CN202499900U - Sputtering target of ion sputtering instrument - Google Patents
Sputtering target of ion sputtering instrument Download PDFInfo
- Publication number
- CN202499900U CN202499900U CN2012200934830U CN201220093483U CN202499900U CN 202499900 U CN202499900 U CN 202499900U CN 2012200934830 U CN2012200934830 U CN 2012200934830U CN 201220093483 U CN201220093483 U CN 201220093483U CN 202499900 U CN202499900 U CN 202499900U
- Authority
- CN
- China
- Prior art keywords
- sputtering
- target
- target head
- upper cover
- cover plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 37
- 238000005477 sputtering target Methods 0.000 title claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 19
- 210000004907 gland Anatomy 0.000 claims description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The utility mode discloses a sputtering target of an ion sputtering instrument, wherein the sputtering target of the ion sputtering instrument comprises an upper cover plate, wherein the upper side of the upper cover plate is provided with a binding post, wherein the lower side of the upper cover plate is provided with a target head which is round; the diameter of the target head is 50mm-60mm; the outer surface of the target head is provided with a sputtering layer; a sputtering material is coated on the sputtering layer; the outer side of the target head is provided with a pressing cover; and the upper cover plate and the target head are fixedly connected through a bolt. The sputtering target of the ion sputtering instrument provided by the utility model is simple to install, is convenient to use, and reduces the area of the target head; the sputtering material is only required to be coated on the frontage of the target head, the materials are saved, and the using cost at the rear stage is lowered.
Description
Technical field
The utility model relates to a kind of ion sputtering instrument parts, relates in particular to a kind of ion sputtering instrument sputtering target.
Background technology
Ion sputtering instrument is in vacuum vessel, and under the effect of high pressure 2000V, residual gas molecule is formed plasma body by ionization, and positively charged ion is the bombardment palladium metal under electric field quickens, and makes atoms metal be splashed to the surface of sample, forms conducting film.The ion sputtering instrument sputtering target is the core component of ion sputtering instrument.The target head sputter material that existing homemade ion sputtering instrument is used generally all is a precious metal, and like gold and silver etc., so the size of its consumption is directly connected to user's use cost; A prior art sputter material that hits has covered the side of target head, this part be sputter in practical application less than, so target head sputter material lays the big or small unreasonable of area, can not make full use of, and has increased the cost of parts.In addition, the target head member complex structure of existing ion sputtering instrument is installed inconvenient.
Therefore, simple, easy to use for the ion sputtering instrument sputtering target is installed, make full use of the sputter material that lays, reduce the later stage use cost, be necessary improving on the existing ion sputtering instrument sputtering target structure.
The utility model content
The utility model technical problem to be solved provides a kind of ion sputtering instrument sputtering target, and it is simple, easy to use that it is installed, and can make full use of the sputter material that lays, and reduces the later stage use cost.
The utility model is to solve the problems of the technologies described above the technical scheme that adopts to provide a kind of ion sputtering instrument sputtering target, comprises upper cover plate, and said upper cover plate upside is provided with terminal stud; Wherein, Said upper cover plate downside is provided with the target head, and said target head is circular, and said target head diameter is 50mm～60mm; Said target head outside surface is provided with sputtering layer, and said sputtering layer scribbles sputter material.
Above-mentioned ion sputtering instrument sputtering target, wherein, the said target head outside is provided with gland.
Above-mentioned ion sputtering instrument sputtering target, wherein, said upper cover plate is connected through bolt with the target head.
The utility model contrast prior art has following beneficial effect: the ion sputtering instrument sputtering target that the utility model provides; Installation is simple, and is easy to use, reduced the diameter of target head; Its target head diameter is designed to 50mm～60mm; Only need target head outside surface sputtering layer to lay sputter material, thereby make full use of the sputter material that lays, reduce the later stage use cost.
Description of drawings
Fig. 1 is the utility model ion sputtering instrument sputtering target sectional structure chart.
Among the figure:
1 target head, 2 sputtering layers, 3 glands
4 upper cover plates, 5 terminal studs, 6 bolts
Embodiment
Below in conjunction with accompanying drawing and embodiment the utility model is done further to describe.
Fig. 1 is the utility model ion sputtering instrument sputtering target structural representation.
See also Fig. 1; The ion sputtering instrument sputtering target that the utility model provides comprises upper cover plate 4, and said upper cover plate 4 upsides are provided with terminal stud 5, and said upper cover plate 4 downsides are provided with target head 1; Said target head 1 is circular; Said target head 1 diameter is 50mm～60mm, and said target head 1 outside surface is provided with sputtering layer 2, and said sputtering layer 2 scribbles sputter material.Said sputter material adopts precious metals such as gold and silver more.Existing target head 1 diameter is 65mm; Sputter material has been coated to the side of target head 1, and promptly sputter material has also covered the side of target head 1 accordingly, the sputter material that covers target head 1 lateral parts in the practical application be sputter less than; So can not make full use of, increase the cost of parts.The utility model only needs to have laid sputter material in the front of target head 1, thereby makes full use of the sputter material that lays to the shortcoming of prior art this respect, reduces the later stage use cost.Said target head 1 outside is provided with gland 3; Said upper cover plate 4 is fixedly connected through bolt 6 with target head 1, installs simple, easy to use.
Though the utility model discloses as above with preferred embodiment; Right its is not in order to limit the utility model; Any those skilled in the art; In spirit that does not break away from the utility model and scope, when can doing a little modification and perfect, so the protection domain of the utility model is when being as the criterion with what claims defined.
Claims (3)
1. ion sputtering instrument sputtering target; Comprise upper cover plate (4), said upper cover plate (4) upside is provided with terminal stud (5), it is characterized in that: said upper cover plate (4) downside is provided with target head (1); Said target head (1) is circular; Said target head (1) diameter is 50mm～60mm, and said target head (1) outside surface is provided with sputtering layer (2), and said sputtering layer (2) scribbles sputter material.
2. ion sputtering instrument sputtering target according to claim 1 is characterized in that: said target head (1) outside is provided with gland (3).
3. ion sputtering instrument sputtering target according to claim 1 is characterized in that: said upper cover plate (4) is fixedly connected through bolt (6) with target head (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200934830U CN202499900U (en) | 2012-03-14 | 2012-03-14 | Sputtering target of ion sputtering instrument |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200934830U CN202499900U (en) | 2012-03-14 | 2012-03-14 | Sputtering target of ion sputtering instrument |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202499900U true CN202499900U (en) | 2012-10-24 |
Family
ID=47036520
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012200934830U Expired - Fee Related CN202499900U (en) | 2012-03-14 | 2012-03-14 | Sputtering target of ion sputtering instrument |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202499900U (en) |
-
2012
- 2012-03-14 CN CN2012200934830U patent/CN202499900U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: NANJING NANDA INSTRUMENT CO., LTD. Free format text: FORMER NAME: NANJING NANDA INSTRUMENT PLANT |
|
| CP03 | Change of name, title or address |
Address after: 210038, No. 20, Guang Lu Road, Qixia street, Nanjing Economic Development Zone, Jiangsu Patentee after: NANJING NANDA INSTRUMENT PLANT Address before: 210038 3B01-2 block, Nanjing economic and Technological Development Zone, Nanjing, Jiangsu Patentee before: Nanjing NanDa Instrument Plant |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121024 Termination date: 20210314 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |