A kind of planar silicon target
Technical field
The utility model relates to the sputter coating technical field, especially a kind of planar silicon target that is used for sputter coating.
Background technology
Existing planar silicon target is to be coated with last layer phosphide material layer to carry out sintering then and process the target product at the back side of plate silicon material mostly; The planar silicon target is mainly used in plated film, in filming process is to utilize phosphide material layer and the copper of planar silicon target to carry out carrying out the plated film operation again after bonding; But this planar silicon target, because the hardness of silicon is high, the hardness of indium is soft, fusing point is low, both bonding strengths are not ideal enough, in use occur phosphide material layer and plate silicon material easily and break away from, and influence the normal use of planar silicon target.
The utility model content
The technical problem that the utility model will solve provides a kind of planar silicon target, and the bonding strength height and the electric conductivity of phosphide material layer and plate silicon material are better, improves the reliability that target uses.
For achieving the above object, the technical scheme of the utility model is: a kind of planar silicon target, comprise plate silicon material, and the back side of plate silicon material is coated with chromium material layer, nickel chromium triangle material layer, silver material layer successively, on silver material layer, is coated with the phosphide material layer at last.
Described plate silicon material is a square or rectangular.
Described plate silicon material is a polysilicon.
The utility model is followed successively by ground floor chromium plating owing to carry out plated film earlier at the plate silicon material back side, and the hardness of chromium is soft slightly than silicon; Second layer nickel plating chromium, the hardness of nickel chromium triangle are soft slightly than chromium again, and the 3rd layer silver-plated; The hardness of silver is soft slightly than nickel chromium triangle again, and the hardness of each layer is reduced successively, and the bond strength of each layer can be guaranteed again; On silver material layer, spray the phosphide material layer at last again, because the hardness of indium is suitable with silver, phosphide material layer and silver material layer ability combine well; The bonding strength and the electric conductivity of final assurance phosphide material layer and plate silicon material are better, improve the reliability that target uses.
Description of drawings
Fig. 1 is the utility model front view.
Fig. 2 is the A-A cutaway view of Fig. 1.
The specific embodiment
Below in conjunction with accompanying drawing and concrete embodiment the utility model is done further explain.
Fig. 1, shown in Figure 2, a kind of planar silicon target comprises plate silicon material 1, the back side of plate silicon material 1 is coated with chromium material layer 2, nickel chromium triangle material layer 3, silver material layer 4 successively, on silver material layer 4, is coated with phosphide material layer 5 at last.
Described plate silicon material 1 is a square or rectangular.
Described plate silicon material is a polysilicon.
Below only be preferred embodiment of the utility model, those skilled in the art is so long as the change of doing to be equal to by claim all falls into the protection domain of this case.