CN203045492U - Grinding polishing system of light-emitting diode (LED) substrate - Google Patents
Grinding polishing system of light-emitting diode (LED) substrate Download PDFInfo
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- CN203045492U CN203045492U CN 201220704849 CN201220704849U CN203045492U CN 203045492 U CN203045492 U CN 203045492U CN 201220704849 CN201220704849 CN 201220704849 CN 201220704849 U CN201220704849 U CN 201220704849U CN 203045492 U CN203045492 U CN 203045492U
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- polishing
- filter
- fine filter
- grinding
- grinder
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Abstract
The utility model discloses a grinding polishing system of a light-emitting diode (LED) substrate. The grinding polishing system of the LED substrate comprises a polishing grinder and a polishing agent recycling groove, wherein the polishing agent recycling groove is connected with a coarse strainer, a metering pump and a fine filter through pipelines in sequence, a control valve is arranged between the coarse strainer and the metering pump, a discharge outlet of the fine filter is connected with a feed inlet pipeline of the polishing grinder, and a switching valve is arranged between the fine filter and the polishing grinder. The fine filter comprises a shell body and a micropore folded filter element, wherein the micropore folded filter element is a teflon film filter element, and a filter pore diameter is 0.5-1 micrometer. Due to the fact that polishing agents which are used are filtered through a plurality of layers and especially through the fine filter with the teflon film filter element, impurities of the used polishing agents are removed to the maximum extent, stability of the polishing agents is effectively ensured, quality of the polishing agents is ensured when the polishing agents are used again, and recycling and stability of the polishing agents are achieved. The grinding polishing system of the LED substrate is simple in structure and convenient to operate.
Description
Technical field
The utility model relates to the production and processing field of LED substrate, particularly at the abrasive polishing process in the LED substrate production.
Background technology
In the process of producing the LED substrate, mainly comprise grinding, polishing, clean three steps, the quality of polishing fluid is most important in polishing process, the kind of impurity and content directly influence the quality of product in the polishing fluid, thereby influence the qualification rate of finished product, therefore, the use of polishing fluid is disposable in the polishing process at present, consumption is very big, and the liquid waste processing after the polishing also influences environment greatly.
The utility model content
At the problems referred to above, the purpose of this utility model is to provide a kind of grinding and polishing system of LED substrate, can realize the recycling of polishing fluid, and the polishing fluid in guaranteeing to recycle reaches required standard.
The purpose of this utility model is achieved through the following technical solutions:
A kind of grinding and polishing system of LED substrate comprises polishing grinder and polishing fluid accumulator tank, and described polishing fluid accumulator tank connects coarse filter, measuring pump and fine filter successively by pipeline; Between described coarse filter and the measuring pump control valve is set; The discharging opening of described fine filter is connected with the charging aperture pipeline of polishing grinder, between fine filter and the polishing grinder switch valve is set.
Further, described fine filter comprises housing and micropore foldable filter element.
Further, described micropore foldable filter element is the polytetrafluoroethylene (PTFE) membrane cartridge, and pore size filter is 0.5-1 μ m.
The utility model is compared than prior art, has the following advantages and beneficial effect:
The utility model is with the multi-level filtration of used polishing fluid process, particularly adopt the fine filter of polytetrafluoroethylene (PTFE) membrane cartridge, make that used polishing fluid impurity is removed to greatest extent, effectively guaranteed the stability of polishing fluid, thereby guaranteed the quality of next time using, realized recycling and stability of polishing fluid.And the utility model is simple in structure, is convenient to operation.
Description of drawings
Fig. 1 is structural representation of the present utility model.
The specific embodiment
Be described in further detail below in conjunction with the utility model of embodiment.
Embodiment
As shown in the figure, a kind of grinding and polishing system of LED substrate comprises polishing grinder 5 and polishing fluid accumulator tank 1, and polishing fluid accumulator tank 1 connects coarse filter 2, measuring pump 3 and fine filter 4 successively by pipeline; Between coarse filter 2 and the measuring pump 3 control valve 6 is set; The discharging opening of fine filter 4 is connected with the charging aperture pipeline of polishing grinder 5, between fine filter 4 and the polishing grinder 5 switch valve 7 is set.Fine filter 4 comprises housing and micropore foldable filter element, and described micropore foldable filter element is the polytetrafluoroethylene (PTFE) membrane cartridge, and pore size filter is 0.5-1 μ m.
In sum, by the description of present embodiment, can make the art personnel better implement this programme.
Claims (3)
1. the grinding and polishing system of a LED substrate comprises polishing grinder and polishing fluid accumulator tank, and it is characterized in that: described polishing fluid accumulator tank connects coarse filter, measuring pump and fine filter successively by pipeline; Between described coarse filter and the measuring pump control valve is set; The discharging opening of described fine filter is connected with the charging aperture pipeline of polishing grinder, between fine filter and the polishing grinder switch valve is set.
2. the grinding and polishing system of LED substrate according to claim 1, it is characterized in that: described fine filter comprises housing and micropore foldable filter element.
3. the grinding and polishing system of LED substrate according to claim 2, it is characterized in that: described micropore foldable filter element is the polytetrafluoroethylene (PTFE) membrane cartridge, pore size filter is 0.5-1 μ m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220704849 CN203045492U (en) | 2012-12-15 | 2012-12-15 | Grinding polishing system of light-emitting diode (LED) substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220704849 CN203045492U (en) | 2012-12-15 | 2012-12-15 | Grinding polishing system of light-emitting diode (LED) substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203045492U true CN203045492U (en) | 2013-07-10 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220704849 Expired - Fee Related CN203045492U (en) | 2012-12-15 | 2012-12-15 | Grinding polishing system of light-emitting diode (LED) substrate |
Country Status (1)
| Country | Link |
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| CN (1) | CN203045492U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104044079A (en) * | 2014-06-23 | 2014-09-17 | 菲斯达精密工业部件（苏州）有限公司 | Magnetic grinding fluid reusing device |
| CN104476383A (en) * | 2014-11-21 | 2015-04-01 | 深圳市力合材料有限公司 | Circulation polishing device of silicon wafer and circulation polishing method |
| CN105313015A (en) * | 2014-07-29 | 2016-02-10 | 盛美半导体设备（上海）有限公司 | Polishing slurry filtering device |
| CN109623508A (en) * | 2019-01-25 | 2019-04-16 | 云南蓝晶科技有限公司 | LED sapphire wafer numerical control polishing method based on high mixture ratio polishing fluid |
| CN110461544A (en) * | 2017-03-23 | 2019-11-15 | 住友电气工业株式会社 | The regenerating unit of grinding fluid and the regeneration method of grinding fluid |
-
2012
- 2012-12-15 CN CN 201220704849 patent/CN203045492U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104044079A (en) * | 2014-06-23 | 2014-09-17 | 菲斯达精密工业部件（苏州）有限公司 | Magnetic grinding fluid reusing device |
| CN104044079B (en) * | 2014-06-23 | 2017-05-17 | 菲斯达精密工业部件（苏州）有限公司 | Magnetic grinding fluid reusing device |
| CN105313015A (en) * | 2014-07-29 | 2016-02-10 | 盛美半导体设备（上海）有限公司 | Polishing slurry filtering device |
| CN105313015B (en) * | 2014-07-29 | 2019-08-16 | 盛美半导体设备（上海）有限公司 | Polishing fluid filter device |
| CN104476383A (en) * | 2014-11-21 | 2015-04-01 | 深圳市力合材料有限公司 | Circulation polishing device of silicon wafer and circulation polishing method |
| CN110461544A (en) * | 2017-03-23 | 2019-11-15 | 住友电气工业株式会社 | The regenerating unit of grinding fluid and the regeneration method of grinding fluid |
| CN109623508A (en) * | 2019-01-25 | 2019-04-16 | 云南蓝晶科技有限公司 | LED sapphire wafer numerical control polishing method based on high mixture ratio polishing fluid |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130710 Termination date: 20131215 |