CN202041501U - Electroplating liquid analyzer - Google Patents
Electroplating liquid analyzer Download PDFInfo
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- CN202041501U CN202041501U CN2011200468259U CN201120046825U CN202041501U CN 202041501 U CN202041501 U CN 202041501U CN 2011200468259 U CN2011200468259 U CN 2011200468259U CN 201120046825 U CN201120046825 U CN 201120046825U CN 202041501 U CN202041501 U CN 202041501U
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- electroplating liquid
- electroplating
- electroplating bath
- bath solution
- light source
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Abstract
The utility model provides an electroplating liquid analyzer, which is applicable to the technical field of electroplating and capable of analyzing concentration of electroplating liquid. The electroplating liquid analyzer comprises a colorimetric cell, a light source, a photoelectric conversion unit, an MCU (microprogrammed control unit) and an analyzed result output display unit, wherein the colorimetric cell is used for containing electroplating liquid to be tested, the light source and the photoelectric conversion unit are arranged on two sides of the colorimetric cell respectively, the MCU is connected with the photoelectric conversion unit, and the analyzed result output display unit is connected with the MCU. Based on the principle of optics, the electroplating liquid analyzer is capable of selecting the corresponding light source according to ions in the electroplating liquid, analyzing concentration of the ions in the electroplating liquid according to the absorption degree of the electroplating liquid for lights, and displaying analyzed results. Further, technical requirements for operators are low during the integral analyzing process, the operators only need to inject electroplating liquid into the colorimetric cell, test speed is fast, preparation of any standard solution is omitted, data can be directly read without relative calculation during test, a test of a sample can be completed in only few seconds, and real-time test can be realized as well.
Description
Technical field
The utility model belongs to the electroplating technology field, relates in particular to a kind of electroplating bath solution analyser.
Background technology
Nickel plating coating has hardness height, good, the good corrosion resistance of magnetic, and application is all arranged in a lot of fields.In the Ni-Speed, the main salt nickelous sulfate of plating bath and the concentration of reductive agent sodium hypophosphite play conclusive effect to the stability of plating speed, coating, plating bath, and consumption, the supply ratio of main salt nickelous sulfate and reductive agent sodium hypophosphite were generally 1: 1.In the electroplating process, main salt nickelous sulfate and reductive agent sodium hypophosphite are with how many ceaselessly consumption of input of workpiece, and concentration also constantly changes.Therefore, the concentration of correct analysis master salt nickelous sulfate gives reasonably to add the consumption part then at short notice, and the variation of control concentration is in certain scope, to keep the consistance of technological process.
For a long time, the existing analytical approach of concentration of nickel sulfate has two kinds of chemical analysis (being analysis by titration again) and the anti-predication methods of measurement of coating thickness, and all there are many deficiencies in these two kinds of methods, and main details are as follows:
Chemical analysis is consuming time, efficient is low, should not grasp, and error is big, but with low cost.Be embodied in: 1. couple laboratory personnel's technical requirement height, the beginner is difficult to grasp at short notice, and visualization of color is seen inaccurate; 2. chemical examination speed is relatively slow, and the most of the time is wasted on the preliminary works such as standard solution preparation, demarcation, and the man-hour of expending is bigger; A duty multipotency is not realized in the post simultaneously; 3. the addition and the order of the preparation of standard solution, demarcation, plating bath dilution, auxiliary reagent, and endpoint exists error relatively large, causes the chemical examination accuracy not high; 4. assay step is loaded down with trivial details, not only needs in the chemical examination process plating bath is diluted, and the reagent of Tian Jiaing is more simultaneously, inefficiency; 5. chemically examine the cost height, the chemical examination medicine that uses in traditional titration process more (chemical examination such as nickelous sulfate needs 5 kinds of reagent), consumption is also bigger, causes the chemical examination cost bigger; 6. the utility appliance of Shi Yonging is more, such as analytical balance, electric furnace, a large amount of transfer pipet, reagent bottle, volumetric flask, buret etc.
The anti-predication method equipment cost of measurement of coating thickness height (needing the X-ray thicknessmeter), the prediction equation of using rule of thumb obtains, and the reckoning value is only represented that measured part, the most important thing is that error is big (after getting a part at coating bath and delivering to the laboratory and measure thickness, extrapolate concentration again, change has taken place again in interior during this period of time bath concentration), though method of testing is fairly simple, if but tested part has broken away from the coating bath time above about 30 seconds (when target coating is 3-5um) in electroplating process, just can not put back to coating bath again, can only scrap.
The utility model content
Technical problem to be solved in the utility model is to provide a kind of electroplating bath solution analyser, is intended to carry out fast and easily the concentration monitor of chemical plating fluid, is convenient to add in real time in the electroplating process, and concentration value is in certain scope, to keep the consistance of technological process.
The utility model is achieved in that a kind of electroplating bath solution analyser, comprising:
Be used to hold the cuvette of electroplating bath solution to be measured;
Be positioned at the light source and the photoelectric conversion unit of described cuvette both sides;
The MCU unit that is connected with described photoelectric conversion unit;
The analysis result output unit that is connected with described MCU unit.
Further, described cuvette has an inlet, and described electroplating bath solution analyser also comprises:
One cooling unit that is connected with the inlet of described cuvette.
Further, described electroplating bath solution analyser also comprises:
Be connected the membrane pump sampling unit between outside coating bath and the described cooling unit.
Further, described electroplating bath solution analyser also comprises the power supply that a while and described light source are connected with described MCU unit.
Further, described cuvette also has a liquid outlet.
Electroplating bath solution analyser provided by the utility model is realized based on optical principle, select corresponding light source irradiation at the ion in the electroplating bath solution, according to electroplating bath solution the degree of absorption of light is analyzed the concentration of this ion in the plating bath and exported analysis result, The whole analytical process is not high to operating personnel's technical requirement, only needing that electroplating bath solution is put into cuvette gets final product, and chemical examination speed is fast, do not need to prepare any standard solution, direct reading in the chemical examination process, do not need relevant the conversion, the chemical examination of a sample only needs just can finish several seconds.
Description of drawings
Fig. 1 is the structure principle chart of the electroplating bath solution analyser that provides of the utility model;
Fig. 2 is the fundamental diagram of electroplating bath solution analyser shown in Figure 1.
Embodiment
In order to make the purpose of this utility model, technical scheme and advantage clearer,, the utility model is further elaborated below in conjunction with drawings and Examples.Should be appreciated that specific embodiment described herein only in order to explanation the utility model, and be not used in qualification the utility model.
Among the utility model embodiment, based on the analysis of optical principle realization to electroplating bath solution intermediate ion concentration, select corresponding light source irradiation at ion to be analyzed, the degree of absorption of light is analyzed the concentration of plating bath intermediate ion and exported analysis result according to electroplating bath solution.
Fig. 1 shows the structural principle of the electroplating bath solution analyser that the utility model provides, and for convenience of description, only shows the part relevant with present embodiment.
With reference to Fig. 1, the electroplating bath solution analyser comprises light source 1, cuvette 2, photoelectric conversion unit 3, MCU unit 4, analysis result output unit 5, wherein, light source 1 and photoelectric conversion unit 3 are positioned at the both sides of cuvette 2, and cuvette 2 is used to hold electroplating bath solution to be measured, in the present embodiment, the light source selected for use need with plating bath in treat that measured ion is corresponding, because nickeliferous plating bath is rendered as green, be about 650nm at the absorption peak of visible-range interior focusing, therefore can select red light source for use.The light that light source 1 sends goes into to inject cuvette 2, and cuvette 2 and a part of by plating bath absorption is wherein crossed in the light transmission, and the light of transmission is converted to electric signal by photoelectric conversion unit 3.MCU unit 4 is connected with photoelectric conversion unit 3, receive the electric signal of photoelectric conversion unit 3 and through analyzing plating bath in the cuvette 2 after the calculation process to the absorbance log of light, and then analyze the concentration of ion in the plating bath, with analysis result output unit 5 outputs of analysis result by being connected with MCU unit 4, also can be further to external agency's output control signal, corresponding liquid medicine is added in control in coating bath.
Further, consider that the temperature of plating bath may be higher, should not directly enter cuvette 2, therefore the inlet at cuvette 2 connects a cooling unit (not shown), enters cuvette 2 again after plating bath cools in this cooling unit.
Further, this electroplating bath solution analyser also can comprise a membrane pump sampling unit, is connected between outside coating bath and this cooling unit.
Further, this chemical plating fluid analyser also comprises the power supply 6 that a while and light source 1 are connected with MCU unit 4, and power supply 6 is used to light source 1 and 4 power supplies of MCU unit.
Further, cuvette 2 also has a liquid outlet, and when analysis finishes, plating bath flows out to outside coating bath from this liquid outlet, and plating bath avoids waste.
The principle of work of above-mentioned electroplating bath solution analyser as shown in Figure 2.
The electroplating bath solution analyser that the utility model provides has following characteristics:
1. technical requirement is not high, only needs use that plating bath is put into cuvette and gets final product.
2. chemical examination speed is fast, does not need to prepare any standard solution, and direct reading in the chemical examination process does not need relevant the conversion, and the chemical examination of a sample only needs just can finish in several seconds.
3. this analyser can also be used for the real-time online continuous detecting, control is added.
4. this analyser can also be done and be used for the detection of hand-held plating bath.
5. can survey liquid nickel plating solution, copper sulphate, nickelous sulfate, nickel chloride, chromium plating plating bath, galvanization liquid.
6. need not add any medicament in the analytic process, so the chemical examination cost is well below traditional titrimetry.
7. do not need to dispose other utility appliance, equipment such as analytical balance, electric furnace, conical flask, beaker do not need.
8. verification when only needing first the use.
9. measuring accuracy is high, can reach 0.1g/L.
The above only is preferred embodiment of the present utility model; not in order to restriction the utility model; all any modifications of within spirit of the present utility model and principle, being done, be equal to and replace and improvement etc., all should be included within the protection domain of the present utility model.
Claims (5)
1. an electroplating bath solution analyser is characterized in that, comprising:
Be used to hold the cuvette of electroplating bath solution to be measured;
Be positioned at the light source and the photoelectric conversion unit of described cuvette both sides;
The MCU unit that is connected with described photoelectric conversion unit;
The analysis result output unit that is connected with described MCU unit.
2. electroplating bath solution analyser as claimed in claim 1 is characterized in that described cuvette has an inlet, and described electroplating bath solution analyser also comprises:
One cooling unit that is connected with the inlet of described cuvette.
3. electroplating bath solution analyser as claimed in claim 2 is characterized in that, described electroplating bath solution analyser also comprises:
Be connected the membrane pump sampling unit between outside coating bath and the described cooling unit.
4. electroplating bath solution analyser as claimed in claim 1 is characterized in that, described electroplating bath solution analyser also comprises the power supply that a while and described light source are connected with described MCU unit.
5. electroplating bath solution analyser as claimed in claim 1 is characterized in that described cuvette also has a liquid outlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011200468259U CN202041501U (en) | 2011-02-24 | 2011-02-24 | Electroplating liquid analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011200468259U CN202041501U (en) | 2011-02-24 | 2011-02-24 | Electroplating liquid analyzer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202041501U true CN202041501U (en) | 2011-11-16 |
Family
ID=44968939
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011200468259U Expired - Fee Related CN202041501U (en) | 2011-02-24 | 2011-02-24 | Electroplating liquid analyzer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202041501U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103323402A (en) * | 2013-04-07 | 2013-09-25 | 东莞市常晋凹版模具有限公司 | Portable chromium liquor components detection device and detection method |
| CN108957345A (en) * | 2018-08-02 | 2018-12-07 | 东北大学 | Information about power acquisition device, method and the detection method of quantity of electricity of all-vanadium liquid flow energy storage system |
| CN110095418A (en) * | 2019-04-08 | 2019-08-06 | 北京时代新维测控设备有限公司 | A kind of photoelectric colorimetry measuring device |
-
2011
- 2011-02-24 CN CN2011200468259U patent/CN202041501U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103323402A (en) * | 2013-04-07 | 2013-09-25 | 东莞市常晋凹版模具有限公司 | Portable chromium liquor components detection device and detection method |
| CN108957345A (en) * | 2018-08-02 | 2018-12-07 | 东北大学 | Information about power acquisition device, method and the detection method of quantity of electricity of all-vanadium liquid flow energy storage system |
| CN108957345B (en) * | 2018-08-02 | 2019-11-26 | 东北大学 | Information about power acquisition device, method and the detection method of quantity of electricity of all-vanadium liquid flow energy storage system |
| CN110095418A (en) * | 2019-04-08 | 2019-08-06 | 北京时代新维测控设备有限公司 | A kind of photoelectric colorimetry measuring device |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20111116 Termination date: 20190224 |
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| CF01 | Termination of patent right due to non-payment of annual fee |