CN203209401U - Substrate cleaning device - Google Patents
Substrate cleaning device Download PDFInfo
- Publication number
- CN203209401U CN203209401U CN 201320137274 CN201320137274U CN203209401U CN 203209401 U CN203209401 U CN 203209401U CN 201320137274 CN201320137274 CN 201320137274 CN 201320137274 U CN201320137274 U CN 201320137274U CN 203209401 U CN203209401 U CN 203209401U
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- Prior art keywords
- cleaning
- band
- substrate
- face
- main body
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- Expired - Lifetime
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- 238000004140 cleaning Methods 0.000 title claims abstract description 312
- 239000000758 substrate Substances 0.000 title claims abstract description 114
- 238000011084 recovery Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 8
- 239000004809 Teflon Substances 0.000 claims description 7
- 229920006362 Teflon® Polymers 0.000 claims description 7
- 230000000694 effects Effects 0.000 abstract description 13
- 238000000034 method Methods 0.000 description 8
- 230000002950 deficient Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000009418 renovation Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
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- Cleaning In General (AREA)
Abstract
The utility model provides a substrate cleaning device which comprises a first cleaning part, a first cleaning belt and a first cleaning belt conveying unit, wherein the first cleaning part presses and contacts the first cleaning belt, the first cleaning belt conveying unit is used for conveying the first cleaning belt, the first cleaning part comprises a first main body and a first cleaning head, the first main body comprises a first end surface, the first cleaning head is arranged on the first end surface and has a first plane; the first cleaning belt is partly bunted against the first plane. The substrate cleaning device has better cleaning effect, and thereby effectively improving the yield rate of the subsequent products of the substrate.
Description
Technical field
The utility model relates to a kind of cleaning device, and particularly relates to a kind of apparatus for cleaning substrate.
Background technology
In the manufacturing process of LCD MODULE, need carry out various operations at glass substrate usually, for example make electric crystal array, make colored filter, attach aeolotropic conductive film (ACF) etc.Before glass substrate was carried out above-mentioned operation, general common need the cleaning glass substrate to remove impurity and the foreign matter on the glass substrate, avoided causing because of impurity and foreign matter the bad quality of subsequent product.
Fig. 1 is the structural representation of existing apparatus for cleaning substrate.See also Fig. 1, apparatus for cleaning substrate 100 utilizes first pinch roller 111 to press and touches first cleaning band 121, first cleaning band 121 is contacted, with the cleaning of realization to the first surface 131 of substrate 130 with the first surface 131 of substrate 130 to be cleaned.Simultaneously, apparatus for cleaning substrate 100 also utilizes second pinch roller 112 to press and touches second cleaning band 122, and second cleaning band 122 is contacted with the second surface 132 of substrate 130, with the cleaning of realization to the second surface 132 of substrate 130, thereby realizes the cleansing double sided of substrate 130.
But, when existing apparatus for cleaning substrate 100 clean substrates 130 that use as shown in Figure 1, because first pinch roller 111 and second pinch roller 112 itself can roll, and first pinch roller 111 cleans with first surface 131 and 132 one-tenth line ways of contact of second surface of substrate 130 respectively with second pinch roller 112, so not only be not easy to confirm the position cleaned, and cleaning effect is not very good yet.Moreover, existing first pinch roller 111 and second pinch roller 112 adopt silica gel material usually, its coefficient of friction is bigger, wearability is relatively poor, therefore, first pinch roller 111 and second pinch roller 112 wear and tear than being easier to, even can't press the first surface 131 and the second surface 132 that contact substrate 130 to carry out effective cleaning first cleaning band 121 and second cleaning band 122.Therefore, the cleaning effect of apparatus for cleaning substrate 100 is not good, thereby causes the fraction defective of subsequent product of substrate 130 still higher.In addition, because first pinch roller 111 and second pinch roller 112 are cylindrical configuration and can roll, therefore, first pinch roller 111 and second pinch roller 112 are pressed the first tactile cleaning band 121 and second cleaning band 122 to be offset easily even are broken away from first pinch roller 111 and second pinch roller 112, like this, first pinch roller 111 may directly contact with substrate 130 with second pinch roller 112, thereby causes the scratch of substrate 130 to be scrapped.
The utility model content
The purpose of this utility model is, a kind of apparatus for cleaning substrate is provided, and it has preferable cleaning effect, thereby can effectively promote the yield of substrate successive process.
It is to adopt following technical scheme to realize that the utility model solves its technical problem.
A kind of apparatus for cleaning substrate comprises first cleaning section, first cleaning band and the first cleaning band supply unit, described first cleaning section is pressed and is touched described first cleaning band, the described first cleaning band supply unit is carried described first cleaning band, described first cleaning section comprises first main body and first cleaning head, described first main body has first end face, described first cleaning head is arranged at described first end face, and has first plane; Described first cleaning band partly is resisted against described first plane.
In preferred embodiment of the present utility model, the described first cleaning band supply unit comprises that first supplies with roller and the first recovery roller, one end of described first cleaning band is wound in described first and supplies with roller, and the other end of described first cleaning band is wound in the described first recovery roller.
In preferred embodiment of the present utility model, described first main body has two first guide channels near an end of described first end face, described two first guide channels lay respectively at the both sides of described first cleaning head, and described first cleaning band is positioned partially in described two first guide channels.
In preferred embodiment of the present utility model, described first main body has first side and the first side opposite that is connected with described first end face, described first side is two relative sides of described first main body with the described first side opposite, and described two first guide channels are formed in two openings of the junction of the junction of described first side and described first end face and the described first side opposite and described first end face respectively.
In preferred embodiment of the present utility model, the material of described first cleaning head of described first main body is Teflon.
In preferred embodiment of the present utility model, also comprise second cleaning section, second cleaning band and the second cleaning band supply unit, described second cleaning section and described first cleaning section are and are oppositely arranged, and comprise second main body and second cleaning head, described second main body has and the described first end face second opposed end face, described second cleaning head is arranged at described second end face and is oppositely arranged with described first cleaning head, and described second cleaning head also has second plane relative with described first plane; Described second cleaning band partly is resisted against described second plane; The described second cleaning band supply unit is carried described second cleaning band.
In preferred embodiment of the present utility model, the described second cleaning band supply unit comprises that second supplies with roller and the second recovery roller, one end of described second cleaning band is wound in described second and supplies with roller, and the other end of described second cleaning band is wound in described second and reclaims roller, and the described second supply roller and described first feeding rollers wheel are positioned at the same side, and the described second recovery roller and described first reclaims roller and is positioned at the same side.
In preferred embodiment of the present utility model, described second main body has two second guide channels near an end of described second end face, described two second guide grooves lay respectively at the both sides of described second cleaning head, and described second cleaning band is positioned partially in described two second guide channels.
In preferred embodiment of the present utility model, described second main body has second side and the second side opposite that is connected with described second end face, described second side is two relative sides of described second main body with the described second side opposite, and described two second guide channels are formed in two openings of the junction of the junction of described second side and described second end face and the described second side opposite and described second end face respectively.
In preferred embodiment of the present utility model, the material of described second cleaning head of described second main body is Teflon.
First cleaning head of first cleaning section of apparatus for cleaning substrate of the present utility model is arranged at first end face and has first plane, first cleaning band part is against first plane, when utilizing apparatus for cleaning substrate that substrate is cleaned, first cleaning band is against part meeting and the substrate contacts on first plane, thereby the mode that contacts with face between win cleaning band and the substrate is cleaned, realizing the preferable cleaning effect of substrate, and then effectively promote the yield of substrate successive process.In addition, the mode that contacts with face between apparatus for cleaning substrate first cleaning band and the substrate cleans and also is conducive to confirm the position cleaned.
Above-mentioned explanation only is the general introduction of technical solutions of the utility model, for above-mentioned and other purpose, feature and advantage of the present utility model can be become apparent, and preferred embodiment cited below particularly, and cooperate appended graphicly, be described in detail below.
Description of drawings
Fig. 1 is the structural representation of existing apparatus for cleaning substrate.
Fig. 2 is the structural representation of apparatus for cleaning substrate of the present utility model.
Fig. 3 is the structural representation of first cleaning section of apparatus for cleaning substrate of the present utility model.
Fig. 4 is the structural representation of the use state of apparatus for cleaning substrate of the present utility model.
Fig. 5 is the follow-up contrast schematic diagram of pressing fraction defective of the substrate of apparatus for cleaning substrate of the present utility model and existing apparatus for cleaning substrate.
The specific embodiment
Be to reach technological means and the effect that predetermined utility model purpose is taked for further setting forth the utility model, below in conjunction with accompanying drawing and preferred embodiment, the specific embodiment, structure, feature and effect thereof to foundation the utility model proposes are described in detail as follows:
Relevant aforementioned and other technology contents, characteristics and effect of the present utility model can be known to present in the following detailed description that cooperates with reference to graphic preferred embodiment.Explanation by the specific embodiment, when can being to reach technological means and the effect that predetermined purpose takes to be able to more deeply and concrete understanding to the utility model, yet appended graphic only provide with reference to the usefulness of explanation, the utility model is limited.
Fig. 2 is the structural representation of apparatus for cleaning substrate of the present utility model.See also Fig. 2, in the present embodiment, apparatus for cleaning substrate 200 comprises first cleaning section 210, first cleaning band 220 and the first cleaning band supply unit 230.First cleaning section 210 is pressed and is touched first cleaning band of being carried by the first cleaning band supply unit 230 220, contacts with the surface to be cleaned of substrate (not shown), thereby realizes the cleaning on the surface to be cleaned of this substrate.
Fig. 3 is the structural representation of first cleaning section of apparatus for cleaning substrate of the present utility model.Please in the lump referring to Fig. 2 and Fig. 3, first cleaning section 210 comprises first main body 211 and first cleaning head 214.In the present embodiment, first main body 211 roughly is cuboid, but not as limit.First main body 211 has first end face 212 and first side 213 that is connected with first end face 212 and the first side opposite (among the figure not label), and first side 213 and the first side opposite are two relative sides of first main body 211.First cleaning head 214 is arranged at first end face 212, and in other words, first cleaning head 214 is protrusions that are formed at first end face 212.It is when apparatus for cleaning substrate 200 clean substrates that first cleaning head 214 has 215, the first planes 215, first plane, the plane relative with the surface to be cleaned of substrate.The area on first plane 215 can be determined according to actual requirement for cleaning, for example be 4cm * 4cm in the present embodiment.First main body 211 has two first guide channels 216 near an end of first end face 212.In the present embodiment, two first guide channels 216 be formed in respectively the junction of first side 213 and first end face 212 and the first side opposite and first end face 212 the junction two openings, and two first guide channels 216 lay respectively at the both sides of first cleaning head 214, are used for holding restriction first cleaning band 220.In addition, first main body 211 has a plurality of first installing holes 217, utilizes first installing hole 217 first cleaning section 210 can be fixed on first installation portion 410 of cleaning board 400, to utilize cleaner platform 400 control cleaning courses.
Please more in the lump referring to Fig. 2 and Fig. 3, first cleaning band 220 is to be carried by the first cleaning band supply unit 230.First cleaning band 220 for example is adhesive-bonded fabric, partly be resisted against first plane 215, that is to say that first cleaning head 214 of first cleaning section 210 is pressed and touched first cleaning band 220, and the contact friction by first cleaning band 220 and the surface to be cleaned of substrate is to realize cleaning surfaces.In the present embodiment, the first cleaning band supply unit 230 comprises that first supplies with roller 231 and the first recovery roller 232.One end of first cleaning band 220 is wound in first and supplies with roller 231, and the other end of first cleaning band 220 is wound in the first recovery roller 232.Carry first cleaning band 220 by the first cleaning band supply unit 230, can constantly upgrade with first plane 215 against part first cleaning band 220, thereby realize preferable cleaning effect.In addition, first cleaning band 220 is positioned partially in two first guide channels 216, avoiding first cleaning band 220 sideslip in the process of carrying, thereby avoids first cleaning head 214 directly to touch the surface to be cleaned of substrate and the scratch substrate.
In the present embodiment, apparatus for cleaning substrate 200 also comprises being with first cleaning section 210 and is oppositely arranged second cleaning section 240, second cleaning band 250 and the second cleaning band supply unit 260.Second cleaning section 240 is pressed and is touched second cleaning band of being carried by the second cleaning band supply unit 260 250, contacts with another surface to be cleaned of substrate, thereby cooperates the cleansing double sided of realization substrate with first cleaning section 210.
The structure of second cleaning section 240 and first cleaning section 210 are roughly the same, comprise second main body 241 and second cleaning head 244.In the present embodiment, second main body 241 also roughly is cuboid, but not as limit.Second main body 241 has and first end face, 212 second opposed end faces 242 and second side 243 that is connected with second end face 242 and the second side opposite (among the figure not label), and second side 243 and the second side opposite are two relative sides of second main body 241.Second cleaning head 244 is arranged at second end face 242, and in other words, second cleaning head 244 is protrusions that are formed at second end face 242.Second cleaning head 244 has second plane 245, the second planes 245 relative with first plane 215 when also being apparatus for cleaning substrate 200 clean substrates, the plane relative with another surface to be cleaned of substrate.The area on second plane 245 can determine that the area on second plane 245 is identical with first plane 215 in the present embodiment, for example is 4cm * 4cm according to actual requirement for cleaning.Similarly, second main body 241 has two second guide channel (not shown) near an end of second end face 242.In the present embodiment, two second guide channels be formed in respectively the junction of second side 243 and second end face 242 and the second side opposite and second end face 242 the junction two openings, and two second guide channels lay respectively at the both sides of second cleaning head 244, are used for holding restriction second cleaning band 250.In addition, second main body 241 has a plurality of second installing holes 247, utilizes second installing hole 247 second cleaning section 240 can be fixed on second installation portion 420 of cleaning board 400, to utilize cleaner platform 400 control cleaning courses.
In the present embodiment, the material of first cleaning head 214 of first cleaning section 210 and second cleaning head 244 of second cleaning section 240 is preferably Teflon, the hardness height of Teflon material, wearability is better, and its coefficient of friction is less, and therefore, first cleaning head 214 and second cleaning head 244 are not easy wearing and tearing, thereby make win cleaning band 220 and second cleaning band 250 can distinguish first surface 31 and the second surface 32 of effective contact substrate 30, to realize preferable cleaning effect.
Fig. 4 is the structural representation of the use state of apparatus for cleaning substrate of the present utility model.See also Fig. 2 to Fig. 4, below will specify and use apparatus for cleaning substrate 200 to treat clean base plate 30 to carry out process of cleaning.
In cleaning course, substrate 30 is after transmitting by first cleaning section 210 and second cleaning section 240 from first end, 33 to second ends 34, can (be Y-direction along the line direction perpendicular to first end 33 and second end 34, Y-direction is perpendicular to the line direction of first end 33 and second end 34, and be parallel to the plane at substrate 30 places) move horizontally certain distance, mobile distance is suitable with the width on second plane 245 of first plane 215 of first cleaning head 214 and second cleaning head 244 usually, certainly not as limit, can be as required, mobile distance can be done suitable adjustment, make substrate 30 transmit again from second end, 34 to first ends 33 by first cleaning section 210 and second cleaning section 240 then, repeatedly repeat comprehensive cleaning that above process can realize first surface 31 and the second surface 32 of substrate 30 afterwards.In the present embodiment, first cleaning band 220 is identical with the direction of transfer of substrate 30 with second cleaning band, 250 throughput directions.Certainly, in other embodiments, first cleaning band 220 and second cleaning band, 250 throughput directions also can be opposite with the direction of transfer of substrate 30.
Be understandable that, second cleaning section 240, second cleaning band 250 and the second cleaning band conveying device 260 can be replaced by the substrate bearing device with supporting plane, at this moment, can utilize first cleaning section 210, first cleaning band 220 and the first cleaning band conveying device 230 to realize the single face cleaning of the first surface 31 of substrate 30.Same, first cleaning section 210, first cleaning band 220 and the first cleaning band conveying device 230 can press the substrate that touches the plane to press tactile device to replace by having, at this moment, can utilize second cleaning section 240, second cleaning band 250 and the second cleaning band conveying device 260 to realize the single face cleaning of the second surface 32 of substrate 30.
Fig. 5 is the follow-up contrast schematic diagram of pressing fraction defective of the substrate of apparatus for cleaning substrate 200 of the present utility model and existing apparatus for cleaning substrate 100.See also Fig. 5, among the figure during the W1241 to W1244, it is the A stage, what use is existing apparatus for cleaning substrate 100, during the W1245 to W1248, it is the B stage, what use is apparatus for cleaning substrate 200 of the present utility model, as can be seen from the figure, use apparatus for cleaning substrate 200 of the present utility model to carry out carrying out the follow-up processing procedure of pressing again behind the board cleaning, the fraction defective that product is being pressed obviously reduces, this shows, with respect to using existing apparatus for cleaning substrate 100, use apparatus for cleaning substrate 200 of the present utility model to have superior cleaning, thereby can effectively improve the yield of subsequent product.
Apparatus for cleaning substrate 200 of the present utility model has the following advantages:
1. the mode that contacts with face between first cleaning band 220 of apparatus for cleaning substrate 200 and second cleaning band 250 and the substrate 30 cleans, not only increased the contact area between first cleaning band 220 and second cleaning band 250 and the substrate 30, and be conducive to confirm easily the position cleaned, with comprehensive cleaning of first surface 31 and the second surface 32 of effective realization substrate 30.
2. first cleaning head 214 of apparatus for cleaning substrate 200 and second cleaning head, 244 materials are Teflon, therefore, first cleaning head 214 and second cleaning head 244 are not easy wearing and tearing, thereby make win cleaning band 220 and second cleaning band 250 can distinguish first surface 31 and the second surface 32 of effective contact substrate 30, to realize preferable cleaning effect.
3. first cleaning band 220 of apparatus for cleaning substrate 200 is positioned partially in two first guiding grooves 216, second cleaning band 250 is positioned partially in two second guide channels, avoiding first cleaning band 220 and second cleaning band 250 sideslip in the process of carrying, thereby avoid first cleaning head 214 and second cleaning head 244 directly to touch the first surface 31 of substrate 130 and second surface 32 and scratch substrate 130.
The above, only be embodiment of the present utility model, be not that the utility model is done any pro forma restriction, though the utility model discloses as above with embodiment, yet be not in order to limit the utility model, any those skilled in the art, in not breaking away from the technical solutions of the utility model scope, when the technology contents that can utilize above-mentioned announcement is made a little change or is modified to the equivalent embodiment of equivalent variations, in every case be not break away from the technical solutions of the utility model content, any simple modification that foundation technical spirit of the present utility model is done above embodiment, equivalent variations and modification all still belong in the scope of technical solutions of the utility model.
Claims (10)
1. apparatus for cleaning substrate, it comprises first cleaning section, first cleaning band and the first cleaning band supply unit, described first cleaning section is pressed and is touched described first cleaning band, the described first cleaning band supply unit is carried described first cleaning band, it is characterized in that: described first cleaning section comprises first main body and first cleaning head, described first main body has first end face, and described first cleaning head is arranged at described first end face, and has first plane; Described first cleaning band partly is resisted against described first plane.
2. apparatus for cleaning substrate according to claim 1, it is characterized in that, the described first cleaning band supply unit comprises that first supplies with roller and the first recovery roller, one end of described first cleaning band is wound in described first and supplies with roller, and the other end of described first cleaning band is wound in the described first recovery roller.
3. apparatus for cleaning substrate according to claim 2, it is characterized in that, described first main body has two first guide channels near an end of described first end face, described two first guide channels lay respectively at the both sides of described first cleaning head, and described first cleaning band is positioned partially in described two first guide channels.
4. apparatus for cleaning substrate according to claim 3, it is characterized in that, described first main body has first side and the first side opposite that is connected with described first end face, described first side is two relative sides of described first main body with the described first side opposite, and described two first guide channels are formed in two openings of the junction of the junction of described first side and described first end face and the described first side opposite and described first end face respectively.
5. apparatus for cleaning substrate according to claim 1 is characterized in that, the material of described first cleaning head of described first main body is Teflon.
6. apparatus for cleaning substrate according to claim 1, it is characterized in that, also comprise second cleaning section, second cleaning band and the second cleaning band supply unit, described second cleaning section and described first cleaning section are and are oppositely arranged, and comprise second main body and second cleaning head, described second main body has and the described first end face second opposed end face, described second cleaning head is arranged at described second end face and is oppositely arranged with described first cleaning head, and described second cleaning head also has second plane relative with described first plane; Described second cleaning band partly is resisted against described second plane; The described second cleaning band supply unit is carried described second cleaning band.
7. apparatus for cleaning substrate according to claim 6, it is characterized in that, the described second cleaning band supply unit comprises that second supplies with roller and the second recovery roller, one end of described second cleaning band is wound in described second and supplies with roller, and the other end of described second cleaning band is wound in described second and reclaims roller, and the described second supply roller and described first feeding rollers wheel are positioned at the same side, and the described second recovery roller and described first reclaims roller and is positioned at the same side.
8. apparatus for cleaning substrate according to claim 7, it is characterized in that, described second main body has two second guide channels near an end of described second end face, described two second guide grooves lay respectively at the both sides of described second cleaning head, and described second cleaning band is positioned partially in described two second guide channels.
9. apparatus for cleaning substrate according to claim 8, it is characterized in that, described second main body has second side and the second side opposite that is connected with described second end face, described second side is two relative sides of described second main body with the described second side opposite, and described two second guide channels are formed in two openings of the junction of the junction of described second side and described second end face and the described second side opposite and described second end face respectively.
10. apparatus for cleaning substrate according to claim 6 is characterized in that, the material of described second cleaning head of described second main body is Teflon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320137274 CN203209401U (en) | 2013-03-25 | 2013-03-25 | Substrate cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320137274 CN203209401U (en) | 2013-03-25 | 2013-03-25 | Substrate cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203209401U true CN203209401U (en) | 2013-09-25 |
Family
ID=49198972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320137274 Expired - Lifetime CN203209401U (en) | 2013-03-25 | 2013-03-25 | Substrate cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203209401U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103977986A (en) * | 2014-05-14 | 2014-08-13 | 昆山龙腾光电有限公司 | Cleaning device and cleaning method thereof |
-
2013
- 2013-03-25 CN CN 201320137274 patent/CN203209401U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103977986A (en) * | 2014-05-14 | 2014-08-13 | 昆山龙腾光电有限公司 | Cleaning device and cleaning method thereof |
| CN103977986B (en) * | 2014-05-14 | 2016-01-13 | 昆山龙腾光电有限公司 | Cleaning device and clean method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 215301, 1, Longteng Road, Kunshan, Jiangsu, Suzhou Patentee after: InfoVision Optoelectronics(Kunshan)Co.,Ltd. Address before: 215301, 1, Longteng Road, Kunshan, Jiangsu, Suzhou Patentee before: INFOVISION OPTOELECTRONICS (KUNSHAN) Co.,Ltd. |
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| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130925 |