CN202568329U - Repairing device for cerebrospinal rhinorrhea with transnasal approach - Google Patents
Repairing device for cerebrospinal rhinorrhea with transnasal approach Download PDFInfo
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- CN202568329U CN202568329U CN 201220112628 CN201220112628U CN202568329U CN 202568329 U CN202568329 U CN 202568329U CN 201220112628 CN201220112628 CN 201220112628 CN 201220112628 U CN201220112628 U CN 201220112628U CN 202568329 U CN202568329 U CN 202568329U
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- patch
- sticking patch
- inner catheter
- repairing device
- transnasal approach
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Abstract
The utility model provides a repairing device for cerebrospinal rhinorrhea with transnasal approach, which comprises a patch group, an outer cannula and an inner catheter; the patch group comprises a patch, a small handle and a guide wire, wherein the patch is an umbrella-shaped body which can be gathered and spread, the position of the umbrella tip of the patch is connected with one end of the small handle, and the other end of the small handle is connected with the guide wire; and the patch group can be placed into one end of the outer cannula after the patch is gathered, the other end of the outer cannula is sleeved with the inner catheter which can be moved, and the guide wire penetrates through the outer cannula and the inner catheter. Furthermore, the patch is an artificial duramater. The repairing device for the cerebrospinal rhinorrhea with transnasal approach has the beneficial effects that because of adopting the technical scheme, the operation difficulty can be lowered, the operation time is shortened, and the success rate of operation is enhanced; because muscle fat tissues do not need to be filled any longer or little muscle fat tissues are filled, the injury and the pain of a patient can be farthest relieved; the repairing device for the cerebrospinal rhinorrhea with transnasal approach can be used for patients with better exposure of a leaking opening, larger breakage of a duramater and higher intracranial pressure; the operation is more convenient; and the repairing device for the cerebrospinal rhinorrhea with transnasal approach has the advantages of simple structure and the like.
Description
Technical field
This utility model belongs to the armarium technical field, especially relates to a kind of transnasal approach cerebrospinal rhinorrhea patcher.
Background technology
Cerebrospinal rhinorrhea is a department of otorhinolaryngology, the neurosurgery commonly encountered diseases.The cause of disease is divided into traumatic and spontaneous, is mostly due to wound or the reason such as iatrogenic.Clinical manifestation: patient's clinostatism; Stand when bowing or occur one-sided firmly the time or the bilateral nasal cavity is interrupted or flows out clear water appearance secretions continuously, the gauze test is positive, and getting secretions, to do the visible sugared content of cerebrospinal fluid biochemical analysis higher; Thereby get rid of for the nasal cavity normal secretion, turn out to be cerebrospinal fluid.Cause the intracranial retrograde infection easily, intracranial pressure is on the low side to wait severe complication.
Therapeutic Method in existing technology is: the first step, and expectant treatment: low salt diet, prevent flu, controlling blood pressure, strict bed rest 1-2 month, prohibit blowing the nose, the filling nasal cavity firmly, needs free movement of the bowels.Second step, operative treatment: invalid through expectant treatment 1-2 month, need operative treatment.Prepare before the art: need the row waist to wear, survey cranium and press, get intracranial infection except the capable biochemical analysis of cerebrospinal fluid, inject contrast agent, row ventriculography, cranium are pressed and need be gone waist Da Chi drain when high.Through ventriculography, confirm the damaged position of basis cranii sclerotin.Common cerebrospinal rhinorrhea oral area position is positioned at sieve top, sphenoid sinus roof or sidewall, sinus frontalis rear wall etc.Method for repairing and mending: remove leak broken sclerotin on every side, mucosa reaches the intracranial tissue that most of hernia goes out, complete exposure leak.Stomach fat or the temples fascia and the muscular tissue etc. of gathering before the filling art in the leak.Biogum such as reuse EC ear brain glue and gelfoam etc. are fixing, at last with iodoform gauze, and filling such as expansion sponge nasal cavity.Postoperative continued strict bed rest 0.5-1 month, and preventing cold is avoided firmly.
The technical problem that this operation exists is: 1; The leak location: the anatomical structure of preceding basis cranii own is complicated; Some serious fracture of skull base patient has lost normal anatomic landmark; Often broken sclerotin and mucosa push overlapping layer by layer, are difficult in the art reply fully, therefore are difficult to remove fully the accurate leak of exposure position.2, waddings such as filling muscle fat: same because preceding basis cranii anatomical structure is complicated, every patient is because of growing, and anatomical variation and damage situations are different; The size that leak can expose, the orientation, angle has nothing in common with each other; Often have the dead angle under the intranasal mirror, the patient uses one-handed performance, and intracranial pressure the higher person can increase the difficulty of filling; Make wadding be difficult for arriving assigned address, be difficult to fix, cause and repair failure.
Summary of the invention
The problem that this utility model will solve provides a kind of patcher, especially is fit to a kind of transnasal approach cerebrospinal rhinorrhea patcher.
For solving the problems of the technologies described above, the technical scheme that this utility model adopts is: a kind of transnasal approach cerebrospinal rhinorrhea patcher comprises sticking patch group, trocar sheath and inner catheter; Said sticking patch group comprises sticking patch, stalklet and seal wire, the fimbriatum of said sticking patch for packing up and strut, and its umbrella tip connects an end of stalklet, and the stalklet other end is connected with seal wire; Said sticking patch group can be inserted after sticking patch is packed up in the end of trocar sheath, and the other end of trocar sheath is with mobilizable inner catheter, and said seal wire passes trocar sheath and inner catheter.
Further, said sticking patch is an artificial dura mater.
Advantage and the good effect that the utlity model has are: owing to adopt technique scheme; Can reduce operating difficulty, shorten operating time, improve success rate of operation; Owing to needn't fill out or clog less the muscle fat tissue again, can alleviate patient's damage and painful to greatest extent; Can be used for leak and expose better, damaged big, the higher patient of intracranial pressure of cerebral dura mater; More convenient to operate; Has advantages of simple structure and simple.
Description of drawings
Fig. 1 is the structural representation of this utility model;
Among the figure:
1, sticking patch 2, stalklet 3, seal wire
4, inner catheter 5, trocar sheath
The specific embodiment
As shown in Figure 1, a kind of transnasal approach cerebrospinal rhinorrhea of this utility model patcher comprises sticking patch group, trocar sheath 5 and inner catheter 4; Said sticking patch group comprises sticking patch 1, stalklet 2 and seal wire 3, the fimbriatum of said sticking patch 1 for packing up and strut, and its umbrella tip connects an end of stalklet 2, and stalklet 2 other ends are connected with seal wire 3; Said sticking patch group can be inserted after sticking patch 1 is packed up in the end of trocar sheath 5, and the other end of trocar sheath 5 is with mobilizable inner catheter 4, and said seal wire 3 passes trocar sheath 5 and inner catheter 4.Further, said sticking patch 1 is an artificial dura mater.
The work process of this instance: when repairing cerebrospinal rhinorrhea, need complete exposure leak equally, use abrasive drilling in case of necessity.The first intracranial tissue of also receiving, an end of this utility model sticking patch group is deep from nasal cavity, the through damaged leak of basis cranii position; Eject and open the sticking patch group with inner catheter 4, said sticking patch 1 is an artificial dura mater, after the sticking patch group is opened; The position of regulating sticking patch 1 through stalklet 2 with trocar sheath 5 guarantees that the sticking patch 1 and the position of leak concern that traction seal wire 3 makes sticking patch 1 contact fully with meninges; Keep trocar sheath 5 motionless fixedly sticking patch 1, extract inner catheter 4 out, inject biogums such as EC ear brain glue through trocar sheath 5; Sticking patch 1 is completely fixed, repeats one deck in case of necessity again.The outer reuse gelfoam of leak, iodoform gauze filling etc.Sticking patch 1 concave surface is placed on leak, can be supported cranium and press, prevent that cerebrospinal fluid from flowing out.Said stalklet 2 is convenient to adjust the position of sticking patch 1, and said seal wire 3 can play the effect of fixing sticking patch 1 and meninges comprehensive engagement.Said sticking patch 1 is an artificial dura mater.This method also can be used for socket of the eye inwall fracture, the repairing of oroantral fistula etc.
Artificial dura mater: be to use multiple bioprotein made, have certain elasticity and toughness intensity, be widely used in neurosurgery, can be good at substituting the cerebral dura mater tissue.Some artificial dura mater does not need to sew up.
More than the embodiment of this utility model is specified, but said content is merely the preferred embodiment of this utility model, can not be considered to be used to limit the practical range of this utility model.All equalizations of doing according to this utility model application range change and improve etc., all should still belong within the patent covering scope of this utility model.
Claims (2)
1. a transnasal approach cerebrospinal rhinorrhea patcher is characterized in that: comprise sticking patch group, trocar sheath and inner catheter; Said sticking patch group comprises sticking patch, stalklet and seal wire, the fimbriatum of said sticking patch for packing up and strut, and its umbrella tip connects an end of stalklet, and the stalklet other end is connected with seal wire; Said sticking patch group can be inserted after sticking patch is packed up in the end of trocar sheath, and the other end of trocar sheath is with mobilizable inner catheter, and said seal wire passes trocar sheath and inner catheter.
2. a kind of transnasal approach cerebrospinal rhinorrhea patcher according to claim 1, it is characterized in that: said sticking patch is an artificial dura mater.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN 201220112628 CN202568329U (en) | 2012-08-10 | 2012-08-10 | Repairing device for cerebrospinal rhinorrhea with transnasal approach |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN 201220112628 CN202568329U (en) | 2012-08-10 | 2012-08-10 | Repairing device for cerebrospinal rhinorrhea with transnasal approach |
Publications (1)
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CN202568329U true CN202568329U (en) | 2012-12-05 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN 201220112628 Expired - Fee Related CN202568329U (en) | 2012-08-10 | 2012-08-10 | Repairing device for cerebrospinal rhinorrhea with transnasal approach |
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CN (1) | CN202568329U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106510896A (en) * | 2016-12-06 | 2017-03-22 | 王晓松 | Artificial cerebral dura mater |
CN107510481A (en) * | 2017-09-18 | 2017-12-26 | 广州派若弥医疗器械有限公司 | Skull base defects block repair apparatus |
-
2012
- 2012-08-10 CN CN 201220112628 patent/CN202568329U/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106510896A (en) * | 2016-12-06 | 2017-03-22 | 王晓松 | Artificial cerebral dura mater |
CN107510481A (en) * | 2017-09-18 | 2017-12-26 | 广州派若弥医疗器械有限公司 | Skull base defects block repair apparatus |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121205 Termination date: 20150810 |
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EXPY | Termination of patent right or utility model |