CN203631508U - Cover plate used for wet etching - Google Patents
Cover plate used for wet etching Download PDFInfo
- Publication number
- CN203631508U CN203631508U CN201320818674.3U CN201320818674U CN203631508U CN 203631508 U CN203631508 U CN 203631508U CN 201320818674 U CN201320818674 U CN 201320818674U CN 203631508 U CN203631508 U CN 203631508U
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- CN
- China
- Prior art keywords
- cover plate
- wet etching
- tft substrate
- raised line
- herringbone structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- ing And Chemical Polishing (AREA)
Abstract
The utility model discloses a cover plate used for wet etching. The cover plate is arranged above a TFT substrate in a wet etching device for etching the TFT substrate. The cover plate comprises a lower surface facing and inclined to the TFT substrate. The cover plate is composed two side plates which are connected to form a herringbone structure. Each side plat comprises a lower surface facing and inclined to the TFT substrate. The lower part of the cover plate is provided with a plurality of protruding strips which are arranged at intervals in the direction perpendicular to the inclined direction of the cover plate. Each protruding strip comprises two side edges which are connected to form a herringbone structure, and two ends of each protruding strip are fixed to the lower surface of the cover plate. An interval is formed between the herringbone structure formed by the two side edges and the lower surface of the cover plate. According to the utility model, the protruding strips of the lower surface of the cover plate are adopted to guide drug liquid drops condensed on the cover plate to two sides of the TFT substrate, and the acidic liquid drops are prevented from falling onto the TFT substrate to influence the etching homogeneity, so that the qualified rate of the product is improved.
Description
Technical field
The utility model belongs to the technical field of wet etching, relates in particular to a kind of wet etching cover plate.
Background technology
Wet-etching technology mainly refers to the technology that adopts liquid chemicals to remove the thing that is etched.To TFT(Thin Film Transistor) substrate is while carrying out wet etching, utilizes chemical liquid and etching thing to carry out chemical reaction, makes the part covering without photoresist depart from TFT substrate surface.In process of production, the volatilization of acidic liquid and the drop spraying out are attached on the cover plate of wet method etching groove, and the acid droplet adhering on the cover board builds up, large acid drop will be condensed into gradually, finally drop on substrate, cause etching inequality, affect conforming product rate.
Utility model content
The utility model provides a kind of wet etching cover plate, can avoid drop to drop on substrate, improves conforming product rate.
The utility model provides a kind of wet etching cover plate, in the wet-method etching equipment of etching TFT substrate, be positioned at described TFT substrate vertically above, described cover plate comprises towards and favours the lower surface of described TFT substrate.
Further, described cover plate is made up of two side plates that are interconnected to herringbone structure, and each side plate includes towards and favour the lower surface of described TFT substrate.
Further, the lower surface of described cover plate is along being formed with multiple grooves with the perpendicular direction interval of the incline direction of cover plate setting.
Further, the below of described cover plate is along being spaced multiple raised lines with the perpendicular direction of the incline direction of cover plate setting.
Further, described raised line is obliquely installed with respect to the lower surface of cover plate, and the nearer one end of the two ends middle distance TFT substrate of raised line and the lower surface of cover plate fix, apart from leaving spacing between TFT substrate one end far away and the lower surface of cover plate.
Further, the angle between the upper surface of described raised line and the lower surface of cover plate is 10 °～30 °.
Further, described raised line comprises two sides that are interconnected to herringbone structure, and the two ends of raised line and the lower surface of cover plate fix, between the herringbone structure junction of two sides and the lower surface of cover plate, leave spacing, and the herringbone structure junction of two sides of each raised line all arranges towards the herringbone structure junction of two side plates.
Further, the below of described two side plates is provided with the multiple raised lines that are arranged in parallel.
Further, the angle between the upper surface of described raised line and the lower surface of cover plate is 10 °～30 °.
Further, the angle between two side plates of the angle between two of described raised line sides, cover plate is 120 °～170 °.
The advantage the utlity model has is:
The wet etching cover plate that the utility model provides, utilizes cover plate lower surface the liquid condensing on cover plate to be dripped to the both sides that are drained to TFT substrate, and avoiding Acidic Liquid to drop onto affects etching homogeneity on TFT substrate, thereby improves conforming product rate.
Accompanying drawing explanation
Fig. 1: the front view of cover plate for the wet etching that the utility model provides;
Fig. 2: the upward view of cover plate for the wet etching that the utility model provides;
Fig. 3: the position relationship schematic diagram of raised line in cover plate and cover plate for the wet etching that the utility model provides;
Fig. 4: the wet etching that the utility model provides is the figure that contrasts with TFT substrate direction of transfer with cover plate;
Fig. 5: for the partial enlarged drawing of raised line part in Fig. 4.
In figure: 1-cover plate; The herringbone structure junction of two side plates of 101-; 2-raised line; The herringbone structure junction of two sides of 201-; 3-TFT substrate.
Embodiment
Below in conjunction with the drawings and specific embodiments, the utility model is described in further detail, so that those skilled in the art can better understand the utility model being implemented, but illustrated embodiment is not as to restriction of the present utility model.
Embodiment 3 provides a kind of wet etching cover plate, is with the difference of embodiment 2, and described cover plate 1 is formed with multiple grooves along plate body length direction interval.The incline direction that described plate body length direction and cover plate arrange is perpendicular.
Embodiment 4 provides a kind of wet etching cover plate, is with the difference of embodiment 3, and described cover plate 1 has been spaced multiple raised lines 2 along plate body length direction.The incline direction that described plate body length direction and cover plate arrange is perpendicular.
Embodiment 5 provides a kind of wet etching cover plate, be with the difference of embodiment 4, the below of described cover plate 1 this cover plate 1 can be obliquely installed multiple raised lines 2, as shown in Figure 1, fixing between one end that the two ends middle distance TFT substrate 3 of raised line 2 is nearer and cover plate 1, unsettled compared with keeping a determining deviation between one end far away and cover plate 1 apart from TFT substrate 3.
Embodiment 6 provides a kind of wet etching cover plate, is with the difference of embodiment 5, and can make the angle between whole raised line 2 and the lower surface of cover plate 1 is 10 °～30 °, is preferably 20 °.
Angle theta between two side plates of the herringbone structure of described cover plate 1
1be 120 °～170 °, be preferably 120 °.
Embodiment 7 provides a kind of wet etching cover plate, be with the difference of embodiment 4, as shown in Figure 2, the lower surface of described cover plate 1 is provided with the multiple raised lines 2 that arrange along cover plate 1 longitudinal separation certain distance, described raised line 2 is also herringbone structure, comprise two sides that left and right connects, wherein raised line 2 arranged direction are the herringbone structure junction 101 towards two side plates of cover plate, the herringbone structure junction 201 that makes two sides.As shown in Figure 3, between the end of two sides of raised line 2 and the lower surface of cover plate 1, be fixedly connected with, between the herringbone structure junction 201 of two sides and the lower surface of cover plate 1 separately, thereby can be good at collecting drop.
Embodiment 8 provides a kind of wet etching cover plate, is with the difference of embodiment 7, and the below of two side plates of described cover plate 1 is provided with the multiple raised lines 2 that are arranged in parallel.
Embodiment 9 provides a kind of wet etching cover plate, is with the difference of embodiment 8, and the angle between the upper surface of described raised line 2 and the lower surface of cover plate 1 is 10 °～30 °.
Embodiment 10 provides a kind of wet etching cover plate, is with the difference of embodiment 9, and the angle between the angle between two sides of described raised line 2, two side plates of cover plate 1 is 120 °～170 °.
As shown in Figure 4, when etching, the direction of transfer of TFT substrate 3 is along longitudinally the transmitting of cover plate 1, and is that horizontal direction is perpendicular with cover plate 1 minor face.As shown in Figure 5, be the partial enlarged drawing of 2 positions of raised line in Fig. 4, wherein the lower surface of raised line 2 is circular arc, is convenient to drop and flows downward.
The above embodiment is only the preferred embodiment for absolutely proving that the utility model is lifted, and protection range of the present utility model is not limited to this.What those skilled in the art did on the utility model basis is equal to alternative or conversion, all within protection range of the present utility model.Protection range of the present utility model is as the criterion with claims.
Claims (10)
1. a wet etching cover plate, in the wet-method etching equipment of etching TFT substrate, be positioned at described TFT substrate vertically above, it is characterized in that, described cover plate comprises towards and favours the lower surface of described TFT substrate.
2. wet etching cover plate according to claim 1, is characterized in that, described cover plate is made up of two side plates that are interconnected to herringbone structure, and each side plate includes towards and favour the lower surface of described TFT substrate.
3. wet etching cover plate according to claim 2, is characterized in that, the lower surface of described cover plate is along being formed with multiple grooves with the perpendicular direction interval of the incline direction of cover plate setting.
4. wet etching cover plate according to claim 2, is characterized in that, the below of described cover plate is along being spaced multiple raised lines with the perpendicular direction of the incline direction of cover plate setting.
5. wet etching cover plate according to claim 4, it is characterized in that, described raised line is obliquely installed with respect to the lower surface of cover plate, and one end that the two ends middle distance TFT substrate of raised line is nearer and the lower surface of cover plate fix, apart from leaving spacing between TFT substrate one end far away and the lower surface of cover plate.
6. wet etching cover plate according to claim 5, is characterized in that, the angle between the upper surface of described raised line and the lower surface of cover plate is 10 °～30 °.
7. wet etching cover plate according to claim 4, it is characterized in that, described raised line comprises two sides that are interconnected to herringbone structure, and the two ends of raised line and the lower surface of cover plate fix, between the herringbone structure junction of two sides and the lower surface of cover plate, leave spacing, and the herringbone structure junction of two sides of each raised line all arranges towards the herringbone structure junction of two side plates.
8. wet etching cover plate according to claim 7, is characterized in that, the below of described two side plates is provided with the multiple raised lines that are arranged in parallel.
9. wet etching cover plate according to claim 8, is characterized in that, the angle between the upper surface of described raised line and the lower surface of cover plate is 10 °～30 °.
10. wet etching cover plate according to claim 8, is characterized in that, the angle between the angle between two sides of described raised line, two side plates of cover plate is 120 °～170 °.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320818674.3U CN203631508U (en) | 2013-12-13 | 2013-12-13 | Cover plate used for wet etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320818674.3U CN203631508U (en) | 2013-12-13 | 2013-12-13 | Cover plate used for wet etching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203631508U true CN203631508U (en) | 2014-06-04 |
Family
ID=50817959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320818674.3U Expired - Fee Related CN203631508U (en) | 2013-12-13 | 2013-12-13 | Cover plate used for wet etching |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203631508U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016090692A1 (en) * | 2014-12-12 | 2016-06-16 | 深圳市华星光电技术有限公司 | Chamber structure for wet process machine |
| CN106940515A (en) * | 2017-05-08 | 2017-07-11 | 武汉华星光电技术有限公司 | Developing apparatus |
| CN107024790A (en) * | 2016-01-29 | 2017-08-08 | 芝浦机械电子株式会社 | Substrate board treatment |
| CN107479340A (en) * | 2017-09-05 | 2017-12-15 | 武汉华星光电技术有限公司 | cover plate and developing apparatus |
| CN109817552A (en) * | 2019-01-23 | 2019-05-28 | 深圳市华星光电技术有限公司 | Wet method etching groove |
| CN112038255A (en) * | 2019-06-04 | 2020-12-04 | 辛耘企业股份有限公司 | Liquid container |
-
2013
- 2013-12-13 CN CN201320818674.3U patent/CN203631508U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016090692A1 (en) * | 2014-12-12 | 2016-06-16 | 深圳市华星光电技术有限公司 | Chamber structure for wet process machine |
| CN107024790A (en) * | 2016-01-29 | 2017-08-08 | 芝浦机械电子株式会社 | Substrate board treatment |
| CN106940515A (en) * | 2017-05-08 | 2017-07-11 | 武汉华星光电技术有限公司 | Developing apparatus |
| CN107479340A (en) * | 2017-09-05 | 2017-12-15 | 武汉华星光电技术有限公司 | cover plate and developing apparatus |
| CN109817552A (en) * | 2019-01-23 | 2019-05-28 | 深圳市华星光电技术有限公司 | Wet method etching groove |
| CN112038255A (en) * | 2019-06-04 | 2020-12-04 | 辛耘企业股份有限公司 | Liquid container |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140604 Termination date: 20151213 |
|
| EXPY | Termination of patent right or utility model |