CN202256725U - Film system structure with high spectra index - Google Patents
Film system structure with high spectra index Download PDFInfo
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- CN202256725U CN202256725U CN2011202418803U CN201120241880U CN202256725U CN 202256725 U CN202256725 U CN 202256725U CN 2011202418803 U CN2011202418803 U CN 2011202418803U CN 201120241880 U CN201120241880 U CN 201120241880U CN 202256725 U CN202256725 U CN 202256725U
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Abstract
The utility model relates to a film system structure with high spectra index. The film system structure comprises a substrate and a film layer which is deposited on the substrate, wherein the film layer comprises at least five single layers; each of odd single layers in the film layer is made of a low-refractive-index material; each of even single layers in the film layer is made of a high-refractive-index material; components of the low-refractive-index material are the same as those of the substrate; the thickness of each of second, third, fourth and fifth single layers is more than 1 QWOT; and the components of the whole film layer form an irregular film system. According to the film system structure with the high spectra index, the sum of transmission rate of the first few layers and thickness values are accurately controlled, so that initial deposition parameters are more accurate, light control accuracy is improved, the matching degree of the film layer and the substrate can be improved, and the quality of the film layer is improved.
Description
Technical field
The utility model relates to optical device and plated film, and particularly a kind of film structure design of high spectrum index to improve the precision of optical monitoring, is applicable to that the spectrum index is high, the preparation of function admirable rete.
Background technology
Coating technique also is thin film technique, is under vacuum condition, to adopt physics or chemical method, makes body surface obtain required rete.Coating technique is to originate from first the thirties in 20th century, just obtains a kind of technology of large development up to the later stage seventies.Be plated in lip-deep one or more layers film of optical element optical thin film in order to change optical element surface optics characteristic; In order to satisfy the particular optical effect; Usually need on substrate, vacuum be coated with tens layers and even the certain thickness optical thin film of layers up to a hundred, and need the thickness of strict control rete.
Optical film thickness monitoring method is divided into quality monitoring method, optical monitor, electricity monitoring method, several big classes of other monitoring methods.Method commonly used in the optical monitor comprises visual method, extremum method, wavelength-modulated method, fixed value method etc.Visual method is the thickness that comes the control medium film through eye-observation film interference change in color, and the method is fit to be coated with simple rete, is not suitable for preparing the high precision film layer structure.Extremum method is a rule of utilizing reflectivity in the film deposition process or transmissivity to change with thicknesses of layers, the method for the extreme value that occurs through photoelectricity thickness monitor detection of reflected transmitted spectrum.This method is fit to the regular film system preparation, but there is certain precision defective in this method, and reason is because emissivity or transmissivity change near extreme value the time slowly.The wavelength-modulated method is a kind of solution that proposes to the limitation of extremum method; Thereby its principle is reflectivity or transmissivity in the monitoring to be carried out differential to wavelength make the insensitive reflectivity of wavelength or transmissivity extreme point become to have higher sensitivity, but the film refractive index chromatic dispersion is bigger to this method affect.Fixed value method is that whether reaching theoretical bits to confirm the end point position mutually mutually through comparing actual bit, and this method precision is higher, is fit to the non-regular thin film preparation.In order further to improve the monitoring precision, when calculating the current layer end point, need consider the embryo deposit parameter, and the embryo deposit parameter is through which floor actual transmitance value before the film system to calculate.Therefore most important as far as preceding which floor actual transmitance control for control and film layer spectrum that whole film is.
Summary of the invention
The purpose of the utility model is to design a kind of new membrane architecture.The film structure of the utility model wants to improve the precision of optical monitoring, is fit to the preparation that high spectrum indicator membrane is.
In order to reach the foregoing invention purpose, the technical scheme that the utility model provides is following:
A kind of film structure of high spectrum index is characterized in that, this film structure comprises substrate and is deposited on suprabasil rete; Described rete comprises at least five layers of individual layer; Odd number individual layer in the rete is a low-index material, and the even number individual layer is a high-index material, and described low-index material is identical with the substrate composition; The thickness in monolayer of the second layer in the rete to layer 5 is all greater than 1QWOT, whole rete consist of non-regular thin film.
In the film structure of the high spectrum index of the utility model, the odd-level in the said rete includes ground floor, the 3rd layer ... Prime coat, described even level comprise the second layer, the 4th layer ...
In the film structure of the high spectrum index of the utility model, described substrate is a glass material, and described low-index material is the Si0 identical with base material
2
In the film structure of the high spectrum index of the utility model, described high-index material or be Ti02 or for Ta205 or be Nb205.
In the film structure of the high spectrum index of the utility model, described high-index material can also be chosen as (Ta205) x (Nb205) y.
Film structure in the high spectrum index of the utility model is the incident light beam split of 1310nm, 1490nm and 1550nm to the incident light medium wavelength; Incident angle is 45 when spending; The transmissivity of different wave length in the incident light: 1255～1365 nm>90%, 1470～1510nm>95%, 1545～1565nm < 5%.
Based on technique scheme, the film structure of the high spectrum index of the utility model compared with prior art has following technique effect:
1. in the film structure of the high spectrum index of the utility model, through making it less than 1QWOT, thereby reach before the accurate control which floor transmitance and and one-tenth-value thickness 1/10 to preceding which floor Thickness Design.Make that like this embryo deposit parameter is more accurate, improve light-operated precision.
2. the first floor adopts and the substrate same material in the film structure of the high spectrum index of the utility model, can improve the coupling of rete and substrate, improves film quality.
Description of drawings
Fig. 1 is that the film of film structure of the high spectrum index of the utility model is project organization figure.
Fig. 2 is the spectrum design curve of the film structure of the high spectrum index of the utility model list.
Fig. 3 is that the theoretical transmitance of the film structure of the high spectrum index of the utility model is with the variation in thickness change curve.
Fig. 4 is the spectrum measured curve figure of the film structure of the high spectrum index of the utility model.
Embodiment
Below we combine accompanying drawing and concrete case study on implementation to come the film structure design of the high spectrum index of the utility model done further to set forth in detail; In the hope of the structure and the course of work of understanding the utility model more cheer and brightly, but can not limit the protection domain of the utility model with this.
In the film structure of the high spectrum index of the utility model, as several technical indicators, need be to the incident light beam split of 1310nm, 1490nm and 1550nm wavelength; Specific targets are: 1255 ~ 1365 nm>90%; 1470 ~ 1510nm>95%, 1545 ~ 1565nm 5%, incident angle 45 degree.In order to reach above-mentioned design parameter, we have designed the described film structure like Fig. 1.The film structure of the high spectrum index of the utility model comprises substrate and is deposited on suprabasil rete.The rete here includes at least five layers of individual layer, is low-index material and the odd number individual layer in the rete adopts, and the even number individual layer is a high-index material.And low-index material is identical with the substrate composition, and substrate is a glass material, and that described low-index material adopts is the Si0 identical with base material
2
The thickness in monolayer of the second layer in the rete to layer 5 is all greater than 1QWOT, whole rete consist of non-regular thin film.
Build film layer structure by the utility model design, as shown in Figure 1.Design film layer structure 1 in substrate 2, wherein prime coat 1-1 is SiO2, and second layer 1-2 is high-index material, and the material that can select adopts (Nb2O5) x (Ta2O5) y here like TiO2, Ta2O5, Nb2O5 etc., and incident medium is an air.Input initial film (LH) ^50 of system in film stack formula considers 0 degree monitoring, and supervisory wavelength 1610nm becomes 2 1/4 optical thicknesses with the first five layer thickening.According to design parameter, its theoretical spectral situation of change is as shown in Figure 2.
In the film structure of the high spectrum index of the utility model, the first five layer thickness satisfies the requirement of thickness in the innovation and creation, as not satisfying, increases thickness and continues to optimize until reaching requirement.After thickness met the demands, the spectrum of inspection monitoring simultaneously is with the thicknesses of layers change curve, and was as shown in Figure 3.Every layer of end point position, spectrum change curve are in rising edge or negative edge but not the extreme point position then meets the demands, otherwise optimize again.Above-mentioned film layer structure is as shown in the table:
| Rete | Thickness (QWOT) |
| SiO2 | 2 |
| (Nb2O5) x (Ta2O5) y | 3.48 |
| SiO2 | 3.18 |
| (Nb2O5) x (Ta2O5) y | 1.91 |
| SiO2 | 2.55 |
| ┇ | ┇ |
| SiO2 | 1.28 |
| (Nb2O5) x (Ta2O5) y | 1.46 |
| SiO2 | 0.48 |
| (Nb2O5) x (Ta2O5) y | 123.12 |
In the case, the film system that design is accomplished carries out plated film, and coating process carries out light-operated.In the coating process, at first calculate the correlative sediments parameter to the 2nd to the 5th layer, this process prepares most important for whole rete, because of face mask layer end point position, back need to calculate with reference to this which floor parameter.
In the film system design of the utility model; Thickness is limited; The starting point of the 2nd to the 5th layer of spectrum has all been passed through maximum value and minimal value to end point, and the position of every layer of end point is at rising edge or negative edge, and promptly spectrum is responsive with variation in thickness; Avoided the insensitive shortcoming of spectrum change in the extremum method, can make parameters calculated more accurate.Begin from layer 6, every layer of spectral transmittance calculated value is all with reference to the 2nd to the 5th layer spectrum parameter.
Through the film structure design of above high spectrum index, we come specifically to answer the utility model with the rete of single fiber three-way optical filter.It is as shown in Figure 4 to manufacture and design the later sample test final curves of completion, and each item performance index reach the expection requirement.Adopt definite value monitoring method in the film structure of the high spectrum index of the utility model, can improve optical monitoring precision and film quality, be fit to the general film structure of preparation, be particularly suitable for the preparation that high spectrum indicator membrane is.
Claims (6)
1. the film structure of a high spectrum index is characterized in that, this film structure comprises substrate and is deposited on suprabasil rete; Described rete comprises at least five layers of individual layer; Odd number individual layer in the rete is a low-index material, and the even number individual layer is a high-index material, and described low-index material is identical with the substrate composition; The thickness in monolayer of the second layer in the rete to layer 5 is all greater than 1QWOT, whole rete consist of non-regular thin film.
2. the film structure of a kind of high spectrum index according to claim 1 is characterized in that, the odd-level in the said rete includes ground floor, the 3rd layer ... Prime coat, described even level comprise the second layer, the 4th layer ...
3. the film structure of a kind of high spectrum index according to claim 2 is characterized in that, described substrate is a glass material, and described low-index material is the Si0 identical with base material
2
4. the film structure of a kind of high spectrum index according to claim 1 is characterized in that, described high-index material or be Ti02 or for Ta205 or for Nb205.
5. the film structure of a kind of high spectrum index according to claim 1 is characterized in that, described high-index material is (Ta205) x (Nb205) y.
6. the film structure of a kind of high spectrum index according to claim 1; It is characterized in that; Described film structure is the incident light beam split of 1310nm, 1490nm and 1550nm to the incident light medium wavelength, and incident angle is 45 when spending, the transmissivity of different wave length in the incident light: 1255～1365 nm>90%; 1470～1510nm>95%, 1545～1565nm < 5%.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011202418803U CN202256725U (en) | 2011-07-11 | 2011-07-11 | Film system structure with high spectra index |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2011202418803U CN202256725U (en) | 2011-07-11 | 2011-07-11 | Film system structure with high spectra index |
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| CN202256725U true CN202256725U (en) | 2012-05-30 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103673905A (en) * | 2013-12-31 | 2014-03-26 | 合波光电通信科技有限公司 | Method for monitoring thickness of magnetron-sputtering-coating optical film |
| CN107728253A (en) * | 2017-11-02 | 2018-02-23 | 北京亮亮视野科技有限公司 | Wide bandwidth, the cascade spectro-film Waveguide array of high uniformity and its application |
| CN112051633A (en) * | 2019-06-07 | 2020-12-08 | 佳能株式会社 | Optical element, optical system, and image pickup apparatus |
| CN114063280A (en) * | 2021-11-19 | 2022-02-18 | 天津津航技术物理研究所 | Wide-angle band-pass filtering film structure for non-planar lens and design method |
-
2011
- 2011-07-11 CN CN2011202418803U patent/CN202256725U/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103673905A (en) * | 2013-12-31 | 2014-03-26 | 合波光电通信科技有限公司 | Method for monitoring thickness of magnetron-sputtering-coating optical film |
| CN103673905B (en) * | 2013-12-31 | 2017-04-12 | 合波光电通信科技有限公司 | Method for monitoring thickness of magnetron-sputtering-coating optical film |
| CN107728253A (en) * | 2017-11-02 | 2018-02-23 | 北京亮亮视野科技有限公司 | Wide bandwidth, the cascade spectro-film Waveguide array of high uniformity and its application |
| CN112051633A (en) * | 2019-06-07 | 2020-12-08 | 佳能株式会社 | Optical element, optical system, and image pickup apparatus |
| CN112051633B (en) * | 2019-06-07 | 2022-08-05 | 佳能株式会社 | Optical element, optical system, and image pickup apparatus |
| US11428858B2 (en) | 2019-06-07 | 2022-08-30 | Canon Kabushiki Kaisha | Optical element, optical system, and image pickup apparatus |
| CN114063280A (en) * | 2021-11-19 | 2022-02-18 | 天津津航技术物理研究所 | Wide-angle band-pass filtering film structure for non-planar lens and design method |
| CN114063280B (en) * | 2021-11-19 | 2024-02-09 | 天津津航技术物理研究所 | Wide-angle band pass filter film structure for non-planar lens and design method |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: HILL MAX TECHNOLOGY LTD. Free format text: FORMER NAME: PINGHU ZHONGTIAN HEBO COMMUNICATION TECHNOLOGY CO., LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: 314200, No. 669, Xinxing Road, Pinghu Economic Development Zone, Zhejiang, Jiaxing, China Patentee after: HEBO OPTICAL COMMUNICATION TECHNOLOGY CO., LTD. Address before: 314200, No. 669, Xinxing Road, Pinghu Economic Development Zone, Zhejiang, Jiaxing, China Patentee before: Pinghu Zhongtian Hebo Communication Technology Co., Ltd. |
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| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20120530 |