CN203003626U - High-precision super large size single face polishing machine - Google Patents

High-precision super large size single face polishing machine Download PDF

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Publication number
CN203003626U
CN203003626U CN 201220675235 CN201220675235U CN203003626U CN 203003626 U CN203003626 U CN 203003626U CN 201220675235 CN201220675235 CN 201220675235 CN 201220675235 U CN201220675235 U CN 201220675235U CN 203003626 U CN203003626 U CN 203003626U
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CN
China
Prior art keywords
polishing
polishing disk
accuracy
disk
single side
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 201220675235
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Chinese (zh)
Inventor
张正钦
资朝红
黄震
陈志华
黄艳
李云江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HUNAN ELECTRONIC INFORMATION INDUSTRY GROUP Co Ltd
CHANGSHA YONGKAI TECHNOLOGY EQUIPMENT Co Ltd
Original Assignee
HUNAN ELECTRONIC INFORMATION INDUSTRY GROUP Co Ltd
CHANGSHA YONGKAI TECHNOLOGY EQUIPMENT Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HUNAN ELECTRONIC INFORMATION INDUSTRY GROUP Co Ltd, CHANGSHA YONGKAI TECHNOLOGY EQUIPMENT Co Ltd filed Critical HUNAN ELECTRONIC INFORMATION INDUSTRY GROUP Co Ltd
Priority to CN 201220675235 priority Critical patent/CN203003626U/en
Application granted granted Critical
Publication of CN203003626U publication Critical patent/CN203003626U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)

Abstract

A high-precision super-large-size single-face polishing machine comprises a machine base, a polishing mechanism and a programmable logic controller (PLC), wherein the polishing mechanism and the PLC are fixed on the machine base, the polishing mechanism comprises a polishing disc and a polishing solution barrel, the polishing solution barrel is connected with two sides of the polishing disc through conduits, the polishing disc is installed on a main bearing seat of the polishing mechanism, semiconductor chip polishing cloth is attached to the surface of the polishing disc, and the PLC is fixed on the side surface of the machine base through wire conduits and connected with each part control modules inside the PLC through wires. The high-precision super-large-size single-face polishing machine is simple in structure, convenient to repair, easy to operate, capable of carrying out high-precision polishing processing on glass substrates of large-size a flat panel display (FPD) and a liquid crystal display (LCD) and satisfying social demands.

Description

High-accuracy oversized single side polishing machine
Technical field
The utility model relates to polishing machine, is specially a kind of high-accuracy oversized single side polishing machine for hard brittle material fine grindings such as large scale FPD, LCD glass substrate and quartz glass, sight glass.
Background technology
Single side polishing machine is the high precision plane polissoir, mainly as the plane polishing of the hard brittle materials such as quartz crystal slice, silicon, germanium wafer, potsherd, piston ring, valve plate, valve block, bearing, sapphire, (FPD, LCD) glass substrate, sight glass.Existing single side polishing machine adopts frequency control motor to drive PLC and controls, configure high-power deceleration system, the soft start soft stop only, polishing time can arbitrarily be set according to timer, adopt plane pressurization form, be equipped with pressurized cylinder on open equipment, can have arbitrarily regulated pressure, be easy to precise finiss.because flat-panel monitor (FPD) especially liquid crystal display (LCD) has the little power consumption of low pressure, flat structure, passive display type (free from glare, do not stimulate human eye, can not cause eye fatigue), show contain much information (because pixel can be done very littlely), be easy to colorize (can reappear very accurately) on chromatogram, electromagnetic-radiation-free is (to human-body safety, be beneficial to information privacy), the plurality of advantages such as long-life, more and more be applied to field of electronic devices, and to flat-panel monitor (FPD), liquid crystal display (LCD) glass substrate carries out polishing and also becomes the important research topic in field for this reason.
But mostly the glass substrate as flat-panel monitor (FPD), liquid crystal display (LCD) critical piece is to adopt conventional polishing machine on process equipment, mainly for the processing of 14 ' * 16 ' glass substrate; Along with flat panel TV, the LCD computer future development towards large scale, high-resolution, requirement to flat-panel monitor (FPD), liquid crystal display (LCD) is also more and more higher, and development becomes problem demanding prompt solution mainly for the polishing machine of the processing of the glass substrate of large scale, high-precision LCD, FPD.
The utility model content
The technical problem that the utility model solves is to provide a kind of high-accuracy oversized single side polishing machine, to solve the shortcoming in the above-mentioned background technology.
The technical problem that the utility model solves realizes by the following technical solutions:
High-accuracy oversized single side polishing machine, comprise support, be fixed on polishing mechanism and PLC controller on described support, described polishing mechanism comprises polishing disk and polishing fluid bucket, described polishing fluid bucket is connected to the both sides of described polishing disk by conduit, described polishing disk is arranged on the main bearing seat of described polishing mechanism, and the surface of described polishing disk is pasted with semiconductor wafer polishing cloth; Described PLC controller is fixed on the side of described support and is connected by the inner each several part control module of wire and its by conduit.
In the utility model, described polishing disk comprises polishing disk and lower polishing disk, and described upper polishing disk is fixed on a guide rail, and described guide rail is connected with described support, the main shaft of described upper polishing disk is connected with the piston rod of a lift cylinder, and the main shaft of described lower polishing disk is connected with a reducing motor.
In the utility model, described guide rail is connected with a swing motor by linkage, and the back of described lift cylinder is connected with the tilting cylinder.Described polishing disk is of a size of 1700mm.
Beneficial effect
The utility model is simple in structure, and is easy to maintenance, simple to operate, can do high-precision polishing to the glass substrate of large scale FPD, LCD, satisfies social needs.
Description of drawings
Fig. 1 is the front view of high-accuracy oversized single side polishing machine.
Fig. 2 is the side view of high-accuracy oversized single side polishing machine.
The specific embodiment
For technological means, creation characteristic that the utility model is realized, reach purpose and effect is easy to understand, below in conjunction with concrete diagram, further set forth the utility model.
Referring to Fig. 1 and Fig. 2, the front view of high-accuracy oversized single side polishing machine and side view, high-accuracy oversized single side polishing machine, comprise support 2, be fixed on polishing mechanism and PLC controller 1 on described support 2, described polishing mechanism comprises polishing disk and polishing fluid bucket 3, described polishing fluid bucket 3 is connected to the both sides of described polishing disk by conduit 5, described polishing disk is arranged on the main bearing seat of described polishing mechanism, and the surface of described polishing disk is pasted with semiconductor wafer polishing cloth; Described PLC controller 1 is fixed on the side of described support 2 and is connected by the inner each several part control module of wire and its by conduit 4.
In the utility model, described polishing disk comprises polishing disk 6 and lower polishing disk 7, described upper polishing disk 6 is fixed on a guide rail 8, described guide rail 8 is connected with described support 2, the main shaft of described upper polishing disk is connected with the piston rod of a lift cylinder 11, and the main shaft of described lower polishing disk 7 is connected with a reducing motor 9.
Polishing disk of the present utility model is of a size of 1700mm, does not temporarily also have large-sized polishing machine like this to appear on the market, and such oversize polishing machine can be done high-precision polishing to the glass substrate of large scale FPD, LCD, satisfies social needs.And described guide rail is connected with a swing motor 10 by linkage, and the back of described lift cylinder 11 is connected with tilting cylinder 12.
above demonstration and described basic principle of the present utility model and principal character and advantage of the present utility model, the technical staff of the industry should understand, the utility model is not restricted to the described embodiments, that describes in above-described embodiment and specification just illustrates principle of the present utility model, under the prerequisite that does not break away from the utility model spirit and scope, the utility model also has various changes and modifications, these changes and improvements all fall in claimed the utility model scope, the claimed scope of the utility model is defined by appending claims and equivalent thereof.

Claims (5)

1. high-accuracy oversized single side polishing machine, comprise support, be fixed on polishing mechanism and PLC controller on described support, it is characterized in that, described polishing mechanism comprises polishing disk and polishing fluid bucket, described polishing fluid bucket is connected to the both sides of described polishing disk by conduit, described polishing disk is arranged on the main bearing seat of described polishing mechanism, and the surface of described polishing disk is pasted with semiconductor wafer polishing cloth; Described PLC controller is fixed on the side of described support and is connected by the inner each several part control module of wire and its by conduit.
2. high-accuracy oversized single side polishing machine according to claim 1, it is characterized in that, described polishing disk comprises polishing disk and lower polishing disk, described upper polishing disk is fixed on a guide rail, described guide rail is connected with described support, the main shaft of described upper polishing disk is connected with the piston rod of a lift cylinder, and the main shaft of described lower polishing disk is connected with a reducing motor.
3. high-accuracy oversized single side polishing machine according to claim 2, is characterized in that, described guide rail is connected with a swing motor by linkage.
4. high-accuracy oversized single side polishing machine according to claim 2, is characterized in that, the back of described lift cylinder is connected with the tilting cylinder.
5. high-accuracy oversized single side polishing machine according to claim 1, is characterized in that, the polishing disk of described high-accuracy oversized single side polishing machine is of a size of 1700mm.
CN 201220675235 2012-12-10 2012-12-10 High-precision super large size single face polishing machine Expired - Fee Related CN203003626U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201220675235 CN203003626U (en) 2012-12-10 2012-12-10 High-precision super large size single face polishing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201220675235 CN203003626U (en) 2012-12-10 2012-12-10 High-precision super large size single face polishing machine

Publications (1)

Publication Number Publication Date
CN203003626U true CN203003626U (en) 2013-06-19

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Family Applications (1)

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CN 201220675235 Expired - Fee Related CN203003626U (en) 2012-12-10 2012-12-10 High-precision super large size single face polishing machine

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CN (1) CN203003626U (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103350377A (en) * 2013-07-12 2013-10-16 曾庆明 Grinding polishing machine suitable for panel display glass substrate
CN103551957A (en) * 2013-11-01 2014-02-05 苏州辰轩光电科技有限公司 Single-sided polishing machine
CN107234510A (en) * 2017-08-03 2017-10-10 合肥念萍电子商务有限公司 Burnishing device for glassware
CN107953247A (en) * 2017-12-13 2018-04-24 无锡上机数控股份有限公司 Numerical control pneumatic lifts bistrique
CN110893576A (en) * 2019-11-11 2020-03-20 东旭(锦州)精密光电科技有限公司 Polishing machine

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103350377A (en) * 2013-07-12 2013-10-16 曾庆明 Grinding polishing machine suitable for panel display glass substrate
CN103551957A (en) * 2013-11-01 2014-02-05 苏州辰轩光电科技有限公司 Single-sided polishing machine
CN103551957B (en) * 2013-11-01 2016-04-20 苏州辰轩光电科技有限公司 Single side polishing machine
CN107234510A (en) * 2017-08-03 2017-10-10 合肥念萍电子商务有限公司 Burnishing device for glassware
CN107953247A (en) * 2017-12-13 2018-04-24 无锡上机数控股份有限公司 Numerical control pneumatic lifts bistrique
CN110893576A (en) * 2019-11-11 2020-03-20 东旭(锦州)精密光电科技有限公司 Polishing machine

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C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130619

Termination date: 20141210

EXPY Termination of patent right or utility model