CN203607381U - Wafer sorter capable of reducing wafer surface contamination - Google Patents
Wafer sorter capable of reducing wafer surface contamination Download PDFInfo
- Publication number
- CN203607381U CN203607381U CN201320735701.0U CN201320735701U CN203607381U CN 203607381 U CN203607381 U CN 203607381U CN 201320735701 U CN201320735701 U CN 201320735701U CN 203607381 U CN203607381 U CN 203607381U
- Authority
- CN
- China
- Prior art keywords
- wafer
- rewinder
- base plate
- gaily decorated
- decorated basket
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000011109 contamination Methods 0.000 title claims abstract description 13
- 238000004140 cleaning Methods 0.000 claims abstract description 16
- 239000013078 crystal Substances 0.000 claims description 15
- 210000005056 cell body Anatomy 0.000 claims description 14
- 239000012530 fluid Substances 0.000 claims description 5
- 238000009434 installation Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 230000005484 gravity Effects 0.000 abstract description 2
- 230000007306 turnover Effects 0.000 abstract 2
- -1 polypropylene Polymers 0.000 description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 description 6
- 239000004743 Polypropylene Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Images
Abstract
The utility model provides a wafer sorter capable of reducing wafer surface contamination. The wafer sorter comprises a groove body and a wafer turnover device which is arranged in the groove body, wherein the wafer turnover device includes a support and a bottom board, the bottom board is mounted on the support through a rotation shaft, a handle is mounted at a side of the bottom board, and the bottom board is enabled to swing around the rotation shaft through pushing the handle. By employing the wafer sorter, the wafer is allowed to be immersed fully in water in the moving process of the wafer, the wafer slides off into a cleaning basket through gravity, so that the wafer will not contact other objects except for the basket, and the opportunity of wafer contamination is reduced to the largest extent, and wafer cleaning effect is improved.
Description
Technical field
The utility model relates to a kind of rewinder, relates in particular to a kind of rewinder that can reduce crystal column surface contamination.
Background technology
In wafer fabrication processes, need to repeatedly clean.Conventionally cleaning need to proceed to wafer in cleaning basket dedicated from the gaily decorated basket, goes back in the clean gaily decorated basket after cleaning again.Tradition reviewing be generally exposed in air, in wafer transfer process crystal column surface be easily dried, be subject to environmental contamination cause wafer be difficult to clean.Often contact crystal round fringes of tradition rewinder push rod design, easily causes crystal round fringes to stain.Have a strong impact on crystal column surface cleaning performance and production efficiency.
Utility model content
The purpose of this utility model is to provide a kind of can reduce the rewinder that crystal column surface stains, make wafer in the time that the gaily decorated basket is transferred to the cleaning gaily decorated basket, keep surface wettability, not stain by air ambient, can effectively reduce wafer open-assembly time in air, reduce air ambient and stain chance, and eliminate the problem of rewinder contamination crystal round fringes.
For achieving the above object, the utility model is by the following technical solutions:
A kind of rewinder that can reduce crystal column surface contamination, this rewinder comprises cell body and is arranged on the reviewing turning device in this cell body, this reviewing turning device comprises support and base plate, this base plate is rack-mount by rotating shaft, one side of this base plate is provided with leader, promotes this handle and can make base plate swing around the shaft.
The upper surface of described base plate is divided into left and right two regions, on the position between two regions of rotating shaft installation.
On two regions of described base plate, be equipped with several location holes and guide vane end stop, guide vane end stop is fixed on location hole for the spacing gaily decorated basket and the cleaning gaily decorated basket.
The location of the position that described guide vane end stop is fixing and the gaily decorated basket and the cleaning gaily decorated basket indicates and matches.
The top of described cell body is provided with overfall, and bottom is provided with inlet and leakage fluid dram.
Rewinder of the present utility model is suitable for carrying the wafer of 5 inches, 6 inches, 8 inches or 12 inches.
The utility model has the advantage of:
The utility model wafer in wafer transfer process is immersed in water completely, and wafer is naturally slipped to and is cleaned in the gaily decorated basket by gravity, except the gaily decorated basket wafer not with other object contacts, reduced to greatest extent wafer contamination chance, improved wafer cleaning effect.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model rewinder.
Fig. 2 is the structural representation of the utility model reviewing turning device.
Embodiment
Below in conjunction with accompanying drawing, the utility model is described in further detail.
As shown in Figure 1, rewinder of the present utility model comprises cell body 1 and reviewing turning device 2, reviewing turning device 2 is arranged on cell body 1 inside, this reviewing turning device 2 comprises support 3 and base plate 4, this base plate 4 is arranged on support 3 by rotating shaft 5, one side of this base plate 4 is provided with leader 6, promotes this handle 6 and can make base plate 45 swing around the shaft.
As shown in Figure 2, base plate 4 is divided into left and right two regions, rotating shaft 5 be arranged on two regions between position on.The region, two of left and right of base plate 4 is used for respectively carrying the gaily decorated basket and cleans the gaily decorated basket.On these two regions, be respectively equipped with several location holes 7 and guide vane end stop 8 for the spacing gaily decorated basket and the cleaning gaily decorated basket.By guide vane end stop is fixed on suitable location hole, the position of guide vane end stop and the location of the gaily decorated basket and the cleaning gaily decorated basket is indicated and match.In addition, can also adjust according to actual needs the size of base plate and the position of location hole, to be applicable to the wafer of sizes, rewinder of the present utility model is suitable for carrying the wafer of 5 inches, 6 inches, 8 inches or 12 inches equidimensions.
As shown in Figure 1, cell body top is provided with overfall 9, and cell body bottom is provided with into, leakage fluid dram 10, enters, leakage fluid dram can be arranged on cell body bottom and share flatly, can adopt threeway and valve to realize respectively feed liquor and draining function in engineering.In addition, inlet and leakage fluid dram can also be separately positioned on the diverse location of cell body, are not particularly limited.
In the utility model, the material of cell body can be the materials such as polypropylene (PP), stainless steel, polytetrafluoroethylene alkoxyl resin (PFA) or polytetrafluoroethylene (PTFE), and the material of the base plate of reviewing turning device can be the materials such as polypropylene (PP), polytetrafluoroethylene alkoxyl resin (PFA) or polytetrafluoroethylene (PTFE).
The utility model in use, will fill water in cell body, the gaily decorated basket that holds wafer is placed on to a side of reviewing turning device base plate, gaily decorated basket location is indicated and enter in base plate guide vane end stop, places and cleans the gaily decorated basket at opposite side.Promote handle base plate tilted, wafer can be under the effect of self gravitation from the gaily decorated basket natural landing to the cleaning gaily decorated basket of opposite side.In operating process, the gaily decorated basket and wafer are immersed in water completely, do not have object to contact with wafer except the gaily decorated basket, have reduced to greatest extent wafer and have stain chance, have improved wafer cleaning effect.
Claims (6)
1. one kind can be reduced the rewinder that crystal column surface stains, it is characterized in that, this rewinder comprises cell body and is arranged on the reviewing turning device in this cell body, this reviewing turning device comprises support and base plate, this base plate is rack-mount by rotating shaft, one side of this base plate is provided with leader, promotes this handle and can make base plate swing around the shaft.
2. the rewinder that can reduce crystal column surface contamination according to claim 1, is characterized in that, the upper surface of described base plate is divided into left and right two regions, on the position between two regions of rotating shaft installation.
3. the rewinder that can reduce crystal column surface contamination according to claim 1, is characterized in that, on two regions of described base plate, is equipped with several location holes and guide vane end stop, and guide vane end stop is fixed on location hole for the spacing gaily decorated basket and the cleaning gaily decorated basket.
4. the rewinder that can reduce crystal column surface contamination according to claim 3, is characterized in that, the location of the position that described guide vane end stop is fixing and the gaily decorated basket and the cleaning gaily decorated basket indicates and matches.
5. the rewinder that can reduce crystal column surface contamination according to claim 1, is characterized in that, the top of described cell body is provided with overfall, and bottom is provided with inlet and leakage fluid dram.
6. according to reducing the rewinder that crystal column surface stains described in any one in claim 1～5, it is characterized in that, described rewinder is suitable for carrying the wafer of 5 inches, 6 inches, 8 inches or 12 inches.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320735701.0U CN203607381U (en) | 2013-11-19 | 2013-11-19 | Wafer sorter capable of reducing wafer surface contamination |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320735701.0U CN203607381U (en) | 2013-11-19 | 2013-11-19 | Wafer sorter capable of reducing wafer surface contamination |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203607381U true CN203607381U (en) | 2014-05-21 |
Family
ID=50720045
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320735701.0U Expired - Lifetime CN203607381U (en) | 2013-11-19 | 2013-11-19 | Wafer sorter capable of reducing wafer surface contamination |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203607381U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108155139A (en) * | 2018-02-26 | 2018-06-12 | 通威太阳能（安徽）有限公司 | A kind of solar cell rewinder with position-limit mechanism |
| CN108511361A (en) * | 2017-02-24 | 2018-09-07 | 中芯国际集成电路制造(上海)有限公司 | Wafer transfer device and its application process |
| CN112967962A (en) * | 2021-01-29 | 2021-06-15 | 上海中欣晶圆半导体科技有限公司 | Jig for preventing silicon wafer from being scratched when transferred after acid corrosion and mounting method thereof |
| CN114353476A (en) * | 2022-01-04 | 2022-04-15 | 江西中弘晶能科技有限公司 | Method for improving drying of monocrystalline silicon wafer |
-
2013
- 2013-11-19 CN CN201320735701.0U patent/CN203607381U/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108511361A (en) * | 2017-02-24 | 2018-09-07 | 中芯国际集成电路制造(上海)有限公司 | Wafer transfer device and its application process |
| CN108155139A (en) * | 2018-02-26 | 2018-06-12 | 通威太阳能（安徽）有限公司 | A kind of solar cell rewinder with position-limit mechanism |
| CN108155139B (en) * | 2018-02-26 | 2023-09-22 | 通威太阳能（安徽）有限公司 | Solar cell rewinding machine with limiting mechanism |
| CN112967962A (en) * | 2021-01-29 | 2021-06-15 | 上海中欣晶圆半导体科技有限公司 | Jig for preventing silicon wafer from being scratched when transferred after acid corrosion and mounting method thereof |
| CN112967962B (en) * | 2021-01-29 | 2022-07-26 | 上海中欣晶圆半导体科技有限公司 | Jig for preventing silicon wafers from being scratched during transfer after acid corrosion and mounting method thereof |
| CN114353476A (en) * | 2022-01-04 | 2022-04-15 | 江西中弘晶能科技有限公司 | Method for improving drying of monocrystalline silicon wafer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: GRINM ADVANCED MATERIALS CO., LTD. Free format text: FORMER NAME: GRINM SEMICONDUCTOR MATERIALS CO., LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: 100088 Beijing city Xicheng District Xinjiekou Avenue No. 2 Patentee after: GRINM ADVANCED MATERIALS CO.,LTD. Address before: 100088 Beijing city Xicheng District Xinjiekou Avenue No. 2 Patentee before: GRINM SEMICONDUCTOR MATERIALS Co.,Ltd. |
|
| ASS | Succession or assignment of patent right |
Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: GRINM ADVANCED MATERIALS CO., LTD. Effective date: 20150611 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20150611 Address after: 101300 Beijing city Shunyi District Shuanghe Linhe Industrial Development Zone on the south side of the road Patentee after: GRINM SEMICONDUCTOR MATERIALS Co.,Ltd. Address before: 100088 Beijing city Xicheng District Xinjiekou Avenue No. 2 Patentee before: GRINM ADVANCED MATERIALS CO.,LTD. |
|
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee after: Youyan semiconductor silicon materials Co.,Ltd. Address before: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee before: GRINM SEMICONDUCTOR MATERIALS Co.,Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140521 |