CN202369634U - Cylindrical target with magnetron sputtering function - Google Patents
Cylindrical target with magnetron sputtering function Download PDFInfo
- Publication number
- CN202369634U CN202369634U CN201120507817XU CN201120507817U CN202369634U CN 202369634 U CN202369634 U CN 202369634U CN 201120507817X U CN201120507817X U CN 201120507817XU CN 201120507817 U CN201120507817 U CN 201120507817U CN 202369634 U CN202369634 U CN 202369634U
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- Prior art keywords
- target
- magnetron sputtering
- cylindrical target
- cap
- cylinder
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- Expired - Fee Related
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Abstract
The utility model discloses a cylindrical target with a magnetron sputtering function. The cylindrical target comprises a cylindrical target body with assembly parts at the two ends, wherein a target cap made of the same material as a target material is sleeved inside each of the assembly parts at the two ends of the cylindrical target body. According to the cylindrical target with the magnetron sputtering function, the utilization rate of the whole target material can be increased.
Description
Technical field
The utility model relates to a kind of magnetron sputtering cylindrical target.
Background technology
In the present domestic all glass vacuum heat collection tube of solar energy coating process, the magnetron sputtering cylindrical target is widely used.But in process of production, ubiquity target pipe two ends etching speed is faster than the centre, and generally about 30%, be difficult to has raising to the utilization ratio that makes target again, has caused the serious waste of target, and utilization ratio is on the low side.
Summary of the invention
Therefore, the utility model provides a kind of magnetron sputtering cylindrical target that can improve the overall target utilization ratio to present magnetron sputtering cylindrical target utilization ratio defective on the low side.
The technical scheme that the utility model adopts is:
The utility model magnetron sputtering cylindrical target comprises that two ends have the cylinder target body of department of assembly, respectively is set with a target cap the same with the target material in the inboard of the department of assembly, two ends of said cylinder target body.
Magnetron sputtering cylindrical target according to the utility model is provided with the target cap at the two ends of cylinder target body, and in magnetron sputtering technique, what two ends at first were etched is the target cap like this, and the target body part of corresponding matching gets into the state that is etched in the later stage.If can not lose efficacy in the two ends of target so, and then the confined state of department of assembly can not be affected, and target can be able to access and continue to use.Through overtesting, reasonable disposition target cap thickness can make the overall utilization rate of target mention 60% ~ 70%.So-called reasonable disposition takes into full account the etching speed ratio of target two ends and other part exactly, just can select rational relatively thickness substantially.It is very difficult that overall utilization rate rethinks raising, even if mainly be to have solved whole etching speed difference, also is difficult to guarantee the homogeneity of whole etching speed.
Above-mentioned magnetron sputtering cylindrical target, the length of said target cap is 0.75 ~ 0.8 with the ratio of said cylinder target body.
Above-mentioned magnetron sputtering cylindrical target, said target cap is a shrink-fit with cooperating of said cylinder target body.
Above-mentioned magnetron sputtering cylindrical target, said department of assembly is provided with chamfering.
Above-mentioned magnetron sputtering cylindrical target, the inner end of said target cap has tapering.
Description of drawings
Fig. 1 is the structural representation according to a kind of magnetron sputtering cylindrical target of the utility model technical scheme.
Among the figure: 1, department of assembly, 2, the target cap, 3, the cylinder target body.
Embodiment
With reference to the magnetron sputtering cylindrical target of explanation shown in the accompanying drawing 1, comprise that two ends have the cylinder target body 3 of department of assembly 1, respectively be set with a target cap 2 the same in the inboard of the department of assembly, two ends of said cylinder target body 3 with the target material.
Here focus on two ends and add the target cap; Can bring up to certain degree to the overall utilization rate of target, be relatively difficult to raising again, and the homogeneity of etching is difficult to hold under present technical qualification; If patching up; As if not only workload is big, and the thickness of type whole thickening target, does not have practical significance.
Preferably, the length of said target cap is 0.75 ~ 0.8 with the ratio of said cylinder target body, and based on the general structure of present target, the length of target cap is about 50mm.This structure can guarantee the relative homogeneity of overall target etching speed basically.Best ratio is 0.758, the overall utilization rate of material about about 69%.Target has specificity, and the overall utilization rate of each root target all can be variant.
Preferably, said target cap is a shrink-fit with cooperating of said cylinder target body, is similar to and cylinder target body monolithic molding, good manufacturability.
For the ease of the assembling of target cap, said department of assembly 1 is provided with chamfering.
Preferably, the inner end of said target cap has tapering, and corresponding tapering portion is because of inner, and its etching speed is relatively low, and this structure also is convenient to assembling simultaneously.Wherein said " interior " is the notion with respect to the two ends of cylinder target body.
Claims (5)
1. magnetron sputtering cylindrical target comprises that two ends have the cylinder target body (3) of department of assembly (1), is characterized in that: the inboard in the department of assembly, two ends of said cylinder target body (3) respectively is set with a target cap (2) the same with the target material.
2. magnetron sputtering cylindrical target according to claim 1 is characterized in that: the length of said target cap is 0.75 ~ 0.8 with the ratio of said cylinder target body.
3. magnetron sputtering cylindrical target according to claim 1 and 2 is characterized in that: said target cap is a shrink-fit with cooperating of said cylinder target body.
4. magnetron sputtering cylindrical target according to claim 3 is characterized in that: said department of assembly (1) is provided with chamfering.
5. magnetron sputtering cylindrical target according to claim 4 is characterized in that: the inner end of said target cap has tapering.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201120507817XU CN202369634U (en) | 2011-12-08 | 2011-12-08 | Cylindrical target with magnetron sputtering function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201120507817XU CN202369634U (en) | 2011-12-08 | 2011-12-08 | Cylindrical target with magnetron sputtering function |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202369634U true CN202369634U (en) | 2012-08-08 |
Family
ID=46593347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201120507817XU Expired - Fee Related CN202369634U (en) | 2011-12-08 | 2011-12-08 | Cylindrical target with magnetron sputtering function |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202369634U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105463390A (en) * | 2014-09-12 | 2016-04-06 | 安泰科技股份有限公司 | Rotary target material and manufacturing method thereof |
-
2011
- 2011-12-08 CN CN201120507817XU patent/CN202369634U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105463390A (en) * | 2014-09-12 | 2016-04-06 | 安泰科技股份有限公司 | Rotary target material and manufacturing method thereof |
| CN105463390B (en) * | 2014-09-12 | 2018-12-04 | 安泰科技股份有限公司 | Rotary target material and its manufacturing method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120808 Termination date: 20141208 |
|
| EXPY | Termination of patent right or utility model |