CN203411607U - Wire-drawing die device with micro aperture and diamond coating - Google Patents

Wire-drawing die device with micro aperture and diamond coating Download PDF

Info

Publication number
CN203411607U
CN203411607U CN201320313241.2U CN201320313241U CN203411607U CN 203411607 U CN203411607 U CN 203411607U CN 201320313241 U CN201320313241 U CN 201320313241U CN 203411607 U CN203411607 U CN 203411607U
Authority
CN
China
Prior art keywords
wire
drawing die
micro
wortle
die device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201320313241.2U
Other languages
Chinese (zh)
Inventor
李建国
胡东平
黄飞
丰杰
王彤伟
万强
刘伟
胡绍全
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SICHUAN ZHONGWU ULTRAHARD MATERIAL CO Ltd
General Engineering Research Institute China Academy of Engineering Physics
Original Assignee
SICHUAN ZHONGWU ULTRAHARD MATERIAL CO Ltd
General Engineering Research Institute China Academy of Engineering Physics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SICHUAN ZHONGWU ULTRAHARD MATERIAL CO Ltd, General Engineering Research Institute China Academy of Engineering Physics filed Critical SICHUAN ZHONGWU ULTRAHARD MATERIAL CO Ltd
Priority to CN201320313241.2U priority Critical patent/CN203411607U/en
Application granted granted Critical
Publication of CN203411607U publication Critical patent/CN203411607U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Metal Extraction Processes (AREA)

Abstract

The utility model discloses a wire-drawing die device with a micro aperture and a diamond coating. The wire-drawing die device comprises a chemical vapor deposition reaction chamber, wherein an exhaust passage is arranged at the upper end of the chemical vapor deposition reaction chamber; an air intake device is arranged at the lower end of the chemical vapor deposition reaction chamber; a wire-drawing main body is arranged in the chemical vapor deposition reaction chamber and connected with a power supply; the wire drawing main body comprises a wire-drawing die, and a high-temperature-resistant support device arranged at the lower end of the wire-drawing die; an upper heating wire and a lower heating wire are respectively arranged in positions 3-5 mm from the upper and lower ends of the wire-drawing die; the two ends of the upper heating wire as well as the lower heating wire are respectively connected with a No. 1 electrode and a No. 2 electrode. According to the wire-drawing die device, the service life of the wire-drawing die is greatly prolonged; the dimensional precision and surface quality of wires or pipes are improved; the diamond coating on the surface of the inner hole of the wire-drawing die is uniform; the bonding force between the diamond coating and the base body is increased; the roundness of the hole after coating is relatively high.

Description

Micro-aperture diamond-coated wire-drawing die device
Technical field
The utility model relates to a kind of diamond-coated wire-drawing die device, relates to specifically a kind of diamond-coated wire-drawing die device of micro-aperture.
Background technology
Micro-aperture wortle is the drawing of the last several passages of finished wire rod normally, is directly connected to finished wire rod production efficiency and quality, so the quality of micro-aperture wortle and use properties play vital effect in wire drawing.Along with the minimizing of wortle aperture size, drawing speed is faster, and the area of frictional wear contact is less, weares and teares sooner, and die life is shorter.What the mould below φ 1.5mm was used at present is Wimet and glomerocryst mould, although sintered-carbide die low price, be only 3 tons work-ing life; And the work-ing life of glomerocryst mould in the situation that guaranteeing that unload maintenance every day is generally at 10 tons~20 tons.Above-mentioned two series products can not meet continuous drawing, large-duty demand.Therefore, developing good, the long-life superhard wire-drawing die of various wear resisting propertys is inexorable trend, to promoting the fast-developing tool of wire rod, tubing processing manufacturing industry, is of great significance.
Diamond has extreme hardness and chemical stability, and its wear resistance is 100 times~250 times of Wimet, have the ability of strong alkali-acid resistance, but toughness is very poor.If the good hard alloy drawing mould of the toughness of take is matrix, the diamond thin that coating one deck wear resistance is high, unreactiveness is good, diamond coatings mould has higher-strength and the super wear-resisting feature of diamond of Wimet concurrently, by the means that are a kind of desirable raising wire-drawing die performance.Chemical vapor deposition (CVD) method can realize on complicated tool and mould surface prepares one deck high rigidity, high-wearing feature, the diamond thin of low-friction coefficient and high surface finish, has become one of material of the tool prospect of wortle, for wortle industry has been brought new vitality.
Through the literature search to prior art, rotational symmetry centered by the structure of discovery wortle, even for guaranteeing the temperature of internal surface, optimal heated filament arrangement mode is that heated filament cylindrical-array is arranged in wortle endoporus.Along with the minimizing in wortle aperture, heated filament quantity is also wanted corresponding minimizing, can be finally that single heated filament is positioned at wire-drawing die central shaft position.Patent ZL02136951.8 provides the preparation method of a kind of wide aperture diamond-coated wire-drawing die, the squirrel-cage filament assembly that adopts many heated filaments to form and evenly isolated distribution by circular molybdenum sheet is as heating and gas driving source, symmetry and homogeneity due to many heated filaments distributions, and the Distance Shortened of heated filament and aperture surface, the quality of coating and thickness can be guaranteed.Patent ZL200810044524.5 provides a kind of small-bore (being greater than Φ 1.5mm) diamond coating drawing die preparation method, adopt in vertical direction and arrange that single heated filament is through nib, use taper weight and the stretching heated filament of high temperature spring, adopt the uniform fixture fixed mould of hoop to realize centering, guarantee the homogeneity of mold surface temperature and energized gas source distribution, thereby expanded the size range of diamond-coated wire-drawing die.But when appeal patent only can be greater than 1.5mm in aperture, use, when aperture is less than 1.5mm, is no longer applicable to heated filament and carries out diamond coatings preparation through wortle.Mainly that the heated filament of nearly 2000 ℃ there will be ablation phenomen to mould because heated filament and mold wall distance is less than 0.8mm; When secondly aperture is less than 1.0mm, the centering operation to a plurality of moulds during heated filament perforation is just very difficult; Also have the barrier action of micro-aperture to reaction atmosphere in conventional chemical gas-phase deposition, make the working face in micro-holes be difficult to generate diamond thin.Below what time limited the application of CVD diamond coatings in small-bore wortle more.
Summary of the invention
In view of this, the utility model provides a kind of micro-aperture diamond-coated wire-drawing die device, large leap ahead the work-ing life of mould, improved dimensional precision and wire rod or tube surfaces quality, can make micro-aperture wortle bore surface diamond coatings even, strengthened coating and matrix binding ability, and the pass roundness after coating is better.
For solving above technical problem, the technical solution of the utility model is:
Micro-aperture diamond-coated wire-drawing die device, comprise chemical vapor deposition reaction chamber, the upper end of this chemical vapor deposition reaction chamber is provided with exhaust-duct, in its lower end, be also provided with diffuser simultaneously, inside at chemical vapor deposition reaction chamber is also provided with wire drawing main body, in this wire drawing main body, is also connected with power supply.
Further, above-mentioned diffuser comprises gas distributor and passes through the coupled mixing chamber of pneumatic tube, on this mixing chamber, be also provided with other three inlet pipe, and the other end of three inlet pipe is connected with respectively methane gas-holder, hydrogen gas-holder and argon gas gas-holder.
As preferably, in described inlet pipe, be respectively arranged with gas meter, this gas distributor funnel and opening up setting.
As preferably, the other end of described exhaust-duct is provided with mechanical pump.
Further, above-mentioned wire drawing main body comprises wortle, is arranged at the high temperature resistant bracing or strutting arrangement of wortle lower end, the position that differs 3~5mm at the two ends up and down of this wortle with it is also respectively arranged with heater strip and lower heater strip, and the two ends of upper heater strip and lower heater strip are connected with respectively an electrode and No. two electrodes.
As preferably, the quantity of described wortle is at least one, and becomes array to be arranged on high temperature resistant bracing or strutting arrangement, and this wortle becomes cylindric, portion is provided with large mouthful of downward funnel-form through hole within it, is coated with the SiO2 coating that is useful on insulation on the inoperative surface of this wortle simultaneously.
Further, an above-mentioned electrode and No. two electrodes are arranged at the axial two ends of wortle, and with the axis of wortle in same plane, and the diameter that is arranged at the upper heater strip between an electrode and No. two electrodes is 0.15mm-0.30mm, the same diameter of heater strip is at present 0.30mm-0.60mm, and its material is tungsten filament or tantalum wire.
As preferably, the two ends of a described electrode are also respectively arranged with a high temperature resistant spring, and the material of this high temperature resistant spring is tungsten filament.
In addition, above-mentioned power supply comprises heating power supply and grid bias power supply, and the two poles of the earth of heating power supply are connected with the two ends of upper heater strip and lower heater strip respectively, and the positive pole of grid bias power supply is connected on high temperature resistant bracing or strutting arrangement, and the negative pole of this grid bias power supply is connected on heater strip.
As preferably, the material of described high temperature resistant bracing or strutting arrangement is miramint.
Compared with prior art, the utility model has following beneficial effect:
(1) the utility model can be realized micro-aperture wortle bore surface diamond coatings, has completed in the industry the breakthrough of technology;
(2) the utility model can complete batch coating and the production of product, has greatly improved production efficiency, has saved and has produced required input cost;
(3) it is even that the utility model can make micro-aperture wortle bore surface diamond coatings, strengthened coating and matrix binding ability, and the pass roundness after coating is better;
(4) the utility model carry out that long service life, the dimensional precision of micro-aperture diamond-coated wire-drawing die of coating is high, wire rod or tube surfaces quality good;
(5) the diamond coatings micro-aperture wortle that prepared by the utility model can draw by the complete finishing die for wire rods such as welding material, stainless steel, cold heading steel, copper aluminium, steel alloy, tungsten, molybdenums, the use range that has greatly increased product, has improved economic benefit;
(5) the utility model is simple in structure, easy to use, and the cost of producing and processing is lower, can be good at carrying out large-scale production and use.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
Fig. 2 is the structural representation of the utility model wire drawing main body;
Fig. 3 is the sectional view of the utility model wire drawing main body.
On figure, Reference numeral is: 1-chemical vapor deposition reaction chamber; 2-exhaust-duct; 3-wire drawing main body; 4-gas distributor; 5-heating power supply; 6-mixing chamber; 7-inlet pipe; 8-grid bias power supply; 9-wortle; 10-upper heater strip; 11-high temperature resistant spring; 12-number electrode; 13-lower heater strip; 14-high temperature resistant bracing or strutting arrangement; 15-No. two electrodes.
Embodiment
Core thinking of the present utility model is, a kind of micro-aperture diamond-coated wire-drawing die device is provided, large leap ahead the work-ing life of mould, improved dimensional precision and wire rod or tube surfaces quality, can make micro-aperture wortle bore surface diamond coatings even, strengthened coating and matrix binding ability, and the pass roundness after coating is better.
In order to make those skilled in the art understand better the technical solution of the utility model, below in conjunction with the drawings and specific embodiments, the utility model is described in further detail.
Embodiment
As shown in Figure 1, 2, 3, micro-aperture diamond-coated wire-drawing die device, comprise chemical vapor deposition reaction chamber 1, the upper end of this chemical vapor deposition reaction chamber 1 is provided with exhaust-duct 2, in its lower end, be also provided with diffuser simultaneously, inside at chemical vapor deposition reaction chamber 1 is also provided with wire drawing main body 3, in this wire drawing main body 3, is also connected with power supply.
Further, above-mentioned diffuser comprises gas distributor 4 and passes through the coupled mixing chamber 6 of pneumatic tube, on this mixing chamber 6, be also provided with other three inlet pipe 7, and the other end of three inlet pipe 7 is connected with respectively methane gas-holder, hydrogen gas-holder and argon gas gas-holder.
As preferably, in described inlet pipe 7, be respectively arranged with gas meter, this gas distributor 4 funnels and opening up setting.
As preferably, the other end of described exhaust-duct 2 is provided with mechanical pump.
Further, above-mentioned wire drawing main body 3 comprises wortle 9, is arranged at the high temperature resistant bracing or strutting arrangement 14 of wortle 9 lower ends, the position that differs 3mm~5mm at the two ends up and down of this wortle 9 with it is also respectively arranged with heater strip 10 and lower heater strip 13, and upper heater strip 10 is connected with respectively an electrode 12 and No. two electrodes 15 with the two ends of lower heater strip 13.
As preferably, the quantity of described wortle 9 is at least one, and becomes array to be arranged on high temperature resistant bracing or strutting arrangement 14, and 9 one-tenth of this wortles are cylindric, portion is provided with large mouthful of downward funnel-form through hole within it, is coated with the SiO2 coating that is useful on insulation on the inoperative surface of this wortle 9 simultaneously.
Further, an above-mentioned electrode 12 and No. two electrodes 15 are arranged at the axial two ends of wortle 9, and with the axis of wortle 9 in same plane, and the diameter that is arranged at the upper heater strip 10 between an electrode 12 and No. two electrodes 15 is 0.15mm-0.30mm, the same diameter of heater strip 13 is at present 0.30mm-0.60mm, and its material is tungsten filament or tantalum wire.
As preferably, the two ends of a described electrode 12 are also respectively arranged with a high temperature resistant spring 11, and the material of this is high temperature resistant spring 11 is tungsten filament.
In addition, above-mentioned power supply comprises heating power supply 5 and grid bias power supply 8, the two poles of the earth of heating power supply 5 are connected with the two ends of upper heater strip 10 and lower heater strip 13 respectively, and the positive pole of grid bias power supply 8 is connected on high temperature resistant bracing or strutting arrangement 14, and the negative pole of this grid bias power supply 8 is connected on heater strip.
As preferably, the material of described high temperature resistant bracing or strutting arrangement 14 is miramint.
Before use, matrix adopting YG6 sintered carbide wire drawing die, profile specification is Φ 12mm * 8mm, aperture Φ 0.8mm, allowable tolerance is-0.02mm~0mm that the aperture Φ 0.86mm after coat-thickness and tolerance is reserved on nib surface through repairing a die; Mould, after surface decontamination cleans, is placed in surface decarburization and processes stove, and atmosphere is the nitrogen atmosphere of carbon containing 0.5%, air pressure 0.5kPa, 950 ℃ of substrate temperatures, carbonization treatment 30min.Taking-up is by dilute nitric acid solution (HNO 3: H 2o=1:3) process, to remove the cobalt of matrix surface, after 15min, take out, with clear water, wash away the acid of remained on surface, mould being put into granularity is the diadust suspension sonic oscillation processing 30min of 1 μ m again, after taking out, with deionized water and raw spirit, clean, completed the making of wortle.
Then wortle is placed on the water-cooled platform of chemical vapor deposition reaction chamber.Heated filament adopts the tantalum wire of two parallel Φ 0.3mm, and strain with high temperature spring at two ends.After reaction chamber vacuumizes, pass into reactant gases, this gas is the gas containing H2 and CH4, and total flux 500ml/min starts chemical gas-phase deposition of diamond coating after adjustment chamber pressure.Forming core stage process parameter is: pressure 4.0kPa, CH 4volume parts be 5%, approximately 850 ℃ of substrate temperatures, time 30min.Growth phase processing parameter is: pressure 7.0kPa, CH 4volume parts is 3%, time 6h; The making Nano surface stage, reaction pressure 4.0kPa, the volume parts of carbon-source gas is 5%, time 30min.The all stage electric current of auxiliary negative bias is 2A.Obtain the fine-grain diamond coatings that approximately 35 μ m are thick.Aperture after coating mold polishing is Φ 0.795mm.So just completed whole techniques of coating, this coating drawing die is for the drawing of last passage of gas protecting welding wire, and its life-span is the more than 10 times of sintered-carbide die.
Below be only preferred implementation of the present utility model, it should be pointed out that above-mentioned preferred implementation should not be considered as restriction of the present utility model, protection domain of the present utility model should be as the criterion with claim limited range.For those skilled in the art, within not departing from spirit and scope of the present utility model, can also make some improvements and modifications, these improvements and modifications also should be considered as protection domain of the present utility model.

Claims (10)

1. micro-aperture diamond-coated wire-drawing die device, it is characterized in that, comprise chemical vapor deposition reaction chamber (1), the upper end of this chemical vapor deposition reaction chamber (1) is provided with exhaust-duct (2), in its lower end, be also provided with diffuser simultaneously, in the inside of chemical vapor deposition reaction chamber (1), be also provided with wire drawing main body (3), in this wire drawing main body (3), be also connected with power supply.
2. micro-aperture diamond-coated wire-drawing die device according to claim 1, it is characterized in that, described diffuser comprises gas distributor (4) and passes through the coupled mixing chamber (6) of pneumatic tube, on this mixing chamber (6), be also provided with other three inlet pipe (7), and the other end of three inlet pipe (7) is connected with respectively methane gas-holder, hydrogen gas-holder and argon gas gas-holder.
3. micro-aperture diamond-coated wire-drawing die device according to claim 2, is characterized in that, described inlet pipe is respectively arranged with gas meter on (7), this gas distributor (4) funnel and opening up setting.
4. micro-aperture diamond-coated wire-drawing die device according to claim 3, is characterized in that, the other end of described exhaust-duct (2) is provided with mechanical pump.
5. micro-aperture diamond-coated wire-drawing die device according to claim 4, it is characterized in that, described wire drawing main body (3) comprises wortle (9), is arranged at the high temperature resistant bracing or strutting arrangement (14) of wortle (9) lower end, the position that differs 3mm~5mm at the two ends up and down of this wortle (9) with it is also respectively arranged with upper heater strip (10) and lower heater strip (13), and upper heater strip (10) is connected with respectively an electrode (12) and No. two electrodes (15) with the two ends of lower heater strip (13).
6. micro-aperture diamond-coated wire-drawing die device according to claim 5, it is characterized in that, the quantity of described wortle (9) is at least one, and become array to be arranged on high temperature resistant bracing or strutting arrangement (14), this wortle (9) becomes cylindric, portion is provided with large mouthful of downward funnel-form through hole within it, is coated with the SiO that is useful on insulation on the inoperative surface of this wortle (9) simultaneously 2coating.
7. micro-aperture diamond-coated wire-drawing die device according to claim 6, it is characterized in that, a described electrode (12) is arranged at axially two ends of wortle (9) with No. two electrodes (15), and with the axis of wortle (9) in same plane, and the diameter that is arranged at the upper heater strip (10) between an electrode (12) and No. two electrodes (15) is 0.15mm-0.30mm, the same diameter of heater strip (13) is at present 0.30mm-0.60mm, and its material is tungsten filament or tantalum wire.
8. micro-aperture diamond-coated wire-drawing die device according to claim 7, is characterized in that, the two ends of a described electrode (12) are also respectively arranged with a high temperature resistant spring (11), and the material of this is high temperature resistant spring (11) is tungsten filament.
9. micro-aperture diamond-coated wire-drawing die device according to claim 8, it is characterized in that, described power supply comprises heating power supply (5) and grid bias power supply (8), the two poles of the earth of heating power supply (5) are connected with the two ends of upper heater strip (10) and lower heater strip (13) respectively, it is upper that the positive pole of grid bias power supply (8) is connected to high temperature resistant bracing or strutting arrangement (14), and the negative pole of this grid bias power supply (8) is connected on heater strip.
10. micro-aperture diamond-coated wire-drawing die device according to claim 9, is characterized in that, the material of described high temperature resistant bracing or strutting arrangement (14) is miramint.
CN201320313241.2U 2013-05-31 2013-05-31 Wire-drawing die device with micro aperture and diamond coating Expired - Fee Related CN203411607U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201320313241.2U CN203411607U (en) 2013-05-31 2013-05-31 Wire-drawing die device with micro aperture and diamond coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201320313241.2U CN203411607U (en) 2013-05-31 2013-05-31 Wire-drawing die device with micro aperture and diamond coating

Publications (1)

Publication Number Publication Date
CN203411607U true CN203411607U (en) 2014-01-29

Family

ID=49974511

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201320313241.2U Expired - Fee Related CN203411607U (en) 2013-05-31 2013-05-31 Wire-drawing die device with micro aperture and diamond coating

Country Status (1)

Country Link
CN (1) CN203411607U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108570654A (en) * 2017-03-13 2018-09-25 深圳先进技术研究院 A kind of wire-drawing die endoporus prepares the device of diamond coatings
CN113151802A (en) * 2021-04-01 2021-07-23 上海交通大学 Clamp and method for small-aperture diamond coating wire-drawing die without wire threading
CN113549894A (en) * 2021-07-29 2021-10-26 久钻科技(成都)有限公司 Diamond coating wire drawing mould processingequipment

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108570654A (en) * 2017-03-13 2018-09-25 深圳先进技术研究院 A kind of wire-drawing die endoporus prepares the device of diamond coatings
CN113151802A (en) * 2021-04-01 2021-07-23 上海交通大学 Clamp and method for small-aperture diamond coating wire-drawing die without wire threading
CN113549894A (en) * 2021-07-29 2021-10-26 久钻科技(成都)有限公司 Diamond coating wire drawing mould processingequipment

Similar Documents

Publication Publication Date Title
CN103114274B (en) Preparation method of diamond coating wire-drawing die with small aperture
CN101280423B (en) Manufacturing method of small aperture diamond coating drawing die
CN203411607U (en) Wire-drawing die device with micro aperture and diamond coating
CN105039927B (en) Large aperture diamond drawing die coating Preparation equipment and preparation method
CN101280422B (en) Device for lot manufactureof diamond coating drawing die
EA200870558A1 (en) METHODS OF PREPARING POLYCRYSTALLIC SILICON SILICONS OF HIGH DEGREE OF PURITY WITH THE USE OF METAL MEANS-BASIS
US20110142745A1 (en) Method and apparatus for forming carbon nanotube array
CN110735126B (en) Method for preparing tungsten carbide transition layer-silicon-doped diamond composite coating on steel substrate
CN103114275B (en) Preparation method of moving core mark for micronano-diamond composite coating tube stock
CN102020262B (en) Method for growing single-walled carbon nanotubes in high efficiency without metal catalyst
TW201236104A (en) Chuck for chemical vapor deposition systems and related methods therefor
CN1049018C (en) Diamond-phase carbon tubes and CVD process for their production
CN203420013U (en) Tungsten plate heater for sapphire crystal growth
CN105307767A (en) Reaction tube and method for producing hydrogen cyanide
CN201195746Y (en) Device for lot manufacture of diamond coating drawing die
CN113151802B (en) Clamp and method for small-aperture diamond coating wire-drawing die without wire threading
CN102787305A (en) Device and method for reducing impurity deposit in chemical vapor deposition process
JP2011060944A (en) Heat conductor including carbon nanotube and method of manufacturing the same, and heat treatment apparatus including the heat conductor
JP2013060321A (en) Quartz burner and method of producing glass preform for optical fiber
CN110042361B (en) Method and device for depositing diamond coating on drawing die
JPH0617251A (en) Improved method for producing article by chemical vapor deposition and article thereby produced
CN103466594A (en) Temperature control CVD furnace and method for controllably preparing single-wall carbon nano tubes with temperature control CVD furnace
CN203999806U (en) A kind of vertical layout is prepared many array thermal silk device of diamond film
CN206545041U (en) A kind of wire-drawing die endoporus prepares the device of diamond coatings
CN101967638B (en) Preparation method of diamond film inner wall of fracture well head

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20140129

Termination date: 20140531