CN203012349U - Dustproof protection device for mask plate - Google Patents
Dustproof protection device for mask plate Download PDFInfo
- Publication number
- CN203012349U CN203012349U CN 201220748966 CN201220748966U CN203012349U CN 203012349 U CN203012349 U CN 203012349U CN 201220748966 CN201220748966 CN 201220748966 CN 201220748966 U CN201220748966 U CN 201220748966U CN 203012349 U CN203012349 U CN 203012349U
- Authority
- CN
- China
- Prior art keywords
- mask plate
- frame
- protecting device
- protective film
- dust protecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The utility model discloses a dustproof protection device for a mask plate. The mask plate is provided with a pattern region. The dustproof protection device for the mask plate comprises a protection film and a frame used for fixing the protection film, wherein a space defined by the protection film and the frame covers the pattern region, the frame comprises a plurality of end-to-end strip-shaped borders, each border comprises a first border close to the mask plate and a second border close to the protection film, and a groove is formed in each second border along the length direction of the border. By using the dustproof protection device provided by the utility model, the frame structure easily absorbs a tension generated by the protection film, therefore, the deformation of the mask plate can be reduced or eliminated, and the yield is increased.
Description
Technical field
The utility model relates to integrated circuit and makes the field, relates in particular to a kind of anti-dust protecting device for mask plate.
Background technology
In the SIC (semiconductor integrated circuit) manufacturing process, photoetching process is one of of paramount importance step wherein.The process of photoetching process be through exposure system will be pre-device on mask plate or circuitous pattern by desired position, accurate transfer is to the photoresist layer that is coated in advance on wafer surface or dielectric layer.Remove or keep the photoresist at exposing patterns position through developing process, with reach with pre-built in the device on mask plate or circuitous pattern the purpose of precise forming on wafer surface or dielectric layer.The quality of photoetching process will directly affect characteristic dimension and the product quality of semiconductor devices, and wherein, mask plate is benchmark and the source of photoetching copy pattern, and any defective on mask plate all can produce serious influence to the final graphics precision.
As shown in Figure 1; Fig. 1 is the cross-sectional view of existing anti-dust protecting device for mask plate; described mask plate 115 has area of the pattern; the anti-dust protecting device that is used for mask plate 115 comprises: framework 113 and protective film 111; described protective film 111 by tight on described framework 113; described protective film 111 light requirements are learned transparent and solid, usually adopt nitrocellulose or cellulose acetate to make.Described framework 113 is around the mask plate edge; the space that described protective film 111 and described framework 113 limit covers described area of the pattern; so that described area of the pattern is sealed; area of the pattern on protection mask plate 115 is not subjected to the pollution of grit or other form; and stick in pollutant on protective film 111 and area of the pattern surface and keep distance enough far away; when imaging, not dropping on wafer surface as the plane of pollutant reduces the impact of pollutant on producing.
Yet; find in actual production; due to protective film 111 by tight on described framework 113; the existence of tension force is arranged on the protective film face; framework 113 is produced acting force, and be delivered on mask plate 115, therefore mask plate 115 can produce miniature deformation; cause area of the pattern to depart from preposition, final impact copies to the effect of the pattern on wafer.
The utility model content
The utility model provides a kind of anti-dust protecting device for mask plate, makes mask plate produce the problem that the influence of crust deformation impact copies to the effect of the pattern on wafer with the tension force that solves the protective film generation.
For addressing the above problem; the utility model provides a kind of anti-dust protecting device for mask plate; described mask plate has area of the pattern; described anti-dust protecting device for mask plate comprises protective film and the framework that is used for fixing described protective film; the space that described protective film and described framework limit covers described area of the pattern; described framework comprises a plurality of end to end strip frames; described frame comprises near the second frame of the first frame of described mask plate and close protective film, offers groove along the frame length direction on described the second frame.
Optionally, described groove is positioned at described the second frame near the side of described area of the pattern or away from the side of described area of the pattern.
Optionally, described groove is positioned on face that described the second frame is connected with protective film or the second frame and face that the first frame is connected.
Optionally, described the second frame changes to a side width that is connected with diaphragm from the side near mask plate.
Optionally, described the second frame evenly diminishes to a side width that is connected with diaphragm from the side near mask plate.
Optionally, described the first frame and the second frame are by the cementing agent bonding connection.
Optionally, described cementing agent is epoxy acrylate, silica gel polyester or acrylic polyester.
Optionally, the material of described frame is any one in metal, alloy, macromolecular material compound.
Optionally, the material of described frame is aluminium alloy.
Compared with prior art, the anti-dust protecting device that is used for mask plate that the utility model provides because frame comprises near the first frame of described mask plate and the second frame of close protective film, offers groove along the frame length direction on described the second frame.This frame easily produces the tension force of deformation absorption portion protective film, and the tension force that mask plate is subject to is diminished, thereby reduces or eliminate the deformation of mask plate, improves exposure effect.
Description of drawings
Fig. 1 is existing anti-dust protecting device cross-sectional view for mask plate;
Fig. 2 is the diagrammatic cross-section of the anti-dust protecting device that is used for mask plate of the utility model embodiment one;
Fig. 3 is the diagrammatic cross-section of the anti-dust protecting device that is used for mask plate of another embodiment of the utility model;
Fig. 4 is the diagrammatic cross-section of the anti-dust protecting device that is used for mask plate of the utility model embodiment two.
Embodiment
Core concept of the present utility model is; a kind of anti-dust protecting device for mask plate is provided; described mask plate has area of the pattern; described anti-dust protecting device for mask plate comprises protective film and the framework that is used for fixing described protective film; the space that described protective film and described framework limit covers described area of the pattern; described framework comprises a plurality of end to end strip frames; described frame comprises near the second frame of the first frame of described mask plate and close protective film, offers groove along the frame length direction on described the second frame.Because such framed structure easily produces deformation, the tension force that described protective film produces can be absorbed, thereby the deformation of mask plate can be reduced or eliminate, prevent that mask plate deformation from exerting an influence to the effect that copies to the pattern on wafer.
Below in conjunction with the drawings and specific embodiments, the anti-dust protecting device that is used for mask plate that the utility model proposes is described in further detail.According to the following describes and claims, advantage of the present utility model and feature will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the purpose of aid illustration the utility model embodiment lucidly.
with reference to accompanying drawing 2, Fig. 2 is the diagrammatic cross-section of the anti-dust protecting device that is used for mask plate of the present embodiment, described mask plate 215 has area of the pattern (not shown), described anti-dust protecting device for mask plate comprises protective film 211 and the framework that is used for fixing described protective film 211, the space that described protective film 211 and described framework limit covers described area of the pattern, described framework comprises a plurality of end to end strip frames 213, described frame comprises the second frame 214 near the first frame 215 of described mask plate and close protective film, offer groove 216 along the frame length direction on described the second frame 214.In the present embodiment, groove 216 is selected to open on the side of the second frame 214 away from area of the pattern.Such border structure; near on the second frame 214 of protective film 211 owing to offering along its length groove 216 thereby easily producing deformation; the tension force of one side energy absorption portion protective film 211; frame 213 can be considered a lever system on the other hand; the second frame 214 is the fulcrum of lever; therefore the moment of the tension force of protective film 211 can reduce tension force to the impact of described mask plate 215 much smaller than the moment of 215 pairs of the second frames 214 of mask plate.
Described the first frame 215 and the second frame 214 are by the cementing agent combination, and by the bonding agent bonding connection, described protective film 211 and described frame 213 are also by the bonding agent bonding connection with described mask plate 215 for described frame 213.Described cementing agent can be the common industrial bonding agents such as epoxy acrylate, silica gel polyester or acrylic polyester.
Described frame 213 materials can be any one in metal, alloy, macromolecular material compound.Be preferably aluminum alloy material, its light weight has enough intensity, and good springiness.Described frame 213 height H need satisfy at exposure bench and detect board inner height demand, are generally 5mm ~ 6.5mm.The utility model does not limit position and the shape of groove 216; also can select groove 216 is opened at the second frame 214 near on the side of area of the pattern; perhaps; in another embodiment of the application (with reference to accompanying drawing 3); be arranged on described the second frame 314 and face that protective film 311 is connected or the second frame 314 and face that the first frame 315 is connected on; when selecting such structure; preferably groove 316 opening parts are set to the structure little than recess width, with the face that guarantees groove 316 places, enough bond areas are arranged.
Embodiment two
with reference to accompanying drawing 4, Fig. 4 is the diagrammatic cross-section of the anti-dust protecting device that is used for mask plate of the present embodiment, described anti-dust protecting device for mask plate comprises protective film 411 and the framework that is used for fixing described protective film 411, the space that described protective film 411 and described framework limit covers described area of the pattern, described framework comprises a plurality of end to end strip frames 413, described frame 413 comprises the second frame 414 near the first frame 415 of described mask plate and close protective film 411, offer groove 416 along the frame length direction on described the second frame 414.Groove 416 is positioned on the second frame 414 and face that protective film 411 is connected; described the second frame 414 changes to a side width that is connected with diaphragm 411 from the side near mask plate 415; can evenly diminish or become large, the variation that also width also can be inhomogeneous certainly.
In the present embodiment, the second frame 414 evenly diminishes to a side width that is connected with diaphragm 411 from the side near mask plate 415.Compare embodiment one, the frame shape deformation nature of the present embodiment is better, therefore can absorb the tension force of more protective films, thereby can further reduce tension force to the impact of described mask plate.
In sum; the utility model provides a kind of anti-dust protecting device for mask plate; the frame of this anti-dust protecting device comprises near the second frame of the first frame of described mask plate and close protective film, offers groove along the frame length direction on described the second frame.Thereby better pliability arranged; easily produce the tension force of deformation absorption portion protective film; the tension force that mask plate is subject to is diminished, reduce or the deformation of eliminating mask plate on the impact of the effect that copies to the pattern on wafer, reach the purpose that promotes exposure effect improving product yield.
Obviously, those skilled in the art can carry out various changes and modification and not break away from spirit and scope of the present utility model the utility model.Like this, if within of the present utility model these are revised and modification belongs to the scope of the utility model claim and equivalent technologies thereof, the utility model also is intended to comprise these changes and modification interior.
Claims (9)
1. anti-dust protecting device that is used for mask plate; described mask plate has area of the pattern; described anti-dust protecting device for mask plate comprises protective film and the framework that is used for fixing described protective film; the space that described protective film and described framework limit covers described area of the pattern; it is characterized in that; described framework comprises a plurality of end to end strip frames; described frame comprises near the second frame of the first frame of described mask plate and close protective film, offers groove along the frame length direction on described the second frame.
2. the anti-dust protecting device for mask plate as claimed in claim 1, is characterized in that, described groove is positioned at described the second frame near the side of described area of the pattern or away from the side of described area of the pattern.
3. the anti-dust protecting device for mask plate as claimed in claim 1, is characterized in that, described groove is positioned on face that described the second frame is connected with protective film or the second frame and face that the first frame is connected.
4. the anti-dust protecting device for mask plate as claimed in claim 3, is characterized in that, described the second frame changes to a side width that is connected with diaphragm from the side near mask plate.
5. the anti-dust protecting device for mask plate as claimed in claim 4, is characterized in that, described the second frame evenly diminishes to a side width that is connected with diaphragm from the side near mask plate.
6. the anti-dust protecting device for mask plate as claimed in claim 1, is characterized in that, described the first frame and the second frame are by the cementing agent bonding connection.
7. the anti-dust protecting device for mask plate as claimed in claim 6, is characterized in that, described cementing agent is epoxy acrylate, silica gel polyester or acrylic polyester.
8. the anti-dust protecting device for mask plate as described in any one in claim 1 to 7, is characterized in that, the material of described frame is any one in metal, alloy, macromolecular material compound.
9. the anti-dust protecting device for mask plate as claimed in claim 8, is characterized in that, the material of described frame is aluminium alloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220748966 CN203012349U (en) | 2012-12-31 | 2012-12-31 | Dustproof protection device for mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220748966 CN203012349U (en) | 2012-12-31 | 2012-12-31 | Dustproof protection device for mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203012349U true CN203012349U (en) | 2013-06-19 |
Family
ID=48603923
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220748966 Expired - Fee Related CN203012349U (en) | 2012-12-31 | 2012-12-31 | Dustproof protection device for mask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203012349U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2021084A (en) * | 2017-06-15 | 2018-12-21 | Asml Netherlands Bv | Pellicle and Pellicle Assembly |
| CN112305854A (en) * | 2019-07-31 | 2021-02-02 | 台湾积体电路制造股份有限公司 | Lithographic apparatus, method of mounting a mask protection film, and method of manufacturing a wafer |
-
2012
- 2012-12-31 CN CN 201220748966 patent/CN203012349U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2021084A (en) * | 2017-06-15 | 2018-12-21 | Asml Netherlands Bv | Pellicle and Pellicle Assembly |
| WO2018228933A3 (en) * | 2017-06-15 | 2019-02-07 | Asml Netherlands B.V. | Pellicle and pellicle assembly |
| NL2022760A (en) * | 2017-06-15 | 2019-03-26 | Asml Netherlands Bv | Pellicle and Pellicle Assembly |
| US11231646B2 (en) | 2017-06-15 | 2022-01-25 | Asml Netherlands B.V. | Pellicle and pellicle assembly |
| US11754918B2 (en) | 2017-06-15 | 2023-09-12 | Asml Netherlands B.V. | Pellicle and pellicle assembly |
| CN112305854A (en) * | 2019-07-31 | 2021-02-02 | 台湾积体电路制造股份有限公司 | Lithographic apparatus, method of mounting a mask protection film, and method of manufacturing a wafer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130619 Termination date: 20181231 |