CN202752271U - High-efficiency sound wave wet treatment device for silicon materials - Google Patents
High-efficiency sound wave wet treatment device for silicon materials Download PDFInfo
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- CN202752271U CN202752271U CN 201220276953 CN201220276953U CN202752271U CN 202752271 U CN202752271 U CN 202752271U CN 201220276953 CN201220276953 CN 201220276953 CN 201220276953 U CN201220276953 U CN 201220276953U CN 202752271 U CN202752271 U CN 202752271U
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- silicon materials
- wet treatment
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- treatment apparatus
- acoustic wave
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Abstract
The utility model provides a high-efficiency sound wave wet treatment device for silicon materials. The wet treatment device comprises at least one mixed acid tank, at least one water seal tank, at least one overflow tank, at least one dewatering tank and a flower basket, the mixed acid tanks, the water seal tanks, the overflow tanks and the dewatering tanks are sequentially arranged, the flower basket is used for containing the silicon materials and is conveyed among the mixed acid tanks, the water seal tanks, the overflow tanks and the dewatering tanks by a conveying mechanism, a partition door plate is arranged above the middle of a tank body of each water seal tank, and sound wave vibration devices are arranged in the mixed acid tanks, the overflow tanks and the dewatering tanks respectively. By the aid of the high-efficiency sound wave wet treatment device for the silicon materials, the silicon materials which are positioned in the middle of the flower basket and are in various shapes can be sufficiently cleaned, a large amount of water carried in the silicon materials and the flower basket can be sufficiently shaken off in the dewatering tanks to improve drying efficiency and shorten drying time, the cleaning quality of the silicon materials is improved, the wet treatment efficiency and the yield of the silicon materials are improved, and manpower and material resources are greatly saved.
Description
Technical field
The utility model relates to a kind of photovoltaic production equipment, is specifically related to a kind of efficient acoustic wave silicon materials wet treatment apparatus.
Background technology
Photovoltaic industry will play very active influence to Chinese energy supply, energy security, energy-saving and emission-reduction, protection of the environment; country pays much attention to the development of this emerging strategic industry, mentions in " 12 " ENERGY PLANNING of appearance and will greatly develop photovoltaic application.At the beginning of 2011 8 months, the National Development and Reform Commission has put into effect the photovoltaic generation online stake electrovalence policy of 1 yuan/kWh, started immediately the China market demand, Bureau of Energy's latest data shows that the annual newly-increased installation of China reached 2.2GW (2,200,000 kilowatts) first in 2011.
Along with the continuous reduction of photovoltaic generation cost, the application of exploit market fast application, especially domestic market makes it to become the green economy growth point of sustainable development, is the important topic that we face.The arrival in photovoltaic " 1 yuan/degree electricity " epoch, photovoltaic will become the power and source of " energy-saving and emission-reduction ", reply climate change, photovoltaic technology and traditional energy technology combine, also can realize the gradually adjustment of future source of energy structure, to realize in time making the transition steadily from fossil energy to regenerative resource.
Silicon materials are a kind of important source material of photovoltaic industry, and the clean level of silicon materials has significant impact for the performance of photovoltaic product.And in the at present general silicon materials cleaning equipment, silicon materials re-use the static ultrasonic cleaning of single groove after the nitration mixture groove cleans, because difform silicon materials are put in the gaily decorated basket relatively closely and are in contact with one another, ultrasonic energy usually can't penetrate intensive layer by layer silicon materials slit, so when holding too much silicon materials, can cause and be positioned at that difform silicon materials wet process (etching and cleaning) effect can't guarantee in the middle of the gaily decorated basket, in addition, because the handle that is arranged on gaily decorated basket top hinders the placement of silicon materials easily, the existing gaily decorated basket holds at most the 20Kg silicon materials usually.In addition, because contaminant particle out and the remaining acid solution of cleaning can not in time be discharged cell body, along with cleaning increasing of basket number, can produce accumulation, cause the silicon materials that come out of low quality, need to do over again and again clean, scavenging period is long, and cleaning yields poorly.And pickling section and washing section are not effectively isolated, and may cause cross pollution, affect the cleaning quality of silicon materials, cause and clean the finished product low qualified.In existing silicon materials wet treatment apparatus, usually just use nitrogen circulation to purge gaily decorated basket surface after cleaning, in order to remove the moisture on the gaily decorated basket and silicon materials surface, but the large quantity of moisture that carry the gaily decorated basket and difform silicon materials inside and bottom can't in time be discharged, and has increased drying time, and production efficiency is low, resource consumption is large, and then cause a large amount of wastes of human resources, natural resources, and improved the cost that cleans, reduced the competitiveness of product on price.
The utility model content
The technical problem that the utility model solves provides a kind of efficient acoustic wave silicon materials wet treatment apparatus, improves the cleaning quality of silicon materials, improves cleaning efficiency and the output of silicon materials, and resource greatly uses manpower and material resources sparingly.
The utility model adopts following technical proposals to solve above-mentioned technical problem:
A kind of efficient acoustic wave silicon materials wet treatment apparatus, comprise at least one nitration mixture groove of setting gradually, at least one water sealed tank, at least one overflow launder and at least one except tank, and be used for holding silicon materials and by transmission mechanism at described nitration mixture groove, water sealed tank, overflow launder with except the gaily decorated basket that transmits between the tank; Described nitration mixture groove, overflow launder and be respectively equipped with the acoustic vibration device except in the tank.
Efficient acoustic wave silicon materials wet treatment apparatus of the present utility model, the acoustic vibration device can make the silicon materials that are positioned at the middle various shapes of the gaily decorated basket also can access sufficient cleaning, and the large quantity of moisture that carries in can be with above-mentioned silicon materials and the gaily decorated basket except tank is fully shaken off, in order to improve drying efficiency and reduce drying time, improve efficient, the Quality and yield of the wet process of silicon material, greatly saved human and material resources.
The top, cell body middle part of described water sealed tank is provided with the partition door-plate, the both sides of described partition door-plate are respectively equipped with first station adjacent with described nitration mixture groove and second station adjacent with described overflow launder, the bottom land of described water sealed tank is provided with the guide rail that connects described the first station and the second station, the described gaily decorated basket under air cylinder driven along described guide rail movement.
Described acoustic vibration device comprises, is suspended in the corresponding cell body to be used for placing the carriage of the gaily decorated basket, is connected to corresponding cell wall and the connector between the carriage, and the acoustic vibration motor that links to each other to drive described carriage vertical vibration with described connector.
The frequency of described acoustic vibration motor is 5-20000HZ, and amplitude is 1-20mm.
Described carriage is L shaped.
The cell wall of described water sealed tank is provided with position sensor.
The bottom land of described water sealed tank is provided with at least one leakage fluid dram, and the leakage fluid dram of described water sealed tank comprises overflow leakage fluid dram and/or manual leakage fluid dram.
Described overflow launder is at least two rank overflow launders, and it comprises hot water storgae and at least one ultrasonic tank that sets gradually, and is respectively equipped with the acoustic vibration device in described hot water storgae and the ultrasonic tank.
The cell wall of described water sealed tank is provided with at least one inlet, is respectively equipped with at least one leakage fluid dram on the bottom land of described hot water storgae and ultrasonic tank, and the leakage fluid dram of described hot water storgae and ultrasonic tank links to each other with the inlet of described water sealed tank.
Be provided with heater in the described hot water storgae, the fluid temperature in the described hot water storgae is 75-80 ℃.
The bottom land of described ultrasonic tank and/or cell wall are provided with the ultrasonic vibrator that links to each other with ultrasonic generator, and the frequency of described ultrasonic vibrator is 28-40KHZ.
The cell wall of described nitration mixture groove is provided with at least two inlets, and the inlet of described nitration mixture groove comprises HF inlet and HCl inlet.
The cell wall of described nitration mixture groove is provided with liquid level sensor.
Be provided with cooling coil in the cell body of described nitration mixture groove, the fluid temperature in the described nitration mixture groove＜25 ℃.
The described gaily decorated basket has the handle that is arranged on gaily decorated basket side.
Efficient acoustic wave silicon materials wet treatment apparatus of the present utility model, thoroughly clean the particle on silicon materials surface and the remaining acid solution in the acid cleaning process by overflow launder, and the partition door-plate is set so that pickling section and washing section are isolated above the middle part of the water sealed tank cell body between nitration mixture groove and the overflow launder, avoided cross pollution, the acoustic vibration device that is arranged in each cell body can make the difform silicon materials that are positioned at gaily decorated basket centre obtain sufficient etching and cleaning, and the large quantity of moisture that carries in can be with silicon materials and the gaily decorated basket except in the tank is fully shaken off in order to improve drying effect, improved the silicon materials cleaning quality, improve cleaning efficiency and output, greatly saved human and material resources.
Description of drawings
Fig. 1 is the structural representation of efficient acoustic wave silicon materials wet treatment apparatus of the present utility model;
Fig. 2 is the side view of the nitration mixture groove of efficient acoustic wave silicon materials wet treatment apparatus of the present utility model;
Fig. 3 is the water sealed tank and the schematic diagram that cuts off door-plate of efficient acoustic wave silicon materials wet treatment apparatus of the present utility model;
Fig. 4 is the side view of the water sealed tank of efficient acoustic wave silicon materials wet treatment apparatus of the present utility model;
Fig. 5 is the top view of the water sealed tank of efficient acoustic wave silicon materials wet treatment apparatus of the present utility model;
Fig. 6 is the side view of three rank overflow launders of efficient acoustic wave silicon materials wet treatment apparatus of the present utility model;
Fig. 7 is the side view of the ultrasonic tank of efficient acoustic wave silicon materials wet treatment apparatus of the present utility model;
Fig. 8 is the side view of the acoustic vibration device of efficient acoustic wave silicon materials wet treatment apparatus of the present utility model;
Fig. 9 is the side view of the gaily decorated basket of efficient acoustic wave silicon materials wet treatment apparatus of the present utility model.
The specific embodiment
Provide the specific embodiment of the present utility model below in conjunction with accompanying drawing, to describe the technical solution of the utility model in detail.
As shown in Figure 1, efficient acoustic wave silicon materials wet treatment apparatus of the present utility model comprises at least one nitration mixture groove 1 of setting gradually, at least one water sealed tank 2, at least one overflow launder 3 and at least one except tank 6, and be used for holding silicon materials and by transmission mechanism for example the manipulator (not shown) at nitration mixture groove 1, water sealed tank 2, overflow launder 3 with except the gaily decorated basket 4 of transmission between the tank 6.Wherein, nitration mixture groove 1, overflow launder 3 and be respectively equipped with acoustic vibration device (see figure 8) except in the tank 6.
As shown in Figure 8, the acoustic vibration device comprises in the cell body that is suspended in correspondence to be used for placing the carriage 71 of the gaily decorated basket 4, be connected to corresponding cell wall and the connector 72 between the carriage 71, and link to each other with the acoustic vibration motor 73 of driven bracket 71 vertical vibrations with connector 72.Wherein, carriage can for shown in Figure 8 L shaped, also can have other arbitrary shape that is suitable for placing the gaily decorated basket.Usually, the vibration frequency of acoustic vibration motor is 5-20000HZ, amplitude is 1-20mm, the vibrating effect that different frequency and amplitude produce is enough to the various sizes contaminant particle more than the 10 μ m in the silicon materials is fully cleaned up, greatly improve the cleaning performance of silicon materials, and can save Vltrasonic device expense required in the cleaning process.
Owing to be provided with the acoustic vibration device in the cell body of nitration mixture groove 1 and overflow launder 3, even also can be cleaned fully in vibration and the movement that intersects so be arranged in the silicon materials of gaily decorated basket centre, and wet treatment apparatus of the present utility model preferably adopts handle 41 to be arranged on the gaily decorated basket (as shown in Figure 9) of side, because the acoustic vibration device helps more effective wet process, the silicon materials that this gaily decorated basket holds at every turn can reach more than the 50Kg, have greatly improved cleaning efficiency and output.For example, if adopt the gaily decorated basket that can hold the 30Kg silicon materials, the cleaning output of the utility model wet treatment apparatus can reach more than the 300kg/hr, has greatly increased the equipment possession value (COO) of End-Customer.In addition, after the cleaning through nitration mixture groove 1, water sealed tank 2, overflow launder 3, the acoustic vibration device that the silicon material gaily decorated basket after cleaning is complete is put into except tank 6 carries out the low-frequency vibration processing, the large quantity of moisture that carries in difform silicon materials and the gaily decorated basket can be shaken off, for the time has been saved in follow-up oven dry, improve production efficiency, reduced resource consumption.
In a specific embodiment of the present utility model, the structure of nitration mixture groove 1 as shown in Figure 2, its cell wall is provided with at least two inlets, for example HF inlet 11 and HCl inlet 12, and by being installed in the liquid level in liquid level sensor 13 control flumes on the cell wall, and then control is used for the acid solution component ratio of mixing.Also be provided with cooling coil 14 in the cell body of nitration mixture groove, around this cooling coil 14 is preferably disposed in the cell body, be used for the mix acid liquor temperature in the nitration mixture groove is controlled at＜25 ℃, guarantee the cleaning performance of mix acid liquor.The bottom land of nitration mixture groove is provided with at least one leakage fluid dram 15, is used for discharging discarded acid solution.
In the nitration mixture groove, HF mixes according to required ratio with HCl and is controlled at proper temperature, then, gripper of manipulator is got the gaily decorated basket that accommodates silicon materials and it is immersed in nitration mixture groove, through about 30 seconds reaction time, clean the pollutants such as metal ion of removing the silicon materials surface, and make the silicon materials surface present hydrophobicity, with convenient follow-up cleaning and oven dry.
In another specific embodiment of the present utility model, such as Fig. 3,4, shown in 5, for avoiding the cross pollution silicon materials, the nitration mixture groove cleaning of equipment leading portion is separated with the overflow launder cleaning of back segment, above the cell body middle part of water sealed tank 2, a PVC is set and cuts off door-plate 5, the both sides that cut off door-plate are respectively equipped with first station 22 adjacent with the nitration mixture groove and second station 23 adjacent with overflow launder, the bottom land of water sealed tank also is provided with the PVC guide rail 24 that connects the first station and the second station, and the gaily decorated basket is moving between the first station and the second station along guide rail 24 under the driving of Rodless cylinder 25.
During cleaning, the manipulator of being responsible for a upper operation is positioned over the first station 22 in the water sealed tank with the gaily decorated basket 4 after the cleaning of nitration mixture groove, the gaily decorated basket is under the rod-free cylinder 25 of cell body both sides drives, PVC guide rail 24 along bottom land moves towards overflow launder 3 directions, until arrive the second station 23, after the position sensor (not shown) on the cell wall is confirmed, be responsible for the robot movement of subsequent processing to this second station crawl gaily decorated basket 4 so that the silicon materials in the basket enter next matting.In addition, when the gaily decorated basket moved towards the overflow launder direction in water sealed tank, Rodless cylinder can be set as back and forth movement twice, rests at last the second station, and purpose is fully to clean micro-acid solution remaining on the silicon materials, can improve the cleaning performance of silicon materials.
In another specific embodiment of the present utility model, overflow launder 3 is at least two rank overflow launders, it comprises that hot water storgae and at least one frequency of setting gradually are the ultrasonic tank of 28-40KHZ, wherein, be respectively equipped with the acoustic vibration device in nitration mixture groove, hot water storgae and the ultrasonic tank, in order to the silicon materials after the pickling are carried out abundant wet process.In embodiment as shown in Figure 6, three rank overflow launders 3 comprise hot water storgae 31, high frequency ultrasound tank 32 and the low frequency ultrasound tank 33 that sets gradually, and the gaily decorated basket immerses successively hot water storgae, high frequency ultrasound tank and low frequency ultrasound tank by the transmission of manipulator and cleans.The cell wall of hot water storgae 31 is provided with at least one inlet 34, the heater 35 of the deionized water that enters thus in being located at hot water storgae heats and maintains 75-80 ℃, with Effective Raise silicon materials surface temperature, be conducive to improve on the one hand cleaning performance like this, shorten scavenging period; Also be conducive to improve on the other hand drying effect, shorten drying time.Deionized water through heating flows into high frequency ultrasound tank 32 and low frequency ultrasound tank 33 successively, be respectively equipped with ultrasonic vibrator 36,37 on the bottom land of high frequency ultrasound tank and low frequency ultrasound tank and/or the cell wall (referring to Fig. 7), described ultrasonic vibrator links to each other with the ultrasonic generator (not shown) respectively.The frequency of the ultrasonic vibrator 36 of high frequency ultrasound tank is 40KHZ, thereby utilize high-frequency ultrasonic that irregular silicon materials are cleaned, its penetration power is stronger, the slit on silicon materials capable of washing surface, aperture etc., the particle that main cleaning is weak with silicon materials surface conjunction power; The frequency of the ultrasonic vibrator 37 of low frequency ultrasound tank is 28KHZ, thereby utilizes low-frequency ultrasonic waves that irregular silicon materials are cleaned, and it is high to the pure water extent of cavitation in the groove, the particle that main cleaning is high with the silicon materials surface bonding strength.By the cleaning of overflow launder, both can effectively remove the particle on silicon materials surface, can fully clean again a small amount of remaining acid solution of silicon materials in acid cleaning process, the silicon materials quality after the cleaning is high, directly drying and packaging.
In addition, be respectively equipped with at least one leakage fluid dram 38 on the bottom land of hot water storgae, high frequency ultrasound tank and low frequency ultrasound tank, be used for discharging discarded deionized water, this leakage fluid dram 38 also can link to each other with the inlet (not shown) on the cell wall of being located at water sealed tank, so, then the water inlet of water sealed tank be the overflow water of three rank overflow launders in the later process as the source, the to the full extent use of conserve water, and finally by overflow leakage fluid dram 26 dischargings of being located at the water sealed tank bottom land.Preferably, the bottom land of water sealed tank is provided with manual leakage fluid dram 27 in addition, can manually carry out the discharge opeing operation.
More than although the specific embodiment of the present utility model has been described, it will be understood by those of skill in the art that these only illustrate, protection domain of the present utility model is limited by appended claims.Those skilled in the art can make various changes or modifications to these embodiments under the prerequisite that does not deviate from principle of the present utility model and essence, but these changes and modification all fall into protection domain of the present utility model.
Claims (15)
1. efficient acoustic wave silicon materials wet treatment apparatus, it is characterized in that, comprise at least one nitration mixture groove of setting gradually, at least one water sealed tank, at least one overflow launder and at least one except tank, and be used for holding silicon materials and by transmission mechanism at described nitration mixture groove, water sealed tank, overflow launder with except the gaily decorated basket that transmits between the tank; Described nitration mixture groove, overflow launder and be respectively equipped with the acoustic vibration device except in the tank.
2. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 1, it is characterized in that, the top, cell body middle part of described water sealed tank is provided with the partition door-plate, the both sides of described partition door-plate are respectively equipped with first station adjacent with described nitration mixture groove and second station adjacent with described overflow launder, the bottom land of described water sealed tank is provided with the guide rail that connects described the first station and the second station, the described gaily decorated basket under air cylinder driven along described guide rail movement.
3. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 1 or 2, it is characterized in that, described acoustic vibration device comprises, be suspended in the corresponding cell body to be used for placing the carriage of the gaily decorated basket, be connected to corresponding cell wall and the connector between the carriage, and the acoustic vibration motor that links to each other to drive described carriage vertical vibration with described connector.
4. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 3 is characterized in that, the frequency of described acoustic vibration motor is 5-20000HZ, and amplitude is 1-20mm.
5. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 3 is characterized in that, described carriage is L shaped.
6. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 1 or 2 is characterized in that the cell wall of described water sealed tank is provided with position sensor.
7. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 1 or 2 is characterized in that the bottom land of described water sealed tank is provided with at least one leakage fluid dram, and the leakage fluid dram of described water sealed tank comprises overflow leakage fluid dram and/or manual leakage fluid dram.
8. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 1 or 2, it is characterized in that, described overflow launder is at least two rank overflow launders, and it comprises hot water storgae and at least one ultrasonic tank that sets gradually, and is respectively equipped with the acoustic vibration device in described hot water storgae and the ultrasonic tank.
9. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 8, it is characterized in that, the cell wall of described water sealed tank is provided with at least one inlet, be respectively equipped with at least one leakage fluid dram on the bottom land of described hot water storgae and ultrasonic tank, the leakage fluid dram of described hot water storgae and ultrasonic tank links to each other with the inlet of described water sealed tank.
10. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 8 is characterized in that, is provided with heater in the described hot water storgae, and the fluid temperature in the described hot water storgae is 75-80 ℃.
11. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 8 is characterized in that the bottom land of described ultrasonic tank and/or cell wall are provided with the ultrasonic vibrator that links to each other with ultrasonic generator, the frequency of described ultrasonic vibrator is 28-40KHZ.
12. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 1 or 2 is characterized in that the cell wall of described nitration mixture groove is provided with at least two inlets, the inlet of described nitration mixture groove comprises HF inlet and HCl inlet.
13. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 1 or 2 is characterized in that the cell wall of described nitration mixture groove is provided with liquid level sensor.
14. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 1 or 2 is characterized in that, is provided with cooling coil in the cell body of described nitration mixture groove, the fluid temperature in the described nitration mixture groove＜25 ℃.
15. efficient acoustic wave silicon materials wet treatment apparatus as claimed in claim 1 or 2 is characterized in that the described gaily decorated basket has the handle that is arranged on gaily decorated basket side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220276953 CN202752271U (en) | 2012-06-12 | 2012-06-12 | High-efficiency sound wave wet treatment device for silicon materials |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220276953 CN202752271U (en) | 2012-06-12 | 2012-06-12 | High-efficiency sound wave wet treatment device for silicon materials |
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| CN202752271U true CN202752271U (en) | 2013-02-27 |
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| CN 201220276953 Expired - Fee Related CN202752271U (en) | 2012-06-12 | 2012-06-12 | High-efficiency sound wave wet treatment device for silicon materials |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110313265A (en) * | 2019-06-26 | 2019-10-11 | 石河子农业科学研究院 | Cotton-seed ginning equipment suitable for a small amount of more parts of test materials |
| CN111744879A (en) * | 2020-06-24 | 2020-10-09 | 常州光晶光电科技有限公司 | Piezoelectric quartz sensor white piece processing equipment and process thereof |
| CN112157055A (en) * | 2020-08-20 | 2021-01-01 | 洛阳中硅高科技有限公司 | Cleaning treatment method, acid temperature control apparatus, and cleaning treatment apparatus |
-
2012
- 2012-06-12 CN CN 201220276953 patent/CN202752271U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110313265A (en) * | 2019-06-26 | 2019-10-11 | 石河子农业科学研究院 | Cotton-seed ginning equipment suitable for a small amount of more parts of test materials |
| CN110313265B (en) * | 2019-06-26 | 2023-12-22 | 石河子农业科学研究院 | Cotton seed delinting equipment suitable for small quantity of multiple test materials |
| CN111744879A (en) * | 2020-06-24 | 2020-10-09 | 常州光晶光电科技有限公司 | Piezoelectric quartz sensor white piece processing equipment and process thereof |
| CN112157055A (en) * | 2020-08-20 | 2021-01-01 | 洛阳中硅高科技有限公司 | Cleaning treatment method, acid temperature control apparatus, and cleaning treatment apparatus |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130227 Termination date: 20170612 |
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| CF01 | Termination of patent right due to non-payment of annual fee |