CN202519366U - Diffusion air inlet pipeline of polycrystalline silicon solar photovoltaic cell silicon wafer - Google Patents

Diffusion air inlet pipeline of polycrystalline silicon solar photovoltaic cell silicon wafer Download PDF

Info

Publication number
CN202519366U
CN202519366U CN2012200416390U CN201220041639U CN202519366U CN 202519366 U CN202519366 U CN 202519366U CN 2012200416390 U CN2012200416390 U CN 2012200416390U CN 201220041639 U CN201220041639 U CN 201220041639U CN 202519366 U CN202519366 U CN 202519366U
Authority
CN
China
Prior art keywords
air inlet
phosphorus source
pipeline
diffusion
photovoltaic cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN2012200416390U
Other languages
Chinese (zh)
Inventor
宋令枝
吴胜勇
吕加先
张涌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUZHOU AIKANG PHOTOELECTRIC TECHNOLOGY CO., LTD.
Original Assignee
SUZHOU SUNCOME SOLAR SCIENCE & TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SUZHOU SUNCOME SOLAR SCIENCE & TECHNOLOGY Co Ltd filed Critical SUZHOU SUNCOME SOLAR SCIENCE & TECHNOLOGY Co Ltd
Priority to CN2012200416390U priority Critical patent/CN202519366U/en
Application granted granted Critical
Publication of CN202519366U publication Critical patent/CN202519366U/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

The utility model relates to a diffusion air inlet pipeline of a polycrystalline silicon solar photovoltaic cell silicon wafer. The diffusion air inlet pipeline is characterized by comprising an air inlet main pipeline (1), wherein the front end of the air inlet main pipeline (1) is connected with an air inlet end of a tubular diffusion furnace (2), the back end of the air inlet main pipeline (1) is connected with an oxygen inlet pipeline (3) and a macronitrogen inlet pipeline (4), the middle part of the air inlet main pipeline (1) is connected with a phosphorus source bottle (6) through a phosphorus source pipeline (5), and the phosphorus source bottle (6) is connected with a micronitrogen inlet pipeline (7). According to the diffusion air inlet pipeline of the polycrystalline silicon solar photovoltaic cell silicon wafer disclosed by the utility model, the macronitrogen inlet pipeline is arranged at the back end of the phosphorus source pipeline, the macronitrogen can bring the phosphorus source into a furnace pipe of the tubular diffusion furnace fast, so that the use ratio of the phosphorus source is improved.

Description

Admission passage is used in the diffusion of polycrystalline silicon solar photovoltaic cell silicon chip
Technical field
The utility model relates to a kind of solar-energy photo-voltaic cell, and admission passage is used in particularly a kind of diffusion of polycrystalline silicon solar photovoltaic cell silicon chip, belongs to solar cell and makes the field.
Background technology
Rise in the polycrystalline silicon solar cell technology of the eighties in last century, process is advanced accumulation and the improvement in 30 years, successfully this technology is applied in the extensive polycrystalline silicon solar cell production.The breakthrough of whole world photovoltaic generation installation total amount, the tubular type diffusion scheme of the brilliance that has benefited from providing such as companies such as German Centrotherm Photovoltaics, Dutch Tempress Systems.These tubular diffusion furnace that are applicable to polysilicon have all been carried out unique design from systems such as temperature control method, the processing of pump drainage wind, soft landings, satisfy the needs of polysilicon scale operation.
As shown in Figure 2, the big nitrogen admission passage of conventional diffusion method is arranged at the front end on phosphorus source capsule road, because the interference in air flow of big nitrogen is unfavorable for the quick derivation in phosphorus source, this design makes that phosphorus source utilization ratio is lower in the diffusion process.
The utility model content
The purpose of the utility model is to overcome above-mentioned deficiency, provides the diffusion of the higher polycrystalline silicon solar photovoltaic cell silicon chip of phosphorus source utilization ratio in a kind of diffusion process to use admission passage.
The purpose of the utility model is achieved in that
A kind of diffusion of polycrystalline silicon solar photovoltaic cell silicon chip comprises the air inlet main line with admission passage; The front end of said air inlet main line is connected with the inlet end of tubular diffusion furnace; The rear end of said air inlet main line is connected with oxygen intake pipe road and big nitrogen admission passage; The centre of said air inlet main line is connected with phosphorus source bottle through phosphorus source capsule road, is connected with little nitrogen admission passage on the bottle of said phosphorus source.
The beneficial effect of the utility model is:
Admission passage is used in the diffusion of the utility model polycrystalline silicon solar photovoltaic cell silicon chip, and big nitrogen admission passage is arranged at the rear end on phosphorus source capsule road, and big nitrogen can be brought the phosphorus source into the boiler tube of tubular diffusion furnace rapidly, thereby has improved phosphorus source utilization ratio.
Description of drawings
Fig. 1 is the admission passage synoptic diagram of the diffusion of the utility model polycrystalline silicon solar photovoltaic cell silicon chip with admission passage.
Fig. 2 is the admission passage synoptic diagram of the diffusion of traditional polycrystalline silicon solar photovoltaic cell silicon chip with admission passage.
Wherein:
Air inlet main line 1
Tubular diffusion furnace 2
Oxygen intake pipe road 3
Big nitrogen admission passage 4
Phosphorus source capsule road 5
Phosphorus source bottle 6
Little nitrogen admission passage 7.
Embodiment
As shown in Figure 1; The diffusion of a kind of polycrystalline silicon solar photovoltaic cell silicon chip that the utility model relates to comprises air inlet main line 1 with admission passage; The front end of said air inlet main line 1 is connected with the inlet end of tubular diffusion furnace 2; The rear end of said air inlet main line 1 is connected with oxygen intake pipe road 3 and big nitrogen admission passage 4, and the centre of said air inlet main line 1 is connected with phosphorus source bottle 6 through phosphorus source capsule road 5, is connected with little nitrogen admission passage 7 on the said phosphorus source bottle 6.

Claims (1)

1. admission passage is used in the diffusion of a polycrystalline silicon solar photovoltaic cell silicon chip; It is characterized in that said admission passage comprises air inlet main line (1); The front end of said air inlet main line (1) is connected with the inlet end of tubular diffusion furnace (2); The rear end of said air inlet main line (1) is connected with oxygen intake pipe road (3) and big nitrogen admission passage (4); The centre of said air inlet main line (1) is connected with phosphorus source bottle (6) through phosphorus source capsule road (5), is connected with little nitrogen admission passage (7) on the said phosphorus source bottle (6).
CN2012200416390U 2012-02-09 2012-02-09 Diffusion air inlet pipeline of polycrystalline silicon solar photovoltaic cell silicon wafer Expired - Lifetime CN202519366U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2012200416390U CN202519366U (en) 2012-02-09 2012-02-09 Diffusion air inlet pipeline of polycrystalline silicon solar photovoltaic cell silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2012200416390U CN202519366U (en) 2012-02-09 2012-02-09 Diffusion air inlet pipeline of polycrystalline silicon solar photovoltaic cell silicon wafer

Publications (1)

Publication Number Publication Date
CN202519366U true CN202519366U (en) 2012-11-07

Family

ID=47102326

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2012200416390U Expired - Lifetime CN202519366U (en) 2012-02-09 2012-02-09 Diffusion air inlet pipeline of polycrystalline silicon solar photovoltaic cell silicon wafer

Country Status (1)

Country Link
CN (1) CN202519366U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103225111A (en) * 2013-05-06 2013-07-31 上海煦康电子科技有限公司 Continuous diffusion furnace and its ventilation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103225111A (en) * 2013-05-06 2013-07-31 上海煦康电子科技有限公司 Continuous diffusion furnace and its ventilation method

Similar Documents

Publication Publication Date Title
CN102569523B (en) Diffusion method for polycrystalline silicon solar photovoltaic cell silicon chip
CN202519366U (en) Diffusion air inlet pipeline of polycrystalline silicon solar photovoltaic cell silicon wafer
CN204404220U (en) Based on the distributed energy resource system of city biogas
CN204119091U (en) A kind of Blast Furnace Top Gas Recovery Turbine Unit (TRT) using solar water heater
CN201412262Y (en) Pipeline cascaded power generating system
CN205231091U (en) Solar cell diffusion tail gas processing apparatus of high -efficient condensation
CN202391497U (en) System for recovering steam of 12MW second-gear steam seal
CN201206912Y (en) Solar water heater with double-row vacuum tube
CN204810178U (en) Utilize thermoelectric power generation device of boiler afterbody flue flue gas waste heat
CN201927625U (en) Photovoltaic and photothermal integrated assembly of solar energy
CN204391146U (en) A kind of wet-method etching device
CN203250776U (en) Solar energy silicon chip diffusion furnace
CN203896899U (en) Solar heat storage system in sunlight greenhouse
CN202483649U (en) Power device converting energy of waste gas into mechanical work
CN203323589U (en) Device for recycling condensate water produced in chinlon production process
CN201985114U (en) High-purity polycrystalline silicon wafer
CN202133154U (en) Efficient solar energy water heater with separated cavities
CN201985115U (en) Polycrystal solar cell
CN102544226A (en) Polycrystalline silicon battery sheet rapid variable temperature phosphorus gettering process
CN202008125U (en) Energy-saving conversion steam supply device combing solar system with production steam boiler
CN205542816U (en) Photovoltaic power generation polycrystal silicon chip
CN202643642U (en) Gas furnace ascending pipeline modification device
CN201852185U (en) Light, heat and gas energy series-parallel connection central heating system
CN202839705U (en) Solar module with thermal collector
CN203690331U (en) Device for solar cell film surface windowing technology

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee
CP01 Change in the name or title of a patent holder

Address after: North West yangshe Town Economic Development Zone of Zhangjiagang City, Suzhou City, Jiangsu province 215600

Patentee after: SUZHOU AIKANG PHOTOELECTRIC TECHNOLOGY CO., LTD.

Address before: North West yangshe Town Economic Development Zone of Zhangjiagang City, Suzhou City, Jiangsu province 215600

Patentee before: Suzhou Suncome Solar Science & Technology Co., Ltd.

CX01 Expiry of patent term

Granted publication date: 20121107

CX01 Expiry of patent term