CN203733825U - Light emitting device chip - Google Patents

Light emitting device chip Download PDF

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Publication number
CN203733825U
CN203733825U CN201420064017.9U CN201420064017U CN203733825U CN 203733825 U CN203733825 U CN 203733825U CN 201420064017 U CN201420064017 U CN 201420064017U CN 203733825 U CN203733825 U CN 203733825U
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CN
China
Prior art keywords
device chip
substrates
luminescent device
epitaxial loayer
district
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Expired - Lifetime
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CN201420064017.9U
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Chinese (zh)
Inventor
廉鹏
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Ma'anshan Taishi Xinguang Technology Co ltd
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BEIJING TIMESLED TECHNOLOGY CO LTD
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Priority to CN201420064017.9U priority Critical patent/CN203733825U/en
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Abstract

The utility model provides a light emitting device chip. The light emitting device chip sequentially comprises a transparent substrate, an epitaxial layer N zone, an N-face electrode, an active zone, an epitaxial layer P zone and a P-face electrode from down to up, wherein the transparent substrate is bonded with the epitaxial layer N zone through a second bonding medium, and the transparent substrate is formed through a conversion mode of a growth substrate. According to the light emitting device chip, As of the growth substrate can not be brought to a subsequent technology flow for preparation of the light emitting device, pollution treatment cost of industrial wastewater is reduced; the transparent substrate has no light absorption performance, light emitting loss is reduced, integral light emitting efficiency of the light emitting device chip is improved; the growth substrate can be reutilized repeatedly, production cost is reduced, and the light emitting device chip has obvious technology advancement and good economic benefits.

Description

A kind of luminescent device chip
Technical field
The utility model relates to LED field, refers to especially a kind of luminescent device chip.
Background technology
In the preparation process of the chip of existing luminescent device, by disposable growth substrates use, or it is directly formed to product as the substrate of chip, or will after its wear down, form product with chip.Growth substrates is mostly as the part of chip product.
The reddish yellow optical chip growth substrates using is at present GaAs, uses the chip product of this growth substrates can contain arsenic.In the preparation process of chip that uses this growth substrates, if applied growth substrates reduction process, in industrial wastewater, will contain GaAs particle, increase the pollution of industrial wastewater, improved the cost of pollutant discharge of enterprise and waste water treatment simultaneously.And, because GaAs is non-transparent material, will affect the light extraction efficiency of the chip that this type of chip forms.The etch stop layer corrosion rate wherein adopting is slow, and elimination is not thorough, need to increase the removing technique of follow-up complexity.
Utility model content
The utility model proposes a kind of luminescent device chip, solved the impact of growth substrates on luminescent device chip light-emitting efficiency and the problem of environmental pollution bringing thereof in prior art.
The technical solution of the utility model is achieved in that a kind of luminescent device chip, comprise: be followed successively by transparent substrates, epitaxial loayer N district, N face electrode, active area, epitaxial loayer P district and p side electrode from bottom to top, described transparent substrates is combined with described epitaxial loayer N layer by the second bonding medium, and described transparent substrates forms by the conversion regime of growth substrates.
Further, described growth substrates comprises preset conversion layer; Described preset conversion layer can be converted to described transparent substrates by described growth substrates.
Further, described preset conversion layer forms described epitaxial loayer N district, described active area and described epitaxial loayer P district from bottom to top successively by epitaxial growth mode; Described N face electrode and described p side electrode pass through photoetching, evaporation and peel off and make, or pass through evaporation, photoetching and be etched into.
Preferably, also comprise support substrates; Described epitaxial loayer P district forms adhesive layer by adhesion mode, the attached described support substrates of described adhesive layer; Or described epitaxial loayer P district passes through the first bonding medium in conjunction with described support substrates; Described support substrates and described transparent substrates are specially Sapphire Substrate or quartz substrate.
Further, described the first bonding medium resist of can being delustered is dissolved, described in the resist of delustering be specially acetone.
Preferably, described the first bonding medium is photoresist, and described photoresist is specially organic gel medium; Described the second bonding medium is specially SiO 2, ITO or Si 3n 4medium.
Further, described preset conversion layer can be corroded liquid selectivity eliminate; Described corrosive liquid is specially HF or BOE.
Preferably, described growth substrates comprises GaAs; Described preset conversion layer comprises AlAs.
Further, growth substrates can recycle through surface treatment.
The beneficial effects of the utility model are:
1, the As of growth substrates can not bring subsequent technique flow process prepared by luminescent device into, reduces the pollution control cost of industrial wastewater, reduces production costs;
2, transparent substrates does not have absorbability to light, can reduce luminous loss, increases the overall light extraction efficiency of luminescent device chip.
Brief description of the drawings
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is only embodiment more of the present utility model, for those of ordinary skill in the art, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the conventional substrate epitaxial chip architecture of prior art schematic diagram;
Fig. 2 is the utility model structural representation with preset conversion layer;
Fig. 3 is the utility model structural representation with support substrates;
Fig. 4 is the utility model structural representation.
In figure:
1, growth substrates; 2-1, etch stop layer; 2-2, preset conversion layer; 3, epitaxial loayer N district; 4, active area; 5, epitaxial loayer P district; 6, the first bonding medium; 7, support substrates; 8, transparent substrates; 9, the second bonding medium; 10, P electrode; 11, N electrode.
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the utility model embodiment is clearly and completely described, obviously, described embodiment is only the utility model part embodiment, instead of whole embodiment.Based on the embodiment in the utility model, those of ordinary skill in the art are not making the every other embodiment obtaining under creative work prerequisite, all belong to the scope of the utility model protection.
Embodiment 1
As shown in Figure 2 and Figure 4, a kind of luminescent device chip of the utility model, comprise: be followed successively by transparent substrates 8, epitaxial loayer N district 3, N face electrode 11, active area 4, epitaxial loayer P district 5 and p side electrode 10 from bottom to top, transparent substrates 8 is by the second bonding medium 9 and 3 combination of epitaxial loayer N layer, and transparent substrates 8 forms by the conversion regime of growth substrates 1.Growth substrates 1 comprises preset conversion layer; Preset conversion layer 2-2 can be converted to transparent substrates 8 by growth substrates 1.
Preset conversion layer 2-2 forms epitaxial loayer N district 3, active area 4 and epitaxial loayer P district 5 from bottom to top successively by epitaxial growth mode; N face electrode 11 and p side electrode 10 pass through photoetching, evaporations and peel off and make, or pass through evaporation, photoetching and be etched into.
The second bonding medium 9 is specially SiO 2, ITO or Si 3n 4medium.Growth substrates 1 comprises GaAs; Preset conversion layer 2-2 comprises AlAs.
Preset conversion layer 2-2 can be corroded liquid selectivity eliminate; Corrosive liquid is specially HF.Growth substrates 1 can recycle through surface treatment.
Adopt the situation of etch stop layer 2-1 with respect to the existing luminescent device chip shown in Fig. 1, the utility model adopts can optionally be corroded by HF the preset conversion layer 2-2 of elimination, make the growth substrates 1 can recycling, the As of growth substrates 1 can not bring subsequent technique flow process prepared by luminescent device into, reduce production cost, utilized transparent substrates 8 to increase the overall light extraction efficiency of luminescent device chip simultaneously.
Embodiment 2
As shown in Fig. 2~4, a kind of luminescent device chip of the utility model, comprise: be followed successively by transparent substrates 8, epitaxial loayer N district 3, N face electrode 11, active area 4, epitaxial loayer P district 5 and p side electrode 10 from bottom to top, transparent substrates 8 is by the second bonding medium 9 and 3 combination of epitaxial loayer N layer, and transparent substrates 8 forms by the conversion regime of growth substrates 1.Growth substrates 1 comprises preset conversion layer; Preset conversion layer 2-2 can be converted to transparent substrates 8 by growth substrates 1.
Preset conversion layer 2-2 forms epitaxial loayer N district 3, active area 4 and epitaxial loayer P district 5 from bottom to top successively by epitaxial growth mode; N face electrode 11 and p side electrode 10 pass through photoetching, evaporations and peel off and make, or pass through evaporation, photoetching and be etched into.
The utility model also comprises support substrates 7; Epitaxial loayer P district 5 forms adhesive layer by adhesion mode, the attached support substrates 7 of adhesive layer; Support substrates 7 and transparent substrates 8 are specially Sapphire Substrate.
The second bonding medium 9 is specially SiO 2, ITO or Si 3n 4medium.Growth substrates 1 comprises GaAs; Preset conversion layer 2-2 comprises AlAs.
Preset conversion layer 2-2 can be corroded liquid selectivity eliminate; Corrosive liquid is specially BOE.Growth substrates 1 can recycle through surface treatment.
Adopt the situation of etch stop layer 2-1 with respect to the existing luminescent device chip shown in Fig. 1, the utility model adopts can optionally be corroded by BOE the preset conversion layer 2-2 of elimination, make the growth substrates 1 can recycling, the As of growth substrates 1 can not bring subsequent technique flow process prepared by luminescent device into, reduce production cost, utilized transparent substrates 8 to increase the overall light extraction efficiency of luminescent device chip simultaneously.
Embodiment 3
As shown in Fig. 2~4, a kind of luminescent device chip of the utility model, comprise: be followed successively by transparent substrates 8, epitaxial loayer N district 3, N face electrode 11, active area 4, epitaxial loayer P district 5 and p side electrode 10 from bottom to top, transparent substrates 8 is by the second bonding medium 9 and 3 combination of epitaxial loayer N layer, and transparent substrates 8 forms by the conversion regime of growth substrates 1.Growth substrates 1 comprises preset conversion layer; Preset conversion layer 2-2 can be converted to transparent substrates 8 by growth substrates 1.
Preset conversion layer 2-2 forms epitaxial loayer N district 3, active area 4 and epitaxial loayer P district 5 from bottom to top successively by epitaxial growth mode; N face electrode 11 and p side electrode 10 pass through photoetching, evaporations and peel off and make, or pass through evaporation, photoetching and be etched into.
The utility model also comprises support substrates 7; Epitaxial loayer P district 5 passes through the first bonding medium 6 in conjunction with support substrates 7; Support substrates 7 and transparent substrates 8 are specially quartz substrate.
The first bonding medium 6 is photoresist, and photoresist is specially organic gel medium, and the resist of can being delustered is dissolved, and the resist of delustering is specially acetone.The second bonding medium 9 is specially SiO 2, ITO or Si 3n 4medium.Growth substrates 1 comprises GaAs; Preset conversion layer 2-2 comprises AlAs.
Preset conversion layer 2-2 can be corroded liquid selectivity eliminate; Corrosive liquid is specially HF.Growth substrates 1 can recycle through surface treatment.
Adopt the situation of etch stop layer 2-1 with respect to the existing luminescent device chip shown in Fig. 1, the utility model adopts can optionally be corroded by HF the preset conversion layer 2-2 of elimination, make the growth substrates 1 can recycling, the As of growth substrates 1 can not bring subsequent technique flow process prepared by luminescent device into, reduce production cost, utilized transparent substrates 8 to increase the overall light extraction efficiency of luminescent device chip simultaneously.
In above embodiment, preset conversion layer 2-2 has 100,000 times of above selective corrosions to HF or BOE corrosive liquid, and due to the Etching effect of preset conversion layer 2-2, the preset conversion layer 2-2 liquid that is corroded melts, and growth substrates 1 just can recycling.
The residual thickness of transparent substrates 8 depends on the chi of epitaxial wafer, relevant with its surface state, can affect the quality of follow-up cutting efficiency and final products, if blocked up, increase and draws sliver difficulty, if excessively thin, affects fragment rate and warpage situation.
The foregoing is only preferred embodiment of the present utility model; not in order to limit the utility model; all within spirit of the present utility model and principle, any amendment of doing, be equal to replacement, improvement etc., within all should being included in protection range of the present utility model.

Claims (9)

1. a luminescent device chip, it is characterized in that, comprise: be followed successively by transparent substrates, epitaxial loayer N district, N face electrode, active area, epitaxial loayer P district and p side electrode from bottom to top, described transparent substrates is combined with described epitaxial loayer N layer by the second bonding medium, and described transparent substrates forms by the conversion regime of growth substrates.
2. a kind of luminescent device chip according to claim 1, is characterized in that, described growth substrates comprises preset conversion layer; Described preset conversion layer can be converted to described transparent substrates by described growth substrates.
3. a kind of luminescent device chip according to claim 2, is characterized in that, described preset conversion layer forms described epitaxial loayer N district, described active area and described epitaxial loayer P district from bottom to top successively by epitaxial growth mode; Described N face electrode and described p side electrode pass through photoetching, evaporation and peel off and make, or pass through evaporation, photoetching and be etched into.
4. a kind of luminescent device chip according to claim 3, is characterized in that, also comprises support substrates; Described epitaxial loayer P district forms adhesive layer by adhesion mode, the attached described support substrates of described adhesive layer; Or described epitaxial loayer P district passes through the first bonding medium in conjunction with described support substrates; Described support substrates and described transparent substrates are specially Sapphire Substrate or quartz substrate.
5. a kind of luminescent device chip according to claim 4, is characterized in that, described the first bonding medium resist of can being delustered is dissolved, described in the resist of delustering be specially acetone.
6. a kind of luminescent device chip according to claim 5, is characterized in that, described the first bonding medium is photoresist, and described photoresist is specially organic gel medium; Described the second bonding medium is specially SiO 2, ITO or Si 3n 4medium.
7. a kind of luminescent device chip according to claim 2, is characterized in that, described preset conversion layer can be corroded liquid selectivity eliminate; Described corrosive liquid is specially HF or BOE.
8. according to a kind of luminescent device chip described in claim 2~7 any one, it is characterized in that, described growth substrates comprises GaAs; Described preset conversion layer comprises AlAs.
9. a kind of luminescent device chip according to claim 8, is characterized in that, described growth substrates can recycle through surface treatment.
CN201420064017.9U 2014-02-13 2014-02-13 Light emitting device chip Expired - Lifetime CN203733825U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103811604A (en) * 2014-02-13 2014-05-21 北京太时芯光科技有限公司 Luminescent device chip and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103811604A (en) * 2014-02-13 2014-05-21 北京太时芯光科技有限公司 Luminescent device chip and manufacturing method thereof

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C14 Grant of patent or utility model
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Effective date of registration: 20180423

Address after: 243000 Ma'anshan City, Anhui Province, undertaking industrial transfer Demonstration Park (north of Longshan Road)

Patentee after: MA'ANSHAN TAISHI XINGUANG TECHNOLOGY CO.,LTD.

Address before: 100176 Beijing Daxing District Beijing economic and Technological Development Zone, No. 1, ground floor, North Street.

Patentee before: Beijing Taishi Xinguang Technology Co.,Ltd.

TR01 Transfer of patent right
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Granted publication date: 20140723

CX01 Expiry of patent term