CN202230458U - Integrated touch display device - Google Patents

Integrated touch display device Download PDF

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Publication number
CN202230458U
CN202230458U CN2011201901115U CN201120190111U CN202230458U CN 202230458 U CN202230458 U CN 202230458U CN 2011201901115 U CN2011201901115 U CN 2011201901115U CN 201120190111 U CN201120190111 U CN 201120190111U CN 202230458 U CN202230458 U CN 202230458U
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China
Prior art keywords
layer
transparency conducting
conducting layer
touch display
sensor
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Expired - Fee Related
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CN2011201901115U
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Chinese (zh)
Inventor
张小华
潘耀南
章晶晶
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NANJING ALEX FOLEY PHOTOELECTRIC TECHNOLOGY CO LTD
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NANJING ALEX FOLEY PHOTOELECTRIC TECHNOLOGY CO LTD
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Abstract

An integrated touch display device comprises a glass panel, a polarizer, a sensor and a liquid crystal display. The manufacturing method of the touch display device is as follows: plating a transparent conducting layer and a metal strengthening layer on two sides of a base material in sequence by a vacuum spurting plating method, afterwards manufacturing well-designed electrode patterns on the transparent conducting layer and the metal strengthening layer by a photoetching method; then manufacturing a protection rubber layer on a lead area of the metal strengthening layer, subsequently conducting secondary metal etching so as to remove the non-lead area of the metal strengthening layer, then plating silicon dioxide layers on the two sides of the base material so as to complete the manufacturing of the sensor, and finally combining the glass panel, the polarizer, the sensor and the liquid crystal device together and leading out the electrode. Compared with the prior art, the integrated touch display device realizes the integration, the thinning and the weight lightening of the touch display panel, and has the advantages that the processing procedures are few, the processing efficiency is greatly improved and the manufacturing cost is low.

Description

Integrated touch display unit
Technical field
The utility model relates to the electronic display technology field, specifically, is a kind of integrated touch display unit.
Background technology
Contact panel (Touch Panel) has been widely used in products such as household electrical appliances, communication, electronics information and has used, like the palm PC of at present extensive commercialization, various home appliance, recreation inputting interface etc.Touch control display apparatus is available for users to touch the action that input institute desire is carried out with finger or pointer according to the function choosing-item in the display frame by the integration of contact panel and display.The touch display unit technology is the computer technology of the public information transmission system of interactive window through the employing advanced person; Various ways such as utilization literal, image, music, explanation, animation, video recording; Intuitively, introduce various information to people visually, bring great convenience to people.
The touch screen of knowing is the separate type touch-screen basically, and so-called separate type touch-screen is exactly touch panel and liquid crystal panel produced by separation, is then assembled to together.Existing contact panel is laid induction region at a substrate surface, and its induction region uses finger or pointer touch icon or menu to reach the purpose of touch-control.This inductive means is sensor.The employed material of the making of this sensing element mostly adopts the glass that has transparent conductive film (tin indium oxide is commonly called as ITO), makes the user when operation, touches this sensor and reaches the purpose that electric charge shifts.The ITO electro-conductive glass is on the basis of sodium calcium base or silicon boryl substrate glass, utilizes the method for magnetron sputtering to plate indium oxide layer tin film processing and fabricating and forms.
Existing sensor mostly is a multilayer compound glass screen; The making of sensor mainly is to plate transparent metal transparency conducting layer (ITO) in the method for glass surface through vacuum sputtering coating; Process electrode pattern through coating, oven dry, exposure, development, etching, technology such as remove photoresist respectively on the two sides then, make layer of metal with the method for printing low-temperature silver slurry or chemical plating metal again and strengthen routing layer at last.The resolution of the electrode that the mode of printing low-temperature silver slurry can be made is lower, and yields is low; The mode of electroless plating is generally selected to use gold (Au), and not only manufacturing procedure is many, and the poor adhesive force of Au, and the cost of Au is very high simultaneously, and the making yield rate is low.The blocked up meeting of substrate of glass causes weight to increase, and crosses to approach in manufacturing process, to be easy to damage, and can't realize curling, and production efficiency is low.
Separate type touch display unit structural sheet is more at present causes it to be difficult to further slimming, and after touch panel and the display panel produced by separation, production cost is high, and technological process is more numerous and diverse, needs the later stage assembling, and processing procedure is difficult to control, and production efficiency is low.
The utility model content
The technical matters that solves:The utility model is intended to propose a kind of incorporate touch display unit, compared with prior art to above problem; This technical scheme has realized integrated, the slimming and the lightweight of touch display panel; And manufacturing procedure reduces, and working (machining) efficiency improves greatly, and manufacturing cost is also low.
Technical scheme:A kind of integrated touch display unit:
At first, it comprises face glass, sensor and liquid crystal display;
Secondly, sensor comprises base material, protects glue-line, first silicon dioxide layer and second transparency conducting layer that forms at the base material lower surface, the second lead-in wire electrode group, second to protect glue-line, second silicon dioxide layer in first transparency conducting layer, the first lead-in wire electrode group, first of the formation of base material upper surface;
The 3rd; First transparency conducting layer and second transparency conducting layer on sensor substrate surface are transparency electrode; The first lead-in wire electrode group is made up of the metal strengthening layer of transparency conducting layer and covering transparency conducting layer; This lead-in wire electrode group and the first electrodepositing transparent conductive layer gas phase connect, and cover the first protection glue-line on it; The second lead-in wire electrode group is made up of the metal strengthening layer of transparency conducting layer and covering transparency conducting layer, and this lead-in wire electrode group and the second electrodepositing transparent conductive layer gas phase connect, and covers the second protection glue-line on it; First transparency conducting layer and second transparency conducting layer are orthogonal, cover silicon dioxide layer on it.
The 4th, face glass, sensor and liquid crystal display are combined successively extraction electrode, being integrally formed touch display unit.
Be provided with polaroid between face glass and the sensor.
Described base material has multiple choices, can be glass, polyethylene terephthalate (PET) or polycarbonate (PC) or transparent materials such as acrylic (PMMA) or polyolefin, thickness 0.05mm~0.7mm.
Described base material can be the polarisation material, and the polarisation material can be materials such as polyvinyl alcohol (PVA), Triafol T, cyclic olefin polymer.
The material of described transparency conducting layer has multiple choices, can be a kind of or any several kinds composition in tin indium oxide (ITO), zinc paste (ZnO), tin oxide (SnO), aluminium (Al), nickel (Ni), molybdenum (Mo), gold (Au), silver (Ag), copper (Cu), CNT (CNT) film or the electroconductive resin.
The material of described metal strengthening layer has multiple choices, can be a kind of or any several kinds alloy in nickel (Ni), molybdenum (Mo), gold (Au), silver (Ag) or the copper (Cu).
The beneficial effect of the utility model:
1, the utility model provides a kind of integrated touch display unit; Cancelled in the traditional sensors manufacturing process and made the reinforcement lead-in wire through the mode of printing or plating; The substitute is use realizes the mode that whole metal strengthening layer carries out photoetching; And the method for two-sided pattern-making, increased the viewing area, reduced accuracy requirement to binding; It is many that integrated touch display unit of while has solved the separate type touch screen structure, needs the problem of assembling.
2, compared with prior art, this device has been realized integrated, the slimming and the lightweight of touch display panel, and manufacturing procedure reduces, and working (machining) efficiency improves greatly, and manufacturing cost is also low, has increased competitive power.
Description of drawings
Fig. 1 is integrated touch display unit structural representation.Be followed successively by face glass, polaroid, sensor, liquid crystal display from top to bottom;
Fig. 2 is the sensor construction synoptic diagram.Base material (1), first transparency conducting layer (2), the first lead-in wire electrode group (3); The first protection glue-line (4), first silicon dioxide layer (9), second transparency conducting layer (5); The second lead-in wire electrode group (6); The second protection glue-line (7), second silicon dioxide layer (10), metal strengthening layer (8).
Fig. 3 is the synoptic diagram behind base material sputter transparency conducting layer and the metal strengthening layer.
Fig. 4 is synoptic diagram, first photosensitive layer (11) and second photosensitive layer (12) after the coating.
Fig. 5 is the back synoptic diagram that develops.
Fig. 6 is a synoptic diagram after the etching.
Fig. 7 is the back synoptic diagram that removes photoresist.
Fig. 8 is the synoptic diagram of making behind the protection glue of metal strengthening cabling.
Fig. 9 is the synoptic diagram after second etch is removed the metal strengthening layer.
Figure 10 is integrated touch display unit structural representation.Be followed successively by face glass, sensor, liquid crystal display from top to bottom;
The concrete operation that the utility model relates to is following:
1, at the two-sided making transparency conducting layer of base material.Transparency conducting layer can pass through the method for vacuum sputtering coating, vacuum ion membrane plating, vacuum thermal evaporation plated film or coating to be made; It can be glass, polyethylene terephthalate (PET) or polycarbonate (PC) or transparent flexible materials such as acrylic (PMMA) or polyolefin that organic substrate can be selected, thickness 0.05mm~0.7mm.Transparency conducting layer can be a kind of or any several kinds composition in tin indium oxide (ITO), zinc paste (ZnO), tin oxide (SnO), aluminium (Al), nickel (Ni), molybdenum (Mo), gold (Au), silver (Ag), copper (Cu), CNT (CNT) film or the electroconductive resin;
2, make the metal strengthening layer on the upper and lower transparent conductor layers surface.The metal strengthening layer can pass through vacuum sputtering coating, vacuum ion membrane plating, vacuum thermal evaporation plated film, plating or chemical plating method to be made, and the metal strengthening layer can be a kind of or any several kinds of alloys in nickel (Ni), molybdenum (Mo), gold (Au), silver (Ag) or the copper (Cu);
3, through the selective corrosion method at two-sided first transparency conducting layer, the first lead-in wire electrode group, second transparency conducting layer, the second lead-in wire electrode block graphics of forming respectively of base material; The selective corrosion method can adopt the coating photoresists, stick photosensitive dry film or serigraphy photoresists, afterwards the making of drying, exposure, development, etching, the method completion electrode pattern that removes photoresist;
4, make one deck electrode protection glue in the corresponding method of strengthening layer lead-in wire zone passage; Protection glue can adopt serigraphy, circle roller bat printing directly to make;
5, carry out metal etch again one time, the metal strengthening layer in non-lead district is removed.
6, and then make silicon dioxide layer in the non-lead zone of base material, silicon dioxide layer can pass through vacuum sputtering coating, vacuum ion membrane plating, vacuum thermal evaporation plated film, plating or chemical plating method to be made.
7, at last glass cover-plate, polaroid, optical filter, sensor and liquid crystal display are assembled extraction electrode.
Specific embodiment
Below in conjunction with accompanying drawing and embodiment the utility model is further described, but the utility model is not limited in this embodiment.
Embodiment 1
Selecting rolling polyethylene terephthalate (PET) film is base material; Successively plate tin indium oxide (ITO) layer 2 and copper (Cu) layers 8 in the upper surface of PET film 1 method through vacuum sputtering coating; Successively plate tin indium oxide (ITO) layer 5 and copper (Cu) layers 8 in the method for lower surface through vacuum sputtering coating again, referring to Fig. 3; Successively make photosensitive layer 11 and layer 12 on the two sides,, single exposure, development, etching then, remove photoresist, make transparent electrode pattern and cabling reinforcement pattern simultaneously referring to Fig. 4 with the mode of serigraphy, referring to Fig. 5,6,7; Make protection glue-line 4 and layer 7 in the mode of the zone passage serigraphy of strengthening cabling afterwards, referring to Fig. 8; This protection glue needs to tolerate the immersion of second etch liquid; And then, the Cu above the transparent electrode layer is carried out taking turns second etch again, exposed Cu is outside removed fully, referring to Fig. 9; Plate the making of silicon dioxide layer 9 and layer 10 completion sensor then on the two sides of PET film through the method for electroless plating, referring to Fig. 2; At last face glass, polaroid, sensor and liquid crystal display layer are assembled successively, extraction electrode is referring to Fig. 1.So far, promptly accomplished the making of the integrated touch display unit of the utility model.
Embodiment 2.
Present embodiment is with the different of embodiment 1, and the used base material of sensor production is except selecting PET, can reelecting glass or PC or PMMA or polyolefin or flexible material.
Embodiment 3.
Present embodiment is with the different of embodiment 1, makes the transparency conducting layer except the method for using vacuum sputtering coating, can also use the method for vacuum ion membrane plating, vacuum thermal evaporation plated film or coating to make.Transparency conducting layer can be a kind of or any several kinds composition in tin indium oxide (ITO), zinc paste (ZnO), tin oxide (SnO), aluminium (Al), nickel (Ni), molybdenum (Mo), gold (Au), silver (Ag), copper (Cu), CNT (CNT) film or the electroconductive resin.
Embodiment 4.
Present embodiment is with the different of embodiment 1, makes the metal strengthening layer except the method for using vacuum sputtering coating, can also use vacuum ion membrane plating, vacuum thermal evaporation plated film, plating or chemical plating method to make.The metal strengthening layer can pass through vacuum sputtering coating, vacuum ion membrane plating, vacuum thermal evaporation plated film, plating or chemical plating method to be made, and the metal strengthening layer can be a kind of or any several kinds alloy in nickel (Ni), molybdenum (Mo), gold (Au), silver (Ag) or the copper (Cu).No matter select wherein any material, all need control suitable coating film thickness, final impedance will be complementary with circuit.
Embodiment 5.
Present embodiment is with the different of embodiment 1, makes the silicon dioxide layer except the method for using electroless plating, can also be able to pass through vacuum sputtering coating, vacuum ion membrane plating, vacuum thermal evaporation plated film, plating or chemical plating method and make.
Embodiment 6.
Present embodiment is with the different of embodiment 1, except the method for using serigraphy is made the photoresists, also can make with coating photoresists or the mode that sticks photosensitive dry film.
Embodiment 7.
Present embodiment is with the different of embodiment 1, except the method for using serigraphy is made anti-etching glue, also can directly make with coating or circle roller bat printing.
Embodiment 8.
Present embodiment is with the different of embodiment 1, makes the sensor except the operating type that uses volume to volume, also can in advance the PET coiled material be cut into sheet, carries out operation with sheet.
Embodiment 9.
Present embodiment is with the different of embodiment 1; When photoresists were carried out photoetching process, to wherein simultaneously carrying out technology, the exposure of one side, development, etching finished afterwards with diaphragm with its protection firmly earlier; Then another side is carried out identical technology, take off from diaphragm after accomplishing.
Embodiment 10
Present embodiment is with the different of embodiment 1; Selecting the polarisation material is base material; Method on the two sides of base material through vacuum sputtering coating successively plates transparency conducting layer and metal strengthening layer, on transparency conducting layer and metal strengthening layer, makes the electrode pattern that designs through the method for photoetching afterwards; Then on metal strengthening layer lead-in wire zone, make layer of protecting glue; And then carry out for the second time metal etch the metal strengthening layer in non-lead district is removed; And then plate the making that silicon dioxide layer is accomplished sensor on the two sides of base material; At last face glass, sensor and liquid crystal display are combined, extraction electrode is referring to Figure 10.
Embodiment 11
Integrated touch display unit: it comprises face glass, sensor and liquid crystal display; Sensor comprises base material, first transparency conducting layer in the formation of base material upper surface, the first lead-in wire electrode group, the first protection glue-line, first silicon dioxide layer and second transparency conducting layer that forms at the base material lower surface, the second lead-in wire electrode group, second and protects glue-line, second silicon dioxide layer; First transparency conducting layer and second transparency conducting layer on sensor substrate surface are transparency electrode; The first lead-in wire electrode group is made up of the metal strengthening layer of transparency conducting layer and covering transparency conducting layer; This lead-in wire electrode group and the first electrodepositing transparent conductive layer gas phase connect, and cover the first protection glue-line on it; The second lead-in wire electrode group is made up of the metal strengthening layer of transparency conducting layer and covering transparency conducting layer, and this lead-in wire electrode group and the second electrodepositing transparent conductive layer gas phase connect, and covers the second protection glue-line on it; First transparency conducting layer and second transparency conducting layer are orthogonal, cover silicon dioxide layer on it.Face glass, sensor and liquid crystal display are combined successively extraction electrode, being integrally formed touch display unit.Be provided with polaroid between face glass and the sensor.Described base material has multiple choices, can be glass, polyethylene terephthalate (PET) or polycarbonate (PC) or transparent materials such as acrylic (PMMA) or polyolefin, thickness 0.05mm~0.7mm.Described base material can be the polarisation material, and the polarisation material can be materials such as polyvinyl alcohol (PVA), Triafol T, cyclic olefin polymer.The material of described transparency conducting layer has multiple choices, can be a kind of or any several kinds composition in tin indium oxide (ITO), zinc paste (ZnO), tin oxide (SnO), aluminium (Al), nickel (Ni), molybdenum (Mo), gold (Au), silver (Ag), copper (Cu), CNT (CNT) film or the electroconductive resin.The material of described metal strengthening layer has multiple choices, can be a kind of or any several kinds alloy in nickel (Ni), molybdenum (Mo), gold (Au), silver (Ag) or the copper (Cu).
The method for making of integrated touch display unit; Comprise face glass, sensor and liquid crystal display are made up successively; Wherein the making step of sensor is: the method on the two sides of base material through vacuum sputtering coating successively plates transparency conducting layer and metal strengthening layer, on transparency conducting layer and metal strengthening layer, makes the electrode pattern that designs through the method for photoetching afterwards; Then on metal strengthening layer lead-in wire zone, make layer of protecting glue; And then carry out for the second time metal etch the metal strengthening layer in non-lead district is removed; And then the method through electroless plating plates the making that silicon dioxide layer is accomplished sensor on the two sides of base material; At last face glass, polaroid, sensor and liquid crystal display are combined, extraction electrode is promptly accomplished the making of this touch display unit.The method for making of described transparency conducting layer has multiple choices, can adopt the method for vacuum sputtering coating, vacuum ion membrane plating, vacuum thermal evaporation plated film or coating to make transparency conducting layer.The method for making of described metal strengthening layer has multiple choices, can adopt vacuum sputtering coating, vacuum ion membrane plating, vacuum thermal evaporation plated film, plating or chemical plating method to make transparency conducting layer.The method for making of described silicon dioxide layer has multiple choices, can adopt vacuum sputtering coating, vacuum ion membrane plating, vacuum thermal evaporation plated film, plating or chemical plating method to make silicon dioxide layer.Described selective corrosion method can adopt serigraphy, circle roller bat printing directly to make anti-etching glue, afterwards the making of drying, exposure, development, etching, the method completion electrode pattern that removes photoresist.Described photoresists are made public, when development, etching and demoulding technology, can be that technology is carried out on the two sides simultaneously; Also can be, to wherein simultaneously carrying out technology, with diaphragm its protection lived after finishing earlier, then another side carried out technology, remove diaphragm after the completion.Described etching solution is a kind of or any several kinds composition in ferric trichloride, sulfuric acid, hydrochloric acid, nitric acid, hydrofluorite, oxalic acid, ammoniacal liquor or the ammonium chloride.Said sensor production technology can cut the back with organic substrate and carry out operation with sheet form; Also can use the pattern of volume to volume (Roll to Roll) to carry out operation.
Not relating to all identical with the prior art prior art that maybe can adopt of part in the literary composition realizes.The above is the preferred embodiment of the utility model, but the utility model also is not limited to above only embodiment, on embodiment, does the protection domain that improvement also will be regarded as the utility model slightly.

Claims (4)

1. integrated touch display unit is characterized in that:
At first, it comprises face glass, sensor and liquid crystal display;
Secondly, sensor comprises base material, protects glue-line, first silicon dioxide layer and second transparency conducting layer that forms at the base material lower surface, the second lead-in wire electrode group, second to protect glue-line, second silicon dioxide layer in first transparency conducting layer, the first lead-in wire electrode group, first of the formation of base material upper surface;
The 3rd; First transparency conducting layer and second transparency conducting layer on sensor substrate surface are transparency electrode; The first lead-in wire electrode group is made up of the metal strengthening layer of transparency conducting layer and covering transparency conducting layer; This lead-in wire electrode group and the first electrodepositing transparent conductive layer gas phase connect, and cover the first protection glue-line on it; The second lead-in wire electrode group is made up of the metal strengthening layer of transparency conducting layer and covering transparency conducting layer, and this lead-in wire electrode group and the second electrodepositing transparent conductive layer gas phase connect, and covers the second protection glue-line on it; First transparency conducting layer and second transparency conducting layer are orthogonal, cover silicon dioxide layer on it;
The 4th, face glass, sensor and liquid crystal display are combined successively extraction electrode, being integrally formed touch display unit.
2. integrated touch display unit according to claim 1 is characterized in that base material is glass, polyethylene terephthalate, polycarbonate, acrylic or polyolefin, thickness 0.05mm~0.7mm.
3. integrated touch display unit according to claim 1 is characterized in that being provided with polaroid between face glass and the sensor.
4. integrated touch display unit according to claim 1 is characterized in that base material is the polarisation material, and said polarisation material is polyvinyl alcohol (PVA), Triafol T or cyclic olefin polymer.
CN2011201901115U 2011-06-07 2011-06-07 Integrated touch display device Expired - Fee Related CN202230458U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102799326A (en) * 2012-07-03 2012-11-28 深圳市长江力伟股份有限公司 Capacitive screen function sheet with double-faced electrode routing and machining method thereof
CN104516184A (en) * 2013-10-02 2015-04-15 胜华科技股份有限公司 touch projection system and method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102799326A (en) * 2012-07-03 2012-11-28 深圳市长江力伟股份有限公司 Capacitive screen function sheet with double-faced electrode routing and machining method thereof
CN104516184A (en) * 2013-10-02 2015-04-15 胜华科技股份有限公司 touch projection system and method thereof

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Granted publication date: 20120523

Termination date: 20140607