CN202430284U - Heater of coating equipment - Google Patents
Heater of coating equipment Download PDFInfo
- Publication number
- CN202430284U CN202430284U CN2011205662128U CN201120566212U CN202430284U CN 202430284 U CN202430284 U CN 202430284U CN 2011205662128 U CN2011205662128 U CN 2011205662128U CN 201120566212 U CN201120566212 U CN 201120566212U CN 202430284 U CN202430284 U CN 202430284U
- Authority
- CN
- China
- Prior art keywords
- support
- heater
- reaction chamber
- meltallizing
- well heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000576 coating method Methods 0.000 title abstract description 5
- 239000011248 coating agent Substances 0.000 title abstract description 4
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 239000011159 matrix material Substances 0.000 claims description 10
- 239000012535 impurity Substances 0.000 abstract description 5
- 230000001788 irregular Effects 0.000 abstract description 2
- 230000002035 prolonged effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000003513 alkali Substances 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 230000003245 working effect Effects 0.000 description 3
- 241000283984 Rodentia Species 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000001458 anti-acid effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Landscapes
- Physical Vapour Deposition (AREA)
- Resistance Heating (AREA)
- Coating By Spraying Or Casting (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
A heater for a coating apparatus mountable in a reaction chamber, comprising: a support assembled with the reaction chamber, a support seat assembled on the support, and a heating element which can be arranged in the support in a heating way. The object bearing seat comprises a base body and a meltallizing layer coated on the base body. The meltallizing layer has an upward object-bearing surface. The object bearing surface is rough and irregular. The heating element heats the object bearing seat in a conduction mode. When the surface of the heater is cleaned, after surface impurities are ground, another layer of meltallizing layer is covered on the substrate in a meltallizing mode, so that the loss of the thickness of the heater can be reduced, and the service life of the heater is further prolonged.
Description
Technical field
The utility model relates to a kind of filming equipment, particularly relates to a kind of well heater of filming equipment.
Background technology
At the filming equipment that generally is used to carry out the vapor deposition film-formation processing procedure, mainly be that the reaction chamber that comprises a hollow, electrode that is installed in this reaction chamber, one are installed in reaction chamber and the well heater separated between the upper and lower with this electrode.When plated film; Be that a thing to be plated is placed on this well heater, make this thing to be plated can reach the optimum temps of film-plating process, and in this reaction chamber, fill the gas that is used for plated film; Then utilize the gas in this electrode pair reaction chamber to impose high-voltage; Make gas transfer free state to, and in order to guide surface that ion can be deposited on this thing to be plated more efficiently, also can on this well heater, impose bias voltage or direct ground connection to form film; Make between this well heater and electrode and form voltage difference, reach the purpose that improves coating speed.
After gas transfers free state to, can in this reaction chamber, produce rodent acid of tool or alkali ion, and the surface of this well heater is to form oxide compound after utilizing anodizing, to resist its erosion.On the other hand, in coating process, residual ion can be deposited on the surface of this well heater in this reaction chamber; And influence thermal conductivity and electroconductibility; Therefore in order to remove heater surfaces cumulative impurity, generally be that this heater surfaces mill is removed a part, impose anodizing again and rebuild; Yet the process that mill removes can be consumed the thickness of this well heater, and reduces the work-ing life of this well heater.
Summary of the invention
The purpose of the utility model is to provide a kind of well heater that improves the filming equipment in work-ing life.
The well heater of the utility model filming equipment; Can be installed in the reaction chamber; And comprise: one is assembled in the support of this reaction chamber assembling, one and holds the thing seat on this support, and one be installed in this support heatablely and the heating of conduction ground this hold the heating member of thing seat; This holds the thing seat and comprises a matrix, and a meltallizing layer that is coated on this matrix, and this meltallizing layer has one and the concavo-convex cursorily object plane that holds up.
The thickness of the meltallizing layer of the well heater of the utility model filming equipment is between 5 microns to 500 microns.
The medullary ray average boldness of holding object plane of the well heater of the utility model filming equipment is between 0.1 micron to 40 microns.
The beneficial effect of the utility model is: this meltallizing layer is that the mode with meltallizing is formed on this matrix; Therefore when this well heater of cleaning surperficial; Be after mill removes surface impurity; Mode with meltallizing covers another layer meltallizing layer on this matrix again, and can reduce the loss of the thickness of this well heater and then the work-ing life of improving this well heater.
Description of drawings
Fig. 1 is a part cross-sectional schematic, mainly shows the preferred embodiment of the well heater of the utility model filming equipment, and is installed in the situation in the reaction chamber;
Fig. 2 is a schematic perspective view, mainly shows this first preferred embodiment.
Embodiment
Below in conjunction with accompanying drawing and embodiment the utility model is elaborated.
Consult Fig. 1,2, the preferred embodiment of the well heater of the utility model filming equipment can be installed in the reaction chamber 11 of a filming equipment 1, and supplies a thing 12 to be plated to place.This well heater 10 comprises: the support that extends below on one 2, one are assembled in this support 2 vertical thing seats 3 that hold, and a heating member 4 that is installed in this support 2.
This support 2 is to be elongate tubular, and assembles with this reaction chamber 11.Said to hold thing seat 3 rectangular, and have a matrix 31, and a meltallizing layer 32 that is coated on this matrix 31.This meltallizing layer 32 have one up hold object plane 321.The said object plane 321 that holds is irregular cursorily concavo-convex.Present embodiment is a method of utilizing meltallizing (thermal spray), and the ceramic powder that high temperature is melted is attached to these matrix 31 surfaces, and then forms this meltallizing layer 32.
This heating member 4 is heatable, and holds object plane 321 with heating this thing 12 to be plated with what heat energy reached that this holds thing seat 3, and the heating member 4 of present embodiment is to utilize coil generation heat energy.
When plated film, be this thing 12 to be plated to be seated in this hold on the thing seat 3, and this heating member 4 can hold thing seat 3 to this and heat; And the temperature that makes this thing 12 to be plated reaches the required temperature of film-plating process, and plated film gas is sent in this reaction chamber 11, imposes high-frequency voltage again and makes plated film gas transfer unbound state to; In addition; Can hold thing seat 3 applying bias at this, make ions in the reaction chamber 11 receive electrical field draw and move, and then be deposited on the surface formation film of this thing 12 to be plated towards this thing 12 to be plated.
Need to prove; For reaching preferable heat conduction and coating effects; The thickness of this meltallizing layer 32 with between 5 microns (μ m) to 500 microns the bests, the material of being selected for use is aluminum oxide, yttrium oxide, zirconium white, titanium oxide, Natural manganese dioxide, silicon oxide, chromic oxide or above material mixed powder.
And in process of plating; Can produce in this reaction chamber 11 and have rodent acidity or alkali ion; And compare with the film that general anodizing forms; Because these meltallizing layer 32 tool crystalline structure that this meltallizing layer 32 produces with the meltallizing method, and preferable structural strength and anti acid alkali performance are arranged, so the thing seat 3 that holds of the utility model well heater 10 has preferable resistance to fouling.In addition; After this filming equipment 1 used for some time, this holds object plane 321 can adhere to and deposit many impurity, when maintenance of clean-up; Be after earlier this being held impurity on the object plane 321 and grinds off; Meltallizing produces another layer meltallizing layer 32 again, and need not to consume this matrix 31, so this holds thing seat 3 and can reach the purpose that increases the service life really.
What deserves to be mentioned is; Accomplish plated film and should thing 12 to be plated remove this hold thing seat 3 after; Residual ion can be deposited on this and hold holding on the object plane 321 of thing seat 3 in this reaction chamber 11; And, therefore can provide bigger contact area to grasp residual ion in the reaction chamber 11 because the object plane 321 that holds of the utility model is rough-shape, reach the effect that improves reaction chamber 11 cleanliness factors.And in order to reach preferable extracting efficient and to keep the intensity that this holds object plane 321 structures, therefore said medullary ray average boldness (Ra) of holding object plane 321 is with between 0.1 micron to 40 microns the best.
Claims (3)
1. the well heater of a filming equipment; Can be installed in the reaction chamber; And comprise: one is assembled in the support of this reaction chamber assembling, one and holds the thing seat on this support, and one be installed in this support heatablely and the heating of conduction ground this hold the heating member of thing seat; It is characterized in that: this holds the thing seat and comprises a matrix, and a meltallizing layer that is coated on this matrix, and this meltallizing layer has one and the concavo-convex cursorily object plane that holds up.
2. the well heater of filming equipment according to claim 1, it is characterized in that: the thickness of this meltallizing layer is between 5 microns to 500 microns.
3. the well heater of filming equipment according to claim 1 and 2, it is characterized in that: this medullary ray average boldness of holding object plane is between 0.1 micron to 40 microns.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100206452 | 2011-04-13 | ||
| TW100206452U TWM410057U (en) | 2011-04-13 | 2011-04-13 | Heater for film coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202430284U true CN202430284U (en) | 2012-09-12 |
Family
ID=45085866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011205662128U Expired - Lifetime CN202430284U (en) | 2011-04-13 | 2011-12-30 | Heater of coating equipment |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN202430284U (en) |
| TW (1) | TWM410057U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107951374A (en) * | 2017-12-29 | 2018-04-24 | 广东天际电器股份有限公司 | A kind of reticulate pattern samming non-stick ceramic pot and preparation method thereof |
| CN115921863A (en) * | 2022-12-12 | 2023-04-07 | 巨玻固能(苏州)薄膜材料有限公司 | Coating material, composite oxide film, preparation method and optical product |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103255390A (en) * | 2012-02-17 | 2013-08-21 | 苏州艾默特材料技术有限公司 | Heater of metal organic chemical vapor deposition |
-
2011
- 2011-04-13 TW TW100206452U patent/TWM410057U/en not_active IP Right Cessation
- 2011-12-30 CN CN2011205662128U patent/CN202430284U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107951374A (en) * | 2017-12-29 | 2018-04-24 | 广东天际电器股份有限公司 | A kind of reticulate pattern samming non-stick ceramic pot and preparation method thereof |
| CN115921863A (en) * | 2022-12-12 | 2023-04-07 | 巨玻固能(苏州)薄膜材料有限公司 | Coating material, composite oxide film, preparation method and optical product |
| CN115921863B (en) * | 2022-12-12 | 2023-10-27 | 巨玻固能(苏州)薄膜材料有限公司 | Coating material, composite oxide film, preparation method and optical product |
Also Published As
| Publication number | Publication date |
|---|---|
| TWM410057U (en) | 2011-08-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20120912 |