CN203002359U - Vacuum device for cleaning and modifying surface by using chemical vapor phase and ultraviolet light chemical dry method - Google Patents
Vacuum device for cleaning and modifying surface by using chemical vapor phase and ultraviolet light chemical dry method Download PDFInfo
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- CN203002359U CN203002359U CN 201220605307 CN201220605307U CN203002359U CN 203002359 U CN203002359 U CN 203002359U CN 201220605307 CN201220605307 CN 201220605307 CN 201220605307 U CN201220605307 U CN 201220605307U CN 203002359 U CN203002359 U CN 203002359U
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Abstract
The utility model discloses a vacuum device for cleaning and modifying a surface by using a chemical vapor phase and ultraviolet light chemical dry process. The vacuum device mainly comprises a vacuum chamber, an ultraviolet light source system, a vacuum pump system and a vacuum equipment control system; the vacuum chamber is composed of an inner high-vacuum chamber and an outer low-vacuum chamber; an ultraviolet lamp light source is fixed on the top end of the outer low-vacuum chamber; and the inner high-vacuum chamber is provided with a height-adjustable sample stage and externally provided with a heating and water cooling system. The vacuum device can be used for accurately controlling the process of an ultraviolet light chemical and chemical vapor phase dry process reaction and effectively cleaning and modifying materials and devices and has important application value in the field of material and nano optoelectronic devices.
Description
Technical field
The utility model relates to the dry method process for treating surface of material, more particularly, relates to a kind of vacuum equipment that collects ultraviolet light chemistry and chemical gaseous phase surface clean and modification.
Background technology
Ultraviolet light chemistry process for treating surface can effectively be removed the organic pollution of most metals, semiconductor and insulating materials, and realize playing an important role the modification of the materials such as metal, semiconductor and carbon group element in the basic scientific research such as Material growth, surface modification and device preparation and industry application.This technique functions comes from nineteen seventies, and it is initially the UV-irradiation air or oxygen, and progressively develop into the VUV cleaning technique with gases such as further reduction water in air vapour, nitrogen dioxide on photochemically reactive impact; Also develop to high-power automatic transmission cleaning equipment from initial small-power substrate cleaning equipment on scale.This ultraviolet lighting cleaning equipment mainly is based on low pressure mercury lamp can launch the ultraviolet light that main wavelength is positioned at 184.9nm and 253.7nm, oxygen generates oxygen atom and ozone under the irradiation of these two kinds of ultraviolet lights, and with the organic molecule generation photochemical reaction that is in excitation state, generate the materials such as water and carbon dioxide, reach the purpose of surface clean.
The surface treatment of ultraviolet light chemistry has the cleaning effect to substrate.But this surface clean only is aimed at the organic pollution of surperficial tens nanometers.When there was organic pollution than thick-layer in sample substrate surface, at first we adopted the organic chemical reagent wet method to remove the organic pollution of substrate surface usually, and then adopt the dry method surface treatment to remove the organic micro-pollutant of remained on surface.Take grapheme material and nano photoelectronic devices as example, we know the method for no matter utilizing tape stripping or utilize photoresist to transfer to certain suprabasil Graphene, inevitably bring organic pollution in its preparation process.For these organic removings, we normally adopt the chemical gas phase reaction technology, are about to sample and put into the approximately annealing furnace of 300 degrees centigrade, pass into simultaneously the gas of certain flow, as Ar and H
2, and keep reaction time more than two hours.This chemical gaseous phase heat treatment is because reaction is very weak, and it is to rely on air-flow that the organic matter of volatilization is taken away basically, thereby longer duration, spends highly, and environment is caused very large pollution.Regrettably, still can there be a large amount of pollutants in the Graphene surface that this method is processed, the people such as Joel doctor Moser of Spain Catalonia nanotechnology research institute are for addressing this problem, proposed to come cleaning element by electronic component being applied transient high-current generation Joule heat, be widely used.But, thisly electronic component is applied instantaneous large-current produce the cleaning that Joule heat carries out nano electron device many limitation are also arranged: 1. the cleaning method of this electric current Joule heat only is only applicable to electronic component, and is not suitable for other material and nano-device outside electronic component.2. the cleaning method of this electric current Joule heat is only to clean for a certain specific graphene nano electronic device, and is not monolith.
We know, the reaction of ultraviolet light chemistry not only has the cleaning effect, the strong oxidizing property of oxygen atom can also be further with (for example silver, aluminium etc.) oxidation of some metal materials or carbon group material (as Graphene, CNT etc.) is carried out carrier adulterate and etching effect, realize material modification.Effective process of controlling the reaction of ultraviolet light chemistry is about to react most important for cleaning and the modification of sample on the reaction aspect that is controlled at oxygen atom and residual organic pollution.This photochemical reaction and two kinds of technology of chemical gas phase reaction are combined, we can reduce the unfavorable factors such as chemical gas phase reaction technology longer duration, cleaning performance be relatively poor, reach effective removing material and nano photoelectronic devices surface contaminant purpose, and can save cost, reduce the pollution to surrounding environment.
We are in the patent (title: proposed the double-cavity structure vacuum equipment of ultraviolet light chemistry reaction the vacuum equipment of collection UV/ozone surface treatment and electrical properties in-situ test), thereby effectively controlled photochemically reactive process of application before.The utility model combines the reaction of ultraviolet light chemistry, accurately the process of the cleaning of Quality control dry method and surface modification on the basis of this design with two kinds of technology of chemical gas phase reaction.For this reason, the utility model need satisfy higher or more special requirement, namely must consider the compatibility of ultraviolet light chemistry surface treatment and two kinds of technology of chemical gaseous phase surface treatment.
The utility model content
The utility model is for the technical problem that exists in above-mentioned prior art, a kind of vacuum plant for chemical gaseous phase and the modification of ultraviolet light chemistry dry method surface clean is provided, overcome the problem that exists in existing dry surface modification technology, realize a kind of vacuum equipment that ultraviolet light is chemical and chemical gaseous phase is cleaned that integrates, it can accurately control photochemistry and chemical gas phase reaction process, effectively realize original position, the dry method cleaning of materials and devices in same equipment, the utility model has important value in the field of surface treatment of material and nano photoelectronic devices.
according to an aspect of the present utility model, a kind of vacuum plant for chemical gaseous phase and the modification of ultraviolet light chemistry dry method surface clean is provided, mainly by vacuum chamber, ultraviolet light source system, vacuum pump system and vacuum-control(led) system form, wherein, described ultraviolet light source system comprises uviol lamp control power supply and the ultraviolet lamp tube that is connected, described vacuum chamber comprises outer chamber and inner cavity chamber, described ultraviolet lamp tube is installed in described outer chamber, be provided with described sample stage in described inner cavity chamber, heater and water cooling plant, described inner cavity chamber also is provided with the gas input port, the gas output end mouth, described gas input port is connected with the oxygen storage device, the nitrogen storage device, the argon gas storage device, hydrogen gas storing device, can realize the chemical gaseous phase surface treatment, the light of described ultraviolet lamp tube emission is by the quartz window of described inner cavity chamber, shine on described sample stage, described inner cavity chamber is filled with the oxygen of certain pressure intensity, described vacuum pump system and vacuum-control(led) system for generation of and control vacuum in vacuum chamber.
Preferably, described ultraviolet lamp tube power is that 100W, main emission wavelength are the ultraviolet light of 184.9nm and 253.7nm.
Preferably, described inner cavity chamber is mainly made by quartz material on top, the bottom is mainly stainless steel material and makes, described inner cavity chamber top has the quartz window at wavelength 184.9nm and 253.7nm place high permeability, the size of described quartz window is not less than the aperture, inside of described inner cavity chamber, and described gas input port, gas output end mouth are arranged on described inner cavity chamber bottom stainless steel parts.
Preferably, described sample stage is by quartz material, it highly can be regulated within the specific limits by control lever, to realize and effectively to control the surface treatment of ultraviolet light chemistry, described control lever is comprised of two parts, namely is connected with described sample stage and is positioned at the quartz rod of described inner cavity chamber and is connected with described quartz rod toward the stainless steel of vacuum chamber outside.
Preferably, described vacuum pump system forms pump by two-stage, i.e. mechanical pump and molecular pump.
Preferably, described vacuum-control(led) system mainly comprises: gas flowmeter, vacuum meter, temperature control system and water-cooling system.
Compared with the prior art, the utlity model has following beneficial effect:
Technical scheme provided by the utility model integrates ultraviolet light chemistry and chemical gaseous phase dry method process for treating surface, and it can realize that effective cleaning of materials and devices and accurately modification are had important application in material, field of nanometer devices.
The utility model adopts the vacuum system of dual cavity, be about to ultraviolet lamp tube and sample stage and be placed in respectively outer chamber and inner cavity chamber, and give effective control by heating and the internal chamber temp of water-cooling system, thereby can control better the process of ultraviolet light chemistry and chemical gas phase reaction.
Description of drawings
By reading the detailed description of non-limiting example being done with reference to the following drawings, it is more obvious that other features, objects and advantages of the present utility model will become:
Fig. 1 represents vacuum device structure schematic diagram of the present utility model.
In figure: 1 is the exocoel chamber cap, and 2 is ultraviolet lamp tube, and 3 is quartz window, and 4 is outer chamber, and 5 is inner cavity chamber, and 6 is sample stage, and 7 is control lever.
The specific embodiment
Below in conjunction with the drawings and specific embodiments, the utility model is described in further detail.Following examples will help those skilled in the art further to understand the utility model, but not limit in any form the utility model.Should be pointed out that to those skilled in the art, without departing from the concept of the premise utility, can also make some distortion and improvement.These all belong to protection domain of the present utility model.
According to the structure of vacuum equipment provided by the utility model as shown in Figure 1, described vacuum equipment is mainly by vacuum chamber, ultraviolet light source system, vacuum pump system and vacuum equipment composition of the control system.Following these four parts are described.
Particularly, ultraviolet light source system comprises uviol lamp control power supply and ultraviolet lamp tube, wherein:
Uviol lamp control power supply can control the unlatching of ultraviolet lamp tube and extinguish, radiation intensity, radiated time etc.Ultraviolet lamp tube is low pressure mercury lamp, at first it is fixed on the aluminum reflector, and then reflector is fixed in the outer chamber top, and light source can be launched the ultraviolet light that is mainly 184.9nm and 253.7nm.
More specifically, vacuum chamber comprises outer chamber and inner cavity chamber, wherein:
Outer chamber is made by stainless steel material, and its upper surface is ultraviolet lamp tube fixedly.After ultraviolet lamp tube was opened, the vacuum environment of outer chamber can effectively reduce gas molecule to the ultraviolet Optical Absorption, avoided unnecessary ozone generating and may be on the impact of surrounding environment.
Inner cavity chamber is divided into quartz chamber and stainless steel chamber two parts, and the quartz chamber on top is mainly made by quartz material, and the stainless steel chamber of bottom is mainly stainless steel material.High-purity quartz window, built-in liftable sample stage and gas input port, gas output end mouth etc. are settled in the inner cavity chamber top.
The quartz window clear light size is not less than inner cavity chamber's internal diameter, is fixed on steel flange, and can see through wavelength is 184.9nm and 253.7nm ultraviolet light, reduces the inhomogeneities of inner cavity chamber's ozone generating.
Sample stage in inner cavity chamber is mainly by quartz material, is 10mm apart from quartz window lower surface minimum distance.Sample stage is connected with the device external environment by control lever, can lifting in the 60mm scope, and by quartz material, the other parts of sample stage are made by stainless steel material the top of sample stage (namely being positioned at the part of quartz chamber).
The stainless steel chamber portion of inner cavity chamber has gas input port, gas output end mouth.
Further, vacuum pump system is mainly by two-stage (two-speed) pump, and namely mechanical pump and molecular pump form, and the base vacuum degree can reach 2*10
-4Pa.
Further, the vacuum equipment control system mainly comprises gas flowmeter, vacuum meter, temperature control system and water-cooling system.
When inner cavity chamber was filled with certain gas, gas flowmeter can be controlled the flow of inflow gas, and the vacuum of inner cavity chamber can be detected by high and low vacuum meter.
For the above-mentioned equipment that integrates ultraviolet light chemistry and chemical gaseous phase dry method process for treating surface, the below is with Si/SiO
2Suprabasil graphene nano electronic component is example, illustrates the key step to its cleaning:
1) open successively main power source, vacuum meter and nitrogen valve, the air pressure in vacuum chamber is closed the nitrogen valve after surpassing 1atm, opens successively outer chamber and the inner cavity chamber of vacuum equipment.
2) the Graphene electronic component is placed on inner cavity chamber's quartz specimen platform, closes successively inside and outside Pit cover.
3) open successively inner cavity chamber's water-cooling system and mechanical pump power supply, after vacuum is higher than 1Pa, open molecular pump.
4) inner cavity chamber's base vacuum degree reaches 2*10
-4After Pa, closure molecule pump and inner cavity chamber's gas output valve are opened the oxygen gas flowmeter.After inner cavity chamber reaches 1atm pressure, close the gas input valve door, open the ultraviolet lamp tube main power source, light application time is set, start the power control switch of ultraviolet source.
5) after the ultraviolet lamp tube irradiation finishes, close the ultraviolet lamp tube main power source, open inner cavity chamber's gas output valve, open molecular pump after vacuum reaches 1Pa, then wait for that vacuum reaches 2*10
-4After Pa, closure molecule pump and mechanical pump successively.
6) open Ar and H
2Gas flowmeter is as Ar and H
2Gas flow is respectively 200sccm and 100sccm.After pressure reaches an atmospheric pressure, open inner cavity chamber and add thermal control equipment, control temperature and rise to 310 degrees centigrade in 30min, and cooling after being incubated with this understanding two hours, control cooling rate and be one hour and be cooled to 80 degrees centigrade.
7) open mechanical pump, close mechanical pump after vacuum reaches 1Pa.
8) open nitrogen input valve, the chamber internal gas pressure is opened outer chamber and inner cavity chamber after greater than 1atm successively, takes out sample.
9) open successively mechanical pump and molecular pump, keep the chamber vacuum state.
10) close the vacuum chamber valve, and then closure molecule pumping source, mechanical pump power supply, barometer, thermometer, water-cooling system and main power source successively.
In the utility model, outer chamber and ultraviolet lamp tube designing and making process are specific as follows:
Outer chamber is cylinder-like structure, made by stainless steel material, on seal cover is arranged.Its total height is 400mm, and internal diameter is 300mm, and wall and upper cover thickness are 6mm.
Ultraviolet lamp tube power is 100W, and tube diameter is 18mm, is shaped as the hairpin structure, bends to the 120mm*120mm swept area.At first ultraviolet lamp tube is fixed on the aluminum reflecting plate, and then the aluminum reflecting plate is fixed in outer chamber seal cover inner tip.
The uviol lamp of ultraviolet lamp tube is controlled power unit and is comprised main switch, uviol lamp opening switch, Timing button.For avoiding ultra violet lamp to the human body injury, when opening vacuum chamber, the ultraviolet lamp tube auto-breaking.
In the utility model, the designing and making process of inner cavity chamber, quartz window, heating and water-cooling system is as follows:
Inner cavity chamber is cylinder-like structure mainly by quartz material, and total height is 130mm, and internal diameter is 80mm, and the chamber wall thickness is 8mm.Inner cavity chamber's top ultraviolet transmission window adopts high-quality quartz material, and external diameter is 100mm, and its transmission diameter is 80mm, and thickness is 10mm, and sealing is embedded in steel flange.Be equipped with fixing hole and sealing ring on flange.The external heater coil of inner cavity chamber and water cooling plant.
Inner cavity chamber's quartz window upper surface is apart from fluorescent tube 10mm bottom.
In the utility model, the design of inner cavity chamber's control lever and sample stage and process are specific as follows:
The sample stage diameter is 60mm, and it is connected with control lever, can enter inner cavity chamber from the vacuum equipment bottom, and handles sample stage lifting in the 60mm scope by control lever.
Control lever length is 350mm, and wherein quartz rod is long is 130mm, and stainless steel is long is 220mm, and its external diameter is 12mm, and there are the screw thread corresponding with quill shaft and stuck point in the stainless steel side end face, can lifting in the 60mm scope.
It should be noted last that, above embodiment is only unrestricted in order to the technical solution of the utility model to be described.Although with reference to embodiment, the utility model is had been described in detail, those of ordinary skill in the art is to be understood that, the technical solution of the utility model is modified or is equal to replacement, do not break away from the spirit and scope of technical solutions of the utility model, it all should be encompassed in the middle of claim scope of the present utility model.
Claims (6)
1. vacuum plant that is used for chemical gaseous phase and the modification of ultraviolet light chemistry dry method surface clean, it is characterized in that, mainly by vacuum chamber, ultraviolet light source system, vacuum pump system and vacuum-control(led) system form, wherein, described ultraviolet light source system comprises uviol lamp control power supply and the ultraviolet lamp tube that is connected, described vacuum chamber comprises outer chamber and inner cavity chamber, described ultraviolet lamp tube is installed in described outer chamber, be provided with described sample stage in described inner cavity chamber, heater and water cooling plant, described inner cavity chamber also is provided with the gas input port, the gas output end mouth, described gas input port is connected with the oxygen storage device, the nitrogen storage device, the argon gas storage device, hydrogen gas storing device, can realize the chemical gaseous phase surface treatment, the light of described ultraviolet lamp tube emission is by the quartz window of described inner cavity chamber, shine on described sample stage, described inner cavity chamber is filled with the oxygen of certain pressure intensity, described vacuum pump system and vacuum-control(led) system for generation of and control vacuum in vacuum chamber.
2. the vacuum plant for chemical gaseous phase and the modification of ultraviolet light chemistry dry method surface clean according to claim 1, is characterized in that, described ultraviolet lamp tube power is that 100W, main emission wavelength are the ultraviolet light of 184.9nm and 253.7nm.
3. the vacuum plant for the modification of chemical gaseous phase and ultraviolet light chemistry dry method surface clean according to claim 1, it is characterized in that, described inner cavity chamber is mainly made by quartz material on top, the bottom is mainly stainless steel material and makes, described inner cavity chamber top has the quartz window at wavelength 184.9nm and 253.7nm place high permeability, the size of described quartz window is not less than the aperture, inside of described inner cavity chamber, and described gas input port, gas output end mouth are arranged on described inner cavity chamber bottom stainless steel parts.
4. the vacuum plant for the modification of chemical gaseous phase and ultraviolet light chemistry dry method surface clean according to claim 1, it is characterized in that, described sample stage is by quartz material, it highly can be regulated within the specific limits by control lever, to realize and effectively to control the surface treatment of ultraviolet light chemistry, described control lever is comprised of two parts, namely is connected with described sample stage and is positioned at the quartz rod of described inner cavity chamber and is connected with described quartz rod toward the stainless steel of vacuum chamber outside.
5. the vacuum plant for chemical gaseous phase and the modification of ultraviolet light chemistry dry method surface clean according to claim 1, is characterized in that, described vacuum pump system forms pump by two-stage, i.e. mechanical pump and molecular pump.
6. the vacuum plant for chemical gaseous phase and the modification of ultraviolet light chemistry dry method surface clean according to claim 1, is characterized in that, described vacuum-control(led) system mainly comprises: gas flowmeter, vacuum meter, temperature control system and water-cooling system.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220605307 CN203002359U (en) | 2012-11-15 | 2012-11-15 | Vacuum device for cleaning and modifying surface by using chemical vapor phase and ultraviolet light chemical dry method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN 201220605307 CN203002359U (en) | 2012-11-15 | 2012-11-15 | Vacuum device for cleaning and modifying surface by using chemical vapor phase and ultraviolet light chemical dry method |
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| CN203002359U true CN203002359U (en) | 2013-06-19 |
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| CN 201220605307 Expired - Fee Related CN203002359U (en) | 2012-11-15 | 2012-11-15 | Vacuum device for cleaning and modifying surface by using chemical vapor phase and ultraviolet light chemical dry method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109881185A (en) * | 2019-03-06 | 2019-06-14 | 北京捷造光电技术有限公司 | A kind of vapor deposition reaction device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109881185A (en) * | 2019-03-06 | 2019-06-14 | 北京捷造光电技术有限公司 | A kind of vapor deposition reaction device |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130619 Termination date: 20151115 |
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| EXPY | Termination of patent right or utility model |