CN203519906U - Cylindrical wave-front generation assembly - Google Patents
Cylindrical wave-front generation assembly Download PDFInfo
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- CN203519906U CN203519906U CN201320696856.8U CN201320696856U CN203519906U CN 203519906 U CN203519906 U CN 203519906U CN 201320696856 U CN201320696856 U CN 201320696856U CN 203519906 U CN203519906 U CN 203519906U
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- grating
- diffraction grating
- cylindrical wave
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- generation component
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- 230000003287 optical effect Effects 0.000 claims abstract description 18
- 239000005304 optical glass Substances 0.000 claims abstract description 16
- 238000007789 sealing Methods 0.000 claims abstract description 11
- 239000011159 matrix material Substances 0.000 claims description 9
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000009418 renovation Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
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Abstract
The utility model discloses a cylindrical wave-front generation assembly which comprises a diffraction grating, a fixed support seat, a sealing lantern ring and an annular buckle. The cylindrical wave-front generation assembly is characterized in that the diffraction grating is coated with the sealing lantern ring and then embedded in a groove of the fixed support seat, the annular buckle is embedded in the groove of the fixed support seat and then presses and fastens the diffraction grating which is embedded in the groove of the fixed support seat and coated with the sealing lantern ring, the diffraction grating is composed of an optical glass substrate and an optical adjustment film, and the optical adjustment film is arranged on the surface of the optical glass substrate to form the diffraction grating. The grating constant d of the diffraction grating is 4.25-5.75 microns. The cylindrical wave-front generation assembly is simple to operate, low in cost, high in accuracy and easy to operate.
Description
Technical field
The utility model relates to a kind of pick-up unit of optical mirror plane, particularly generation component before a kind of cylindrical wave.
Background technology
Optical element has now been widely used in the fields such as imaging, communication, medical treatment.Along with the continuous technical renovation of optics industry and at present constantly towards future development intensive, miniaturization, optical instrumentation, communication facilities portable proposed to higher requirement.
Cylindrical mirror is mainly used in and changes over picture size, for example a some hot spot is changed to spot into a line, or in the situation that not changing image width degree, change the height of picture, can be applicable to line detector illumination, bar code scanning, holographic illumination, optical information processing, computing machine, Laser emission etc., optics cylindrical mirror also has a wide range of applications in strong laser system and synchrotron radiation light beam line.
Along with improving constantly that optical articles application requires element, high precision instrument for testing device and the devices such as the chamber sheet of high power laser resonator cavity and long-distance line interferometer, requirement to cylindrical mirror part is also more and more higher, and cylindrical mirror machining precision and accuracy of detection are needed the problem of solution badly with regard to becoming present optics manufacture field.
Tradition cylinder processing technology is controlled the face shape machining precision of product conventionally with model, but along with improving constantly of product requirement, the method gradually demonstrates its drawback and can not meet the accuracy requirement of product, and the interferometer of rising in recent years is applied to plane more and spherical mirror detects, and be difficult to meet the accuracy of detection requirement of cylindrical mirror.
In view of the foregoing, the utility model provides a kind of diffraction grid component that detects cylindrical mirror, and this assembly can be positioned over this grating assembly the front end of interferometer, can be used for the optical parametric of measurement column face mirror.
Summary of the invention
The purpose of this utility model, exactly for a kind of pick-up unit of optical mirror plane is provided, particularly generation component before a kind of cylindrical wave.
To achieve these goals, the technical solution adopted in the utility model is: generation component before described a kind of cylindrical wave, comprise diffraction grating, hold-down support, sealing ring and annular buckle, its design feature is for to embed in the groove of hold-down support after diffraction grating overcoat has sealing shroud, after described annular buckle embeds the groove of hold-down support and push down and the groove of fastening hold-down support in embedded cover have the diffraction grating of sealing shroud; Described diffraction grating regulates film to form by optical glass matrix and optics, and optics forms diffraction grating after regulating film that the surface of optical glass matrix is set.
The surface that described optics regulates film that optical glass matrix is set forms the diffraction grating of grating parameter 1a and grating parameter 1b afterwards; The numerical value of grating parameter 1a and grating parameter 1b is respectively parameter a, b, and parameter a, b meet grating constant=a+b.
It is CrO that described optics regulates film
2rete.
The two sides face shape of described optical glass and see through wavefront and be and be greater than 1/20 λ, wherein λ is optical wavelength.
The computing formula of the grating constant of described diffraction grating is
, wherein L is cylindrical mirror focal length, and λ is the wavelength of light wave used, and x is the distance of certain one-level striped and zero order fringe.
The grating constant of described diffraction grating is 4.25～5.75 μ m.
Grating is a kind of conventional optical dispersion element, there is space periodicity, it seems a diffraction screen being comprised of a large amount of thin slits wide, equidistant and that be parallel to each other, dispersive power is large, resolving power is high, can be by measuring the wavelength of light wave, the structure of For Studing The Spectral Line and intensity, an important physical amount of sign diffraction grating character is exactly grating constant, grating constant=a+b.
The beneficial effects of the utility model: the utility model is simple to operate, can obtain before cylindrical wave quickly and accurately, practical, are applied to the processing of optical element, can significantly mention the machining precision of optical element, have higher using value and economic benefit.
Accompanying drawing explanation
Fig. 1 is diffraction grating principle schematic.
Fig. 1-1st, the graph of a relation of θ, dSin θ, a and b.
Fig. 2 is the front view of generation component before a kind of cylindrical wave.
Fig. 3 is the vertical view of generation component before a kind of cylindrical wave.
Fig. 4 is the front view of diffraction grating structure.
Fig. 5 is the vertical view of diffraction grating structure.
Fig. 6 is the material structure schematic diagram of making diffraction grating.
Fig. 7 is material structure and the process schematic representation of making diffraction grating.
In figure, 1a, 1b are grating parameters, the 2nd, and light wave, the 3rd, hold-down support, the 4th, diffraction grating, the 5th, annular buckle, the 6th, sealing ring, the 40th, photoresist layer, the 41st, CrO
2rete, the 42nd, quartzy optical glass.
Embodiment
For the utility model is done further to understand, the existing action principle of 1 pair of grating is by reference to the accompanying drawings made specific description, and the P in Fig. 1 represents parts, and L is cylindrical mirror focal length, and x is the distance of certain one-level striped and zero order fringe.
Important physical amount of grating is exactly grating constant, and its satisfied equation is exactly grating equation.
Grating constant=a+b
Grating equation dSin θ=k λ
In formula, θ is angle of diffraction, and λ is the wavelength of light wave used, and k is the level time of diffraction spectrum, k=0, ± 1, ± 2, ± 3, ± 4.
According to grating equation, the position of bright fringes determines by grating equation, only considers the situation of k=± 1 grade, and Sin θ is exactly an a small amount of, Sin θ ≈ tg θ now, and therefore, grating equation can be write as following formula, calculates thus grating constant:
Embodiment 1
For the utility model is done further to understand, now by reference to the accompanying drawings it is made to specific description.
As shown in drawings, generation component before a kind of cylindrical wave described in the utility model, comprise diffraction grating 4, hold-down support 3, sealing ring 6 and annular buckle 5, its design feature is by the described hold-down support 3 of the described diffraction grating 4 cover rear embedding of upper sleeve gasket 6, embeds subsequently annular buckle 5 fastening.
Wherein, diffraction grating belongs to crucial optical dispersion element, by optical glass matrix 42 and optics, regulates film 41 to form, and described optical glass matrix 42 is preferably quartzy optical glass, and optics regulates film 41 to be preferably CrO
2rete.Described CrO
2rete is arranged at the surface of quartzy optical glass, by CrO
2coating materials evenly applies or is plated on the optical glass matrix of diffraction grating, obtains parameter values and be respectively the grating parameter 1a of a, b and the diffraction grating of grating parameter 1b after photoetching, the processing of removing photoresist, and wherein parameter a, b meet grating constant=a+b.Therefore, diffraction has space periodicity, just as the diffraction screen being comprised of a large amount of thin slits wide, equidistant and that be parallel to each other by, forms.
The computing formula of the grating constant of described diffraction grating 4 is
, grating constant is 4.25～5.75 μ m.Wherein L is cylindrical mirror focal length, and λ is the wavelength of light wave used, and x is the distance of certain one-level striped and zero order fringe.
Shown in Fig. 6 and Fig. 7, the preparation process of diffraction grating is described now by reference to the accompanying drawings 4.
The step of preparation process of diffraction grating is:
(1) the processing quartzy optical flat 42 of 4 inches, its two sides face shape and see through wavefront and all need to be better than 1/20 λ.
(2) linging: at the plated surface CrO of quartzy optical flat 42
2film, forms CrO
2rete 41.
(3) at CrO
2rete 41 surface uniform resist coating layers 40, and the control of attention parameters is, the viscosity of photoresist and rotational speed.Viscosity is lower, and the thickness of photoresist is thinner; Rotational speed is faster, and the thickness of photoresist is thinner.
(4) exposure.In exposure, most important two parameters are exposure energy and focal length.
(5) remove photoresist layer 40, develop, can obtain diffraction grating 4.
By above step, can obtain diffraction grating.This diffraction grating is carried out to assembly by embodiment 1 and obtain generation component before cylindrical wave, assembly is positioned over to the front end of interferometer, can be used for measuring.
Utilize grating equation, the wavelength that detects conventional laser instrument generation is 632.8nm light wave, by controlling grating parameter, can obtain before needed cylindrical wave.
Wherein L is cylindrical mirror focal length, and λ is the wavelength of light wave used, and x is the distance of certain one-level striped and zero order fringe.Preparing focal length is the standard mirror that 75mm, effective aperture are 95mm, and step of preparation process is as follows:
(1) the quartzy optical flat 42 that preparation satisfies condition, wavefront reaches 1/20 λ, and to its plating CrO
2rete 41.
By formula
known, L=75mm, λ=632.8nm, x=10mm, formula (1) is calculated grating constant=4.75 μ m.
(2) flat board is carried out can obtaining a diffraction grating 4 after photoetching.
(3) by the mode of embodiment 1, to this grating, use mechanical parts to fix, and realize the detection of cylindrical mirror.
Claims (6)
1. generation component before a cylindrical wave, comprise diffraction grating (4), hold-down support (3), sealing ring (6) and annular buckle, it is characterized in that: in diffraction grating (4) overcoat has the groove that embeds hold-down support (3) after sealing shroud (6), after described annular buckle (5) embeds the groove of hold-down support (3) and push down and the groove of fastening hold-down support (3) in embedded cover have the diffraction grating (4) of sealing shroud (6); Described diffraction grating (4) regulates film to form by optical glass matrix (42) and optics, and optics forms diffraction grating after regulating film (41) that the surface of optical glass matrix (42) is set.
2. generation component before a kind of cylindrical wave according to claim 1, is characterized in that: the surface that optics regulates film (41) that optical glass matrix (42) is set forms the diffraction grating of grating parameter 1a and grating parameter 1b afterwards; The numerical value of grating parameter 1a and grating parameter 1b is respectively parameter a, b, and parameter a, b meet grating constant=a+b.
3. generation component before a kind of cylindrical wave according to claim 1 and 2, is characterized in that: it is CrO that described optics regulates film
2rete.
4. generation component before a kind of cylindrical wave according to claim 1 and 2, is characterized in that: the two sides face shape of described optical glass (42) and see through wavefront and be and be greater than 1/20 λ, wherein λ is optical wavelength.
5. generation component before a kind of cylindrical wave according to claim 2, is characterized in that: the computing formula of the grating constant of described diffraction grating (4) is
, wherein L is cylindrical mirror focal length, and λ is the wavelength of light wave used, and x is the distance of certain one-level striped and zero order fringe.
6. according to generation component before a kind of cylindrical wave described in claim 2 or 5, it is characterized in that: the grating constant of described diffraction grating (4) is 4.25～5.75 μ m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320696856.8U CN203519906U (en) | 2013-11-06 | 2013-11-06 | Cylindrical wave-front generation assembly |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320696856.8U CN203519906U (en) | 2013-11-06 | 2013-11-06 | Cylindrical wave-front generation assembly |
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| Publication Number | Publication Date |
|---|---|
| CN203519906U true CN203519906U (en) | 2014-04-02 |
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| CN201320696856.8U Expired - Lifetime CN203519906U (en) | 2013-11-06 | 2013-11-06 | Cylindrical wave-front generation assembly |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107907307A (en) * | 2017-11-09 | 2018-04-13 | 成都精密光学工程研究中心 | A kind of measuring device and method of wedge-shaped lens transmission wavefront |
| CN111426750A (en) * | 2020-04-16 | 2020-07-17 | 武汉理工大学 | A simulation test device and test method capable of generating cylindrical waves |
-
2013
- 2013-11-06 CN CN201320696856.8U patent/CN203519906U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107907307A (en) * | 2017-11-09 | 2018-04-13 | 成都精密光学工程研究中心 | A kind of measuring device and method of wedge-shaped lens transmission wavefront |
| CN107907307B (en) * | 2017-11-09 | 2024-04-30 | 成都精密光学工程研究中心 | Wedge-shaped lens transmission wavefront measuring device and method |
| CN111426750A (en) * | 2020-04-16 | 2020-07-17 | 武汉理工大学 | A simulation test device and test method capable of generating cylindrical waves |
| CN111426750B (en) * | 2020-04-16 | 2021-01-26 | 武汉理工大学 | Simulation test device and test method capable of generating cylindrical wave |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 350100 building, No. nine East Road, Minhou economic and Technological Development Zone, Fuzhou, Fujian 2, China Patentee after: FUZHOU HAICHUANG OPTICAL Co.,Ltd. Address before: 350100 building, No. nine East Road, Minhou economic and Technological Development Zone, Fuzhou, Fujian 2, China Patentee before: FUJIAN BASI PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |
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| CP01 | Change in the name or title of a patent holder | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200611 Address after: 350100 27th floor, Chuangye building, Haixi hi tech Industrial Park, hi tech Zone, Fuzhou City, Fujian Province Patentee after: FUJIAN HAICHUANG PHOTOELECTRIC Co.,Ltd. Address before: 350100 building, No. nine East Road, Minhou economic and Technological Development Zone, Fuzhou, Fujian 2, China Patentee before: FUZHOU HAICHUANG OPTICAL Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| CP03 | Change of name, title or address |
Address after: 350100 floor 5, building 19, phase II, innovation park, No. 7, middle wulongjiang Avenue, Shangjie Town, Minhou County, Fuzhou City, Fujian Province Patentee after: Fujian Haichuang Photoelectric Technology Co.,Ltd. Address before: 350100 27th floor, Pioneer Building, Haixi hi tech Industrial Park, high tech Zone, Fuzhou City, Fujian Province Patentee before: FUJIAN HAICHUANG PHOTOELECTRIC CO.,LTD. |
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| CP03 | Change of name, title or address | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140402 |
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| CX01 | Expiry of patent term |