CN202443247U - Exposure device based on adjustable mask plate - Google Patents
Exposure device based on adjustable mask plate Download PDFInfo
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- CN202443247U CN202443247U CN2012200646462U CN201220064646U CN202443247U CN 202443247 U CN202443247 U CN 202443247U CN 2012200646462 U CN2012200646462 U CN 2012200646462U CN 201220064646 U CN201220064646 U CN 201220064646U CN 202443247 U CN202443247 U CN 202443247U
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- mask
- exposure
- mask plate
- exposure device
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Abstract
The utility model discloses an exposure device based on an adjustable mask plate. The exposure device based on the adjustable mask plate comprises an exposure machine body, an adjustable mask plate arranged on the exposure machine body, and a controlling system connected with the adjustable mask plate, wherein the exposure machine body is used for performing exposure operation by using the adjustable mask plate, the controlling system is used for controlling pattern variation of the adjustable mask plate, and the adjustable mask plate is used for exposing a base plate to form mask plate patterns on the base plate. According to the exposure device based on the adjustable mask plate, a structure which is matched with the adjustable mask plate is arranged to perform the operation of photoresist exposure in base plate manufacturing technology. Among the different exposure steps, the exposure can be achieved free of replacing the mask plate, and the mask plate is not needed to detach within the normal service life of the mask plate. In addition, the exposure device based on the adjustable mask plate is simple in structure, low in base plate manufacturing cost, simple in processing operation, and less in energy consumption.
Description
Technical field
The utility model relates to mask manufacturing equipment technical field, but particularly relates to a kind of exposure device based on the modulation mask.
Background technology
Mask is used for the batch duplicating production of mask manufacturing process as the instrument that shifts Micropicture, in substrate production, has the key effect of forming a connecting link, and is important step indispensable in the display device industrial chain.In the substrate production technological process; There is the how many times photoetching what just need open the mask of different graphic; The quantity of mask has been represented the number of the photoetching process sub-process that adopts in the substrate production process, and reducing the quantity of mask and the number of times of photoetching is the key that improves yield rate, shortens fabrication cycle, cuts down the consumption of energy.
Mask costs an arm and a leg, if in processes such as mask design, making, transportation or preservation, any mistake is arranged, mask just can't be used, and all brings very big puzzlement for the deviser and the producer.In addition, the minimizing of the mask quantity of using in the substrate production technological process is in the past considered from the structure and the work simplification of substrate often, has ignored from the mask manufacturing equipment itself to consider a problem.
The utility model content
The technical matters that (one) will solve
But the technical matters that the utility model will solve provides a kind of exposure device that is complementary with the modulation mask, and exposure figure and exposure with control adjustment mask improve the exposure quality in the photoetching process.
(2) technical scheme
In order to solve the problems of the technologies described above; But the utility model provides a kind of exposure device based on the modulation mask; It comprises: the exposure machine main body; But be arranged on the modulation mask on the said exposure machine main body, but and the control system that links to each other with said modulation mask, but said exposure machine main body is used to adopt said modulation mask to carry out exposing operation; But said control system is used to control the variation of said modulation mask plate patterns; But said modulation mask is used for substrate is made public, and on substrate, forms reticle pattern.
Wherein, said exposure machine main body also comprises mask bed and substrate platform, but places said modulation mask on the said mask bed; Place the substrate that needs exposure on the said substrate platform.
Wherein, said exposure machine main body also comprises light-source system, and said light-source system links to each other with said control system, and said light-source system is that said exposing operation provides light source.
Wherein, said light-source system comprises light source and the light that said light source sends is changed exit direction to satisfy the light-conducting system of exposing operation.
Wherein, said exposure device also comprises the mask storage bin, and it links to each other with said exposure machine main body, but said mask storage bin stored modulation mask.
Wherein, said exposure device also comprises air-conditioning system, and said air-conditioning system links to each other with said control system, and said air-conditioning system is used to control and is in temperature constant state in the exposure device.
Wherein, also be provided with monitor in the said exposure machine main body, said monitor links to each other with said control system, but said monitor is used to monitor and control the alignment mark of modulation mask described in the adjustment exposing operation and said substrate.
(3) beneficial effect
But the exposure device that technique scheme provided based on the modulation mask, but the structure that is complementary with the modulation mask be provided with, to accomplish the exposing operation in the substrate manufacture technology; In the different step of exposure, but the modulation mask need not change and can make public, but the modulation mask need not unload within its scope the time in normal serviceable life yet; Whole exposure device is simple in structure; The substrate manufacture cost is low, and technological operation is simple, saves energy consumption.
Description of drawings
But Fig. 1 is based on the structural representation of the exposure device of modulation mask among the utility model embodiment 1;
But Fig. 2 is based on the structural representation of the exposure device of modulation mask among the utility model embodiment 2.
Embodiment
Below in conjunction with accompanying drawing and embodiment, the embodiment of the utility model is described in further detail.Following examples are used to explain the utility model, but are not used for limiting the scope of the utility model.
Conventional mask is made up of the real estate of soda glass or quartzy material and the pattern plane of chromium material; Its mask pattern is confirmed by designing requirement in advance; And do not have information transmission between the control desk of exposure device, when other figure of need exposure, change mask through the mask changer.At present, but a kind of modulation mask occurred, this kind mask has Presentation Function, utilizes display pattern to the passing through or block the basic function of selecting to realize mask of ultraviolet (UV) light, finally realizes the transfer of figure.But the modulation mask plate mainly comprises: the pattern displaying screen is used to appear mask pattern; Control module is used for controlling the light transmission amount of said pattern displaying screen in zones of different according to the gray level information of the required mask pattern of photoetching process, to present said mask pattern.The display pattern of this kind mask can be regulated as required, to realize the transfer of different graphic.Use this kind mask and carry out the production of array base palte, only need just can accomplish the making of all substrate process with a slice.
It is set that but the exposure device that the utility model embodiment is provided promptly is based on above-mentioned modulation mask, carries out the description of its structure through two embodiment below.
Embodiment 1
But Fig. 1 shows in the present embodiment structural representation based on the exposure device of modulation mask.The present embodiment exposure device comprises with the lower part:
The exposure machine main body, but be arranged on the modulation mask on the exposure machine main body, but and the control system that links to each other with the modulation mask; But the exposure machine main body is used for adopting the modulation mask to carry out exposing operation; But control system is used to control the variation of modulation mask plate patterns; But the modulation mask is used for substrate is made public, and on substrate, forms reticle pattern.
The exposure machine main body is provided with mask bed and substrate platform, but places the modulation mask on the mask bed, places the substrate that needs exposure on the substrate platform.The exposure machine main functions is exactly that the pattern on the mask is projected on the photoresist on the substrate accurately, makes photoresist sensitization, realizes that the pattern on the photoresist is consistent with the pattern on the mask.
Also be provided with light-source system on the exposure machine main body, light-source system links to each other with control system, for above-mentioned exposing operation provides light source; Light-source system specifically comprises light source and the light that light source sends is changed exit direction to satisfy the light-conducting system of exposing operation.In the present embodiment, the mercury vapor lamp of the preferred power of light source about 5KW, the light that light-conducting system sends light source guide to mask bed zone, but carry out base plate exposure through the modulation mask that is placed on the mask bed.
But the control system of present embodiment both linked to each other with the modulation mask; Link to each other with the exposure machine main body again, exposing operation is moved, under specific exposure program and technological parameter, carried out to control system through the programmed control exposure machine main body of its inner setting according to certain operational factor; Control system also is used for but the exposing patterns of modulation mask is controlled adjustment, to satisfy the needs of multistep photoetching process in the substrate production technology.Also be provided with monitor in the exposure machine main body, monitor links to each other with control system, but is used for monitoring and controlling the alignment mark of adjustment exposing operation modulation mask and substrate.
But the modulation mask of present embodiment links to each other through signal wire or infrared remote signal with above-mentioned control system, but adjusts the exposing patterns of modulation mask by control system control.Also be provided with the mask storage bin on the exposure device; But the modulation mask that its storage inside is for use; It is outside that the mask storage bin is arranged on the exposure machine main body, and the mask storage bin transmits the road through mask and links to each other with the exposure machine main body, is transferred in the exposure machine main body but the modulation mask transmits the road through mask; Be placed on the mask bed, so that the substrate of placing on the substrate platform is made public.But can lay in 1-2 modulation mask in the mask storage bin, when storing two mask, one of them is subsequent use, occurs to prevent fortuitous event.But but the modulation mask sees through the display pattern that zone and ultraviolet light occlusion area form the modulation mask by spaced apart ultraviolet light, can be processed by display panel, and this display panel can be realized through liquid crystal mode or non-liquid crystal mode.
In the present embodiment; Light-source system links to each other with said control system through signal wire; By the power and the time shutter of control system control exposure light source that light-source system provides; When the needs exposure light source was opened contraposition or exposure, light source just can be opened automatically, the serviceable life of saving energy consumption and strengthening exposure light source.In addition, also be provided with air-conditioning system in the exposure device, link to each other,, preferably remain on 22 deg.c to guarantee being in temperature constant state in the exposure device with said control system.
But the exposure device of present embodiment can be controlled the display pattern of adjustment modulation mask as required through control system, need not carry out mask and change, and has also saved energy consumption in the time of convenient and simple.
Embodiment 2
But Fig. 2 shows in the present embodiment structural representation based on the exposure device of modulation mask.The structure similar of the exposure device of the structure of the exposure device of present embodiment and embodiment 1; Its difference part is; The mask storage bin is arranged in the exposure machine main body in the present embodiment; Can make public because but the modulation mask when carrying out different exposure technologys, need not to change mask, but the modulation mask need not unload in its scope the time in normal serviceable life yet; But the mask storage bin of therefore depositing the modulation mask can be arranged in the exposure machine main body, simplifies the structure of present embodiment exposure device.
Can find out by above embodiment, but the utility model embodiment is provided with the structure that is complementary with the modulation mask, to accomplish the exposure of photoresist in the substrate manufacture technology; In the different step of exposure, mask need not changed and can make public, and mask need not unload within its scope the time in normal serviceable life yet; Whole exposure device is simple in structure; The substrate manufacture cost is low, and technological operation is simple, saves energy consumption.
The above only is the preferred implementation of the utility model; Should be understood that; For those skilled in the art; Under the prerequisite that does not break away from the utility model know-why, can also make some improvement and replacement, these improvement and replacement also should be regarded as the protection domain of the utility model.
Claims (7)
1. but exposure device based on the modulation mask; It is characterized in that; Comprise: the exposure machine main body; But be arranged on the modulation mask on the said exposure machine main body, but and the control system that links to each other with said modulation mask, but said exposure machine main body is used to adopt said modulation mask to carry out exposing operation; But said control system is used to control the variation of said modulation mask plate patterns; But said modulation mask is used for substrate is made public, and on substrate, forms reticle pattern.
2. exposure device as claimed in claim 1 is characterized in that, said exposure machine main body also comprises mask bed and substrate platform, but places said modulation mask on the said mask bed; Place the substrate that needs exposure on the said substrate platform.
3. exposure device as claimed in claim 1 is characterized in that, said exposure machine main body also comprises light-source system, and said light-source system links to each other with said control system, and said light-source system is that said exposing operation provides light source.
4. exposure device as claimed in claim 3 is characterized in that, said light-source system comprises light source and the light that said light source sends is changed exit direction to satisfy the light-conducting system of exposing operation.
5. exposure device as claimed in claim 1 is characterized in that, also comprises the mask storage bin, and it links to each other with said exposure machine main body, but said mask storage bin stored modulation mask.
6. exposure device as claimed in claim 1 is characterized in that, also comprises: air-conditioning system, link to each other with said control system, and said air-conditioning system is used to control and is in temperature constant state in the exposure device.
7. exposure device as claimed in claim 1; It is characterized in that; Also be provided with monitor in the said exposure machine main body, said monitor links to each other with said control system, but said monitor is used to monitor and control the alignment mark of modulation mask described in the adjustment exposing operation and said substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200646462U CN202443247U (en) | 2012-02-24 | 2012-02-24 | Exposure device based on adjustable mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200646462U CN202443247U (en) | 2012-02-24 | 2012-02-24 | Exposure device based on adjustable mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202443247U true CN202443247U (en) | 2012-09-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012200646462U Expired - Lifetime CN202443247U (en) | 2012-02-24 | 2012-02-24 | Exposure device based on adjustable mask plate |
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| CN (1) | CN202443247U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105334700A (en) * | 2014-07-21 | 2016-02-17 | 中芯国际集成电路制造(上海)有限公司 | Method and device for assisting switching photomask of photolithography area machine and machine |
| CN105549336A (en) * | 2016-01-29 | 2016-05-04 | 清华大学 | Nano photoetching device and method for preparing super diffraction limit pattern |
| CN106647178A (en) * | 2016-11-25 | 2017-05-10 | 天津津芯微电子科技有限公司 | Light direct-writing imaging equipment and system |
-
2012
- 2012-02-24 CN CN2012200646462U patent/CN202443247U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105334700A (en) * | 2014-07-21 | 2016-02-17 | 中芯国际集成电路制造(上海)有限公司 | Method and device for assisting switching photomask of photolithography area machine and machine |
| CN105334700B (en) * | 2014-07-21 | 2017-11-03 | 中芯国际集成电路制造(上海)有限公司 | Photoetching area board is aided in switch method, device and the board of light shield |
| CN105549336A (en) * | 2016-01-29 | 2016-05-04 | 清华大学 | Nano photoetching device and method for preparing super diffraction limit pattern |
| CN106647178A (en) * | 2016-11-25 | 2017-05-10 | 天津津芯微电子科技有限公司 | Light direct-writing imaging equipment and system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20120919 |