to be cut and the crystal grain of the high-quality that cuts out 0.2~5mm according to aforementioned data and the utility model structure; And then stock utilization to be cut can be promoted to 36%, cutting speed promotes 50%, and thermoelectricity product maximum temperature difference parameter reaches 71 DEG C (27 DEG C of hot-face temperatures), and owing to adopting water-soluble metalworking liquid, whole cutting technique can be accomplished cleaner production.
Above record, only, for utilizing the embodiment of this origination techniques content, modification, variation that any those skilled in the art use this creation to do, all belong to the scope of the claims that this creation is advocated, and be not limited to those disclosed embodiments.

Claims (4)

1. a semi-conductor thermoelectric material cutter sweep, is characterized in that: this cutter sweep comprises three rotary toolings, many scroll saws and lifting machine table; Described three rotary toolings are positioned at directly over lifting machine table and distribution triangular in shape, are sheathed on three rotary toolings and can drive scroll saws move back and forth by three rotary toolings, and then realize cutting and many scroll saws are parallel to each other; Described every scroll saw is the metal scroll saw that is electroplate with diamond particles.
2. a kind of semi-conductor thermoelectric material cutter sweep according to claim 1, it is characterized in that: directly over described lifting machine table, be provided with coolant nozzle, this coolant nozzle periphery is surrounded by three rotary toolings, on this jet pipe downside and end face, offers multiple squit holes.
3. a kind of semi-conductor thermoelectric material cutter sweep according to claim 2, it is characterized in that: described coolant nozzle downside extends to form cooling fluid deflector downwards the suitable formation cooling fluid ejection of the squit hole passage of this cooling fluid deflector and coolant nozzle below.
4. a kind of semi-conductor thermoelectric material cutter sweep according to claim 1, is characterized in that: the described valency machine table that rises is the processing platform that a below has elevating mechanism, places material to be processed in its platform plane.
CN201420130147.8U 2014-03-21 2014-03-21 Device for cutting semiconductor thermoelectric materials Expired - Lifetime CN203739035U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201420130147.8U CN203739035U (en) 2014-03-21 2014-03-21 Device for cutting semiconductor thermoelectric materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201420130147.8U CN203739035U (en) 2014-03-21 2014-03-21 Device for cutting semiconductor thermoelectric materials

Publications (1)

Publication Number Publication Date
CN203739035U true CN203739035U (en) 2014-07-30

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Application Number Title Priority Date Filing Date
CN201420130147.8U Expired - Lifetime CN203739035U (en) 2014-03-21 2014-03-21 Device for cutting semiconductor thermoelectric materials

Country Status (1)

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CN (1) CN203739035U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113547652A (en) * 2021-07-19 2021-10-26 福州天瑞线锯科技有限公司 Spacing-adjustable polycrystalline silicon squarer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113547652A (en) * 2021-07-19 2021-10-26 福州天瑞线锯科技有限公司 Spacing-adjustable polycrystalline silicon squarer

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Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder

Address after: 361000 Fujian province Xiamen torch hi tech Zone (Xiangan) Industrial Zone Xiang Ming Road No. 28 building 5F Frestech

Patentee after: P&N TECHNOLOGY (XIAMEN) CO.,LTD.

Address before: 361000 Fujian province Xiamen torch hi tech Zone (Xiangan) Industrial Zone Xiang Ming Road No. 28 building 5F Frestech

Patentee before: PENGNAN ELECTRONIC TECHNOLOGY (XIAMEN) Co.,Ltd.

CX01 Expiry of patent term

Granted publication date: 20140730

CX01 Expiry of patent term