CN203492261U - Radio frequency plasma source - Google Patents
Radio frequency plasma source Download PDFInfo
- Publication number
- CN203492261U CN203492261U CN201320649541.8U CN201320649541U CN203492261U CN 203492261 U CN203492261 U CN 203492261U CN 201320649541 U CN201320649541 U CN 201320649541U CN 203492261 U CN203492261 U CN 203492261U
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- radio frequency
- power supply
- radio
- power
- adaptation
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Abstract
Disclosed is a radio frequency plasma source. The plasma source belongs to the field of electronic instruments and devices. The plasma source comprises a device chassis. The panel disposed at the front part of the chassis is provided with a switch, a liquid crystal display screen, a parameter setting button and a power adjusting button. An electronic circuit board is disposed inside the chassis. The circuit broad is provided with a main board portion. The main board portion can process radio frequency power supply and matcher data and allow the data to be displayed on the liquid crystal display screen. The circuit board is connected with circuit parts of power supply control and power control and then connected with a matching calculation portion. The main effects of the plasma source are that the plasma source is small in size and saves about 40% size compared with the scheme of utilizing a radio frequency power supply and a radio frequency automatic matcher, allows radio frequency lines to be reduced, and allows the radio frequency power supply and the automatic matcher to be under communication integration processing to achieve better cooperation between the radio frequency power supply and the automatic matcher.
Description
Technical field
The utility model belongs to electronic equipment field, specially refers to a kind of radio frequency plasma body source.
Background technology
The radio frequency plasma application apparatus of market sale now.The generation of its equipment applying plasma is not quite similar, and generally adopts at present radio-frequency power supply and radio frequency adaptation combination results plasma.And radio-frequency power supply and radio frequency automatic matcher are all two products independently, the interconnecting not only in occupation of larger spatial volume of system, and this connection more complicated and fastidious.Need to there is the engineer of radio frequency experience to carry out installment and debugging.The utility model is creatively integrated in one by functions such as radio-frequency power supply and radio frequency automatic matchers, simplify outside connection and debug process, make this equipment directly become driving plasma, produce the power supply of plasma, become that volume is little, connecting line is few, radio frequency plasma body source that can independent utility.By the design of special radio frequency isolation, realize radio-frequency power supply and adaptation does not disturb mutually, thereby two independent cabinets are synthesized in a cabinet, reduced the volume of radio system, approximately reduced by 40% volume.In Miniature RF plasma apparatus, can save the volume of radio frequency part and simplify radio system design, thereby saving radio frequency part cost.
Summary of the invention
The utility model technical issues that need to address are, in order effectively to simplify outside connection and debug process, radio-frequency power supply and radio frequency automatic matcher need to be become one, and reduce volume and the connecting line of equipment.
The purpose of this utility model is to provide a kind of radio frequency plasma body source.
Before describing the technical program, first introduce this equipment operation principle.220V civil power is input to DC power supply through switch, is converted to direct current 48V, 24V, 15V, the voltages such as 5V.These voltages are input to respectively mainboard, and power supply is controlled and power control board and adaptation computing board, as power supply, supplies with.Mainboard is responsible for processing the data of radio-frequency power supply and adaptation, the state of power supply, and incident power, the operational data of reflection power and adaptation is shown in LCDs.The button that user can pass through to control power supply is to power adjustments, and the article on plasma sources such as radio-frequency (RF) switch and setting parameter operate and set.By adaptation button, adaptation electric capacity is regulated, setting parameter and working method are set.Outer computer or PLC can be sampled and be controlled by digital and analog interface article on plasma source.
Power supply is controlled and main being responsible for of power control manages the various voltages of input, coordinates each several part switching sequence and power supply size.The power of radio-frequency power amplifier is carried out to closed-loop control and adjusting according to the signal of radio-frequency power transducer.Adaptation has tuning part, and motor and radio frequency sensor form.The radio-frequency power of radio-frequency power amplifier output is input to tuning part after radio frequency sensor, and impedance is converted, and is transformed to the impedance with load matched, then through radio-frequency (RF) output end output, drives plasma load, lights a fire and maintains plasma.
Adaptation computing board is responsible for the radiofrequency signal of radio frequency sensor collection to calculate, and according to result of calculation CD-ROM drive motor, tuning capacitance and inductance is regulated.Thereby realize impedance matching.Adaptation state and transfer of data are arrived to mainboard simultaneously, process and display.
The technical scheme that the utility model adopts is as follows, a kind of radio frequency plasma body source, comprise equipment cabinets, on the panel of cabinet front portion, be furnished with switch, LCDs, and setting parameter and power adjustments button, it is characterized in that, cabinet inside is provided with electronic circuit board, includes and process radio-frequency power supply and adaptation data and be shown to the main board on liquid crystal display screen on this wiring board; It is connected to the circuit part that power supply is controlled and power is controlled, and is connected to adaptation calculating section.
The main effect of radio frequency plasma body source is: 1. volume is little, and the former employing radio-frequency power supply of volume ratio and radio frequency automatic matcher scheme are saved volume 40%; 2. radio frequency (RF) cable reduces, as long as an AC power supplies input line, ground wire and radio frequency output line.And adopt radio-frequency power supply and adaptation to need extra radio frequency cable and radio frequency control line, ac power cable and the radio-frequency power supply ground wire increasing between radio-frequency power supply and adaptation.Simplify radio system, reduce failure rate.Make connection and problem with grounding complicated between original radio frequency source and adaptation, be solved.3. communication integrated approach between radio-frequency power supply and automatic adapter, can better coordinate the two.
Accompanying drawing explanation
Fig. 1 is the cabinet panel figure of radio frequency plasma body source;
Fig. 2 is equipment cabinets layout;
Fig. 3 is electronic circuit board electrical schematic diagram in cabinet;
Embodiment
With reference to Fig. 1, be the cabinet panel figure of radio frequency plasma body source, in figure, 2 is cabinet panel, has mains switch 2.1 on cabinet panel, LCDs 2.2, setup parameter button 2.3, power adjustments button 2.4, radio-frequency (RF) switch 2.5 and adaptation control board 2.6.With reference to Fig. 2, be equipment cabinets 1 interior layout figure, in cabinet, except electronic circuit board 3, also contain tunable capacitor Ca, Cb, and DC power supply DC.With reference to Fig. 3, be the electrical schematic diagram of electronic circuit board in cabinet 3, mainly contain mainboard 3.1, power supply control and power control circuit 3.2, adaptation 3.3 and the adaptation computing board 3.4 of processing radio-frequency power supply and adaptation data.
Claims (5)
1. a radio frequency plasma body source, comprise equipment cabinets, on the panel of cabinet front portion, be furnished with switch, LCDs, and setting parameter and power adjustments button, it is characterized in that, cabinet inside is provided with electronic circuit board, includes and process radio-frequency power supply and adaptation data and be shown to the main board on liquid crystal display screen on this wiring board; It is connected to the circuit part that power supply is controlled and power is controlled, and is connected to adaptation calculating section.
2. radio frequency plasma body source according to claim 1, is characterized in that, described mainboard is responsible for processing the data of radio-frequency power supply and adaptation, the state of power supply, and incident power, the operational data of reflection power and adaptation is shown in LCDs.
3. radio frequency plasma body source according to claim 1, it is characterized in that, described power supply is controlled and main being responsible for of power control manages the various voltages of input, coordinate each several part switching sequence and power supply size, the power of radio-frequency power amplifier is carried out to closed-loop control and adjusting according to the signal of radio-frequency power transducer.
4. radio frequency plasma body source according to claim 1, is characterized in that, described adaptation has tuning part, and motor and radio frequency sensor form.
5. radio frequency plasma body source according to claim 1, is characterized in that, described adaptation computing board is responsible for the radiofrequency signal of radio frequency sensor collection to calculate, and according to result of calculation CD-ROM drive motor, tuning capacitance and inductance is regulated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320649541.8U CN203492261U (en) | 2013-10-22 | 2013-10-22 | Radio frequency plasma source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320649541.8U CN203492261U (en) | 2013-10-22 | 2013-10-22 | Radio frequency plasma source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203492261U true CN203492261U (en) | 2014-03-19 |
Family
ID=50263054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320649541.8U Expired - Fee Related CN203492261U (en) | 2013-10-22 | 2013-10-22 | Radio frequency plasma source |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203492261U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106406193A (en) * | 2016-12-15 | 2017-02-15 | 北京北广科技股份有限公司 | Dynamically monitoring system for radio frequency power supply with integrated control panel |
| CN106851956A (en) * | 2015-10-23 | 2017-06-13 | 永信射频电子有限公司 | Integral high-frequency normal pressure plasma generator with matching part and analyte sensors |
-
2013
- 2013-10-22 CN CN201320649541.8U patent/CN203492261U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106851956A (en) * | 2015-10-23 | 2017-06-13 | 永信射频电子有限公司 | Integral high-frequency normal pressure plasma generator with matching part and analyte sensors |
| CN106851956B (en) * | 2015-10-23 | 2019-08-06 | 永信射频电子有限公司 | Integral high-frequency normal pressure plasma generator with matching part and analyte sensors |
| CN106406193A (en) * | 2016-12-15 | 2017-02-15 | 北京北广科技股份有限公司 | Dynamically monitoring system for radio frequency power supply with integrated control panel |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140319 Termination date: 20191022 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |