CN203735772U - Gas cylinder cabinet - Google Patents
Gas cylinder cabinet Download PDFInfo
- Publication number
- CN203735772U CN203735772U CN201420109859.1U CN201420109859U CN203735772U CN 203735772 U CN203735772 U CN 203735772U CN 201420109859 U CN201420109859 U CN 201420109859U CN 203735772 U CN203735772 U CN 203735772U
- Authority
- CN
- China
- Prior art keywords
- gas
- cabinet
- inert gas
- bottle
- hazardous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 claims abstract description 146
- 239000011261 inert gas Substances 0.000 claims abstract description 69
- 239000004065 semiconductor Substances 0.000 claims abstract description 20
- 238000000926 separation method Methods 0.000 claims abstract description 5
- 231100001261 hazardous Toxicity 0.000 claims description 44
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 230000007613 environmental effect Effects 0.000 claims description 13
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000004341 Octafluorocyclobutane Substances 0.000 claims description 5
- 229910018503 SF6 Inorganic materials 0.000 claims description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 5
- 239000001569 carbon dioxide Substances 0.000 claims description 5
- 238000001514 detection method Methods 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 5
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims description 5
- 229910052743 krypton Inorganic materials 0.000 claims description 5
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052754 neon Inorganic materials 0.000 claims description 5
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 5
- BCCOBQSFUDVTJQ-UHFFFAOYSA-N octafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(F)C1(F)F BCCOBQSFUDVTJQ-UHFFFAOYSA-N 0.000 claims description 5
- 235000019407 octafluorocyclobutane Nutrition 0.000 claims description 5
- 231100000614 poison Toxicity 0.000 claims description 5
- 230000007096 poisonous effect Effects 0.000 claims description 5
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 5
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 5
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 abstract description 15
- 230000004888 barrier function Effects 0.000 abstract 1
- 229910000831 Steel Inorganic materials 0.000 description 7
- 239000010959 steel Substances 0.000 description 7
- 238000007726 management method Methods 0.000 description 5
- 241001074085 Scophthalmus aquosus Species 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- GOLXNESZZPUPJE-UHFFFAOYSA-N spiromesifen Chemical compound CC1=CC(C)=CC(C)=C1C(C(O1)=O)=C(OC(=O)CC(C)(C)C)C11CCCC1 GOLXNESZZPUPJE-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
Landscapes
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Packages (AREA)
Abstract
The utility model provides a gas cylinder cabinet is applied to the semiconductor processing procedure, and gas cylinder cabinet contains a cabinet body, an air separation body and an air current pipeline. The cabinet body is internally provided with a space. The gas separator is arranged in the cabinet body and divides the space of the cabinet body into an open space and a closed space, wherein the open space is used for placing an inert gas bottle for semiconductor processing, and the closed space is used for placing a dangerous gas bottle for semiconductor processing. The gas flow pipeline is connected with the inert gas bottle and the dangerous gas bottle and used for enabling the inert gas in the inert gas bottle to flow to the gas flow pipeline. The utility model discloses an open space and airtight space of the gas barrier piece separation cabinet body, reducible gas cylinder cabinet is in the exhaust cost in airtight space by this.
Description
Technical field
The utility model is a kind of gas cabinet, refers in particular to a kind of gas cabinet with air bound part.
Background technology
Dust free room, power system, water system, air-conditioning system, process gas system and exhaust emission system etc. are set in semiconductor factory conventionally, wherein process gas system is particularly important, be used in nitrogen envelope, oxidation, silicon wafer manufacture, doping or lithography no matter be, the needed all kinds of gas of above-mentioned processing procedure has corrosivity, toxicity or combustibility mostly, once process gas system is unstable or design bad, by causing increasing the cost of process gas, cause what is more leaking of process gas.
Therefore general semiconductor factory is used gas cabinet management processing procedure desired gas, places the process gas steel cylinder of high pressure, and be a confined space in gas cabinet, uses and prevents that burning things which may cause a fire disaster or process gas from leaking.In addition more the measure of insurance is in or beyond gas cabinet, to place an inert gas steel cylinder, in the time changing process gas steel cylinder, inert blowing gas in inert gas bottle is rushed in the airflow pipeline of hazardous gas bottle, make it be full of inert gas, and this inert gas can not produce and react with process gas, guarantees to change job safety.
But the inert gas steel cylinder being positioned over outside gas cabinet must additionally arrange its fixture, and inert gas steel cylinder fixedly be to avoid and topples over danger; On the other hand as while inert gas steel cylinder and process gas steel cylinder being placed in the space of same gas cabinet, will increase the exhaust apparatus cost of gas cabinet exhaust.
Therefore, creator is inspired by this, adheres to for many years relevantly to enrich research experience, and then researches and develops a kind of novel gas cabinet,, safety more convenient to bringing and cheaply gas delivery.
Utility model content
A kind of embodiment of the present utility model is that a kind of gas cabinet is being provided, and it is applied to manufacture of semiconductor, and gas cabinet comprises a cabinet, an air bound part and an airflow pipeline.Cabinet inside has a space.Air bound part is placed in cabinet, and the space region of cabinet is divided into an open space and a confined space, and wherein open space is an inert gas bottle of using for placing manufacture of semiconductor, and confined space is a hazardous gas bottle of using for placing manufacture of semiconductor.Airflow pipeline connects inert gas bottle and hazardous gas bottle, and the inert gas in inert gas bottle is flowed to confined space by airflow pipeline.The space that air bound part of the present utility model intercepts cabinet is open space and confined space, because confined space separates with open space, the overall space being positioned in same gas cabinet than inert gas bottle and hazardous gas bottle is little, confined space only needs the exhaust apparatus that setup cost is lower, can reduce by this cost of the confined space exhaust of gas cabinet.
According to an embodiment of the present utility model, in above-described embodiment, also can comprise a detector, an exhaust apparatus, a controller and a control panel, an environmental factor of detector detecting confined space; Exhaust apparatus is located at the confined space of gas cabinet; Controller control exhaust apparatus, airflow pipeline and detector, controller is in order to hazardous gas and environmental factor in inert gas, hazardous gas bottle in management and control inert gas bottle; Control panel is electrically connected controller and detector.Above-mentioned detector can be a temperature detecting device, pressure detection device or a flame detecting device, and environmental factor can be temperature or pressure.An above-mentioned water sprinkler and the vacuum generator of also can comprising, eliminates possible burning things which may cause a fire disaster and by this to airflow pipeline extracting vacuum.The above-mentioned non-return valve that also can comprise, it is installed in airflow pipeline, and non-return valve makes inert gas one-way flow.Inert gas in above-mentioned inert gas bottle can be nitrogen, carbon tetrafluoride, perfluoroethane, octafluorocyclobutane, sulfur hexafluoride, carbon dioxide, neon, krypton or helium.Hazardous gas in hazardous gas bottle is corrosive gas, poisonous gas, imflammable gas or combustion-supporting property gas.
Another embodiment of the present utility model is that a kind of gas cabinet is being provided, and it is applied to manufacture of semiconductor, and gas cabinet comprises a cabinet, an air bound part, a cabinet door and an airflow pipeline, and cabinet inside has a space; Air bound part is placed in cabinet, and the space region of cabinet is divided into one can open space and a confined space, and wherein open space is an inert gas bottle of using for placing manufacture of semiconductor, and confined space is a hazardous gas bottle of using for placing manufacture of semiconductor; Cabinet door is installed in cabinet, cabinet door in order to airtight can open space; Airflow pipeline connects inert gas bottle and hazardous gas bottle, in order to the inert gas in inert gas bottle is directed to airflow pipeline.
According to another embodiment of the present utility model, in above-described embodiment, also can comprise a detector, an exhaust apparatus, a controller and a control panel, an environmental factor of detector detecting confined space; Exhaust apparatus is located at the confined space of gas cabinet; Controller control exhaust apparatus, airflow pipeline and detector, controller is in order to hazardous gas and environmental factor in inert gas, hazardous gas bottle in management and control inert gas bottle; Control panel is electrically connected controller and detector.Above-mentioned detector can be a temperature detecting device, pressure detection device or a flame detecting device, and environmental factor can be temperature or pressure.An above-mentioned water sprinkler and the vacuum generator of also can comprising, eliminates by this possible burning things which may cause a fire disaster and airflow pipeline is extracted as vacuum.The above-mentioned non-return valve that also can comprise, it is installed in airflow pipeline, and non-return valve makes inert gas one-way flow.Inert gas in above-mentioned inert gas bottle can be nitrogen, carbon tetrafluoride, perfluoroethane, octafluorocyclobutane, sulfur hexafluoride, carbon dioxide, neon, krypton or helium.Hazardous gas in hazardous gas bottle is corrosive gas, poisonous gas, imflammable gas or combustion-supporting property gas.
Can learn that thus gas cabinet of the present utility model sets up an air bound part, the inert gas bottle and the hazardous gas bottle that are arranged in gas cabinet are separated out, only inert gas bottle need be connected on the one hand an airflow pipeline with transmission inert gas to airflow pipeline; The inert gas bottle that is positioned on the other hand open space is changed easily, do not need to open the cabinet door of the confined space of placing hazardous gas bottle, reduce the risk that staff sucked or contacted hazardous gas, staff's safety is not only subject to ensureing and also reduces the gas cabinet that originally must waste in the exhaust apparatus cost of confined space exhaust; And gas cabinet of the present utility model avoids inert gas bottle to be positioned over outside gas cabinet, reduce the risk that inert gas bottle corrosion and destruction are toppled over.
Brief description of the drawings
Fig. 1 is the plane illustrating according to a kind of gas cabinet of the utility model one embodiment.
Fig. 2 is the opening figure illustrating according to a kind of gas cabinet of the utility model one embodiment.
Fig. 3 is the schematic diagram illustrating according to a kind of gas cabinet of the utility model one embodiment.
Detailed description of the invention
Please refer to Fig. 1, Fig. 2 and Fig. 3, they are plane, opening figure and the schematic diagrames that illustrate according to the gas cabinet of the utility model one embodiment.Gas cabinet is that to be applied to manufacture of semiconductor required, and gas cabinet comprises a cabinet 100, an air bound part 200, an airflow pipeline 300, a detector 400, an exhaust apparatus 500, a controller 600 and a control panel 700.
Cabinet 100 inside have a space, and cabinet 100 can be an explosion-proof material, and cabinet 100 comprises one first cabinet door 110, one second cabinet door 120 and a windowpane 130.
Air bound part 200 is placed in cabinet 100, be one can open space A and a confined space B by the spatial separation of cabinet 100, wherein open space A can place the inert gas bottle X that manufacture of semiconductor is used, and confined space B can place the hazardous gas bottle Y that manufacture of semiconductor is used.The first cabinet door 110 of cabinet 100 and the second cabinet door 120 can be opened can open space A and confined space B, by this replaceable inert gas bottle X and hazardous gas bottle Y.The inert gas of inert gas bottle X is generally nitrogen, carbon tetrafluoride, perfluoroethane, octafluorocyclobutane, sulfur hexafluoride, carbon dioxide, neon, krypton or helium.The hazardous gas of hazardous gas bottle Y is corrosive gas, poisonous gas, imflammable gas or combustion-supporting property gas.
Airflow pipeline 300 connects inert gas bottle X and hazardous gas bottle Y, and the inert gas in inert gas bottle X is directed to airflow pipeline 300.On airflow pipeline 300, also can install a non-return valve (not shown), non-return valve makes inert gas one-way flow to airflow pipeline 300, because the design of non-return valve only allows inert gas one-way flow, forbid that hazardous gas is along with inert gas refluxes, increase the security of gas cabinet.
Detector 400 is detected an environmental factor of confined space B, and detector can be a temperature detecting device, a pressure detection device or a flame detecting device, and environmental factor is temperature or the pressure in gas cabinet.When the temperature in gas cabinet or pressure are when undesired, all can give a warning.
Exhaust apparatus 500 is located at the confined space B of gas cabinet, and the hazardous gas that may leak is disposed to outside.Because it is known techniques, the circuit design that exhaust apparatus 500 includes repeats no longer in detail at this.
Controller 600 connects airflow pipeline 300, detector 400 and exhaust apparatus 500.Present embodiment middle controller 600 can be a programmable logic controller (PLC) (PLC), in advance by the control setting parameter of inert gas bottle X, hazardous gas bottle Y and detector 400 in programmable logic controller (PLC), parameter that so can simple and easy storing and setting and the setting of being convenient to expand controller 600 inside.
Control panel 700 can be controlled airflow pipeline 300, detector 400 and exhaust apparatus 500, sets by this parameter of the required hazardous gas of processing procedure and detecting.The instruction that control panel 700 is inputted is controlled exhaust apparatus 500, airflow pipeline 300 and detector 400 by controller 600, the inert gas in by this can wisdom management and control inert gas bottle X, hazardous gas and the environmental factor in hazardous gas bottle Y.
In addition, in order to increase practicality and the security of gas cabinet, gas cabinet also can comprise a water sprinkler and a vacuum generator (not shown), eliminates by this possible burning things which may cause a fire disaster and the airflow pipeline of gas cabinet is got rid of to gas, makes the management of gas cabinet that stability is provided.
Can learn in gas cabinet and install additional after air bound part by the utility model, can reduce that inert gas is bottled is located at the risk that gas cabinet suffers corrosion outward, destroys and topples over.When periodic replacement inert gas bottle, do not need to open the cabinet door of the confined space of placing hazardous gas bottle, the risk that reduces on the one hand staff's suction or contact hazardous gas, staff's safety is not only subject to ensureing the exhaust apparatus cost that also reduces palpus waste originally; And air bound part intercepts after inert gas bottle and hazardous gas bottle, gas cabinet does not need to arrange more expensive exhaust apparatus in confined space yet, as between high-power air exhauster or wide-aperture steam vent, the low-power air exhauster that only setup cost is less or the exhaust space of small-bore, just the hazardous gas that may leak can be discharged rapidly, so can reduce extra installation cost and shortening time, bring more convenience for user.
Reference numerals list
100: cabinet
110: the first cabinet doors
120: the second cabinet doors
130: windowpane
200: air bound part
300: airflow pipeline
400: detector
500: exhaust apparatus
600: controller
700: control panel
A: open space
B: confined space
X: inert gas bottle
Y: hazardous gas bottle
Claims (14)
1. a gas cabinet, it is applied to manufacture of semiconductor, and this gas cabinet comprises:
One cabinet, inside has a space;
One air bound part, be placed in this cabinet, be an open space and a confined space by this spatial separation of this cabinet, wherein this open space is to place the inert gas bottle that manufacture of semiconductor is used, and this confined space is to place the hazardous gas bottle that manufacture of semiconductor is used; And
One airflow pipeline, it connects this inert gas bottle and this hazardous gas bottle, in order to the inert gas in this inert gas bottle is flowed to this airflow pipeline.
2. gas cabinet as claimed in claim 1, wherein also comprises:
One detector, detects an environmental factor of this confined space;
One exhaust apparatus, is located at this confined space of this gas cabinet;
One controller, controls this exhaust apparatus, this airflow pipeline and this detector, and this controller is in order to hazardous gas and this environmental factor in this inert gas of management and control, this hazardous gas bottle; And
One control panel, is electrically connected this controller and this detector.
3. gas cabinet as claimed in claim 2, wherein this detector is a temperature detecting device, a pressure detection device or a flame detecting device.
4. gas cabinet as claimed in claim 3, wherein also comprises a water sprinkler and a vacuum generator.
5. gas cabinet as claimed in claim 4, wherein also comprises a non-return valve, is installed in this airflow pipeline, and this non-return valve makes this inert gas one-way flow.
6. gas cabinet as claimed in claim 1, wherein the inert gas of this inert gas bottle is nitrogen, carbon tetrafluoride, perfluoroethane, octafluorocyclobutane, sulfur hexafluoride, carbon dioxide, neon, krypton or helium.
7. gas cabinet as claimed in claim 1, wherein the hazardous gas of this hazardous gas bottle is corrosive gas, poisonous gas, imflammable gas or combustion-supporting property gas.
8. a gas cabinet, it is applied to manufacture of semiconductor, and this gas cabinet comprises:
One cabinet, inside has a space;
One air bound part, be placed in this cabinet, be one can open space and a confined space by this spatial separation of this cabinet, wherein this open space be to place the inert gas bottle that manufacture of semiconductor is used, and this confined space is to place the hazardous gas bottle that manufacture of semiconductor is used;
One cabinet door, is installed in this cabinet, this cabinet door in order to airtight this can open space; And
One airflow pipeline, connects this inert gas bottle, in order to the inert gas in this inert gas bottle is directed to this airflow pipeline.
9. gas cabinet as claimed in claim 8, wherein also comprises:
One detector, detects an environmental factor of this confined space;
One exhaust apparatus, is located at this confined space of this gas cabinet;
One controller, controls this exhaust apparatus, this airflow pipeline and this detector, and this controller is in order to hazardous gas and this environmental factor in this inert gas of management and control, this hazardous gas bottle; And
One control panel, is electrically connected this controller and this detector.
10. gas cabinet as claimed in claim 9, wherein this detector is a temperature detecting device, a pressure detection device and a flame detecting device.
11. as the gas cabinet of claim 10, wherein also comprises a water sprinkler and an exhaust apparatus.
12. as the gas cabinet of claim 11, wherein also comprises a non-return valve, is installed in this airflow pipeline, and this non-return valve makes this inert gas one-way flow.
13. gas cabinets as claimed in claim 8, wherein the inert gas in this inert gas bottle is nitrogen, carbon tetrafluoride, perfluoroethane, octafluorocyclobutane, sulfur hexafluoride, carbon dioxide, neon, krypton or helium.
14. gas cabinets as claimed in claim 8, wherein the hazardous gas in this hazardous gas bottle is corrosive gas, poisonous gas, imflammable gas or combustion-supporting property gas.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW102204437U TWM458660U (en) | 2013-03-11 | 2013-03-11 | Cylinder cabinet |
| TW102204437 | 2013-03-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203735772U true CN203735772U (en) | 2014-07-30 |
Family
ID=49480263
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420109859.1U Expired - Lifetime CN203735772U (en) | 2013-03-11 | 2014-03-11 | Gas cylinder cabinet |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN203735772U (en) |
| TW (1) | TWM458660U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104545040A (en) * | 2014-12-05 | 2015-04-29 | 安徽华盛科技控股股份有限公司 | CIT multifunctional gas cylinder cabinet |
| CN106974452A (en) * | 2017-03-29 | 2017-07-25 | 西安科技大学 | Imflammable gas gas cylinder storage protection cabinet and method |
| CN109530381A (en) * | 2018-11-21 | 2019-03-29 | 德淮半导体有限公司 | Toxic gas cabinet and toxic gas processing system including it |
-
2013
- 2013-03-11 TW TW102204437U patent/TWM458660U/en not_active IP Right Cessation
-
2014
- 2014-03-11 CN CN201420109859.1U patent/CN203735772U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104545040A (en) * | 2014-12-05 | 2015-04-29 | 安徽华盛科技控股股份有限公司 | CIT multifunctional gas cylinder cabinet |
| CN106974452A (en) * | 2017-03-29 | 2017-07-25 | 西安科技大学 | Imflammable gas gas cylinder storage protection cabinet and method |
| CN106974452B (en) * | 2017-03-29 | 2022-05-27 | 西安科技大学 | Storage protection cabinet and method for combustible gas high-pressure gas cylinder |
| CN109530381A (en) * | 2018-11-21 | 2019-03-29 | 德淮半导体有限公司 | Toxic gas cabinet and toxic gas processing system including it |
Also Published As
| Publication number | Publication date |
|---|---|
| TWM458660U (en) | 2013-08-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140730 |