CN203366657U - Base plates, display screens and spliced screen provided with alignment marks - Google Patents
Base plates, display screens and spliced screen provided with alignment marks Download PDFInfo
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- CN203366657U CN203366657U CN 201320445128 CN201320445128U CN203366657U CN 203366657 U CN203366657 U CN 203366657U CN 201320445128 CN201320445128 CN 201320445128 CN 201320445128 U CN201320445128 U CN 201320445128U CN 203366657 U CN203366657 U CN 203366657U
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Abstract
The utility model discloses base plates, display screens and a spliced screen provided with alignment marks, wherein the spliced screen comprises at least two display screens with the alignment marks, each base plate of each display screen is provided with at least two alignment marks, different alignment marks are different in height, and the height difference is larger than or equal to a standard difference. Formation of the alignment marks with height difference on the base plates can be carried out on back faces of the base plates or front faces of the base plates. According to the utility model, the alignment marks are arranged in different heights outside an effective display area of a panel, so that the different alignment marks are different in height. When identification and alignment are carried out, an image observing device sets a focal distance so as to display one alignment mark and an exclusive area of the alignment mark in an image. Even if different alignment marks are arranged together, the alignment marks do not interfere with each other, so that precise positioning when the display screens are spliced is realized, thereby further realizing narrow frame splicing of the display screens.
Description
Technical field
The utility model relates to field of liquid crystal display, relates in particular to a kind of substrate, display screen and mosaic screen that is provided with alignment mark.
Background technology
Popular Compact TV(compact TV in recent years, be narrow frame TV) and PID(Public Information Display, public information display) usable range of mosaic display screen is more and more wider, the splicing of display screen and display requires also more and more higher, mosaic display screen is exactly to arrange (for example 2 * 2 as display unit with matrix by a plurality of display screens, 3 * 3, 4 * 4 and larger freedom infinitely splices) form the mosaic display screen of a giant-screen, each display screen shows the part of an image, the common long-pending very large image of a breadth that shows of the display screen that matrix is arranged, also but split screen shows different images.
After the input signal of mosaic display screen is all processed by image controller, distribute and output to each display screen, the picture that each display screen shows can be crossed over the border of display screen, but usually needs to guarantee gap minimum between display screen.The display quality of single display screen directly affects the effect of whole mosaic screen, the result that adopts dissimilar display screen to obtain differing widely.Image processor is one of core devices of mosaic display screen, its effect is that the signal that the needs such as computing machine, video, network are shown is delivered to image mosaic controller, picture signal is after treatment delivered to respectively corresponding display screen, each display screen only shows a part of whole image, all display screen is added together and has just formed a complete large picture, the multiple that the resolution of large picture is each display resolution.But image processor can only made improvement aspect the processing of video, the splicing effect of the mosaic screen obtained still has very wide splicing seams, can't meet the demand of narrow splicing seams, as shown in Figure 1, the mosaic screen of take one 2 * 2 describes as example, and wherein each display unit shows a small size picture.
The narrow mosaic display screen technology of prior art is exactly the border width of existing each the piece display screen of compression, reaches the narrower purpose of piece of having spliced rear centre, the schematic diagram that Fig. 2 is narrow mosaic display screen periphery alignment mark design in prior art.Wherein A, B and C represent respectively the upper left corner, the lower left corner and the lower right corner of a fritter display screen, 1A, 2A and 3A representative are at three alignment marks in the upper left corner, 1B, 2B and 3B representative are at three alignment marks in the lower left corner, and 1C, 2C and 3C representative are at three alignment marks in the lower right corner.Any one alignment mark, have an exclusive district around it, the zone of forbidding exactly any image, and the area of alignment mark is 0.5mm*0.5mm, its exclusive district area is 1.5mm*1.5mm.If there is other pattern to enter in the exclusive district scope of alignment mark, will causes the warning of producing line equipment and can't carry out flow.As shown in Figure 2, there do not is covering between three alignment marks in the upper left corner and exclusive district thereof, can not cause can't flow, but exist and cover between three alignment marks in the lower left corner and the lower right corner and exclusive district thereof, especially the alignment mark 1B in the lower left corner, between the exclusive district of 2B and 3B, cover very serious, enlarged drawing as shown in Figure 3, all there are partly overlapping situation in the upper right corner in the exclusive district of the lower left corner in the exclusive district of alignment mark 2B and alignment mark 1B and alignment mark 2B and the exclusive district of alignment mark 3B, cause pattern to enter into the exclusive district of alignment mark, causing can't flow.
If realize the narrow frame of mosaic display screen, will the limit compress the surplus that has technique now, reduce the width at display screen alignment mark place, reduce the width of the alignment mark of substrate, improve precision and standard.But only by the surplus of the existing technique of limit compression, the frame of mosaic display screen is narrowed down and significantly do not improve, the problem that affects the mosaic display screen display effect still exists.
The utility model content
(1) technical matters that will solve
For above-mentioned defect, at least soluble technical matters of the utility model is how to avoid mosaic screen splicing seams in splicing wide, realizes narrow frame splicing.
(2) technical scheme
For addressing the above problem, the utility model provides a kind of substrate that is provided with alignment mark, comprises on described substrate and has difference in height between different alignment marks by least two alignment marks, and doubly, N is more than or equal to 1 to the N that described difference in height is standard deviation.
Further, described standard deviation is at least 2000 dusts.
Further, described alignment mark is positioned at the back side and/or the front of described substrate.
Further, the described alignment mark with difference in height is that the same layer rete forms; Perhaps the described alignment mark with difference in height is that the different layers rete forms.
For addressing the above problem, the utility model also provides a kind of display screen, comprises at least first substrate, and described first substrate is aforesaid substrate.
For addressing the above problem, the utility model also provides a kind of mosaic screen, it is characterized in that, described mosaic screen comprises at least two display screens, and described display screen is above-mentioned display screen.
(3) beneficial effect
The utility model proposes a kind of substrate, display screen and mosaic screen that is provided with alignment mark, by the effective display area by display screen, overseas alignment mark is arranged to have the form of difference in height, can utilize image viewing equipment that the alignment mark of exclusive area overlapping is distinguished, when the polylith display screen splices the identification contraposition, together can be to not producing and disturb each other even if different alignment marks is arranged in yet, realize precise positioning when display screen splices, obtain the mosaic screen of narrow frame.
The accompanying drawing explanation
The design sketch that Fig. 1 is the prior art mosaic screen;
The alignment mark design diagram that Fig. 2 is the periphery of narrow frame splicing in prior art;
Three alignment mark distribution schematic diagrams that Fig. 3 is zone, the prior art lower left corner;
Fig. 4 is that in the utility model embodiment, a kind of substrate that is provided with alignment mark is arranged on alignment mark the schematic diagram of substrate front side;
Fig. 5 is that in the utility model embodiment, a kind of substrate that is provided with alignment mark is arranged on alignment mark the schematic diagram of substrate back;
Fig. 6 is alignment mark Mark1 and exclusive district thereof in a kind of mosaic screen in the utility model embodiment;
Fig. 7 is alignment mark Mark2 and exclusive district thereof in a kind of mosaic screen in the utility model embodiment;
Fig. 8 is alignment mark Mark3 and exclusive district thereof in a kind of mosaic screen in the utility model embodiment;
Fig. 9 is the splicing effect figure that in the utility model embodiment, a kind of mosaic screen obtains;
The flow chart of steps that Figure 10 is a kind of alignment method of mosaic screen in the embodiment of the present invention.
Embodiment
Below in conjunction with drawings and Examples, embodiment of the present utility model is described in further detail.Following examples are used for the utility model is described, but are not used for limiting scope of the present utility model.
Embodiment mono-
A kind of substrate that is provided with alignment mark is provided in the utility model embodiment mono-, comprise at least two alignment marks on substrate, there is difference in height between different alignment marks, the N that described difference in height is standard deviation doubly, N is more than or equal to 1, and wherein standard deviation is the measuring accuracy of the image viewing equipment used in splicing.
The image viewing equipment of the present embodiment can be camera at existing image viewing equipment, can also be other image viewing equipment such as microscope higher than the precision of camera, below take microscope as example.Microscope can adjusting focal length, and the setting range of focal length is very wide.The alignment mark of differing heights need to be observed under different focal lengths; Under same focal length, because different alignment marks has different height, therefore only have the alignment mark corresponding with selected focal length can be clearly seen that, except other alignment mark corresponding with selected focal length smudgy, therefore the alignment mark with difference in height can be distinguished, make between alignment mark and can not be affected each other again.
When according to alignment mark, being identified contraposition, image viewing equipment is used different focal lengths to observe the alignment mark of differing heights, and the size of focal length is regulated accordingly according to the height of alignment mark.
By alignment mark being arranged to different height, make between alignment mark and there is difference in height.In prior art, when the exclusive district of an alignment mark enters into the exclusive district of another alignment mark, just these two alignment marks can't be distinguished, during splicing, location is inaccurate, causes the frame of mosaic screen larger.In the utility model embodiment owing between different alignment marks, thering is difference in height, just the alignment mark of exclusive area overlapping can be distinguished, even if two alignment mark distances very closely also can be distinguished from each other out them, just can realize location accurately when positioning, for the technique realized based on alignment mark, can access good effect.
Preferably, the size of standard deviation is at least 2000 dusts.When standard deviation is 2000 dust, just two highly different alignment marks can be distinguished.It should be noted that, 2000 dusts are the bottom line value that standard deviation is set, and minimum can not be lower than 2000 dusts, but be not limited to 2000 dusts, can also be the numerical value that is greater than 2000 dusts, and when standard deviation reaches 5000 dust better effects if.
Preferably, alignment mark wherein is positioned at the back side and/or the front of substrate.The back side at substrate forms the structure that alignment mark can be considered viewing area, in the front of substrate, forms other structures that alignment mark need to be considered viewing area.Generation type with alignment mark of difference in height comprises following two kinds: the alignment mark with difference in height forms on the same layer rete; Perhaps the described alignment mark with difference in height forms on the different layers rete.
Below take on the same layer rete of the back side of substrate to form to there is the alignment mark of difference in height and form alignment mark with difference in height on the different layers rete of substrate and describe as example.
Form the alignment mark with difference in height on substrate back same layer rete.At first carry out primary depositing at the back side of substrate and form rete, then apply photoresist, photoresist is passed through to mask plate (MASK) illumination, develop, form desired pattern on photoresist, afterwards this rete is carried out to etching, according to the preset height to each alignment mark by being etched away unnecessary height, the alignment mark that obtains highly meeting the demands.Concrete, the lower left corner two alignment marks wherein of take in the present embodiment in Fig. 3 describe as example, at first deposit and form rete at the overseas W of the effective display area of substrate back B, utilize afterwards composition technique to carry out same layer rete etching, carry out etching according to the preset height of alignment mark, finally obtain alignment mark Mark1 and Mark2, the numbering of their correspondences is respectively 10 and 20, as shown in Figure 4, the difference in height between alignment mark Mark1 and Mark2 is standard value one times.Preferably, described standard value is 2000 dusts.Further, the difference in height between described alignment mark Mark1 and Mark2 can be N times of standard value, and N is more than or equal to 1.
It should be noted that, above-mentioned alignment mark can be also to be respectively formed on the different layers rete at the back side of substrate.No matter alignment mark is arranged on layer also is arranged on different layers, while depositing with etching at the back side of substrate, due to alignment mark and vis-a-vis independence, can be arranged to difference in height arbitrarily, the height extent is directly proportional to the measuring accuracy of image viewing equipment.As an embodiment of the present utility model, image viewing equipment is used high-precision microscope in the present embodiment, its measuring accuracy can reach 2000 dusts, the N that difference in height between just can alignment mark is set to 2000 dusts doubly, just can distinguish two alignment marks with difference in height by regulating different focal lengths so under this microscope.
Further, sometimes according to process requirements, also alignment mark can be arranged on to the front of substrate.If be arranged on substrate front side, the composition technique of described alignment mark can be worked it out in the composition technique of existing TFT, need not additionally increase MASK, can not increase cost.Because the function shown need to be realized in the front of substrate, forming alignment mark in the front of substrate can impact the normal demonstration of display screen, therefore in order not affect normal demonstration, can be outside the effective display area of display screen W, alignment mark is set on different layers.Can form by composition technique, similar with top embodiment, can be by deposition, photoresist composition technique, the steps such as etching form.The alignment mark of these two different layers settings can be any one deck that forms the viewing area structure, below take gate insulation layer and semiconductor active layer to describe as example.
At first, carry out the deposition of gate insulation layer in the front of substrate, then apply photoresist, photoresist, by mask plate (MASK) illumination, is developed, form desired pattern on photoresist, afterwards gate insulation layer is carried out to etching.In the figure that forms gate insulation layer, outside effective display area, W obtains the figure of alignment mark Mark1.This is the figure of the Mark1 that obtains according to the first preset height.Then, carry out again the deposition of semiconductor active layer, then apply photoresist, photoresist, by mask plate illumination, is developed, form desired pattern on photoresist, afterwards semiconductor active layer is carried out to etching, when forming the semiconductor active layer figure, effective display area outside, W obtains alignment mark Mark2, this figure that is the Mark2 that obtains according to the second preset height.Thus, there is a default difference in height between alignment mark Mark1 and Mark2.The alignment mark Mark1 that above-mentioned technique obtains and Mark2 all are positioned at the front of substrate, and be positioned at the different layers of substrate, therefore carry out in the front of substrate alignment mark Mark1 and the Mark2 that the different layers etching obtains having difference in height, the numbering of their correspondences is respectively 10 and 20, as shown in Figure 5, the N that both differences in height are standard deviation doubly.Preferably, described standard deviation is 2000 dusts.
It should be noted that, also can on the same layer of the positive F of substrate, by composition technique, form two alignment marks with difference in height, in the similar above-mentioned Fig. 4 of method with the method for layer etching.Known according to the alignment mark lithographic method of Fig. 4 and Fig. 5: the alignment mark that no matter has difference in height is at the positive of substrate or, at the back side of substrate, different alignment marks both can form at same layer, can also form at different layers.
Two alignment marks of take in above-mentioned Fig. 4 and Fig. 5 obtain as example describes, and the above-mentioned formation method with alignment mark of difference in height is equally applicable to the formation of the alignment mark more than three and three.
In sum, substrate with difference in height alignment mark, can distinguish exclusive area overlapping or the very near alignment mark of distance, can be when proceeding to each processing technology, identify accurately location according to the alignment mark distinguished, realize better technological effect.
The substrate that is provided with alignment mark based in embodiment, the utility model embodiment mono-also provides a kind of display screen, comprises at least first substrate, and described first substrate is the above-mentioned substrate that is provided with alignment mark.Take LCDs as example, and above-mentioned first substrate can be color membrane substrates and/or array base palte, will have an effective display area that the alignment mark of difference in height is arranged on array base palte or color membrane substrates overseas.Wherein the beneficial effect of the setting of alignment mark and realization is with the setting of alignment mark in above-mentioned substrate and the beneficial effect of realization.
Above-mentioned display screen, except comprising aforesaid substrate, can also comprise backlight, is used to the normal demonstration of display screen that light source is provided.It should be noted that, the liquid crystal module of display screen except comprising that aforesaid substrate and backlight form, also comprise that other display device realizes the necessary structure of Presentation Function, does not repeat them here.
Also it should be noted that, the display screen in the present embodiment be take LCDs as example describes, and for the display screen of realizing Presentation Function outside LCDs, is equally applicable to.
Therefore, the display screen that is provided with alignment mark that the present embodiment provides, while examining under a microscope, exclusive area overlapping or the very near alignment mark of distance can be distinguished, when proceeding to each processing technology, identify accurately location according to the alignment mark distinguished, realize better technological effect.
Embodiment bis-
A kind of mosaic screen is provided in the utility model embodiment bis-, has comprised at least two display screens, the display screen of display screen wherein for providing in above-described embodiment one.
Provide the alignment mark Mark1 that three different kinds of process flows need to be used in this enforcement, Mark2 and Mark3, wherein Mark1 is into the mark of using when box (Cell) technique is cut, Mark2 is into mould (Module) technique POL(polaroid laminating) operation and OLB(binding) mark of operation use while carrying out contraposition, Mark3 is the UV(ultraviolet light polymerization) mark that uses during black matrix (BM) contraposition of technique, these three alignment marks all have exclusive district separately, forbid occurring image in exclusive district, if overlap in the exclusive district of exclusive district and other alignment marks, will cause location inaccurate.
Take liquid crystal panel as example, and by above-mentioned three alignment mark Mark1, Mark2 and Mark3 all are arranged at the overseas W of effective display area of liquid crystal panel, are arranged on liquid crystal panel successively increasing or decreasing.
The polylith display screen is spliced, the image viewing equipment that need to use during location, be generally camera or microscope, and the difference in height between telltale mark is more than or equal to standard deviation, when standard deviation is 2000 dust, just two highly different alignment marks can be distinguished.It should be noted that, 2000 dusts are the bottom line value that standard deviation is set, and minimum can not still be not limited to 2000 dusts lower than 2000 dusts, can also be the numerical value that is greater than 2000 dusts, better effects if when standard deviation reaches 5000 dust.
Fig. 6 be carry out in the molding process process when the selected focal length corresponding with alignment mark Mark1 observed the alignment mark observed with and exclusive district, Fig. 7 is for carrying out POL& The alignment mark and the exclusive district thereof that when in the OLB technological process, the selected focal length corresponding with alignment mark Mark2 observed, observe, Fig. 8 carries out in the UV technological process when the selected focal length corresponding with alignment mark Mark3 observed the alignment mark and the exclusive district thereof that observe.
Carry out the display screen splicing by the alignment mark with difference in height that adopts the present embodiment to provide, when the exclusive district of different alignment marks mutual when overlapping, image viewing equipment adopts selected focal length to be identified the exclusive district that contraposition also can only be seen alignment mark and the alignment mark corresponding with selected focal length, and can't see the exclusive district of other alignment mark and other alignment mark.Even if therefore the exclusive district of alignment mark exists and partly overlaps, can not affect identification and contraposition yet.The effect of the mosaic screen that uses above-mentioned splicing process to obtain as shown in Figure 9, with the design sketch of prior art mosaic screen in Fig. 1, compare, splicing seams narrows down significantly, for large scale (more than 46 ') mosaic screen, the piece of original mosaic screen is at 7～10mm, use the present embodiment to provide the substrate with difference in height alignment mark to be spliced, the piece that obtains mosaic screen can be reduced to 4～6mm.
The narrow frame mosaic screen that the present embodiment provides, make the form with difference in height by the alignment mark by beyond the panel effective display area on substrate, when being identified contraposition, only need to regulate the focal length of image viewing equipment, can only see an alignment mark and other district under same focal length, can not produce each other interference even if different alignment marks is arranged in together yet, thereby different alignment marks can be arranged on to relatively near position, realize narrow frame splicing.
In sum, the narrow frame mosaic screen that the present embodiment provides is arranged to different height by alignment mark the panel effective display area is overseas, make to there is difference in height between different alignment marks, when being identified contraposition, image viewing equipment is set a focal length just can only show an alignment mark and exclusive district thereof in image, can not produce each other interference even if different alignment marks is arranged in together yet, in order to carry out contraposition accurately, realize the narrow frame splicing of display screen.
Embodiment tri-
A kind of implementation method of above-mentioned mosaic screen also is provided in embodiment tri-, and steps flow chart as shown in figure 10, specifically comprises the following steps:
Step S1, the alignment mark that setting has difference in height on display screen.
Further, doubly, N is more than or equal to 1 to the N that wherein difference in height is standard deviation.Preferably, the measuring accuracy that wherein standard deviation is the image viewing equipment that uses in splicing.
Take LCDs as example, display screen wherein comprises: backlight and liquid crystal panel, liquid crystal panel is the liquid crystal panel based on alignment mark, liquid crystal panel further can comprise the liquid crystal between color membrane substrates, array base palte and color membrane substrates and array base palte, the effective display area that alignment mark is arranged on array base palte or institute's color membrane substrates is overseas, and color membrane substrates and/or array base palte are all the substrates that the alignment mark above it has difference in height.Certainly display screen can be also the display screen of realizing Presentation Function outside LCDs.
Alignment mark with difference in height wherein is set in step S1 specifically to be comprised:
There is the alignment mark of difference in height for forming with layer etching; The alignment mark that perhaps has difference in height is different layers etching formation respectively.This have been described in detail in embodiment mono-, does not repeat them here.
Step S2, when at least two display screens are spliced, by regulating the size of image viewing device focus, with the alignment mark contraposition of target.
Due to the size by adjusting image viewing device focus, set a focal length and just can only in image, show an alignment mark and exclusive district thereof, just the alignment mark with difference in height can be distinguished, in order to carry out contraposition accurately, splice location, obtain narrow frame mosaic screen.
While wherein being identified contraposition, the different focal length of alignment mark correspondence image facilities for observation of differing heights, alignment mark that just need to be required according to technique while proceeding to different processing technologys selects corresponding focal length to be observed.Such as, in molding process, need to position according to the alignment mark of Mark1, just need to the focal length that the focus adjustment of image viewing equipment is corresponding to the height with Mark1 on, at POL& In OLB technique, need to position according to the alignment mark of Mark2, on just need to the focal length that the focus adjustment of image viewing equipment is corresponding to the height with Mark2, in UV technique, need to position according to the alignment mark of Mark3, just need to the focal length that the focus adjustment of image viewing equipment is corresponding to the height with Mark3 on.
When carrying out a certain technique the image viewing selection of equipment the corresponding focal length of alignment mark needed with this technique, under this focal length, can only observe and this alignment mark, and can't see other alignment mark, therefore at an easy rate different alignment marks is distinguished.Because forbid any image in the exclusive district of alignment mark, therefore need to when carrying out a certain technique, can only see the alignment mark needed, and other alignment mark just can avoid not in viewing area the impact produced each other.With molding process, POL& OLB technique and UV technique are that example describes, and the alignment mark that three technological processes are observed and exclusive district result thereof are with above-mentioned Fig. 6-Fig. 8.Even being arranged in together, different alignment marks can not produce each other interference yet, thereby different alignment marks can be arranged on to relatively near position, realize narrow frame splicing, make splicing seams narrow down, for large scale (more than 46 ') mosaic screen, by 7 original～10mm, can be reduced to 4～6mm.
Preferably, the size of standard deviation is at least 2000 dusts.When standard deviation is 2000 dust, just two highly different alignment marks can be distinguished.It should be noted that, 2000 dusts are the bottom line value that standard deviation is set, and minimum can not be lower than 2000 dusts, but be not limited to 2000 dusts, can also be the numerical value that is greater than 2000 dusts, and when standard deviation reaches 5000 dust better effects if.
By the narrow frame mosaic screen joining method that uses the present embodiment to provide, needn't change the position of the overlapped alignment mark of existing technique, but the alignment mark beyond panel effective display area territory is made to different height, make between different alignment marks to have obvious difference in height, when being identified contraposition, only need to regulate the focal length of display device, can only see an alignment mark and other district under same focal length, even if being arranged in together, different alignment marks can not produce each other interference yet, thereby different alignment marks can be arranged on to the position of close together, realize narrow frame splicing.
Above embodiment is only for illustrating the utility model; and be not limitation of the utility model; the those of ordinary skill in relevant technologies field; in the situation that do not break away from spirit and scope of the present utility model; can also make a variety of changes and modification; therefore all technical schemes that are equal to also belong to category of the present utility model, and scope of patent protection of the present utility model should be defined by the claims.
Claims (6)
1. a substrate that is provided with alignment mark, is characterized in that, comprises on described substrate and have difference in height between different alignment marks by least two alignment marks, and doubly, N is more than or equal to 1 to the N that described difference in height is standard deviation.
2. substrate as claimed in claim 1, is characterized in that, described standard deviation is at least 2000 dusts.
3. substrate as claimed in claim 1, is characterized in that, described alignment mark is positioned at the back side and/or the front of described substrate.
4. substrate as claimed in claim 1, is characterized in that, the described alignment mark with difference in height is that the same layer rete forms; Perhaps the described alignment mark with difference in height is that the different layers rete forms.
5. a display screen, comprise at least first substrate, it is characterized in that, described first substrate is the substrate described in any one in claim 1-4.
6. a mosaic screen, is characterized in that, described mosaic screen comprises at least two display screens, and described display screen is the display screen described in claim 5.
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| Application Number | Priority Date | Filing Date | Title |
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| CN 201320445128 CN203366657U (en) | 2013-07-24 | 2013-07-24 | Base plates, display screens and spliced screen provided with alignment marks |
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| Application Number | Priority Date | Filing Date | Title |
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| CN 201320445128 CN203366657U (en) | 2013-07-24 | 2013-07-24 | Base plates, display screens and spliced screen provided with alignment marks |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103366648A (en) * | 2013-07-24 | 2013-10-23 | 京东方科技集团股份有限公司 | Substrate, display screen, spliced screen and alignment method for spliced screen |
| CN115359730A (en) * | 2022-08-16 | 2022-11-18 | 深圳市易天自动化设备股份有限公司 | Miniled high-precision splicing method and device |
-
2013
- 2013-07-24 CN CN 201320445128 patent/CN203366657U/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103366648A (en) * | 2013-07-24 | 2013-10-23 | 京东方科技集团股份有限公司 | Substrate, display screen, spliced screen and alignment method for spliced screen |
| WO2015010415A1 (en) * | 2013-07-24 | 2015-01-29 | 京东方科技集团股份有限公司 | Substrate, display screen, splicing screen and alignment method for splicing screens |
| CN103366648B (en) * | 2013-07-24 | 2015-06-17 | 京东方科技集团股份有限公司 | Substrate, display screen, spliced screen and alignment method for spliced screen |
| US9916121B2 (en) | 2013-07-24 | 2018-03-13 | Boe Technology Group Co., Ltd. | Substrate, display screen, splicing screen and alignment method of splicing screen |
| CN115359730A (en) * | 2022-08-16 | 2022-11-18 | 深圳市易天自动化设备股份有限公司 | Miniled high-precision splicing method and device |
| CN115359730B (en) * | 2022-08-16 | 2024-04-30 | 深圳市易天自动化设备股份有限公司 | Miniled high-precision splicing method and Miniled high-precision splicing device |
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| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20131225 |