CN202332780U - 离子注入电弧反应室 - Google Patents
离子注入电弧反应室 Download PDFInfo
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- CN202332780U CN202332780U CN2011204682764U CN201120468276U CN202332780U CN 202332780 U CN202332780 U CN 202332780U CN 2011204682764 U CN2011204682764 U CN 2011204682764U CN 201120468276 U CN201120468276 U CN 201120468276U CN 202332780 U CN202332780 U CN 202332780U
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CN2011204682764U CN202332780U (zh) | 2011-11-21 | 2011-11-21 | 离子注入电弧反应室 |
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CN2011204682764U CN202332780U (zh) | 2011-11-21 | 2011-11-21 | 离子注入电弧反应室 |
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CN202332780U true CN202332780U (zh) | 2012-07-11 |
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CN2011204682764U Expired - Fee Related CN202332780U (zh) | 2011-11-21 | 2011-11-21 | 离子注入电弧反应室 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106439575A (zh) * | 2016-08-29 | 2017-02-22 | 浙江宙辉电器有限公司 | 一种可调节高度的纸吊灯 |
CN113539778A (zh) * | 2021-07-13 | 2021-10-22 | 长鑫存储技术有限公司 | 气体注射器及扩散炉管设备 |
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2011
- 2011-11-21 CN CN2011204682764U patent/CN202332780U/zh not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106439575A (zh) * | 2016-08-29 | 2017-02-22 | 浙江宙辉电器有限公司 | 一种可调节高度的纸吊灯 |
CN113539778A (zh) * | 2021-07-13 | 2021-10-22 | 长鑫存储技术有限公司 | 气体注射器及扩散炉管设备 |
CN113539778B (zh) * | 2021-07-13 | 2023-02-17 | 长鑫存储技术有限公司 | 气体注射器及扩散炉管设备 |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130425 |
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C41 | Transfer of patent application or patent right or utility model | ||
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Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
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TR01 | Transfer of patent right |
Effective date of registration: 20130425 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120711 Termination date: 20181121 |