CN202542965U - Treatment device for cleaning waste system and corrosion waste system in photocell production and comprehensive treatment device of waste system - Google Patents
Treatment device for cleaning waste system and corrosion waste system in photocell production and comprehensive treatment device of waste system Download PDFInfo
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- CN202542965U CN202542965U CN2011204408416U CN201120440841U CN202542965U CN 202542965 U CN202542965 U CN 202542965U CN 2011204408416 U CN2011204408416 U CN 2011204408416U CN 201120440841 U CN201120440841 U CN 201120440841U CN 202542965 U CN202542965 U CN 202542965U
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Abstract
The utility model relates to a treatment device for cleaning a waste system and a corrosion waste system in photocell production and a comprehensive treatment device of the waste system. The treatment device for cleaning the waste system in the photocell production mainly comprises separation equipment and electrodialysis equipment, wherein the separation equipment is used for separating solid impurity in the waste system, and the electrodialysis equipment is communicated with a fluid of the separation equipment. The treatment device has the advantages that a working solution used in photocell production can be recycled, consumption of a large amount of raw materials is eliminated, a large amount of polluted sewage is prevented from being generated, and a poisonous waste gas is prevented from being released. By using the treatment device disclosed by the utility model, the raw materials are saved, and the treatment device is favorable for protecting environment.
Description
Technical field
The utility model relates to the treatment unit of waste systems, specifically, relates to and cleaning in the sensitive cell production and the treatment unit of corrosion waste systems and the Integrated Processing Unit of waste systems.
Background technology
Need carry out burn into to wafer in the wet production line in sensitive cell production and carve operations such as suede, acid cleaning and water cleaning.The staple of wafer is silicon (Si), can produce a large amount of refuses after the long-time processing, and possibly contain toxic gas.For example using HNO
3Carry out in the corrosion process with HF mixing acid system, because reaction below taking place:
HNO
3+3Si--＞3SiO
2+4NO↑+2H
2O
SiO
2+6HF--＞H
2SiF
6+2H
2O
Produce and promptly produce NO after NO gas runs into air
2Gas.
What the meeting generation was a large amount of in matting is the waste systems of staple with water; Discharge after generally the cleaning waste systems of gained being handled emission standard in the existing sensitive cell production process; And it is not recycled, caused the waste of water resources like this.
If they are not handled, both can cause the pollution of environment, increase burden to environmental improvement, can cause the huge waste of raw material again.From the angle of economy and environmental protection, all hope the waste systems that produces handled making raw material be fully used.
One Chinese patent application 201010577683.9 discloses a kind of corrosion wastewater treatment and treatment facility of silicon wafer; The wastewater treatment method and the treatment unit of having been discharged when specifically disclosing with aqueous sodium hydroxide solution etch silicon wafer comprise in this etching waste water and to add acid and separate out silicon-dioxide and silicon-dioxide is carried out solid-liquid separation.
One Chinese patent application 201010286071.4 discloses a kind of photovoltaic light-cells production wastewater treatment technology; Wherein need carry out pH regulator through adding strong acid or highly basic; Then treatment solution is carried out defluorination and/or removes COD (chemical oxygen demand) step, the waste water that will reach emission standard effluxes.
More than in two patent documentations disclosed treatment process all need use new chemical substance.
Hope to have a kind of treatment unit, can handle the waste systems that produces in the sensitive cell processing, thereby make raw material be fully used, and help environment protection.
The utility model content
The utility model technical problem to be solved provides the treatment unit of the waste systems that produces in a kind of sensitive cell production, so that various resource is fully used.
The utility model technical problem to be solved can solve through following technical scheme:
An aspect of the utility model provides the treatment unit that cleans waste systems in a kind of sensitive cell production, and corrosion of silicon produces said cleaning waste systems through cleaning, it is characterized in that, said treatment unit comprises:
Be used for separating the separating device of the solid impurity of waste systems; With
Electrodialysis appts with said separating device fluid communication.
In one embodiment, said treatment unit also comprises reverse osmosis equipment, and said reverse osmosis equipment and said electrodialysis appts fluid communication are to be further purified the aqueous systems through said electrodialysis appts purifying.
In one embodiment, said treatment unit also comprises respectively the intermediate water tank with said separating device, said electrodialysis appts and said reverse osmosis equipment fluid communication; Wherein said separating device and said reverse osmosis equipment are via said intermediate water tank and said electrodialysis appts fluid communication.
In one embodiment; Said treatment unit also comprises and is used for cleaning equipment that corrosion of silicon is cleaned, said cleaning equipment and said separating device fluid communication with carry to said separating device waste systems and with said electrodialysis appts fluid communication to receive the water after handling.
In one embodiment; Said treatment unit also comprises and is used for cleaning equipment that corrosion of silicon is cleaned, said cleaning equipment and said separating device fluid communication with carry to said separating device waste systems and with said reverse osmosis equipment fluid communication to receive the water after handling.
In one embodiment, said reverse osmosis equipment is through being provided with water outlet and the said cleaning equipment fluid communication on it.
In some embodiments, said intermediate water tank is made up of dense water tank and fresh-water tank, is provided with the unidirectional riser that flows to said dense water tank for liquid from said fresh-water tank between dense water tank and the fresh-water tank.
In one embodiment; Said electrodialysis appts comprises first electrodialysis cell, second electrodialysis cell and the 3rd electrodialysis cell that is arranged in order; Each electrodialysis cell comprises a dense hydroecium and a freshwater room; The dense hydroecium fluid communication of the dense hydroecium of the 3rd electrodialysis cell and second electrodialysis cell wherein; The dense hydroecium of second electrodialysis cell and the freshwater room fluid communication of first electrodialysis cell, the freshwater room fluid communication of the freshwater room of first electrodialysis cell and second electrodialysis cell, the freshwater room fluid communication of the freshwater room of second electrodialysis cell and the 3rd electrodialysis cell.
In one embodiment, the dense hydroecium fluid communication of the dense hydroecium of said intermediate water tank and the 3rd electrodialysis cell.
The treatment unit that cleaning waste systems in a kind of sensitive cell production also is provided on the one hand of the utility model, corrosion of silicon produces said cleaning waste systems through cleaning, it is characterized in that, and said treatment unit comprises:
Be used for separating the separating device of the solid impurity of waste systems; With
Reverse osmosis equipment with said separating device fluid communication.
In one embodiment, said treatment unit also comprises electrodialysis appts, and said electrodialysis appts and said reverse osmosis equipment fluid communication are to be further purified the aqueous systems through said reverse osmosis equipment purifying.
In one embodiment; Said electrodialysis appts comprises first electrodialysis cell, second electrodialysis cell and the 3rd electrodialysis cell that is arranged in order; Each electrodialysis cell comprises a dense hydroecium and a freshwater room; The dense hydroecium fluid communication of the dense hydroecium of the 3rd electrodialysis cell and second electrodialysis cell wherein; The dense hydroecium of second electrodialysis cell and the freshwater room fluid communication of first electrodialysis cell, the freshwater room fluid communication of the freshwater room of first electrodialysis cell and second electrodialysis cell, the freshwater room fluid communication of the freshwater room of second electrodialysis cell and the 3rd electrodialysis cell.
The Integrated Processing Unit that waste systems in a kind of sensitive cell production also is provided on the one hand of the utility model is characterized in that, comprising:
Be used to carry out the etching apparatus of silicon slice corrosion; Be used to carry out the cleaning equipment that silicon chip water cleans; Respectively with first separating device and the electrodialysis appts of said etching apparatus fluid communication; Respectively with second separating device and the reverse osmosis equipment of said cleaning equipment fluid communication;
Wherein said first separating device, second separating device, said reverse osmosis equipment also with said electrodialysis appts fluid communication.
Said electrodialysis appts can be one-level or more multistage electrodialysis appts.
In some embodiments, said first separating device is a centrifugal separation equipment.In some embodiments, said second separating device is a centrifugal separation equipment.
In some embodiments, said first separating device is a straining installation.In some embodiments, said second separating device is a straining installation.
In some embodiments, said Integrated Processing Unit comprises also respectively and the intermediate water tank of said second separating device, said electrodialysis appts and said reverse osmosis equipment fluid communication that said intermediate water tank is made up of fresh-water tank and dense water tank; Wherein said second separating device and said reverse osmosis equipment are via said intermediate water tank and said electrodialysis appts fluid communication.
In some embodiments, said Integrated Processing Unit also comprises the gas recovery unit with said etching apparatus fluid communication.
In some embodiments, said Integrated Processing Unit also comprises condensing equipment and storage facilities, and wherein said etching apparatus is via said condensing equipment and said gas recovery unit fluid communication; Said storage facilities and said condensing equipment fluid communication be used for receiving from the liquid of condensing equipment and with said etching apparatus fluid communication.
In some embodiments, in the said electrodialysis appts with the dividing plate of band circular hole or square hole fixedly positively charged ion and anionic membrane.
In some embodiments; Said electrodialysis appts comprises a plurality of electrodialysis cell; Each electrodialysis appts has a dense hydroecium and a freshwater room; Dense hydroecium import of said etching apparatus and one of them electrodialysis cell and outlet fluid communication, said reverse osmosis equipment exports with the freshwater room of another electrodialysis cell and dense hydroecium inlet fluid communicates.
In some embodiments; Said electrodialysis appts comprises first electrodialysis cell, second electrodialysis cell and the 3rd electrodialysis cell; Wherein first electrodialysis cell and said etching apparatus fluid communication; The 3rd electrodialysis cell and said reverse osmosis equipment fluid communication, the dense hydroecium fluid communication of the dense hydroecium of the 3rd electrodialysis cell and second electrodialysis cell, the dense hydroecium of second electrodialysis cell and the first electrodialysis cell freshwater room fluid communication; The freshwater room fluid communication of the freshwater room of first electrodialysis cell and second electrodialysis cell, the freshwater room fluid communication of the freshwater room of second electrodialysis cell and the 3rd electrodialysis cell.
In some embodiments, said gas recovery unit and said electrodialysis appts fluid communication.
In one embodiment, the Integrated Processing Unit of waste systems in a kind of sensitive cell production is provided, it is characterized in that, comprising:
Be used for silicon chip is carried out the corrosive etching apparatus; Be used for cleaning equipment that corrosion of silicon is cleaned; Respectively with condensing equipment, storage facilities, first separating device and the electrodialysis appts of said etching apparatus fluid communication; Respectively with second separating device and the reverse osmosis equipment of said cleaning equipment fluid communication; Respectively with the gas recovery unit of said condensing equipment and said electrodialysis appts fluid communication;
Wherein said condensing equipment also with said storage facilities fluid communication, said first separating device, second separating device, said reverse osmosis equipment also with said electrodialysis appts fluid communication.
In one embodiment, the Integrated Processing Unit of waste systems is characterized in that during a kind of sensitive cell was produced, and comprising:
Be used for silicon chip is carried out the corrosive etching apparatus; Be used for cleaning equipment that corrosion of silicon is cleaned; Respectively with condensing equipment, storage facilities, first separating device and the electrodialysis appts of said etching apparatus fluid communication; Respectively with second separating device and the reverse osmosis equipment of said cleaning equipment fluid communication; Respectively with the gas recovery unit of said condensing equipment and said electrodialysis appts fluid communication; Respectively with the intermediate water tank of said second separating device, said electrodialysis appts and said reverse osmosis equipment fluid communication;
Wherein said condensing equipment also with said storage facilities fluid communication, said first separating device also with said electrodialysis appts fluid communication.
In a specific embodiments, said etching apparatus is provided with first inlet, second inlet, first outlet and second outlet; Said cleaning equipment is provided with the 3rd inlet and the 3rd outlet; Said condensing equipment is provided with the 4th inlet, the 5th inlet, the 4th outlet and the 5th outlet; Said storage facilities is provided with the 6th inlet, the 6th outlet and the 7th outlet; Said first separating device is provided with the 7th inlet and the 8th outlet; Said electrodialysis appts is provided with the 8th inlet, the 9th inlet, the tenth inlet, the 9th outlet, the tenth outlet and the 11 outlet; Said second separating device is provided with the 11 inlet and the 12 outlet; Said reverse osmosis equipment is provided with the 12 inlet, the 13 outlet and the 14 outlet; Said gas recovery unit is provided with the 13 inlet, the 14 inlet, the 15 outlet and the 16 outlet; Said intermediate water tank is provided with the 15 inlet, the 16 inlet, the 17 inlet and the 17 outlet and the 18 outlet; Wherein first inlet is through first pump, first valve and pipeline and the 9th outlet fluid communication; Second inlet is through second pump, second valve and pipeline and the 7th outlet fluid communication; The 3rd inlet is through the 3rd pump, the 3rd valve and pipeline and the 14 outlet fluid communication; The 4th inlet is through the 4th valve and the pipeline and the second outlet fluid communication; The 5th inlet is through the 4th pump, the 5th valve and pipeline and the 6th outlet fluid communication; The 6th inlet is through the 5th pump, the 6th valve and pipeline and the 4th outlet fluid communication; The 7th inlet is through the 6th pump, the 7th valve and pipeline and the first outlet fluid communication; The 8th inlet is through the 7th pump, the 8th valve and pipeline and the 8th outlet fluid communication; The 9th inlet is through the 8th pump, the 9th valve and pipeline and the 15 outlet fluid communication; The tenth inlet is through the 9th pump, the tenth valve and pipeline and the 18 outlet fluid communication; The 11 inlet is through the tenth pump, the 11 valve and pipeline and the 3rd outlet fluid communication; The 12 inlet is through the 11 pump, the 12 valve and pipeline and the 17 outlet fluid communication; The 13 inlet is through the 13 valve and pipeline and the 5th outlet fluid communication; The 14 inlet is through the 12 pump, the 14 valve and pipeline and the tenth outlet fluid communication; The 15 inlet is through the 13 pump, the 15 valve and pipeline and the 12 outlet fluid communication; The 16 inlet is through the 14 pump, the 16 valve and pipeline and the 13 outlet fluid communication; The 17 inlet is through the 15 pump, the 17 valve and pipeline and the 11 outlet fluid communication; The 16 outlet communicates with the 8th valve flow body.
Said in some embodiments electrodialysis is undertaken by multistage electrodialysis appts.
The treatment unit that corrosion waste systems in a kind of sensitive cell production also is provided on the one hand of the utility model, said corrosion waste systems produces through with corrosive fluid silicon chip being corroded, and it is characterized in that, and said treatment unit comprises:
Be used for silicon chip is carried out the corrosive etching apparatus; With
Separating device and electrodialysis appts with said etching apparatus fluid communication.
In some embodiments, said treatment unit also comprises the gas recovery unit with said etching apparatus fluid communication.
In some embodiments, said treatment unit also comprises condensing equipment and storage facilities, and wherein said etching apparatus is via said condensing equipment and said gas recovery unit fluid communication; Said storage facilities and said condensing equipment fluid communication be used for receiving from the liquid of condensing equipment and with said etching apparatus fluid communication.
In some embodiments, said gas recovery unit and said electrodialysis appts fluid communication absorb the gas in the gas recovery unit from said electrodialysis appts, to extract water.
In sensitive cell was produced, the corrosive fluid of use had HF and HNO
3Mixing acid, KOH alkali lye or HF and HCl mixing acid.
At HF and HNO
3When mixing acid corrodes, can produce and comprise waste systems, it comprises by NO
2, HF, steam and air is formed waste gas and by HF, HNO
3, H
2SiF
6, the waste liquid formed of silicon and water, wherein NO
2React and produce by the oxygen in NO and corrosion or the treatment facility.
When using KOH alkali lye to corrode, because reaction below taking place:
KOH+Si--＞K
2SiO
3+H
2↑
Can produce and comprise KOH, H
2O, K
2SiO
3And H
2Waste systems.
When the mixing acid system of using HF and HCl is corroded, heavy metal ion mainly takes place reacted by bonded, form CuCl
2, KCl, FeCl
3, H
2The waste systems of O, HF and HCl etc.
The advantage of the utility model treatment unit is that the work fluid power that uses in feasible corrosion and the cleaning process obtains recycle, thereby eliminates a large amount of consumptions of raw materials, has avoided the generation of a large amount of pollutant effluents and the release of poisonous fume.Use the utility model device both to practice thrift raw material, help environment protection again.
Description of drawings
With reference to accompanying drawing, the disclosure of the utility model will be easier to understand.Those skilled in the art are understood that easily: these accompanying drawings only are used to illustrate the technical scheme of the utility model, and are not to be intended to the protection domain of the utility model is constituted restriction, wherein:
Fig. 1 is the synoptic diagram of Integrated Processing Unit of the sensitive cell production waste systems of an embodiment of the utility model.
Embodiment
Below in conjunction with accompanying drawing the utility model embodiment is elaborated, so that the feature and advantage of the utility model treatment unit are clearer, but the utility model is not limited to the embodiment that lists among this paper.
Embodiment 1
Below with the electrodialysis appts for three-stage electrodialysis equipment is example, the device that the utility model is used for the comprehensive treating process of sensitive cell production waste systems describes.
With reference to figure 1, be used for the device of sensitive cell production waste systems comprehensive treating process, it comprises the etching apparatus 1 that is used to carry out silicon slice corrosion; Be used to carry out the cleaning equipment 2 that silicon chip water cleans; Respectively with condensing equipment 3, storage facilities 4, first separating device 50 and the electrodialysis appts 6 of said etching apparatus 1 fluid communication; Respectively with second separating device 7 and reverse osmosis equipment 8 of said cleaning equipment 2 fluid communication; Respectively with the gas recovery unit 9 of condensing equipment 3 and electrodialysis appts 6 fluid communication; Respectively with the intermediate water tank 10 of second separating device 7, electrodialysis appts 6 and reverse osmosis equipment 8 fluid communication.
Wherein condensing equipment 3 also with storage facilities 4 fluid communication, first separating device 5 also with electrodialysis appts 6 fluid communication.
Electrodialysis appts 6 is made up of electrolyzer, electrode, anion-exchange membrane, cationic exchange membrane; Comprise first electrodialysis cell 61, second electrodialysis cell 62 and the 3rd electrodialysis cell 63; Comprise the dividing plate (not shown) that is used for clamping cationic exchange membrane (not shown) and anion-exchange membrane (not shown) separately; To form dense hydroecium and freshwater room (not shown), have square hole or circular hole on the dividing plate.
Intermediate water tank 100 is separated into dense water tank (not shown) and fresh-water tank (not shown) by dividing plate, is provided with unidirectional riser (not shown), and water flow to dense water tank through unidirectional riser from fresh-water tank.
Common structure in electrodialysis appts 6 and reverse osmosis equipment 8 employing this areas does not detail its structure at this.
Etching apparatus 1 is provided with first inlet, 101, second inlet, 103, first outlet, 102 and second outlet 104; Cleaning equipment 2 is provided with the 201 and the 3rd outlet 202 of the 3rd inlet; Condensing equipment 3 is provided with the 4th inlet the 301, the 5th inlet the 302, the 4th outlet the 303 and the 5th outlet 304; Storage facilities 4 is provided with the 6th inlet the 401, the 6th outlet the 402 and the 7th outlet 403; First separating device 5 is provided with the 501 and the 8th outlet 502 of the 7th inlet; First electrodialysis cell 61 is provided with the 8th inlet (dense hydroecium inlet) the 6101, the 18 inlet (freshwater room inlet) the 6102, the 9th outlet (dense hydroecium outlet) the 6103 and the 19 outlet (freshwater room outlet) 6104; Second electrodialysis cell 62 is provided with the 9th inlet (dense hydroecium inlet) the 6201, the 19 inlet (freshwater room inlet) the 6202, the tenth outlet (freshwater room outlet) the 6203, the 20 outlet (dense hydroecium outlet) 6204; The 3rd electrodialysis cell 63 is provided with the tenth inlet (dense hydroecium inlet) the 6301, the 20 inlet (freshwater room inlet) the 6304, the 11 outlet (freshwater room outlet) the 6303 and the 21 outlet (dense hydroecium outlet) 6302; Second separating device 7 is provided with the 701 and the 12 outlet 702 of the 11 inlet; Reverse osmosis equipment 8 is provided with the 12 inlet the 801, the 13 outlet the 802 and the 14 outlet 803; Gas recovery unit 9 is provided with the 13 inlet the 901, the 14 inlet the 902, the 15 outlet the 903 and the 16 outlet 904; Intermediate water tank 10 is provided with the 15 inlet 1001 (dense water inlets), the 16 inlet 1002 (another dense water inlets), the 17 inlet 1003 (fresh water inlets) and the 17 outlet 1004 (water outlets) and the 18 outlet 1005 (dense water outs) (wherein the 15 inlet the 1001 and the 16 enter the mouth 1002 can be a bite together); Wherein first inlet 101 is through the first pump A, the first valve a and pipeline and the 9th outlet 6103 fluid communication; Second inlet 103 is through the second pump B, the second valve b and pipeline and the 7th outlet 403 fluid communication; The 3rd inlet 201 is through the 3rd pump C, the 3rd valve c and pipeline and the 14 outlet 803 fluid communication; The 4th inlet 301 is through the 4th valve d and pipeline and second outlet, 104 fluid communication; The 5th inlet 302 is through the 4th pump D, the 5th valve e and pipeline and the 6th outlet 402 fluid communication; The 6th inlet 401 is through the 5th pump E, the 6th valve f and pipeline and the 4th outlet 303 fluid communication; The 7th inlet 501 is through the 6th pump F, the 7th valve g and pipeline and first outlet, 102 fluid communication; The 8th inlet 6101 is through the 7th pump G, the 8th valve h and pipeline and the 8th outlet 502 fluid communication; The 9th inlet 6201 is through the 8th pump H, the 9th valve i and pipeline and the 15 outlet 903 fluid communication; The tenth inlet 6301 is through the 9th pump I, the tenth valve j and pipeline and the 18 outlet 1105 fluid communication; The 11 inlet 701 is through the tenth pump J, the 11 valve k and pipeline and the 3rd outlet 202 fluid communication; The 12 inlet 801 is through the 11 pump K, the 12 valve l and pipeline and the 17 outlet 1004 fluid communication; The 13 inlet 901 is through the 13 valve m and pipeline and the 5th outlet 502 fluid communication; The 14 inlet 902 is through the 12 pump L, the 14 valve n and pipeline and the tenth outlet 6203 fluid communication; The 15 inlet 1001 is through the 13 pump M, the 15 valve o and pipeline and the 12 outlet 702 fluid communication; The 16 inlet 1002 is through the 14 pump N, the 16 valve p and pipeline and the 13 outlet 802 fluid communication; The 17 inlet 1003 is through the 15 pump O, the 17 valve q and pipeline and the 11 outlet 6303 fluid communication; The 16 outlet the 904 and the 18 valve r fluid communication; The 18 inlet 6102 is through the 16 pump P, the 18 valve s and pipeline and the 20 outlet 6204 fluid communication; The 19 inlet 6202 is through the 16 pump Q, the 19 valve t and pipeline and the 19 outlet 6104 fluid communication; The 20 inlet 6304 is through the 20 valve u and pipeline and the tenth outlet 6203 fluid communication; The 21 outlet 6302 is through the 21 valve v and pipeline and the 19 inlet 6201 fluid communication.
What it will be understood by those skilled in the art that is; Above-mentioned outlet and inlet also can be used for other purpose; Perhaps, in all devices other outlet and/or inlet can be set also, for example also be provided with an outlet (not shown) on first separating device 5 to collect silicon for other purpose; The outlet 904 of gas recovery unit 9 also can be used for to wherein aerating oxygen or air, and perhaps equipment is openable.
Condensing equipment 3 can be transferred to wherein to promote gas with a vacuum pump (not shown) fluid communication with gas recovery unit 9.
The device that is used for the comprehensive treating process of sensitive cell production waste systems in the face of the utility model down describes.Should understand and use the corrosion waste systems of the utility model treatment unit in handling to handle with water cleaning liquid waste disposal and can separately carry out or carry out simultaneously.Below to comprise HF and HNO
3The mixing acid etchant solution describe as corrosive fluid.
In etching apparatus 1, at HF and HNO
3The mixing acid etching liquid for a long time silicon chip is handled the waste systems that the back produces and comprises by NO
2, HF, steam and air is formed waste gas and by HF, HNO
3, H
2SiF
6, the waste liquid formed of silicon and water.
In cleaning equipment, after cleaning after a while, contain a large amount of silicon chips in the waste water system in the cleaning equipment 2.
Now earlier to comprising by NO
2, HF, steam and air is formed waste gas and by HF, HNO
3, H
2SiF
6, the waste liquid formed of silicon and water the processing of waste systems describe.
At first, let volatile NO
2, HF, steam and air evaporate into the condensing equipment 3 from etching apparatus 1 through second outlet the 104, the 4th valve d, the 4th inlet 301 and pipeline and (comprise NO to obtain evaporable waste gas
2, HF, steam and air) and comprise HF, HNO
3, H
2SiF
6, silicon and water the first remaining system.In condensing equipment 3, obtaining liquid through condensation (is HF and HNO
3Mixing acid, HNO wherein
3Pass through NO
2Being absorbed the back by water forms) and the gas (HF, the NO that are not condensed
2And air); The liquid that condensation is obtained is transferred to the storage facilities 4 from condensing equipment 3 through the 4th outlet the 303, the 5th pump E, the 6th valve f, the 6th inlet 401 and pipeline; Spray into condensing equipment 3 to absorb the gas that is not condensed through the 4th outlet the 402, the 4th pump D, the 5th valve e, the 5th inlet 302 and pipeline from storage facilities 4 then, let the gained liquid (be HF and HNO
3Mixing acid) return in the storage facilities 4, when needs use through in the 7th outlet 403, the second pump B, the second valve b, second inlet 103 and pipe-line transportation to the etching apparatus 1.
With the gas that is not condensed in the condensing equipment 3 and absorb (is NO
2, HF and air) be transferred in the gas recovery unit 9 through the 5th outlet the 502, the 13 valve m, the 13 inlet 901 and pipeline, extract liquid (staple is a water) to the gas recovery units 9 with absorption of N O from second electrodialysis cell 62 through the tenth outlet the 6203, the 14 valve n, the 12 pump L, the 14 inlet 902 and pipeline
2Here need to prove, also can extract liquid (staple is a water) to the gas recovery unit 9 with absorption of N O from the 3rd electrodialysis cell 63
2Perhaps extract liquid from second electrodialysis cell 62 and the 3rd electrodialysis cell 63 simultaneously.Export the 903, the 8th pump H, the 9th valve i, the 9th inlet 6201 and pipeline with absorption of N O through the 15 then
2After absorption liquid (HNO
3Solution) be transferred to the second dialysis equipment 62 from gas recovery unit 9.Here need to prove, also can be with absorption of N O
2After liquid (HNO
3Solution) be transferred to the 3rd dialysis unit 63 from gas recovery unit 9.Perhaps be transferred to second electrodialysis cell 62 and the 3rd electrodialysis cell 63 simultaneously.
The first remaining system is transferred to the separating device 5 from etching apparatus 1 through first outlet the 102, the 6th pump F, the 7th valve g, the 7th inlet 501 and pipeline.In separating device 5, isolate solid silicon, obtain comprising HF, HNO
3And H
2SiF
6The second remaining system.The second remaining system is transferred to from first separating device 5 through the 8th outlet the 502, the 7th pump G, the 8th valve h, the 8th inlet 6101 and pipeline carries out the electrodialysis effect the electrodialysis appts 6.With HF that has higher concentration after the electrodialysis and HNO
3Mixing acid (the dense hydroecium water outlet of first electrodialysis cell) is transferred to the corrosion process that is used for sensitive cell processing the etching apparatus 1 through the 9th outlet 6103, the first pump A, the first valve a, first inlet 101 and pipeline from electrodialysis appts 6.The freshwater room that the freshwater room water outlet of first electrodialysis cell 61 is transferred to second electrodialysis cell 62 and the 3rd electrodialysis cell 63 through the 19 outlet the 6104, the 16 pump Q, the 19 valve t, the 19 inlet 6202 and pipeline is to continue dialysis up to the concentrated aqueous solutions and the fresh water solution that obtain to reach request for utilization.Dense water and the fresh water mentioned below more than reaching all just define with ionic concn.Concentration is higher is called dense water, and concentration is lower is called fresh water.
Introduce water below and clean liquid waste disposal.
Cleaning equipment is in order to clean the silicon chip after corrosion, and main clean-out system is a pure water.The waste water system (mainly comprise water, residue in acid solution, the silicon chip of silicon chip surface) that after cleaning, comprises the silicon chip is transferred to second separating device 7 from cleaning equipment 2 through the 3rd outlet the 202, the tenth pump J, the 11 valve k, the 11 inlet 701 and pipeline.In second separating device 7, isolate the solid silicon chip in the Cleaning Wastewater system, obtain the first waste water system (mainly comprising water and acid solution).
Through the 12 outlet the 702, the 13 pump M, the 15 valve o, the 15 inlet 1001 and pipeline the first waste water system is transferred to the dense hydroecium of intermediate water tank 10 from second separating device 7.
Through the 18 outlet the 1105, the 9th pump I, the tenth valve j, the tenth inlet 6301 and pipeline the first waste water system is transferred to the 3rd electrodialysis cell 63 from the dense hydroecium of middle water tank 10 again; The dense hydroecium water outlet of the 3rd electrodialysis cell 63 is transferred to the dense hydroecium of second electrodialysis cell 62 through the 21 outlet the 6302, the 19 inlet 6201, the dense hydroecium water outlet of second electrodialysis cell 62 is further handled through the freshwater room that the 20 outlet the 6204, the 18 inlet 6102 is transferred to first electrodialysis cell 61.The freshwater room water outlet of first electrodialysis cell 61 is transferred to the freshwater room of second electrodialysis cell 62 through the 19 outlet the 6104, the 19 inlet 6202, and the freshwater room that the freshwater room water outlet of second electrodialysis cell 62 is transferred to the 3rd electrodialysis cell 63 through the tenth outlet the 6203, the 20 inlet 6304 carries out further dialysis to be handled.The freshwater room water outlet of the 3rd electrodialysis 63 is transferred to the freshwater room of intermediate water tank 10 through the 11 outlet the 6303, the 15 pump O, the 17 valve q, the 17 inlet 1003 and pipeline.
The waste water system (fresh water) that to pass through electrodialysis process through the 17 outlet the 1004, the 11 pump K, the 12 valve l, the 12 inlet 801 and pipeline is transferred in the reverse osmosis equipment 8.In reverse osmosis equipment 8, through further handling the waste water system that obtains pure water and still contain small amount of acid.Pure water is transferred to cleaning equipment 2 through the 14 outlet the 803, the 3rd pump C, the 3rd valve c, the 3rd inlet 201 and pipeline from reverse osmosis equipment 8 to be cleaned silicon chip is carried out water.The waste water system that still needs purifying is returned the 3rd electrodialysis cell to carry out the dialysis processing again through the dense hydroecium of intermediate water tank.
To be carried out solid-liquid separation to remove particle wherein by the rinse water that the chemical substance in bathing from work is polluted, said particle can damage the film in the follow-up electrodialysis appts.
The work that will be transferred to from the salt in " carrier " solution of first electrodialysis cell 61 is bathed in the utility model, and links to each other (not shown) with treatment facility to remove the particle in the solution through another filtering system (not shown).The solution that salt is reduced returns second electrodialysis cell with load salt again.
The 3rd electrodialysis cell 63 and 62 multiple operations of second electrodialysis cell, it links to each other with the gas processing platform.Second electrodialysis cell 62 is used for the salt from the 3rd electrodialysis cell 63 is transferred to first electrodialysis cell 61.
In the 3rd electrodialysis chamber 63, keep total salt concentration to be lower than 0.6gr/l, this is the maximum load with the solution of reverse osmosis system processing.
Working fluid described here is meant corrosive fluid or Woolen-making liquid, and carrier soln is the aqueous solution, and salt is hydrochloric acid, hydrofluoric acid, nitric acid and silicofluoric acid, potassium silicate and phosphoric acid.
Those skilled in the art should be understood that; Intermediate water tank 10 only plays the effect of storage at this; Can directly be transferred to the 3rd electrodialysis cell 63 without the first waste water system that intermediate water tank 10 will be isolated silicon; To handle the waste water system that still contains small amount of acid that obtains through reverse osmosis equipment 8 and directly be transferred to the 3rd electrodialysis cell 63, the liquid flow rate of link coupling before and after only in this process, noting.
Those skilled in the art should also be understood that the valve mentioned in the present embodiment or pump not necessarily, and those skilled in the art can determine the setting of valve or pump according to practical situation.
Those skilled in the art should also be understood that reverse osmosis equipment and electrodialysis need not to be and possess simultaneously.
Below only to comprise HF and HNO
3The mixing acid etchant solution be illustrated as the device of corrosive fluid the utility model, the device that is intended to show the utility model can be used for sensitive cell produce in the processing of contained gas, liquid and solid waste systems.It is understandable that the adjusting (close or open) through each valve makes a part of equipment not participate in treating processes.For example, when the waste systems that produces for the HF/HCl corrosive fluid, contained gas then can not make condensing surface 3, storage facilities 4 and gas recovery unit 9 not participate in treating processes.For the comprise H of KOH alkali lye as the corrosive fluid generation
2Waste systems in, can make storage facilities 4 not participate in treating processes, condensing surface 3 is only as gas passage, with H
2Directly discharge through being arranged on the outlet of the 16 on the gas recovery unit 9 904.
Abovely described the optional embodiment of the utility model, how to have implemented and reproduce the utility model with instruction those skilled in the art with reference to figure 1.In order to instruct the utility model technical scheme, simplified or omitted some conventional aspects.Those skilled in the art should understand that the modification or the replacement that are derived from these embodiments will drop in the scope of the utility model.
Claims (24)
1. clean the treatment unit of waste systems during a sensitive cell is produced, corrosion of silicon produces said cleaning waste systems through cleaning, it is characterized in that, said treatment unit comprises:
Be used for separating the separating device of the solid impurity of waste systems; With
Electrodialysis appts with said separating device fluid communication.
2. the described treatment unit of claim 1 is characterized in that, also comprises reverse osmosis equipment, and said reverse osmosis equipment and said electrodialysis appts fluid communication are to be further purified the aqueous systems through said electrodialysis appts purifying.
3. the described treatment unit of claim 2 is characterized in that, also comprises respectively the intermediate water tank with said separating device, said electrodialysis appts and said reverse osmosis equipment fluid communication; Wherein said separating device and said reverse osmosis equipment are via said intermediate water tank and said electrodialysis appts fluid communication.
4. the described treatment unit of claim 1; It is characterized in that; Also comprise being used for cleaning equipment that corrosion of silicon is cleaned, said cleaning equipment and said separating device fluid communication with carry to said separating device waste systems and with said electrodialysis appts fluid communication to receive the water after handling.
5. claim 2 or 3 described treatment unit; It is characterized in that; Also comprise being used for cleaning equipment that corrosion of silicon is cleaned, said cleaning equipment and said separating device fluid communication with carry to said separating device waste systems and with said reverse osmosis equipment fluid communication to receive the water after handling.
6. the described treatment unit of claim 5 is characterized in that, said reverse osmosis equipment is through being provided with water outlet and the said cleaning equipment fluid communication on it.
7. the treatment unit described in the claim 3 is characterized in that, said intermediate water tank is made up of dense water tank and fresh-water tank, is provided with the unidirectional riser that flows to said dense water tank for liquid from said fresh-water tank between dense water tank and the fresh-water tank.
8. the described treatment unit of claim 1; It is characterized in that; Said electrodialysis appts comprises first electrodialysis cell, second electrodialysis cell and the 3rd electrodialysis cell that is arranged in order; Each electrodialysis cell comprises a dense hydroecium and a freshwater room, the dense hydroecium fluid communication of the dense hydroecium of the 3rd electrodialysis cell and second electrodialysis cell wherein, the dense hydroecium of second electrodialysis cell and the freshwater room fluid communication of first electrodialysis cell; The freshwater room fluid communication of the freshwater room of first electrodialysis cell and second electrodialysis cell, the freshwater room fluid communication of the freshwater room of second electrodialysis cell and the 3rd electrodialysis cell.
9. clean the treatment unit of waste systems during a sensitive cell is produced, corrosion of silicon produces said cleaning waste systems through cleaning, it is characterized in that, said treatment unit comprises:
Be used for separating the separating device of the solid impurity of waste systems; With
Reverse osmosis equipment with said separating device fluid communication.
10. the described treatment unit of claim 9 is characterized in that, also comprises electrodialysis appts, and said electrodialysis appts and said reverse osmosis equipment fluid communication are to be further purified the aqueous systems through said reverse osmosis equipment purifying.
11. the described treatment unit of claim 10; It is characterized in that; Said electrodialysis appts comprises first electrodialysis cell, second electrodialysis cell and the 3rd electrodialysis cell that is arranged in order; Each electrodialysis cell comprises a dense hydroecium and a freshwater room, the dense hydroecium fluid communication of the dense hydroecium of the 3rd electrodialysis cell and second electrodialysis cell wherein, the dense hydroecium of second electrodialysis cell and the freshwater room fluid communication of first electrodialysis cell; The freshwater room fluid communication of the freshwater room of first electrodialysis cell and second electrodialysis cell, the freshwater room fluid communication of the freshwater room of second electrodialysis cell and the 3rd electrodialysis cell.
12. the Integrated Processing Unit of waste systems is characterized in that during a sensitive cell was produced, and comprising:
Be used to carry out the etching apparatus of silicon slice corrosion; Be used to carry out the cleaning equipment that silicon chip water cleans; Respectively with first separating device and the electrodialysis appts of said etching apparatus fluid communication; Respectively with second separating device and the reverse osmosis equipment of said cleaning equipment fluid communication;
Wherein said first separating device, second separating device, said reverse osmosis equipment also with said electrodialysis appts fluid communication.
13. the described Integrated Processing Unit of claim 12 is characterized in that, comprises also respectively and the intermediate water tank of said second separating device, said electrodialysis appts and said reverse osmosis equipment fluid communication that said intermediate water tank is made up of fresh-water tank and dense water tank; Wherein said second separating device and said reverse osmosis equipment are via said intermediate water tank and said electrodialysis appts fluid communication.
14. claim 12 or 13 described Integrated Processing Units is characterized in that, also comprise the gas recovery unit with said etching apparatus fluid communication.
15. the described Integrated Processing Unit of claim 14 is characterized in that, also comprises condensing equipment and storage facilities, wherein said etching apparatus is via said condensing equipment and said gas recovery unit fluid communication; Said storage facilities and said condensing equipment fluid communication be used for receiving from the liquid of condensing equipment and with said etching apparatus fluid communication.
16. the described Integrated Processing Unit of claim 12; It is characterized in that; Said electrodialysis appts comprises a plurality of electrodialysis cell; Each electrodialysis appts has a dense hydroecium and a freshwater room, dense hydroecium import of said etching apparatus and one of them electrodialysis cell and outlet fluid communication, and said reverse osmosis equipment exports with the freshwater room of another electrodialysis cell and dense hydroecium inlet fluid communicates.
17. the described Integrated Processing Unit of claim 16; It is characterized in that; Said electrodialysis appts comprises first electrodialysis cell, second electrodialysis cell and the 3rd electrodialysis cell; Wherein first electrodialysis cell and said etching apparatus fluid communication; The 3rd electrodialysis cell and said reverse osmosis equipment fluid communication, the dense hydroecium fluid communication of the dense hydroecium of the 3rd electrodialysis cell and second electrodialysis cell, the dense hydroecium of second electrodialysis cell and the first electrodialysis cell freshwater room fluid communication; The freshwater room fluid communication of the freshwater room of first electrodialysis cell and second electrodialysis cell, the freshwater room fluid communication of the freshwater room of second electrodialysis cell and the 3rd electrodialysis cell.
18. the described Integrated Processing Unit of claim 14 is characterized in that, said gas recovery unit and said electrodialysis appts fluid communication.
19. the Integrated Processing Unit of waste systems is characterized in that during a sensitive cell was produced, and comprising:
Be used for silicon chip is carried out the corrosive etching apparatus; Be used for cleaning equipment that corrosion of silicon is cleaned; Respectively with condensing equipment, storage facilities, first separating device and the electrodialysis appts of said etching apparatus fluid communication; Respectively with second separating device and the reverse osmosis equipment of said cleaning equipment fluid communication; Respectively with the gas recovery unit of said condensing equipment and said electrodialysis appts fluid communication;
Wherein said condensing equipment also with said storage facilities fluid communication, said first separating device, second separating device, said reverse osmosis equipment also with said electrodialysis appts fluid communication.
20. the Integrated Processing Unit of waste systems is characterized in that during a sensitive cell was produced, and comprising:
Be used for silicon chip is carried out the corrosive etching apparatus; Be used for cleaning equipment that corrosion of silicon is cleaned; Respectively with condensing equipment, storage facilities, first separating device and the electrodialysis appts of said etching apparatus fluid communication; Respectively with second separating device and the reverse osmosis equipment of said cleaning equipment fluid communication; Respectively with the gas recovery unit of said condensing equipment and said electrodialysis appts fluid communication; Respectively with the intermediate water tank of said second separating device, said electrodialysis appts and said reverse osmosis equipment fluid communication;
Wherein said condensing equipment also with said storage facilities fluid communication, said first separating device also with said electrodialysis appts fluid communication.
21. the treatment unit of corrosion waste systems during a sensitive cell is produced, said corrosion waste systems produces through with corrosive fluid silicon chip being corroded, and it is characterized in that, said treatment unit comprises:
Be used for silicon chip is carried out the corrosive etching apparatus; With
Separating device and electrodialysis appts with said etching apparatus fluid communication.
22. the described treatment unit of claim 21 is characterized in that, also comprises the gas recovery unit with said etching apparatus fluid communication.
23. the described treatment unit of claim 22 is characterized in that, also comprises condensing equipment and storage facilities, wherein said etching apparatus is via said condensing equipment and said gas recovery unit fluid communication; Said storage facilities and said condensing equipment fluid communication be used for receiving from the liquid of condensing equipment and with said etching apparatus fluid communication.
24. claim 22 or 23 described treatment unit is characterized in that, said gas recovery unit and said electrodialysis appts fluid communication.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011204408416U CN202542965U (en) | 2011-10-31 | 2011-10-31 | Treatment device for cleaning waste system and corrosion waste system in photocell production and comprehensive treatment device of waste system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011204408416U CN202542965U (en) | 2011-10-31 | 2011-10-31 | Treatment device for cleaning waste system and corrosion waste system in photocell production and comprehensive treatment device of waste system |
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| CN202542965U true CN202542965U (en) | 2012-11-21 |
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| CN2011204408416U Expired - Fee Related CN202542965U (en) | 2011-10-31 | 2011-10-31 | Treatment device for cleaning waste system and corrosion waste system in photocell production and comprehensive treatment device of waste system |
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| CN (1) | CN202542965U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103086528A (en) * | 2011-10-31 | 2013-05-08 | 库特勒自动化系统(苏州)有限公司 | Treatment device and treatment method for waste system in photocell production |
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2011
- 2011-10-31 CN CN2011204408416U patent/CN202542965U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103086528A (en) * | 2011-10-31 | 2013-05-08 | 库特勒自动化系统(苏州)有限公司 | Treatment device and treatment method for waste system in photocell production |
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Granted publication date: 20121121 Termination date: 20201031 |