CN202443221U - Machine platform used for base plate friction orientation - Google Patents
Machine platform used for base plate friction orientation Download PDFInfo
- Publication number
- CN202443221U CN202443221U CN201220061545XU CN201220061545U CN202443221U CN 202443221 U CN202443221 U CN 202443221U CN 201220061545X U CN201220061545X U CN 201220061545XU CN 201220061545 U CN201220061545 U CN 201220061545U CN 202443221 U CN202443221 U CN 202443221U
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- China
- Prior art keywords
- limiting stand
- plummer
- base plate
- substrate
- board
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Abstract
The utility model relates to the technical field of liquid crystal panels production, in particular to a machine platform used for base plate friction orientation. The machine platform used for base plate friction orientation is used for avoiding the damage to frictional bristles of frictional cloth when the frictional cloth is used to rub a base plate placed on a machine. The machine platform used for base plate friction orientation comprises a bearing platform, a limiting stand and a lifting-control device, wherein the limiting stand is in hollow structure and used for fixing the base plate and a guide rail is arranged on the inner side of limiting stand in the vertical direction. The bearing platform is used for supporting the base plate and arranged inside the limiting stand. The limiting stand and the bearing platform are in circle distribution and formed a base plate bearing area. The lifting-control device is used for controlling the bearing platform to move along the guide rail and regulating the height difference between the bearing platform and the limiting stand. By using the machine platform used for base plate friction orientation, the damage to the frictional bristles of the frictional cloth can be avoided.
Description
Technical field
The utility model relates to the liquid crystal panel manufacture technology field, relates in particular to a kind of board that is used for the substrate friction orientation.
Background technology
Liquid crystal display as shown in Figure 1 mainly comprises upper and lower two substrates 11, alignment films 12 and liquid crystal molecule 13; Wherein, comprise many orientation raceway grooves on the alignment films 12, liquid crystal molecule 13 is distributed in the orientation raceway groove, and liquid crystal molecule is orientated, and controls transmittance through the anglec of rotation that changes liquid crystal molecule, so that on liquid crystal display, form shades of colour.
As shown in Figure 2, in the prior art, the substrate 11 that will have alignment films 12 is placed on the friction board 21, rubs through the alignment films 12 that is wrapped in the 22 pairs of substrates 11 of friction cloth on the roller bearing 23, forms many orientation raceway grooves.
But have following problem in the prior art: the edge of substrate 11 can be to friction hair 24 generation cutting actions in friction process, and fracture of feasible friction hair or minimizing damage friction cloth.
The utility model content
The utility model embodiment provides a kind of board that is used for the substrate friction orientation, is used to avoid when using friction cloth to rub to being placed on substrate on the board, the friction hair on the friction cloth is caused damage.
The utility model provides a kind of board that is used for the substrate friction orientation, comprising: plummer, limiting stand and apparatus for controlling of lifting.Wherein, limiting stand is a hollow structure, is used for fixing substrate, and the inboard is provided with the guide rail of vertical direction; Plummer is used for bearing substrate, and is arranged in the said limiting stand; Said limiting stand and plummer are enclosed to form the base plate carrying zone; Apparatus for controlling of lifting is used to control plummer and moves along the guide rail direction, the difference in height between adjustment plummer and the limiting stand.
Preferably, said carrier-table edge is close to the inwall of said limiting stand.
Preferably, above-mentioned board also comprises rotatable base and power control unit, is used to control said board rotation.
The utility model also provides a kind of board that is used for the substrate friction orientation, comprising: plummer and limiting stand; Wherein, limiting stand is used for fixing substrate; Plummer is used for bearing substrate, and said limiting stand and said plummer are enclosed to form the base plate carrying zone; The plummer height is less than said limiting stand height, and the difference in height between plummer and the limiting stand equals the thickness of substrate.
Preferably, above-mentioned board also comprises rotatable base and power control unit, is used to control the rotation of said plummer and limiting stand.
It is thus clear that the board that uses the utility model embodiment to provide adopts apparatus for controlling of lifting control plummer to move along the guide rail direction; Difference in height between adjustment plummer and the limiting stand maintains an equal level the upper surface that is placed on the substrate on this board and the upper surface of limiting stand, when using the cloth that rubs that this substrate is rubbed; The edge of this substrate can not produce the action of cutting to the friction hair; Therefore, can not cause the fracture of friction hair, avoid damage friction hair on the friction cloth.
Description of drawings
Fig. 1 is the inner structure synoptic diagram of liquid crystal display in the prior art;
The synoptic diagram of Fig. 2 when substrate being rubbed in the prior art;
The sectional structure chart of first kind of board that Fig. 3 provides for the utility model embodiment;
The sectional structure chart of second kind of board that Fig. 4 provides for the utility model embodiment;
The sectional structure chart of the third board that Fig. 5 provides for the utility model;
The sectional structure chart of the 4th kind of board that Fig. 6 provides for the utility model.
Embodiment
The utility model embodiment provides a kind of board that is used for the substrate friction orientation; When using this board; Elder generation raises plummer, reaches with the limiting stand height to equate or be higher than the limiting stand height, substrate is placed on the plummer again; Utilize control system control plummer to descend, the upper surface and the fixed station upper surface that are positioned at the substrate on the plummer are maintained an equal level.When using friction cloth that this substrate is rubbed, the edge of this substrate can not produce cutting to the friction hair, therefore, can not cause the fracture of friction hair, has avoided the damage to friction hair on the friction cloth.Below introduce with specific embodiment:
Embodiment one:
As shown in Figure 3, the utility model embodiment provides first kind of board that is used for the substrate friction orientation, and this board comprises plummer 32, limiting stand 31 and apparatus for controlling of lifting.Wherein, limiting stand 31 is a hollow structure, is used for fixing substrate position, and the limiting stand inboard is provided with guide rail, and guide rail is used to make plummer vertically to move; Plummer 32 is arranged in the limiting stand 31, and limiting stand 31 is enclosed to form the base plate carrying zone with plummer 32.In the present embodiment, the periphery of plummer 32 is close to the inwall of limiting stand 31, and the substrate that is placed on the plummer 32 can be close to the inwall of limiting stand 31, so that the friction hair is reached the better protection effect.Apparatus for controlling of lifting is used to control plummer 32 along guide rail direction vertical motion, the difference in height of adjustment plummer 32 and limiting stand 31 upper surfaces.
Concrete, apparatus for controlling of lifting control plummer 32 maintains an equal level the upper surface of upper surface of base plate and limiting stand 31 along guide rail direction vertical motion.
Preferable, said board as shown in Figure 4 also comprises rotating base 41 and power control unit.Said rotating base 41 is used to drive plummer with power control unit and limiting stand is rotated, and said rotary manipulation can be for arbitrarily angled, and preferable can be 90 degree.
Embodiment two:
As shown in Figure 5, the utility model embodiment provides first kind of board that is used for the substrate friction orientation, and this board comprises limiting stand 51 and plummer 52; Wherein, limiting stand 51 is used for fixing substrate; Plummer 52 is used for bearing substrate, and limiting stand 51 is enclosed to form the base plate carrying zone with plummer 52; Plummer 52 height are less than limiting stand 51 height.Limiting stand 51 equates with the thickness of the substrate that uses this board to rub with the difference in height of plummer 52; Preferable, the area of plummer 52 equates with the area of substrate, and the end face shape of plummer 52 is identical with the shape of substrate.
Preferable, actual for ease the use, this board also comprises rotatable base 41 and power control unit, and is as shown in Figure 6.Said rotating base 41 links to each other with limiting stand 51, is used to drive limiting stand 51 and is rotated with plummer 52; This rotary manipulation can be for arbitrarily angled, and preferable can be 90 degree.
Obviously, those skilled in the art can carry out various changes and modification to the utility model and not break away from the spirit and the scope of the utility model.Like this, belong within the scope of the utility model claim and equivalent technologies thereof if these of the utility model are revised with modification, then the utility model also is intended to comprise these changes and modification interior.
Claims (4)
1. a board that is used for the substrate friction orientation is characterized in that, comprising:
Limiting stand is hollow structure, is used for fixing substrate, and said limiting stand inboard is provided with the guide rail of vertical direction;
Plummer is used for bearing substrate, is arranged in the said limiting stand; Said limiting stand and plummer are enclosed to form the base plate carrying zone;
Apparatus for controlling of lifting is used to control said plummer and moves along the guide rail direction, adjusts the difference in height between said plummer and the said limiting stand.
2. board as claimed in claim 1 is characterized in that said carrier-table edge is close to the inwall of said limiting stand.
3. a board that is used for the substrate friction orientation is characterized in that, comprising:
Limiting stand is used for fixing substrate;
Plummer is used for bearing substrate, is arranged in the said limiting stand;
Limiting stand and plummer are enclosed to form the base plate carrying zone;
Said plummer height is less than said limiting stand height, and the difference in height between said plummer and the limiting stand equals substrate thickness.
4. board as claimed in claim 3 is characterized in that said board also comprises rotatable base and power control unit, is used to control the rotation of said plummer and limiting stand.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201220061545XU CN202443221U (en) | 2012-02-22 | 2012-02-22 | Machine platform used for base plate friction orientation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201220061545XU CN202443221U (en) | 2012-02-22 | 2012-02-22 | Machine platform used for base plate friction orientation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202443221U true CN202443221U (en) | 2012-09-19 |
Family
ID=46824664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201220061545XU Expired - Fee Related CN202443221U (en) | 2012-02-22 | 2012-02-22 | Machine platform used for base plate friction orientation |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202443221U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103439834A (en) * | 2013-08-09 | 2013-12-11 | 昆山龙腾光电有限公司 | Rubbing carrying and conveying device and rubbing system |
-
2012
- 2012-02-22 CN CN201220061545XU patent/CN202443221U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103439834A (en) * | 2013-08-09 | 2013-12-11 | 昆山龙腾光电有限公司 | Rubbing carrying and conveying device and rubbing system |
| CN103439834B (en) * | 2013-08-09 | 2015-11-25 | 昆山龙腾光电有限公司 | Friction matching carrying conveyer and friction matching system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: JINGDONGFANG SCIENCE AND TECHNOLOGY GROUP CO., LTD Free format text: FORMER OWNER: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY CO., LTD. Effective date: 20150708 Owner name: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY Effective date: 20150708 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20150708 Address after: 100015 Jiuxianqiao Road, Beijing, No. 10, No. Patentee after: BOE Technology Group Co., Ltd. Patentee after: Beijing BOE Photoelectricity Science & Technology Co., Ltd. Address before: 100176 Beijing city in Western Daxing District economic and Technological Development Zone, Road No. 8 Patentee before: Beijing BOE Photoelectricity Science & Technology Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120919 Termination date: 20210222 |