CN202405228U - 一种用于等离子体处理装置的聚焦环 - Google Patents
一种用于等离子体处理装置的聚焦环 Download PDFInfo
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- CN202405228U CN202405228U CN2012200277114U CN201220027711U CN202405228U CN 202405228 U CN202405228 U CN 202405228U CN 2012200277114 U CN2012200277114 U CN 2012200277114U CN 201220027711 U CN201220027711 U CN 201220027711U CN 202405228 U CN202405228 U CN 202405228U
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- focusing ring
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- substrate
- plasma processing
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Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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CN2012200277114U CN202405228U (zh) | 2012-01-20 | 2012-01-20 | 一种用于等离子体处理装置的聚焦环 |
TW101225587U TWM464460U (zh) | 2012-01-20 | 2012-12-28 | 一種用於等離子體處理裝置的聚焦環 |
Applications Claiming Priority (1)
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CN2012200277114U CN202405228U (zh) | 2012-01-20 | 2012-01-20 | 一种用于等离子体处理装置的聚焦环 |
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CN202405228U true CN202405228U (zh) | 2012-08-29 |
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CN2012200277114U Expired - Lifetime CN202405228U (zh) | 2012-01-20 | 2012-01-20 | 一种用于等离子体处理装置的聚焦环 |
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CN (1) | CN202405228U (zh) |
TW (1) | TWM464460U (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105575872A (zh) * | 2016-02-26 | 2016-05-11 | 上海华力微电子有限公司 | 改善静电吸附盘树脂保护环损伤的结构及方法 |
CN107316795A (zh) * | 2016-04-26 | 2017-11-03 | 北京北方华创微电子装备有限公司 | 一种聚焦环和等离子体处理装置 |
-
2012
- 2012-01-20 CN CN2012200277114U patent/CN202405228U/zh not_active Expired - Lifetime
- 2012-12-28 TW TW101225587U patent/TWM464460U/zh not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105575872A (zh) * | 2016-02-26 | 2016-05-11 | 上海华力微电子有限公司 | 改善静电吸附盘树脂保护环损伤的结构及方法 |
CN105575872B (zh) * | 2016-02-26 | 2019-05-03 | 上海华力微电子有限公司 | 改善静电吸附盘树脂保护环损伤的结构及方法 |
CN107316795A (zh) * | 2016-04-26 | 2017-11-03 | 北京北方华创微电子装备有限公司 | 一种聚焦环和等离子体处理装置 |
Also Published As
Publication number | Publication date |
---|---|
TWM464460U (zh) | 2013-11-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: Focusing ring for plasma processing device Effective date of registration: 20150202 Granted publication date: 20120829 Pledgee: China Development Bank Co Pledgor: Advanced Micro-Fabrication Equipment (Shanghai) Inc. Registration number: 2009310000663 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20170809 Granted publication date: 20120829 Pledgee: China Development Bank Co Pledgor: Advanced Micro-Fabrication Equipment (Shanghai) Inc. Registration number: 2009310000663 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
CP01 | Change in the name or title of a patent holder |
Address after: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee after: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd. Address before: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee before: Advanced Micro-Fabrication Equipment (Shanghai) Inc. |
|
CP01 | Change in the name or title of a patent holder | ||
CX01 | Expiry of patent term |
Granted publication date: 20120829 |
|
CX01 | Expiry of patent term |