CN203217239U - Large-area nano graphics device - Google Patents
Large-area nano graphics device Download PDFInfo
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- CN203217239U CN203217239U CN 201320242545 CN201320242545U CN203217239U CN 203217239 U CN203217239 U CN 203217239U CN 201320242545 CN201320242545 CN 201320242545 CN 201320242545 U CN201320242545 U CN 201320242545U CN 203217239 U CN203217239 U CN 203217239U
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Abstract
The utility model discloses a large-area nano graphics device comprising a bearing table, a substrate, a coating device, a mould feeding device, a strip mould, a release agent sprayer, a mould cleaner, an auxiliary impressing device, a UV solidifying device, an impressing device and the like. A method implementing large-area nano graphics by the device includes: 1, pretreating; 2, coating impressing material; 3, impressing and forming; and 4, processing with the mould. The large-area nano graphics device has the advantages that efficient and low-cost scale production of micro-nano structures on super-sized non-flat rigid substrates is realized, the industrial-level solution is provided for large-area nano graphics on large-sized rigid substrates, and the large-area nano graphics device is applicable to scale production in the industries of high-performance glass, solar panels, flat-panel displaying, micro-optical devices, LEDs and the like.
Description
Technical field
The utility model belongs to technical field of micro-nano manufacture, relates in particular to a kind of patterned device of large-area nano that is applicable to the oversize rigid substrate.
Background technology
Product quality be enhanced product performance and be improved to large area functional surface nano-structure and nano-structured coating can greatly, have very extensive and huge commercial applications prospect.For example produce moth eye (Moth-Eyes) structure or nanocone structure at glass surface or the clear coat on it, glass then has good antireflection, automatically cleaning, anti-dazzle, anti-mist, high performance such as transparent, and these high-performance glass can be widely used in skyscraper glass curtain wall and shield glass, solar panel, flat pannel display (televisor screen, touch-screen, notebook screen, smart mobile phone screen etc.), optical device numerous industries such as (camera lens, microlens, optical lenses).Though for example solar panel is handled through hydrophobic coating, but the solar battery panel surface still accumulates dust and dirt easily, the light efficiency loss in efficiency can reach 40% after 6 months, make cell panel if adopt nanostructured glass, waterproof more effectively not only keeps the cleaning of panel more muchly; And, the nanostructured glass of this low reflection can make the more rays transmission cross its surface and be not reflected, the efficient of cell panel will have very large improvement.Produce the coating with moth ocular structure at liquid crystal panel (flat pannel display), not only reflectivity can be down to 0.1%, visible angle reaches 176 ゜; And this TV with moth eye panel can also be realized high-contrast, makes color more bright-coloured.In addition, this novel nano structural glass also can be applied to the optical device field, adopts the microscope of this technology and camera to have high antireflection and anti-mist ability, can work in a humid environment.For touch panel device, adopt this nanostructured glass not only can effectively eliminate reflection, improve contrast, obtain picture clearly, and its self-cleaning function that has can also effectively be kept out the sweat stain contamination.In particular for the front windshield of automobile, not only can self-cleaning glass outside surface dirt and gravel, and can eliminate dazzle, strengthen visibility, and prevent the inside surface atomizing.
Yet, existing various minute manufacturing technology (as optical lithography, beamwriter lithography, laser interference lithography, holographic lithography etc.), maximum graphical area is confined to 12 inches wafers (300mm) at present, and require harshly for the substrate flatness, especially also face challenging technical barriers such as production cost height, efficient be low.In addition, efficient, that low-cost large-area nano graph metallization processes volume to volume nano impression (Roll-to-roll NIL) is primarily aimed at the flexible substrate large-area nano is graphical, it is graphical not to be suitable for non-smooth rigid substrate.Traditional plate (platen, plate die marks rigid substrate) nano impression and roller type (roll extrusion flat, roller type die marks rigid substrate) nano impression faces a following difficult problem: (1) large tracts of land evenly exert pressure (consistance of guaranteeing coining pattern and residual layer thickness); (2) the conformal contact of the non-smooth substrate large tracts of land of mould; (3) efficient is low, and plate nano impression can't be realized large area imprinting and row graphization, and it is long that the time that needs is solidified in the contact of roller type nano impression line; (4) the large tracts of land demoulding (even adopt the scheme of fexible film mould and the open-type demoulding, graphically also having reluctant problems such as bubble and defective for large-area nano more than 300 millimeters); (5) die life, weak point and mould were made many difficult problems such as difficulty, were difficult to realize the nano patterning of the non-smooth rigid substrate of large tracts of land more than 12 inches.Therefore; existing various technology and method all can not satisfy non-smooth rigid substrate large-area graphs chemical industry level requirement of massive production more than 12 inches; this has seriously restricted large area functional surface nano-structure and nano-structured coating in application and the popularization of industries such as high-performance glass, solar panel, flat pannel display, becomes the bottleneck of these technology promotion and application of restriction.Therefore, press for the apparatus and method of the new overlarge area nano patterning of exploitation.
The utility model content
The purpose of this utility model is exactly in order to address the above problem; provide a kind of being applicable at the non-smooth rigidity lining of oversize to realize device efficient, low-coat scale manufacturing large area micro-nano rice structure, realize that the large-area nano of large-scale rigid substrate is graphical.
To achieve these goals, the utility model adopts following technical scheme:
The patterned device of a kind of large-area nano, it comprises: wafer-supporting platform, substrate, apparatus for coating, impression materials, mould feed arrangement, band shape mould, release agent spray equipment, mold cleaning device, mould guide piece, demoulding roller, auxiliary imprinting apparatus, UV solidification equipment and imprinting apparatus;
Wherein substrate places on the wafer-supporting platform, and apparatus for coating evenly is applied to substrate top surface with liquid impression materials above substrate; Band shape mould is wrapped on mould feed arrangement, mould guide piece, demoulding roller, auxiliary imprinting apparatus and the imprinting apparatus running roller separately; The UV solidification equipment places the consolidation zone between imprinting apparatus and the demoulding roller, and be positioned at auxiliary imprinting apparatus directly over, auxiliary imprinting apparatus also places the consolidation zone between imprinting apparatus and the demoulding roller; Release agent spray equipment and mold cleaning device place the band shape mould outside after the demoulding roller successively; Imprinting apparatus will copy to the feature pattern on the shape mould on the liquid impression materials of substrate top surface, and auxiliary imprinting apparatus then makes liquid impression materials be filled in the feature structure of being with the shape mould fully and band shape mould is contacted with the impression materials on the substrate is conformal; Figure behind the UV solidification equipment solidified imprinting; Feature pattern after demoulding roller is realized solidifying separates with band shape mould.
Described band shape mould comprises supporting layer and feature structure layer, wherein supporting layer is the package polyethylene terephthalate thin film, the feature structure layer is ethylene-tetrafluoroethylene copolymer or PDMS or metallic nickel, and the feature structure layer comprises protruding, recessed micro nano structure figure; 200 microns-700 microns of the thickness of described supporting layer, the feature structure layer thickness is the 20-80 micron.
Described imprinting apparatus comprises at least one roller platen, and it is provided with the force of impression regulating device, and gap and roller platen are applied to band shape mould upward pressure between force of impression regulating device adjusting roller platen and the impression materials; Described auxiliary imprinting apparatus comprises at least one conformal roller, and it is provided with the passive adaptation regulating device; Described roller platen, conformal roller, mould guide piece, the employed roller of demoulding roller are flexible roller.
Described apparatus for coating adopts nick version roller coat cloth and the accurate apparatus for coating of bar seam coating.
Described mould feed arrangement comprises a pair of driven roller, and they are connected with motor, reductor and tension controller, the outside surface roughening treatment of driven roller or have the tooth-shape structure that the lower surface with the mould supporting layer cooperatively interacts.
Described mold cleaning device comprises nozzle, gas chamber and compressed air line; Described release agent spray equipment comprises spray gun, release agent and compressed air line.
Described roller platen applied pressure is 0.1MPa-10MPa; Described substrate moves towards the direction of demoulding roller with identical linear velocity with band shape mould, is 1-5m/min; The direction of motion of described band shape mould is consistent with the direction of motion of substrate.
A kind of method that adopts the patterned device of large-area nano to realize large-area graphsization comprises the steps:
Step (1): pre-service;
Step (2): carry out the impression materials coating at the large tracts of land substrate;
Step (3): imprinting moulding on the large tracts of land substrate, and the demoulding;
Step (4): mould is handled.
The course of work of described step (3) is:
(3-1) at first, imprinting apparatus is exerted pressure to band shape mould by roller platen, under the effect of online contact printing power with the liquid impression materials extrusion packing that is coated with on the substrate in the concave character of band shape mould;
(3-2) subsequently, realize impression materials to filling fully and the uniform spreading of band shape mould concave character by the conformal roller of auxiliary imprinting apparatus, and guarantee to fill fully back band shape mould and remain good conformal the contact with impression materials on the substrate; And by the liquid impression materials of UV solidification equipment curing, realize the complete curing molding of stamping structure;
(3-3) last, the feature structure of utilizing demoulding roller will impress curing molding is separated with band shape mould, finishes the demoulding.
The course of work of described step (4) is:
(4-1) mold cleaning utilizes the mold cleaning device to remove residual impression materials, particle contaminated materials in band shape die surface and the concave character structure;
(4-2) spraying release agent after band shape mould is cleared up, sprays one deck release agent material by the release agent spray equipment in band shape die surface and concave character structure.
Significant advantage of the present utility model is: the utility model combines the advantage of plate nano impression and contour roll forming nano impression, adopts flexible band shape nano die, has realized the non-smooth rigid substrate continuous large-area nano patterning of large scale.Have that efficient height, production cost are low, the coining pattern area big (realizing that rigid substrate meter level scale nanometer is graphical), good demolding performace, die life is long and easy to maintenance, coining pattern high conformity and resolution height, for the good significant advantage of non-smooth rigid substrate adaptability.Overcome classic flat-plate nano impression efficient low, the impression area little, die life short and defective difficult in maintenance and that can't realize row graphization.Overcoming the contour roll forming nano impression is used for rigid substrate impression efficient low (ultra-violet curing line contact need is long set time), is difficult to realize hot roll extrusion seal (Roller hot embossing), non-shortcoming for the conformal engagement capacity difference of smooth substrate.For large-area nano on the oversize rigid substrate graphically provides a kind of production decision of technical grade.
In conjunction with etching or Lift-off technology, manufacturings such as the utility model can be used for that glass is graphical, solar panel, flat pannel display, graphical, the various coating of LED and surface structure (antireflection, automatically cleaning, frost-resistant etc.), large scale micro-optical device (as optical lens, diffraction optical element etc.), micro-fluidic device.Be particularly suitable for the technical grade production in enormous quantities of the required nanostructured functional coating of high-performance glass, flat pannel display, solar panel, large scale optical device.
Description of drawings
Fig. 1 is the structural representation of the graphical device of the utility model large-area nano;
Fig. 2 is the utility model band shape mould structure synoptic diagram;
Fig. 3 is the patterned course of work process flow diagram of the utility model large-area nano.
Wherein, 1 wafer-supporting platform; 2 substrates; 3 impression materials; 4 apparatus for coating; 5,9 mould feed arrangements; 6 band shape moulds; 601 supporting layers; 602 feature structure layers; 60201 protruding micro-nano structure features; 60202 recessed micro-nano structure features; 7 release agent spray equipments; 8 mold cleaning devices; 10,16 mould guide pieces; The feature structure of 11 impressions; 12 demoulding rollers; 13 auxiliary imprinting apparatus; The 14UV solidification equipment; 15 imprinting apparatus.
Embodiment
The utility model is described in further detail below in conjunction with accompanying drawing and embodiment.
The utility model turns to embodiment with the nano graph of glass, and the coating on glass substrate produces the large tracts of land structure.
Fig. 1 is the structural representation of the graphical device of the utility model large-area nano, and it comprises: wafer-supporting platform 1, substrate (glass) 2, liquid impression materials (transparent UV cure polymer) 3, apparatus for coating 4, mould feed arrangement 5 and 9, band shape mould 6, release agent spray equipment 7, mold cleaning device 8, mould guide piece 10 and 16, the feature structure 11 of impression, demoulding roller 12, auxiliary imprinting apparatus 13, UV solidification equipment 14, imprinting apparatus 15.Wherein substrate 2 places on the wafer-supporting platform 1, utilize apparatus for coating 4 that liquid impression materials 3 evenly is applied to substrate 2 upper surfaces, band shape mould 6 is wrapped in mould feed arrangement 5 and 9, mould guide piece 10 and 16, demoulding roller 12, auxiliary imprinting apparatus 13, on the imprinting apparatus 15 flexible running roller separately, UV solidification equipment 14 places the consolidation zone between imprinting apparatus 15 and the demoulding roller 12, and be positioned at band shape mould 6 and auxiliary imprinting apparatus 13 directly over, auxiliary imprinting apparatus 13 places the zone between imprinting apparatus 15 and the demoulding roller 12, and release agent spray equipment 7 and mold cleaning device 8 place band shape mould 6 lateral surfaces of (mould direction of feed) after the demoulding roller 12 successively.
To copy to the feature pattern on the shape mould 6 on the impression materials 3 by imprinting apparatus 15, utilize the feature pattern behind UV solidification equipment 14 solidified imprintings, auxiliary imprinting apparatus 13 is guaranteed liquid impression materials 3 for impression materials 3 good conformal contacts the on the complete filling of band shape mould 6 spill micro-nano feature structures 60202 and band shape mould 6 and the glass substrate 2, the feature structure 11 of the impression after demoulding roller 12 is realized solidifying and being with separating of shape mould 6.
Wherein, the described glass substrate 2 patterned glass size of wanting is 1mX0.3m.
Impression materials 3 is transparent liquid UV cure polymer or resin material or sol-gel material.
Apparatus for coating 4 adopts nick version roller coat cloth, and it comprises: reticulate pattern applicator roll, bull adhesive dripping machine, scraper, backing roll.Apparatus for coating 4 evenly is coated with liquid impression materials (UV cure polymer) 3 and is layered on glass substrate 2 upper surfaces.The thickness of coating is determined by screen density and the mesh volume of reticulate pattern applicator roll.Coating fluid (impression materials 3) in the reticulate pattern applicator roll surface crazing contacts with heterodromous glass substrate 2 one, and liquid UV cure polymer impression materials 3 is just transferred to the upper surface of glass substrate 2.The bull adhesive dripping machine be used for to be placed liquid UV cure polymer impression materials 3, and utilizes its a plurality of mini sprinklers that liquid UV cure polymer impression materials 3 evenly is coated with to be layered on reticulate pattern applicator roll surface.Described scraper is used for removing the unnecessary liquid UV cure polymer impression materials 3 in reticulate pattern applicator roll surface.
Mould feed arrangement 5 and 9 comprises motor, reductor, driven roller, tension controller.Mould feed arrangement 5 and 9 has tension force control function, utilizes tension controller to realize the tension stability of band shape mould 6.The outside surface of driven roller should or have the tooth-shape structure that cooperatively interacts with the lower surface of being with shape mould supporting layer by alligatoring.The driven by motor driven roller utilizes the frictional force drives mould feeding between the tooth-shape structure of driven roller and band shape mould 6 supporting layer PET.Mould feed arrangement 5 and 9 should guarantee that driven roller does not produce relative slip with band shape mould 6, not horizontal and lateral sliding in band shape mould 6 moulding process, the demoulding and the motion process.Mould feed arrangement 5 and 9 cooperates the tensioning function that realizes band shape mould 6, the control of tensile force, the control of band shape mould 6 translational speeds.
Release agent spray equipment 7 comprises spray gun, release agent and compressed air line.Release agent employing Teflon (teflon, PTFE).
Mold cleaning device 8 comprises nozzle, gas chamber and compressed air line.
Auxiliary imprinting apparatus 13 comprises passive adaptation regulating device and conformal roller.Auxiliary imprinting apparatus 13 guarantees that the liquid impression materials 3 of liquid UV cure polymer is for liquid UV cure polymer impression materials 3 good conformal contacts the on the complete filling of band shape mould 6 concave character structures 60202 and band shape mould 6 and the glass substrate 2.
UV solidification equipment 14 adopts high-power ultraviolet LED lamp module.
Imprinting apparatus 15 comprises force of impression regulating device and roller platen.The force of impression regulating device realizes gap adjustment between roller platen and the impression materials 3 and the adjusting that is applied to band shape mould 6 upward pressures.
Mould guide piece 10,16 is realized the change of band shape mould 6 trends.
The feature structure 11 of the impression after demoulding roller 12 is realized solidifying is separated with band shape mould 6.
Fig. 2 is the utility model band shape mould 6 structural representations, described band shape mould 6 comprises supporting layer 601 and feature structure layer 602, wherein feature structure layer 602 adopts ETFE, and the feature structure layer comprises protruding, recessed micro-nano structure feature 60201,60202, and feature structure layer 602 is positioned on the supporting layer.Supporting layer 601 adopts PET, and supporting layer is positioned on the feature structure layer 602, feature structure layer 602 is played a supporting role, and increase the intensity of band shape mould.200 microns of the thickness of supporting layer 601,50 microns of feature structure layer 602 thickness.
Fig. 3 is the patterned course of work process flow diagram of the utility model large-area nano, and it comprises following processing step:
(1) pre-service
To need patterned glass substrate 2 to be placed on the wafer-supporting platform 1, and be fixed by the vacuum suction mode.
Opening mold feed arrangement 5 and 9; Liquid UV solidified imprinting material 3 is put in the fluid reservoir of bull adhesive dripping machine of apparatus for coating 4; Opening mold cleaning plant 8; Opening release agent spray equipment 7(uses teflon to be release agent).
(2) impression materials coating
1. open wafer-supporting platform 1, wafer-supporting platform 1 and the glass substrate 2 on it move to apparatus for coating 4 directions;
2. utilize the bull adhesive dripping machine of apparatus for coating 4 UV solidified imprinting material 3 to be applied to uniformly in the mesh of reticulate pattern applicator roll (using quadrangular intaglio plate applicator roll), and use scraper that the unnecessary UV solidified imprinting material 3 in anilox roll surface is scraped off;
3. the coating fluid in the reticulate pattern applicator roll surface crazing contacts with heterodromous glass substrate 2 one, and UV solidified imprinting material 3 is just transferred to the upper surface of glass substrate 2, realizes the UV solidified imprinting material 3 in the anilox roll groove evenly is applied on the glass substrate 2.The thickness of coating UV solidified imprinting material 3 is 10 microns.
(3) imprinting moulding
1. at first, imprinting apparatus 15 is exerted pressure to band shape mould 6 by roller platen, under the effect of online contact printing power with UV solidified imprinting material 3 extrusion packings of coating on the glass substrate 2 in the spill micro-nano structure feature 60202 of band shape mould 6;
2. subsequently, mould feed arrangement 5 and 9 drives band shape mould 6 and moves to demoulding roller 12 directions, wafer-supporting platform 1 carries glass substrate 2 and the 6 equidirectional motions of band shape mould simultaneously, realize filling fully and the uniform spreading of 3 pairs of bands of UV solidified imprinting material shape mould, 6 spill micro-nano structure features 60202 by the conformal roller of auxiliary imprinting apparatus 13, guarantee to fill fully back band shape mould 6 and remain good conformal the contact with UV solidified imprinting material 3 on the glass substrate 2.And utilize UV solidification equipment 14 to solidify liquid UV solidified imprinting material 3, realize the curing molding cmpletely of stamping structure;
3. last, the feature structure 11 of utilizing demoulding roller 12 will impress the impression of curing molding is separated from each other with band shape mould 6, finishes the demoulding.
(4) mould is handled
1. utilize mold cleaning device 8 to remove the dirty materials of shape such as impression materials residual in band shape mould 6 surfaces and the spill micro-nano feature structure 60202, a thing grain.
2. after being with shape mould 6 to be cleaned out, in band shape mould 6 surfaces and concave character structure 60202, spray the thick teflon release agent of 3-5nm by release agent spray equipment 7.
Described glass substrate 2 is moved towards the direction of demoulding roller 12 with identical linear velocity with band shape mould 6, and speed is 1-5m/min.Described apparatus for coating 4 reticulate pattern applicator rolls are opposite with the direction of motion of glass substrate 2.The direction of motion that described mould feed arrangement 5 and 9 drives band shape mould 6 is consistent with the direction of motion of glass substrate 2.The roller platen applied pressure is 0.1MPa-10Mpa.
The described imprinting apparatus 15 of present embodiment is 0.2MPa to the roller platen applied pressure, and the translational speed of band shape mould 6 is 1m/min, and the translational speed of glass substrate 2 is 1m/min.
This enforcement need be carried out surface treatment for the adhesiveness between the UV solidified imprinting material 3 that improves glass substrate 2 and liquid state for glass substrate 2.At first carry out plasma surface treatment, technological parameter: 100w, 250mTorr, 10min; Heat deposition adhesion promotor Sliquest187 (GE) subsequently, technological parameter: 140 ℃, 10 minutes.
Though above-mentionedly by reference to the accompanying drawings embodiment of the present utility model is described; but be not the restriction to the utility model protection domain; one of ordinary skill in the art should be understood that; on the basis of the technical solution of the utility model, those skilled in the art do not need to pay various modifications that creative work can make or distortion still in protection domain of the present utility model.
Claims (7)
1. the patterned device of large-area nano, it is characterized in that it comprises: wafer-supporting platform, substrate, apparatus for coating, impression materials, mould feed arrangement, band shape mould, release agent spray equipment, mold cleaning device, mould guide piece, demoulding roller, auxiliary imprinting apparatus, UV solidification equipment and imprinting apparatus;
Wherein substrate places on the wafer-supporting platform, and apparatus for coating evenly is applied to substrate top surface with liquid impression materials above substrate; Band shape mould is wrapped on mould feed arrangement, mould guide piece, demoulding roller, auxiliary imprinting apparatus and the imprinting apparatus running roller separately; The UV solidification equipment places the consolidation zone between imprinting apparatus and the demoulding roller, and is positioned at the top of auxiliary imprinting apparatus, and auxiliary imprinting apparatus also places the consolidation zone between imprinting apparatus and the demoulding roller; Release agent spray equipment and mold cleaning device place the band shape mould outside after the demoulding roller successively; Imprinting apparatus will copy to the feature pattern on the shape mould on the liquid impression materials of substrate top surface, and auxiliary imprinting apparatus then makes liquid impression materials be filled in the feature structure of being with the shape mould fully and band shape mould is contacted with the impression materials on the substrate is conformal; Figure behind the UV solidification equipment solidified imprinting; Feature pattern after demoulding roller is realized solidifying separates with band shape mould.
2. the patterned device of large-area nano as claimed in claim 1, it is characterized in that, described band shape mould comprises supporting layer and feature structure layer, wherein supporting layer is the package polyethylene terephthalate thin film, the feature structure layer is ethylene-tetrafluoroethylene copolymer or PDMS or metallic nickel, and the feature structure layer comprises protruding, recessed micro nano structure figure; 200 microns-700 microns of the thickness of described supporting layer, the feature structure layer thickness is the 20-80 micron.
3. the patterned device of large-area nano as claimed in claim 1, it is characterized in that, described imprinting apparatus comprises at least one roller platen, and it is provided with the force of impression regulating device, and gap and roller platen are applied to band shape mould upward pressure between force of impression regulating device adjusting roller platen and the impression materials; Described auxiliary imprinting apparatus comprises at least one conformal roller, and it is provided with the passive adaptation regulating device; Described roller platen, conformal roller, mould guide piece, the employed roller of demoulding roller are flexible roller.
4. the patterned device of large-area nano as claimed in claim 1 is characterized in that, described apparatus for coating adopts nick version roller coat cloth and the accurate apparatus for coating of bar seam coating.
5. the patterned device of large-area nano as claimed in claim 1 or 2, it is characterized in that, described mould feed arrangement comprises a pair of driven roller, they are connected with motor, reductor and tension controller, the outside surface roughening treatment of driven roller or have the tooth-shape structure that the lower surface with the mould supporting layer cooperatively interacts.
6. the patterned device of large-area nano as claimed in claim 1 is characterized in that, described mold cleaning device comprises nozzle, gas chamber and compressed air line; Described release agent spray equipment comprises spray gun, release agent and compressed air line.
7. the patterned device of large-area nano as claimed in claim 3 is characterized in that, described roller platen applied pressure is 0.1MPa-10MPa; Described substrate moves towards the direction of demoulding roller with identical linear velocity with band shape mould, is 1-5m/min; The direction of motion of described band shape mould is consistent with the direction of motion of substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320242545 CN203217239U (en) | 2013-05-07 | 2013-05-07 | Large-area nano graphics device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320242545 CN203217239U (en) | 2013-05-07 | 2013-05-07 | Large-area nano graphics device |
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| CN203217239U true CN203217239U (en) | 2013-09-25 |
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| CN 201320242545 Expired - Fee Related CN203217239U (en) | 2013-05-07 | 2013-05-07 | Large-area nano graphics device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103235483A (en) * | 2013-05-07 | 2013-08-07 | 青岛博纳光电装备有限公司 | Large-area nanometer imaging device and large-area nanometer imaging method |
| CN111531760A (en) * | 2020-05-11 | 2020-08-14 | 中国矿业大学 | Manufacturing method of flexible metal micro-mold for hot stamping |
-
2013
- 2013-05-07 CN CN 201320242545 patent/CN203217239U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103235483A (en) * | 2013-05-07 | 2013-08-07 | 青岛博纳光电装备有限公司 | Large-area nanometer imaging device and large-area nanometer imaging method |
| CN103235483B (en) * | 2013-05-07 | 2016-01-20 | 青岛博纳光电装备有限公司 | The patterned apparatus and method of large-area nano |
| CN111531760A (en) * | 2020-05-11 | 2020-08-14 | 中国矿业大学 | Manufacturing method of flexible metal micro-mold for hot stamping |
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| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130925 Termination date: 20180507 |