CN202502035U - Damage threshold measurement device of laser irradiated optical thin-film at high temperature environment - Google Patents
Damage threshold measurement device of laser irradiated optical thin-film at high temperature environment Download PDFInfo
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- CN202502035U CN202502035U CN2012201132894U CN201220113289U CN202502035U CN 202502035 U CN202502035 U CN 202502035U CN 2012201132894 U CN2012201132894 U CN 2012201132894U CN 201220113289 U CN201220113289 U CN 201220113289U CN 202502035 U CN202502035 U CN 202502035U
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- catoptron
- laser
- high temperature
- damage threshold
- optical thin
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Abstract
The utility model relates to a damage threshold measurement device of a laser irradiated optical thin-film at high temperature environment. The device comprises a computer, a first laser, a reflecting mirror, a second laser, a first reflecting mirror, a second reflecting mirror, a third reflecting mirror, an energy attenuator, a spectroscope, an energy meter, a focusing lens, an on-line microscope judgment device, a high-temperature-resistant movable platform and a temperature control box. Different temperature and thermal insulation time is set through the temperature control box, and evaluation is performed on the instant damage threshold and the damage durability of a thin film. The problem that a damage threshold of the laser irradiated optical thin-film can only be measured at normal temperature environment in the prior art is solved, and the device capable of measuring the damage threshold of the laser irradiated optical thin-film at high temperature environment is provided. The device is simple in structure and easy to practice, and by using the device, the measurement of an instant damage threshold of the laser irradiated optical thin-film at high temperature environment can be performed, and the damage thresholds of samples on which thermal insulation is performed for different time can also be measured, and the durability of laser damage of the thin film at high temperature environment is evaluated.
Description
Technical field
The utility model relates to a kind of optical property measurement mechanism of optical thin film, laser irradiation optical thin film damage threshold measurement mechanism under particularly a kind of hot environment.
Background technology
The optical thin film damage is the principal element that limit laser system high power, high energy quantize, and is hot issue for many years to Research on injury threshold therefore always.Because most laser instruments all are uses under normal temperature environment, so all be to test at normal temperatures to the laser damage threshold of optical thin film, what obtain is the normal temperature laser damage threshold.But along with the expansion in laser applications field, temperature factor is more and more outstanding to the influence of membrane laser damage.Under the background that develops rapidly in current space technology, the space laser device just needs the account temperature factor affecting, because space middle-jiao yang, function of the spleen and stomach light direct beam surface temperature can rise to more than 250 ℃; In this external laser lithography technology of future generation, some thin-film components also need bear the high temperature of hundreds of degree for a long time, like thatly all need carry out the laser damage threshold evaluation of film under hot environment.But, still under hot environment, do not carry out the device that laser irradiation optical thin film damage threshold is measured at present both at home and abroad.
Summary of the invention
The purpose of the utility model is that laser irradiation optical thin film damage threshold measurement mechanism under a kind of hot environment will be provided, and solving present laser damage threshold to optical thin film all is to test at normal temperatures, can not obtain the problem of high-temperature laser damage threshold.
The purpose of the utility model is achieved in that this optical thin film damage threshold measurement comprises device:
The measurement mechanism of laser irradiation optical thin film damage threshold under the hot environment comprises: computing machine, first laser instrument, catoptron, second laser instrument, first catoptron, second catoptron, the 3rd catoptron, energy attenuator, spectroscope, energy meter, condenser lens, online microscope judgment means, high temperature resistant moveable platform and temperature control box;
The output terminal of computing machine is connected with high temperature resistant moveable platform with first laser instrument, second laser instrument, online microscope judgment means; First catoptron, second catoptron, the 3rd catoptron, energy attenuator, spectroscope, condenser lens are on second light path of second laser instrument; First catoptron in second light path and second catoptron are refracting telescope, and the 3rd catoptron, spectroscope and condenser lens are diaphotoscope; Catoptron, the 3rd catoptron, energy attenuator, spectroscope, condenser lens are on first light path of first laser instrument; Catoptron in first light path and the 3rd catoptron are refracting telescope; Spectroscope and condenser lens are diaphotoscope; Energy meter is on the spectroscope refractive light paths, and high temperature resistant moveable platform and testing sample are positioned at temperature control box, and testing sample is positioned on first light path and second light path; Online microscope judgment means is positioned at outside the temperature control box.
Beneficial effect; Owing to adopted such scheme; First laser instrument is used for collimated light path and second laser instrument that assist to detect damage, is used for sample is heated and can realize temperature controlled temperature control box; Be positioned at the high temperature resistant moveable platform of temperature control box, the testing sample on high temperature resistant moveable platform; On described first laser light path, set gradually energy attenuator, spectroscope and condenser lens, on spectroscopical reflected light path, energy meter is set, carry out the measurement of laser energy; Described condenser lens has the travel mechanism at optical axis direction; Described high temperature resistant moveable platform and sample all place in the temperature control box, and wherein the heat resisting temperature of high temperature resistant platform is not less than 400 ℃, and the temperature controlling range of temperature control box is room temperature～350 ℃; In described testing sample space surface online microscope judgment means is set; Described first laser instrument, second laser instrument, online microscope judgment means, high temperature resistant moveable platform are connected with computing machine; Can measure the laser damage threshold of optical thin film under the hot environment; Can carry out the measurement of the instant damage threshold of laser irradiation optical thin film under the hot environment, can also measure the damage threshold of insulation different time sample simultaneously, estimate the permanance of film damage from laser under hot environment.
Description of drawings
Fig. 1 is the structural representation of laser irradiation optical thin film damage threshold measurement mechanism under the utility model hot environment.
Fig. 2 is the instant damage threshold and damage durability data of laser irradiation optical thin film under the hot environment.
Among the figure, 1, computing machine; 2, first laser instrument; 3, catoptron; 4, second laser instrument; 5, first catoptron; 6, second catoptron; 7, the 3rd catoptron; 8, energy attenuator; 9, spectroscope; 10, energy meter; 11, condenser lens; 12, online microscope judgment means; 13, high temperature resistant moveable platform; 14, temperature control box; 15, testing sample.
Embodiment
Below in conjunction with accompanying drawing the embodiment of the utility model is done further description:
Embodiment 1: in Fig. 1; Measurement mechanism comprises: computing machine 1, first laser instrument 2, catoptron 3, second laser instrument 4, first catoptron 5, second catoptron 6, the 3rd catoptron 7, energy attenuator 8, spectroscope 9, energy meter 10, condenser lens 11, online microscope judgment means 12, high temperature resistant moveable platform 13 and temperature control box 14;
The output terminal of computing machine 1 and first laser instrument 2, second laser instrument 4, online microscope judgment means 12 are connected with high temperature resistant moveable platform 13; First catoptron 5, second catoptron 6, the 3rd catoptron 7, energy attenuator 8, spectroscope 9, condenser lens 11 are on second light path of second laser instrument 4; First catoptron 5 in second light path and second catoptron 6 are refracting telescope, and the 3rd catoptron 7, spectroscope 9 and condenser lens 11 are diaphotoscope; Catoptron 3, the 3rd catoptron 7, energy attenuator 8, spectroscope 9, condenser lens 11 are on first light path of first laser instrument 2; Catoptron 3 in first light path and the 3rd catoptron 7 are refracting telescope; Spectroscope 9 is a diaphotoscope with condenser lens 11; Energy meter 10 is on spectroscope 9 refractive light paths, and high temperature resistant moveable platform 13 is positioned at temperature control box 14 with testing sample, and testing sample is positioned on first light path and second light path; Online microscope judgment means 12 is positioned at outside the temperature control box 14.
Described first laser instrument 2 is the Nd:YAG laser instrument; Described second laser instrument 4 is the He-Ne laser instrument; This 1064nm, 532nm or the 355nm laser of first laser instrument 2 output; The continuous laser of the 632.8nm of described second laser instrument 4 outputs.
Computing machine 1, first laser instrument 2, catoptron 3; The online microscopic examination device 12 that is used for collimated light path and second laser instrument 4 that assist to detect damage, first catoptron 5, second catoptron, the 3rd catoptron 7, energy attenuator 8, spectroscope 9, energy meter 10, condenser lens 11 and is used for sample damage is carried out; Be used for heating and carrying out the temperature control box 14 of temperature control; Be positioned at the high temperature resistant moveable platform 13 of temperature control box; Testing sample 15 on high temperature resistant moveable platform arrives the surface of testing sample 15 respectively through first light path and second light path.
Test process: at first testing sample 15 is placed on the high temperature resistant moveable platform 13, utilize described condenser lens 11 travel mechanisms to carry out hot spot and regulate, and make laser irradiation that first laser instrument 2 sends on testing sample.Start temperature control box, begin automatically behind the design temperature to heat up.Through described first laser instrument 2 of computer control, high temperature resistant moveable platform 13, second laser instrument 4, energy meter 10; Measure the instant damage threshold of testing sample under laser irradiation under the hot environment according to the ISO11254-1 international standard; Be that point of every survey changes a position, utilize online microscope judgment means 12 to carry out online damage simultaneously and judge.10 * 10 points of general measure are gathered through computing machine the laser energy that acts on the sample at every turn in real time, then according to damage probability in each energy section, and the laser damage threshold of film when drawing the zero probability damage through the linear fit method of mapping.As select the monoxide monofilm, and optical maser wavelength 1064nm, pulsewidth 12ns, the instant damage threshold that carries out respectively under 100 ℃, 200 ℃, the 300 ℃ temperature is measured, and the result sees Fig. 2, shows that damage threshold reduces along with the rising of temperature; Like need the damage permanance of film under hot environment done evaluation, can temperature control box be warming up to temperature requiredly, carry out the insulation of certain hour; As be made as 1h, 2h, 3h ... 1d; 2d ... The damage threshold test then can draw the laser damage threshold of film under different temperature retention times with the above, estimates the damage permanance of laser irradiation film.Damage threshold measurement result as above-mentioned oxide monofilm is incubated 1h, 10h, 1d respectively under 300 ℃ of temperature is seen Fig. 2, shows along with holding time prolonging, and the damage permanance reduces.
Claims (1)
1. laser irradiation optical thin film damage threshold measurement mechanism under the hot environment; It is characterized in that: the measurement mechanism of laser irradiation optical thin film damage threshold under the hot environment comprises: computing machine, first laser instrument, catoptron, second laser instrument, first catoptron, second catoptron, the 3rd catoptron, energy attenuator, spectroscope, energy meter, condenser lens, online microscope judgment means, high temperature resistant moveable platform and temperature control box;
The output terminal of computing machine is connected with high temperature resistant moveable platform with first laser instrument, second laser instrument, online microscope judgment means; First catoptron, second catoptron, the 3rd catoptron, energy attenuator, spectroscope, condenser lens are on second light path of second laser instrument; First catoptron in second light path and second catoptron are refracting telescope, and the 3rd catoptron, spectroscope and condenser lens are diaphotoscope; Catoptron, the 3rd catoptron, energy attenuator, spectroscope, condenser lens are on first light path of first laser instrument; Catoptron in first light path and the 3rd catoptron are refracting telescope; Spectroscope and condenser lens are diaphotoscope; Energy meter is on the spectroscope refractive light paths, and high temperature resistant moveable platform and testing sample are positioned at temperature control box, and testing sample is positioned on first light path and second light path; Online microscope judgment means is positioned at outside the temperature control box.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012201132894U CN202502035U (en) | 2012-03-23 | 2012-03-23 | Damage threshold measurement device of laser irradiated optical thin-film at high temperature environment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012201132894U CN202502035U (en) | 2012-03-23 | 2012-03-23 | Damage threshold measurement device of laser irradiated optical thin-film at high temperature environment |
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| CN202502035U true CN202502035U (en) | 2012-10-24 |
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| CN2012201132894U Expired - Fee Related CN202502035U (en) | 2012-03-23 | 2012-03-23 | Damage threshold measurement device of laser irradiated optical thin-film at high temperature environment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170307493A1 (en) * | 2016-04-21 | 2017-10-26 | The Boeing Company | System and method for evaluating bubble formation potential in a structure |
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2012
- 2012-03-23 CN CN2012201132894U patent/CN202502035U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170307493A1 (en) * | 2016-04-21 | 2017-10-26 | The Boeing Company | System and method for evaluating bubble formation potential in a structure |
| US10139325B2 (en) * | 2016-04-21 | 2018-11-27 | The Boeing Company | System and method for evaluating bubble formation potential in a structure |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121024 Termination date: 20150323 |
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| EXPY | Termination of patent right or utility model |