CN202337819U - Chemical vapor deposit (CVD) furnace gas diffusion device - Google Patents
Chemical vapor deposit (CVD) furnace gas diffusion device Download PDFInfo
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- CN202337819U CN202337819U CN2011204846285U CN201120484628U CN202337819U CN 202337819 U CN202337819 U CN 202337819U CN 2011204846285 U CN2011204846285 U CN 2011204846285U CN 201120484628 U CN201120484628 U CN 201120484628U CN 202337819 U CN202337819 U CN 202337819U
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- diffusion
- cvd furnace
- furnace gas
- pipe
- diffusion shell
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Abstract
The utility model discloses a CVD furnace gas diffusion device, which comprises an air inlet pipe. The air inlet pipe is communicated with a small bore end of a cone-shaped diffusion pipe, at least one diffusion shield is arranged in the middle of the diffusion pipe, air through holes are evenly distributed on the diffusion shield, a high density filter screen is arranged at the bottom of the cone-shaped diffusion pipe. According to the CVD furnace gas diffusion device, diffusion pipe is connected with the air inlet pipe to transmit gas evenly in the CVD furnace, so that all the surface of diamonds in the CVD furnace is guaranteed to receive gas evenly, the production quality of diamonds can be improved, and inferior rate can be reduced. The cone-shaped diffusion shields are arranged in the diffusion pipe respectively, so that gas is gradually diffused, and the effect is obvious. The diffusion shield in the diffusion pipe coordinates with the high density filter screen at the bottom, to further guarantee the even distribution of the gas. The CVD furnace gas diffusion device has the advantages of being simple in structure, convenient to use, and easy to process and implement.
Description
Technical field:
The utility model relates to the gaseous diffusion technology in the diamond machined field, is specifically related to a kind of CVD furnace gas dispersion device.
Background technology:
The air inlet of the CVD stove that uses in the diamond machined field requires evenly; And the intake method of existing C VD stove is reasonable inadequately; Because the bore of inlet pipe is less, there is the problem that in-situ velocity is big and density is big in air inlet mouth of pipe place, and the air-flow velocity in the place far away apart from inlet mouth is little and density is little; Occur the difference of diamond quality like this with regard to causing same CVD stove internal cause gas reaction degree difference, fraction defective is high.
The utility model content:
The utility model proposes a kind of CVD furnace gas dispersion device to the problem and shortage that at present existing situation exists.
The technical scheme that the utility model adopted: a kind of CVD furnace gas dispersion device; Comprise inlet pipe; This inlet pipe is communicated with the small-caliber end of the diffuser tube of a taper; The middle part of this diffuser tube is fixed with a diffusion shell at least, is evenly equipped with breather hole on the diffusion shell, and the bottom of conic diffuse is provided with the high-density filter screen.
Said diffusion shell is a pyramidal structure, and wealthy mouthful of coupling of its lower edge is fixed on the diffuser tube inwall.
Fix the diffusion shell of two tapers in the diffuser tube from top to bottom successively.
The breather hole aperture of upper and lower two diffusion shells is identical, and perhaps the breather hole aperture of bottom diffusion shell is less than the breather hole aperture of top diffusion shell.
The positively effect of the utility model: be utilized on the inlet pipe and connect diffuser tube, guarantee that diamond surface all evenly receives reactant gases in the CVD stove, can improve the diamond quality of production, reduction in the numbers of seconds to evenly gas transmission in the CVD stove.Be respectively arranged with the diffusion shell of taper in the diffuser tube, be convenient to step by step gas carried out diffusion, effect is remarkable.Diffusion shell in the diffuser tube with the high-density filter screen of bottom cooperation further guarantees gas by even diffused, it is simple in structure, and is easy to use, processes easily and implements.
Description of drawings:
Fig. 1 is the utility model cross-sectional view;
Fig. 2 is that the A of Fig. 1 is to synoptic diagram.
Label 1 is an inlet pipe among the figure, and 2 is diffuser tube, and 3 is the high-density filter screen, and 4 is the upper strata diffusion shell, and 41 is the breather hole of upper strata diffusion shell, and 5 is lower floor's diffusion shell.
Embodiment:
Embodiment one: referring to Fig. 1 and Fig. 2; This CVD furnace gas dispersion device is that the small-caliber end of inlet pipe 1 with the diffuser tube 2 of a taper is communicated with; The middle part of this diffuser tube 2 is fixed the diffusion shell of two tapers, i.e. upper strata diffusion shell 4 and lower floor's diffusion shell 5 from top to bottom successively.Each diffusion shell is a pyramidal structure, and wealthy mouthful of coupling of its lower edge is fixed on diffuser tube 2 inwalls, and on diffusion shell, is evenly equipped with a plurality of breather holes, and the bottom of conic diffuse 2 is provided with high-density filter screen 3.In the present embodiment, the breather hole aperture of upper and lower two diffusion shells is identical.
Embodiment two: accompanying drawing is not drawn, and content and embodiment one are basic identical, and something in common does not repeat, and different is: the breather hole aperture of bottom diffusion shell is less than the breather hole aperture of top diffusion shell.
Claims (4)
1. CVD furnace gas dispersion device; Comprise inlet pipe, it is characterized in that: this inlet pipe is communicated with the small-caliber end of the diffuser tube of a taper, and the middle part of this diffuser tube is fixed with a diffusion shell at least; Be evenly equipped with breather hole on the diffusion shell, the bottom of conic diffuse is provided with the high-density filter screen.
2. CVD furnace gas dispersion device according to claim 1 is characterized in that: said diffusion shell is a pyramidal structure, and wealthy mouthful of coupling of its lower edge is fixed on the diffuser tube inwall.
3. CVD furnace gas dispersion device according to claim 1 is characterized in that: the diffusion shell of fixing two tapers in the diffuser tube from top to bottom successively.
4. CVD furnace gas dispersion device according to claim 3 is characterized in that: the breather hole aperture of upper and lower two diffusion shells is identical, and perhaps the breather hole aperture of bottom diffusion shell is less than the breather hole aperture of top diffusion shell.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011204846285U CN202337819U (en) | 2011-11-29 | 2011-11-29 | Chemical vapor deposit (CVD) furnace gas diffusion device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011204846285U CN202337819U (en) | 2011-11-29 | 2011-11-29 | Chemical vapor deposit (CVD) furnace gas diffusion device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202337819U true CN202337819U (en) | 2012-07-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011204846285U Expired - Fee Related CN202337819U (en) | 2011-11-29 | 2011-11-29 | Chemical vapor deposit (CVD) furnace gas diffusion device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202337819U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109939618A (en) * | 2019-03-26 | 2019-06-28 | 沈阳拓荆科技有限公司 | Spray structure and chemical source supply system |
| CN115261784A (en) * | 2022-07-29 | 2022-11-01 | 固安翌光科技有限公司 | Mask structure and OLED device |
-
2011
- 2011-11-29 CN CN2011204846285U patent/CN202337819U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109939618A (en) * | 2019-03-26 | 2019-06-28 | 沈阳拓荆科技有限公司 | Spray structure and chemical source supply system |
| CN115261784A (en) * | 2022-07-29 | 2022-11-01 | 固安翌光科技有限公司 | Mask structure and OLED device |
| CN115261784B (en) * | 2022-07-29 | 2023-10-27 | 固安翌光科技有限公司 | Mask structure and OLED device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120718 Termination date: 20131129 |