CN203044900U - Preparation device of amorphous/nanocrystalline metal powder - Google Patents
Preparation device of amorphous/nanocrystalline metal powder Download PDFInfo
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- CN203044900U CN203044900U CN 201320048238 CN201320048238U CN203044900U CN 203044900 U CN203044900 U CN 203044900U CN 201320048238 CN201320048238 CN 201320048238 CN 201320048238 U CN201320048238 U CN 201320048238U CN 203044900 U CN203044900 U CN 203044900U
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Abstract
The utility model relates to a preparation device of amorphous/nanocrystalline metal powder. According to the technical scheme, the lower end of a hollow supporting rod (6) is linked with the upper end of a quartz crucible (12) through a diameter-reducing seal joint (11), and the upper end of the hollow supporting rod (6) penetrates through a lifting hole and is linked with a lifting mechanism (1) through a flange (3). Four to eight heating elements (22) are evenly fixed on the inner wall of a high-temperature resistant protection layer (21), a water cooling receiving copper plate (15) is arranged on a central position close to the lower portion of a furnace body (8), and an induction heating coil (13) is arranged over the water cooling receiving copper plate (15). A corundum insulation protecting pipe (5) is arranged in the hollow supporting rod (6), one end of a conductive electrode (2) is externally connected with the positive electrode of a direct current high-voltage power supply (25) through wires, and the other end of the conductive electrode (2) penetrates out of the corundum insulation protecting pipe (5) and contacts with the bottom portion of the quartz crucible (12). The preparation device of the amorphous/nanocrystalline metal powder has the advantages of being low in investment, high in efficiency, easy in operation and fast in solidification, and can control powder features and a microstructure conveniently, and prepared powder is narrow in particle size distribution, fine in crystalline particles, and high in degree of purity.
Description
Technical field
The utility model belongs to powder metallurgical technology, is specifically related to a kind of preparation facilities of amorphous/nanocrystalline metal dust.
Background technology
The preparation of raw metal powder is one of operation the most basic in the powder metallurgy production process, the composition of powder, purity, particle diameter and microstructure etc. play decisive role to the performance of final products, and every physical performance index of powder and its preparation technology's tight association.By selecting different preparation methods and regulating the related process parameter, can effectively control phase composition and the microstructure of powder.So in order to obtain to satisfy the dusty material of performance requirement, technology of preparing is most important.
At present, the powder preparation method that powder metallurgical technology is relevant comprises from top to bottom and two kinds of basic means from the bottom to top.Method has technology such as physical vaporous deposition, chemical vapour deposition technique, reducing process, electrolysis and the precipitation method from the bottom to top; From top to bottom method has means such as mechanical crushing method and atomization.Wherein mechanical crushing method is introduced medium easily, thereby causes the pollution to powder, reduces the degree of purity of product, and gather a large amount of internal stress, the particle diameter wider distribution of powder is difficult to obtain the product of single-size, powder morphology is irregular, has reduced the quality of powder, as " iron-based composite oxides Ca
2Fe
2O
5The preparation method " (CN201110060821.0).And atomization is at preparation also polluted product easily of atomizing medium during powder, powder purity is low, particle diameter is big, be difficult to obtain having the dusty material of sub-micron even nano-scale, as " a kind of iron-based special alloy powder and production method thereof " (CN201110048676.4) and " nonferrous metal powder and device ", (CN200410079654.4).In addition, atomization prepares powder (as aerosolization) and must use the production cost that the use of a large amount of atomizing mediums, particularly high-purity gas has increased powder.Just also there is not which kind of method can obtain size homogeneous, powder purity height, the controlled submicron dusty material of pattern in the existing technology for preparing powder from top to bottom.
Summary of the invention
The utility model is intended to overcome the deficiencies in the prior art, purpose provides the preparation facilities of the amorphous/nanocrystalline metal dust of a kind of small investment, efficient height, simple to operate and rapid solidification, this device can conveniently be controlled powder morphology and microstructure, and prepared powder has narrow diameter distribution, crystal grain is tiny and the characteristics of high purity.
For achieving the above object, the technical solution adopted in the utility model is: described thin crystalline flour end preparation facilities comprises that elevating mechanism, hollow bar, silica crucible, load coil, water-cooled receive copper coin, body of heater and infrared radiation thermometer.
The center at body of heater top is provided with lift span, hollow bar is passed lift span, the lower end of hollow bar connects with the upper end of silica crucible by the reducing seal nipple, and the upper end of hollow bar connects with elevating mechanism by flange, elevating mechanism be positioned at the body of heater top center directly over.
Be close to the inwall of body of heater and built high temperature resistance protective layer by laying bricks or stones, at the inwall of high temperature resistance protective layer 4 ~ 8 heaters are arranged fixedly vertically, 4 ~ 8 heaters layout that is centrosymmetric equably, the upper end of 4 ~ 8 heaters passes the body of heater top respectively.Near the center of body of heater bottom water-cooled is housed and receives copper coin, be provided with load coil directly over the water-cooled reception copper coin.
The body of heater top is provided with the interface of bleeding, and bottom of furnace body is provided with protection gas inflation interface; One side of body of heater is provided with the infrared measurement of temperature hole, and infrared radiation thermometer is equipped with in the outside, infrared measurement of temperature hole, and the center line in the receiving terminal of infrared radiation thermometer, infrared measurement of temperature hole and the central point of load coil axis are located along the same line.The opposite side of body of heater is equipped with hermatic door, and the inwall of hermatic door has been built high temperature resistance protective layer by laying bricks or stones.
Flange is made up of upper flange plate and lower flange, be provided with first sealing ring between upper flange plate and the lower flange, upper flange plate is discoid, and lower flange is circular, the upper flange plate of flange is provided with the boosting air inlet, and the lower flange of flange is fixedlyed connected with the hollow bar upper end.
Be provided with the corundum insulation protection tube in the hollow bar, the upper end of corundum insulation protection tube is fixed on the upper flange plate of flange, and corundum insulation protection tube lower end is near the silica crucible bottom.One end of conductive electrode is by the external DC high-voltage power supply positive pole of lead, and the other end of conductive electrode passes from the corundum insulation protection tube with the bottom of silica crucible and contacts.
The water cooled electrode of load coil is passed in the external intermediate frequency power supply of insulating washer on the body of heater, and 4 ~ 8 heaters are respectively by the external control power supply of lead.
It is in the form of annular discs that described water-cooled receives copper coin, is provided with cooling water pipe in the cross section of water-cooled reception copper coin; The negative pole of DC high-voltage power supply receives copper coin by water cooled electrode and water-cooled and is connected.
Infrared measurement of temperature hole before the described infrared radiation thermometer is embedded with quartz glass.
Lift span on the described body of heater is embedded with second sealing ring.
The contact position of described hermatic door and body of heater is provided with the 3rd sealing ring.
Because adopt technique scheme, the utility model compared with prior art.Have the following advantages:
(1) the utility model need not to add any medium in pulverizing process, and is pollution-free, and powder purity height is fit to produce high purity powdered form.
(2) the utility model is by regulating the high-voltage electrostatic field size, can change the size of the suffered dispersion force of molten metal drop, can control the degree that molten metal is evenly broken up in course of injection, control granularity, particle size distribution range and the pattern of metal dust effectively.
(3) the utility model adopts flash set technology, and the metal that fusion is broken up is scattered in has 10 after water-cooled receives on the copper coin
6The cooldown rate of K/S can guarantee that the molten metal drop cools off fast, and the gained powder grain is tiny, obtains manocrystalline powders, even amorphous powder.
(4) the utility model adopts the technology that rapid solidification and electrostatic spraying combine, and is simple to operate, not only do not have medium in process of production and the purity height, and because need not to add in a large number expensive material, as high-purity gas etc., reduced production cost and investment, have the favorable industrial application prospect.
Therefore, the utlity model has the characteristics of small investment, efficient height, simple to operate and rapid solidification, this device can conveniently be controlled powder morphology and microstructure, the prepared tiny and high purity of powder diameter narrowly distributing, crystal grain, be not only applicable to the preparation of multiple manocrystalline powders, be applicable to amorphous powder yet.
Description of drawings
Fig. 1 is a kind of structural representation of the present utility model.
The specific embodiment
The utility model will be further described below in conjunction with the drawings and specific embodiments, is not the restriction to its protection domain.
Embodiment 1
A kind of preparation facilities of amorphous/nanocrystalline metal dust.As shown in Figure 1, this device comprises that elevating mechanism 1, hollow bar 6, silica crucible 12, load coil 13, water-cooled receive copper coin 15, body of heater 8 and infrared radiation thermometer 18.
The center at body of heater 8 tops is provided with lift span, hollow bar 6 is passed lift span, the lower end of hollow bar 6 connects with the upper end of silica crucible 12 by reducing seal nipple 11, the upper end of hollow bar 6 connects with elevating mechanism 1 by flange 3, elevating mechanism 1 be positioned at body of heater 8 top center directly over.
Be close to the inwall of body of heater 8 and built high temperature resistance protective layer 21 by laying bricks or stones, at the inwall of high temperature resistance protective layer 21 22,4 ~ 8 heaters 22 of 4 ~ 8 heaters layout that is centrosymmetric is equably arranged fixedly vertically, the upper end of 4 ~ 8 heaters 22 passes body of heater 8 tops respectively.Near the center of body of heater 8 bottoms water-cooled is housed and receives copper coin 15, be provided with load coil 13 directly over the water-cooled reception copper coin 15.
Body of heater 8 tops are provided with the interface 24 of bleeding, and body of heater 8 bottoms are provided with protection gas inflation interface 16; One side of body of heater 8 is provided with the infrared measurement of temperature hole, and infrared radiation thermometer 18 is equipped with in the outside, infrared measurement of temperature hole, and the central point of the center line in the receiving terminal of infrared radiation thermometer 18, infrared measurement of temperature hole and load coil 13 axis is located along the same line.The opposite side of body of heater 8 is equipped with hermatic door 10, and the inwall of hermatic door 10 has been built high temperature resistance protective layer 14 by laying bricks or stones.
Flange 3 is made up of upper flange plate and lower flange, be provided with first sealing ring 4 between upper flange plate and the lower flange, upper flange plate is discoid, and lower flange is circular, the upper flange plate of flange 3 is provided with boosting air inlet 26, and the lower flange of flange 3 is fixedlyed connected with hollow bar 6 upper ends.
Be provided with corundum insulation protection tube 5 in the hollow bar 6, the upper end of corundum insulation protection tube 5 is fixed on the upper flange plate of flange 3, and corundum insulation protection tube 5 lower ends are near silica crucible 12 bottoms; One end of conductive electrode 2 is by external DC high-voltage power supply 25 positive poles of lead, and the other end of conductive electrode 2 passes from corundum insulation protection tube 5 with the bottom of silica crucible 12 and contacts.
20,4 ~ 8 heaters 22 of the external intermediate frequency power supply of insulating washer that the water cooled electrode of load coil 13 is passed on the body of heater 8 pass through the external control power supply 23 of lead respectively.
It is in the form of annular discs that described water-cooled receives copper coin 15, is provided with cooling water pipe 17 in the cross section of water-cooled reception copper coin 15; The negative pole of DC high-voltage power supply 25 receives copper coin 15 by water cooled electrode and water-cooled and is connected.
Infrared measurement of temperature hole before the described infrared radiation thermometer 18 is embedded with quartz glass 19.
Lift span on the described body of heater 8 is embedded with second sealing ring 7.
Described hermatic door 10 is provided with the 3rd sealing ring 9 with the contact position of body of heater 8.
The using method of the preparation facilities of the described amorphous/nanocrystalline metal dust of present embodiment is:
Step 1, raw metal is packed in the silica crucible 12, open hermatic door 10, described silica crucible 12 is moved under the hollow bar 6, be connected with hollow bar 6 by reducing seal nipple 11, regulate elevating mechanism 1 again, silica crucible 12 is stretched in the load coil 13, close hermatic door 10.
Step 2, start vacuum extractor, the air in the body of heater 8 are evacuated to the vacuum of setting by the interface 24 of bleeding; Feed argon gas by protection gas inflation interface 16 again, open the cooling water that water-cooled receives copper coin 15 then.
Step 3, unlatching control power supply 23 treat that heater 22 is heated to the design temperature in the body of heater 8, open intermediate frequency power supply 20, and the raw material that is positioned at the silica crucible 12 of load coil 13 begins to heat up.
Step 4, the raw material in silica crucible 12 rise to the melt temperature of setting, and insulation starts DC high-voltage power supply 25 then, the raw material melt positively charged in the silica crucible 12, and it is electronegative that water-cooled receives copper coin 15.
Step 5, when regulating DC high-voltage power supply 25 and making raw material melt in the silica crucible 12 and water-cooled receive electric field between the copper coin 15 to reach the voltage of setting, feed argon gas by boosting air inlet 26, make the fused raw material ejection in the silica crucible, the fused raw material of ejection is scattered in water-cooled and receives rapid solidification on the copper coin 15, makes amorphous/nanometer powder.
Step 6, dust and finish, close DC high-voltage power supply 25, stop heating, cooling.
Embodiment 2
A kind of preparation facilities of amorphous/nanocrystalline metal dust.Present embodiment is the nitrogen except heater 22 is 5 ~ 8 with argon gas, and all the other are with embodiment 1.
This specific embodiment compared with prior art.Have the following advantages:
(1) this specific embodiment need not to add any medium in pulverizing process, and is pollution-free, and powder purity height is fit to produce high purity powdered form.
(2) this specific embodiment is by regulating the high-voltage electrostatic field size, can change the size of the suffered dispersion force of molten metal drop, can control the degree that molten metal is evenly broken up in course of injection, control granularity, particle size distribution range and the pattern of metal dust effectively.
(3) this specific embodiment adopts flash set technology, and the metal that fusion is broken up is scattered in has 10 after water-cooled receives on the copper coin
6The cooldown rate of K/S can guarantee that the molten metal drop cools off fast, and the gained powder grain is tiny, obtains manocrystalline powders, even amorphous powder.
(4) this specific embodiment adopts the technology that rapid solidification and electrostatic spraying combine, and is simple to operate, not only do not have medium in process of production and the purity height, and because need not to add in a large number expensive material, as high-purity gas etc., reduced production cost and investment, have the favorable industrial application prospect.
Therefore, this specific embodiment has the characteristics of small investment, efficient height, simple to operate and rapid solidification, this device can conveniently be controlled powder morphology and microstructure, the prepared tiny and high purity of powder diameter narrowly distributing, crystal grain, be not only applicable to the preparation of multiple manocrystalline powders, be applicable to amorphous powder yet.
Claims (5)
1. the preparation facilities of an amorphous/nanocrystalline metal dust is characterized in that described thin crystalline flour end preparation facilities comprises that elevating mechanism (1), hollow bar (6), silica crucible (12), load coil (13), water-cooled receive copper coin (15), body of heater (8) and infrared radiation thermometer (18);
The center at body of heater (8) top is provided with lift span, hollow bar (6) is passed lift span, the lower end of hollow bar (6) connects with the upper end of silica crucible (12) by reducing seal nipple (11), the upper end of hollow bar (6) connects with elevating mechanism (1) by flange (3), elevating mechanism (1) be positioned at body of heater (8) top center directly over;
Be close to the inwall of body of heater (8) and built high temperature resistance protective layer (21) by laying bricks or stones, inwall at high temperature resistance protective layer (21) vertically fixedly has 4 ~ 8 heaters (22), 4 ~ 8 heaters (22) layout that is centrosymmetric equably, the upper end of 4 ~ 8 heaters (22) passes body of heater (8) top respectively; Near the center of body of heater (8) bottom water-cooled is housed and receives copper coin (15), be provided with load coil (13) directly over the water-cooled reception copper coin (15);
Body of heater (8) top is provided with the interface of bleeding (24), and body of heater (8) bottom is provided with protection gas inflation interface (16); One side of body of heater (8) is provided with the infrared measurement of temperature hole, and infrared radiation thermometer (18) is equipped with in the outside, infrared measurement of temperature hole, and the central point of the receiving terminal of infrared radiation thermometer (18), the center line in infrared measurement of temperature hole and load coil (13) axis is located along the same line; The opposite side of body of heater (8) is equipped with hermatic door (10), and the inwall of hermatic door (10) has been built high temperature resistance protective layer (14) by laying bricks or stones;
Flange (3) is made up of upper flange plate and lower flange, be provided with first sealing ring (4) between upper flange plate and the lower flange, upper flange plate is discoid, lower flange is circular, the upper flange plate of flange (3) is provided with boosting air inlet (26), and the lower flange of flange (3) is fixedlyed connected with hollow bar (6) upper end;
Be provided with corundum insulation protection tube (5) in the hollow bar (6), the upper end of corundum insulation protection tube (5) is fixed on the upper flange plate of flange (3), and corundum insulation protection tube (5) lower end is near silica crucible (12) bottom; One end of conductive electrode (2) is by the external DC high-voltage power supply of lead (25) positive pole, and the other end of conductive electrode (2) passes from corundum insulation protection tube (5) with the bottom of silica crucible (12) and contacts;
The water cooled electrode of load coil (13) is passed in the external intermediate frequency power supply of insulating washer (20) on the body of heater (8), and 4 ~ 8 heaters (22) are respectively by the external control power supply of lead (23).
2. the preparation facilities of amorphous/nanocrystalline metal dust according to claim 1 is characterized in that described water-cooled reception copper coin (15) is in the form of annular discs, is provided with cooling water pipe (17) in the cross section of water-cooled reception copper coin (15); The negative pole of DC high-voltage power supply (25) receives copper coin (15) by water cooled electrode and water-cooled and is connected.
3. the preparation facilities of amorphous/nanocrystalline metal dust according to claim 1 is characterized in that the preceding infrared measurement of temperature hole of described infrared radiation thermometer (18) is embedded with quartz glass (19).
4. the preparation facilities of amorphous/nanocrystalline metal dust according to claim 1 is characterized in that the lift span on the described body of heater (8) is embedded with second sealing ring (7).
5. the preparation facilities of amorphous/nanocrystalline metal dust according to claim 1 is characterized in that described hermatic door (10) and the contact position of body of heater (8) are provided with the 3rd sealing ring (9).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320048238 CN203044900U (en) | 2013-01-29 | 2013-01-29 | Preparation device of amorphous/nanocrystalline metal powder |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320048238 CN203044900U (en) | 2013-01-29 | 2013-01-29 | Preparation device of amorphous/nanocrystalline metal powder |
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| CN203044900U true CN203044900U (en) | 2013-07-10 |
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| CN 201320048238 Withdrawn - After Issue CN203044900U (en) | 2013-01-29 | 2013-01-29 | Preparation device of amorphous/nanocrystalline metal powder |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103042222A (en) * | 2013-01-29 | 2013-04-17 | 武汉科技大学 | Device for preparing fine crystal powder based on electrostatic spraying, and using method thereof |
| CN112797788A (en) * | 2020-12-30 | 2021-05-14 | 江苏三环奥纳科技有限公司 | Smelting device applied to nanocrystalline magnetically soft alloy material |
-
2013
- 2013-01-29 CN CN 201320048238 patent/CN203044900U/en not_active Withdrawn - After Issue
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103042222A (en) * | 2013-01-29 | 2013-04-17 | 武汉科技大学 | Device for preparing fine crystal powder based on electrostatic spraying, and using method thereof |
| CN103042222B (en) * | 2013-01-29 | 2014-12-03 | 武汉科技大学 | Device for preparing fine crystal powder based on electrostatic spraying, and using method thereof |
| CN112797788A (en) * | 2020-12-30 | 2021-05-14 | 江苏三环奥纳科技有限公司 | Smelting device applied to nanocrystalline magnetically soft alloy material |
| CN112797788B (en) * | 2020-12-30 | 2021-12-07 | 江苏三环奥纳科技有限公司 | Smelting device applied to nanocrystalline magnetically soft alloy material |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20130710 Effective date of abandoning: 20141203 |
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| RGAV | Abandon patent right to avoid regrant |