CN203317866U - Wire mesh - Google Patents

Wire mesh Download PDF

Info

Publication number
CN203317866U
CN203317866U CN2013202007133U CN201320200713U CN203317866U CN 203317866 U CN203317866 U CN 203317866U CN 2013202007133 U CN2013202007133 U CN 2013202007133U CN 201320200713 U CN201320200713 U CN 201320200713U CN 203317866 U CN203317866 U CN 203317866U
Authority
CN
China
Prior art keywords
plate body
woven wire
array
thin grid
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2013202007133U
Other languages
Chinese (zh)
Inventor
魏志凌
高小平
张炜平
杨志龙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunshan Power Stencil Co Ltd
Original Assignee
Kunshan Power Stencil Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kunshan Power Stencil Co Ltd filed Critical Kunshan Power Stencil Co Ltd
Priority to CN2013202007133U priority Critical patent/CN203317866U/en
Application granted granted Critical
Publication of CN203317866U publication Critical patent/CN203317866U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Abstract

The utility model discloses a wire mesh which comprises a plate body and outer edges, wherein the plate body is in a grid structure formed by interconnecting rectangular grid arrays; a fine grid line pattern is arranged on the grid structure, and formed by line segment arrays connecting the grid structure of the plate body; the wire mesh is in the structure formed integrally, and has no woven warp and weft nodes; and the outer edges are arranged at the periphery of the plate body. The wire mesh is in the structure formed integrally, and has no woven warp and weft nodes, so that the defect caused by the woven warp and weft nodes of the traditional mesh can be overcome.

Description

A kind of woven wire
Technical field
The utility model relates to a kind of woven wire, in particular to a kind of woven wire of printing solar cell positive electrode.
Background technology
That solar energy has is harmless one of (clean energy resource), huge (the annual lip-deep solar radiant energy of the earth that arrives approximately is equivalent to 130,000,000,000,000 tons of coals to the energy, its total amount belongs to the maximum energy that can develop in the world now), the advantage such as can utilize for a long time, earth energy shortage in addition, the storage capacity of the non-renewable resources such as coal and oil reduces day by day, and solar energy becomes one of energy that people extensively utilize in recent years.Solar cell is exactly one of core representative of Application of Solar Energy.
The transformation efficiency that improves solar cell is a main target of current solar cell research, except the improvement of the selection to the cell substrate material, substrate manufacture craft, selects suitable Printing screen also can improve the transformation efficiency of battery.
The printing solar cell positive electrode need to be used mask plate, the mask plate of tradition use is to apply or overlay on the surface of the silk screens such as the woven wire of Weaving type or polyester webs the composite mask plate that one deck emulsion forms, but the composite mask plate that this type of Weaving type silk screen forms has the node of Weaving type, during printing, can cause lower slurry uneven, thereby affect the transformation efficiency of battery.
The utility model is mainly to propose a kind of silk screen for above problem, solves preferably the above problem.
The utility model content
In view of this, need to overcome at least one in above-mentioned defect of the prior art.The utility model provides a kind of woven wire, described woven wire comprises plate body, described plate body is to interconnect by the rectangular mesh array network formed, and described network is provided with thin grid line pattern, and described thin grid line pattern is comprised of the array of line segments of connecting plate volume mesh structure; The structure of described woven wire is formed in one, and without the longitude and latitude node of Weaving type, can overcome the defect that traditional screen knitting type longitude and latitude node brings.
According to described to prior art in this patent background technology, the mask plate of tradition use is to apply or overlay on the surface of the silk screens such as the woven wire of Weaving type or polyester webs the composite mask plate that one deck emulsion forms, but the composite mask plate that this type of Weaving type silk screen forms has the node of Weaving type, during printing, can cause lower slurry uneven, thereby affect the transformation efficiency of battery.The woven wire that the utility model provides has integrated structure, without the longitude and latitude node of Weaving type, can overcome the defect that traditional screen knitting type longitude and latitude node brings.
In addition, also there is following additional technical feature according to the disclosed woven wire of the utility model:
Preferably, described woven wire also has outside, and described outside is the non-net region that is arranged on described plate body periphery.The width of described outside is 0.5-2mm, and described outside plays and reinforce plate body, prevents that even fracture phenomena from appearring being out of shape in the plate body periphery, and described outside and described plate body are one-body molded, and have identical material with described plate body.
Because silk screen is very thin, its thickness, generally in 10 μ m-30 μ m scopes, even breaks so the silk screen of moulding is easy to distortion, behind the periphery design outside of silk screen plate body, can prevent well that the silk screen plate body deformability from even breaking.
Further, described outside is one-body molded with plate body and have identical thickness with plate body, outside is entity structure (being one deck nickel or nickel-base alloy), or being provided with the pattern of manhole or polygon through hole on the entity structure of described outside, described through-hole pattern is evenly distributed on the entity structure of described outside.
Further, the line segment wire diameter size r1 scope of described thin grid line area of the pattern array of line segments is 10 μ m≤r1≤25 μ m.
Further, the wire diameter size r2 scope of described plate body grid lines is 15 μ m≤r2≤30 μ m.
Further, in described plate body rectangular mesh array, the length dimension d1 scope of rectangle is 40 μ m≤d1≤100 μ m.
Further, in described plate body rectangular mesh array, the width dimensions d2 scope of rectangle is 30 μ m≤d2≤90 μ m.
Further, the line segment length size d3 scope of described thin grid line area of the pattern array of line segments is 60 μ m≤d3≤180 μ m.
Further, the spacing d4 scope between the line segment of described thin grid line area of the pattern array of line segments is 40 μ m≤d4≤100 μ m.
Preferably, according to size range as above, in the line segment length size d3 of described thin grid line area of the pattern array of line segments and described plate body rectangular mesh array, the pass of the width dimensions d2 of rectangle is: d3=2d2; The rectangle length size d1 of the spacing d4 between the line segment of described thin grid line area of the pattern array of line segments and described plate body rectangular mesh array closes: d4=d1; The pass of the line segment wire diameter size r1 of described thin grid line area of the pattern array of line segments and the wire diameter size r2 of described plate body grid lines is: r1<r2.
The line segment wire diameter size of described thin grid line area of the pattern array of line segments line segment is less than the wire diameter size of described plate body grid lines, its objective is the line segment that the reduces thin grid region barrier effect to printing slurry, to reach good lower slurry effect.
Alternatively, the material of described woven wire is nickel or nickel-base alloy.
Alternatively, described woven wire is to form by electroforming or etch process.
The aspect that the utility model is additional and advantage part in the following description provide, and part will become obviously from the following description, or recognize by practice of the present utility model.
The accompanying drawing explanation
Above-mentioned and/or additional aspect of the present utility model and advantage will become from the following description of the accompanying drawings of embodiments and obviously and easily understand, wherein:
Figure 1 shows that a kind of woven wire overall structure schematic diagram;
Figure 2 shows that the partial structurtes enlarged diagram in woven wire 12 zones in Fig. 1;
Figure 3 shows that the partial structurtes enlarged diagram in woven wire 13 zones in Fig. 1;
Figure 4 shows that the partial structurtes enlarged diagram in woven wire 31 zones in Fig. 3.
In Fig. 1,11 is thin grid line pattern, and 12,13 is regional area to be amplified, and 14 is plate body, and 15 is outside;
In Fig. 3,31 is regional area to be amplified;
In Fig. 4,41 line segments that are thin grid line area of the pattern, 42 is the plate body grid lines, the line segment wire diameter size that r1 is thin grid line array of line segments, the wire diameter size that r2 is the plate body grid lines, the length dimension that d1 is rectangle in plate body plate body rectangular mesh array, the width dimensions that d2 is rectangle in plate body rectangular mesh array, the line segment length size that d3 is thin grid line pattern array of line segments, the spacing between the line segment of the array of line segments that d4 is thin grid line area of the pattern.
The specific embodiment
Below describe embodiment of the present utility model in detail, the example of described embodiment is shown in the drawings, and wherein same or similar label means same or similar element or the element with identical or similar functions from start to finish.Be exemplary below by the embodiment be described with reference to the drawings, only for explaining the utility model, and can not be interpreted as restriction of the present utility model.
In description of the present utility model, it will be appreciated that, term " on ", orientation or the position relationship of the indications such as D score, " end ", " top ", 'fornt', 'back', " interior ", " outward ", " left side ", " right side " be based on orientation shown in the drawings or position relationship, only the utility model and simplified characterization for convenience of description, rather than indicate or imply that the device of indication or element must have specific orientation, construct and operation with specific orientation, therefore can not be interpreted as restriction of the present utility model.
In description of the present utility model, it should be noted that, unless otherwise clearly defined and limited, term " connection ", " connection ", " being connected ", " connection ", " linking " should be done broad understanding, for example, can be to be fixedly connected with, connecting integratedly, can be also to removably connect; It can be the connection of two element internals; Can be directly to be connected, also can indirectly be connected by intermediary, for the ordinary skill in the art, can concrete condition understand the concrete meaning of above-mentioned term in the utility model.
Inventive concept of the present utility model is as follows, as stated in the Background Art, according to described to prior art in this patent background technology, the mask plate of tradition use is to apply or overlay on the surface of the silk screens such as the woven wire of Weaving type or polyester webs the composite mask plate that one deck emulsion forms, but the composite mask plate that this type of Weaving type silk screen forms has the node of Weaving type, during printing, can cause lower slurry uneven.The woven wire that the utility model provides has integrated structure, without the longitude and latitude node of Weaving type, can overcome the defect that traditional screen knitting type longitude and latitude node brings.
Describe below with reference to accompanying drawings the woven wire of printing use of the present utility model, wherein Figure 1 shows that a kind of woven wire overall structure schematic diagram, Fig. 2-Figure 4 shows that partial structurtes enlarged diagram of woven wire.
According to embodiment of the present utility model, as Figure 1-Figure 4, the utility model provides a kind of woven wire, described woven wire comprises plate body 14, described plate body 14 is to interconnect by the rectangular mesh array network formed, described network is provided with thin grid line pattern 11, and described thin grid line pattern 11 is comprised of the array of line segments of connecting plate volume mesh structure; The structure of described woven wire is formed in one, and without the longitude and latitude node of Weaving type, can overcome the defect that traditional screen knitting type longitude and latitude node brings.
In addition, also there is following additional technical feature according to the disclosed woven wire of the utility model:
Preferably, described woven wire also has outside 15, and described outside 15 is for being arranged on the non-net region of described plate body 14 peripheries.The width of described outside 15 is 0.5-2mm, and described outside 15 plays and reinforce plate body, prevents that even fracture phenomena from appearring being out of shape in the plate body periphery, and described outside 15 is one-body molded with described plate body 14, and has identical material with described plate body.
Because silk screen is very thin, its thickness, generally in 10 μ m-30 μ m scopes, even breaks so the silk screen of moulding is easy to distortion, behind the periphery design outside 15 of silk screen plate body 14, can prevent well that the silk screen plate body deformability from even breaking.
Further, described outside 15 is one-body molded with plate body 14 and have identical thickness with plate body 14, outside 15 (is one deck nickel or nickel-base alloy for entity structure, as shown in Figure 1), or being provided with the pattern (not shown) of manhole or polygon through hole on the entity structure of described outside 15, described through-hole pattern is evenly distributed on (not shown) on the entity structure of described outside.
According to embodiment more of the present utility model, as shown in Figure 4, the wire diameter size r1 scope of the line segment 41 of described thin grid line area of the pattern array of line segments is 10 μ m≤r1≤25 μ m.
According to embodiment more of the present utility model, as shown in Figure 4, the wire diameter size r2 scope of described plate body grid lines 42 is 15 μ m≤r2≤30 μ m.
According to embodiment more of the present utility model, as shown in Figure 4, in described plate body rectangular mesh array, the length dimension d1 scope of rectangle is 40 μ m≤d1≤100 μ m.
According to embodiment more of the present utility model, as shown in Figure 4, in described plate body rectangular mesh array, the width dimensions d2 scope of rectangle is 30 μ m≤d2≤90 μ m.
According to embodiment more of the present utility model, as shown in Figure 4, the line segment 41 length dimension d3 scopes of the array of line segments of described thin grid line pattern are 60 μ m≤d3≤180 μ m.
According to embodiment more of the present utility model, as shown in Figure 4, the spacing d4 scope between the line segment 41 of the array of line segments of described thin grid line area of the pattern is 40 μ m≤d4≤100 μ m.
Preferably, In Figure 2-4, according to size range as above, in the line segment 41 length dimension d3 of described thin grid line area of the pattern array of line segments and described plate body rectangular mesh array, the pass of the width dimensions d2 of rectangle is: d3=2d2; In spacing d4 between the line segment 41 of described thin grid line area of the pattern array of line segments and described plate body rectangular mesh array, the length dimension d1 of rectangle closes and is: d4=d1; The pass of the line segment 41 wire diameter size r1 of described thin grid line area of the pattern array of line segments and the wire diameter size r2 of described plate body grid lines 42 is: r1<r2.
The line segment 41 wire diameter sizes of the regional array of line segments line segment of described thin grid line pattern (11) are less than the wire diameter size of described plate body (14) grid lines 42, reduce the barrier effect of 41 pairs of slurries of line segment of thin grid region while its objective is printing, to reach good lower slurry effect.
Alternatively, the material of described woven wire is nickel or nickel-base alloy.
Alternatively, described woven wire is to form by electroforming or etch process.
According to an embodiment of the present utility model, in the wire diameter size r1 of the wire diameter size r2 of described plate body grid lines 42, thin grid line area of the pattern array of line segments line segment 41, plate body rectangular mesh array in the length dimension d1 of rectangle, described plate body rectangular mesh array the spacing d4 between the line segment 41 of the line segment 41 length dimension d3 of the width dimensions d2 of rectangle, thin grid line area of the pattern array of line segments, thin grid line area of the pattern array of line segments be respectively: r2=20 μ m, r1=16 μ m, d1=80 μ m, d2=65 μ m, d3=130 μ m, d4=80 μ m.
According to an embodiment of the present utility model, above-mentioned size is respectively: r2=25 μ m, r1=19 μ m, d1=70 μ m, d2=50 μ m, d3=100 μ m, d4=70 μ m.
According to an embodiment of the present utility model, above-mentioned size is respectively: r2=27 μ m, r1=22 μ m, d1=95 μ m, d2=85 μ m, d3=170 μ m, d4=95 μ m.
According to an embodiment of the present utility model, above-mentioned size is respectively: r2=15 μ m, r1=10 μ m, d1=40 μ m, d2=30 μ m, d3=60 μ m, d4=40 μ m.
According to an embodiment of the present utility model, above-mentioned size is respectively: r2=30 μ m, r1=25 μ m, d1=100 μ m, d2=90 μ m, d3=180 μ m, d4=100 μ m.
According to an embodiment of the present utility model, above-mentioned size is respectively: r2=17 μ m, r1=13 μ m, d1=50 μ m, d2=45 μ m, d3=90 μ m, d4=50 μ m.
Although with reference to a plurality of illustrative examples of the present utility model, the specific embodiment of the present utility model is described in detail, but it must be understood that, those skilled in the art can design multiple other improvement and embodiment, and these improve and within embodiment will drop on the spirit and scope of the utility model principle.Particularly, within the scope of aforementioned open, accompanying drawing and claim, can aspect the layout of parts and/or subordinate composite configuration, make rational modification and improvement, and can not break away from spirit of the present utility model.Except modification and the improvement of parts and/or layout aspect, its scope is limited by claims and equivalent thereof.

Claims (10)

1. a woven wire, comprise plate body, it is characterized in that:
Described plate body is to interconnect by the rectangular mesh array network formed, described network is provided with thin grid line pattern, described thin grid line pattern is comprised of the array of line segments of connecting plate volume mesh structure, and the structure of described woven wire is formed in one, without the longitude and latitude node of Weaving type.
2. woven wire according to claim 1, is characterized in that, described woven wire also comprises outside, and described outside is the non-net region that is arranged on described plate body periphery.
3. woven wire according to claim 1 and 2, is characterized in that, the line segment wire diameter size r1 scope of described thin grid line area of the pattern array of line segments is 10 μ m≤r1≤25 μ m.
4. woven wire according to claim 1 and 2, is characterized in that, the wire diameter size r2 scope of described plate body grid lines is 15 μ m≤r2≤30 μ m.
5. woven wire according to claim 1 and 2, is characterized in that, in described plate body rectangular mesh array, the length dimension d1 scope of rectangle is 40 μ m≤d1≤100 μ m.
6. woven wire according to claim 1 and 2, is characterized in that, in described plate body rectangular mesh array, the width dimensions d2 scope of rectangle is 30 μ m≤d2≤90 μ m.
7. woven wire according to claim 1 and 2, is characterized in that, the line segment length size d3 scope of described thin grid line area of the pattern array of line segments is 60 μ m≤d3≤180 μ m.
8. woven wire according to claim 1 and 2, is characterized in that, the spacing d4 scope between the line segment of described thin grid line area of the pattern array of line segments is 40 μ m≤d4≤100 μ m.
9. woven wire according to claim 1 and 2, is characterized in that, in the line segment length size d3 of described thin grid line area of the pattern array of line segments and described plate body rectangular mesh array, the pass of the width dimensions d2 of rectangle is: d3=2d2; In spacing d4 between the line segment of described thin grid line area of the pattern array of line segments and described plate body rectangular mesh array, the length dimension d1 of rectangle closes and is: d4=d1; The pass of the wire diameter size r2 of the wire diameter size r1 of the line segment of described thin grid line area of the pattern array of line segments and described plate body grid lines is: r1<r2.
10. woven wire according to claim 1, is characterized in that, described woven wire is to form by electroforming or etch process.
CN2013202007133U 2013-04-20 2013-04-20 Wire mesh Expired - Fee Related CN203317866U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2013202007133U CN203317866U (en) 2013-04-20 2013-04-20 Wire mesh

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2013202007133U CN203317866U (en) 2013-04-20 2013-04-20 Wire mesh

Publications (1)

Publication Number Publication Date
CN203317866U true CN203317866U (en) 2013-12-04

Family

ID=49657251

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2013202007133U Expired - Fee Related CN203317866U (en) 2013-04-20 2013-04-20 Wire mesh

Country Status (1)

Country Link
CN (1) CN203317866U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104108233A (en) * 2013-04-20 2014-10-22 昆山允升吉光电科技有限公司 Metal wire mesh

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104108233A (en) * 2013-04-20 2014-10-22 昆山允升吉光电科技有限公司 Metal wire mesh

Similar Documents

Publication Publication Date Title
CN202782135U (en) Plane silk screen used for manufacturing solar cell piece printing screen
CN105514183B (en) A kind of preparation method of crystal silicon solar batteries front electrode
CN103358672A (en) Metal screen cloth
CN202573247U (en) Metal screen cloth
CN202428772U (en) Solar cell electrode printing screen
CN102615951A (en) Wire mesh
CN203317866U (en) Wire mesh
CN203617305U (en) Grid line structure of solar cell
CN202782136U (en) Printing screen
CN103770452A (en) Metal wire mesh
CN204063405U (en) The steady water-locator of water cool-storage technology system tank
CN103640327A (en) Novel nodeless screen
CN202782134U (en) Metal silk screen
CN103358669A (en) Plane silk screen for manufacturing printing screen of solar cell
CN104108233A (en) Metal wire mesh
CN103552368A (en) Double-printing screen for silicon solar cells
CN203254763U (en) Wire mesh screen and composite screen plate corresponding to wire mesh screen
CN103358671A (en) Honeycomb metal wire mesh
CN203726976U (en) Wire mesh
CN109980023A (en) Photovoltaic cell and photovoltaic module
CN203726975U (en) Wire mesh
CN207818578U (en) Photovoltaic cell and photovoltaic module
CN207676918U (en) A kind of electrode structure at right side of MWT solar battery sheets
CN202782137U (en) Wire net with combined structure
CN203456476U (en) Crystalline silica solar cell front electrode

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
PP01 Preservation of patent right
PP01 Preservation of patent right

Effective date of registration: 20190808

Granted publication date: 20131204

PD01 Discharge of preservation of patent
PD01 Discharge of preservation of patent

Date of cancellation: 20220808

Granted publication date: 20131204

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20131204

Termination date: 20200420