CN201903327U - Free space micro optics optical lever system for nanoscale micro-displacement measurement - Google Patents
Free space micro optics optical lever system for nanoscale micro-displacement measurement Download PDFInfo
- Publication number
- CN201903327U CN201903327U CN2010206657207U CN201020665720U CN201903327U CN 201903327 U CN201903327 U CN 201903327U CN 2010206657207 U CN2010206657207 U CN 2010206657207U CN 201020665720 U CN201020665720 U CN 201020665720U CN 201903327 U CN201903327 U CN 201903327U
- Authority
- CN
- China
- Prior art keywords
- micro
- free space
- optical lever
- waveguide interface
- nanoscale
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
A free space micro optics optical lever system for nanoscale micro-displacement measurement comprises a semiconductor laser, wherein incoming laser into a micro collimating lens is emitted from the semiconductor laser, reflected light from the micro collimating lens enters into a cantilever beam-mass block system, light beam from the cantilever beam-mass block system is reflected by a reflecting mirror, reflected light reflected by the reflecting mirror is projected on a PSD photosensitive board through a waveguide interface, the waveguide interface is coated with a high-reflective film, and the waveguide interface is connected with a processing circuit board. By adopting the technical scheme and in virtue of micro optics processing techniques such as photoetching and etch, the free space micro optics optical lever system can be used for developing a plane integrated free space optical lever type micro accelerometer. The integrated free space micro optics system manufactured through the micro optics technique has the advantages of small volume, low cost, high alignment accuracy, steady system, convenience in mass production, and the like.
Description
Technical field
The utility model relates to a kind of optical lever system, specifically relates to a kind of free space micro-optic optical lever system of nanoscale microdisplacement measurement.
Background technology
The minute angle measuring system can the measurement plane mirror A or the anglec of rotation of level crossing A ' by measuring the displacement of luminous point on PSD.Can constitute surface plasma resonance sensor thus, or utilize surface plasmon oscillations to carry out the detection of the terahertz electromagnetic wave under the room temperature.
1, optical lever is amplified: it is the reflection law that utilizes light that optical lever is amplified, and minute angle, micro-displacement are amplified.Measure the value of small quantity indirectly by measuring amplification quantity, can reflect direction of motion simultaneously.This method also often is applied in the design of AFM (atomic force microscope).
Surface plasma body resonant vibration (SPR) sensor: this sensor comprises a prism that is coated with the thin coat of metal.Wherein metal level becomes the interface between prism and the insulator.A branch of horizontal unidirectional polarized light of magnetization incides on the face of prism, by metal layer reflection, arrives the another side of prism.The intensity of folded light beam can measure, be used for calculating the size of the incident angle of incident beam.Catoptrical intensity descends suddenly at some special incident angles, just in this angle. and the energy of incident light is complementary with the surface plasma body resonant vibration (SPR) that is produced by the excitation of metal-insulator interface.General-layer film (as biological membrane) is deposited on the metal level, and the refraction coefficient of megohmite insulant can change.Refraction coefficient depends on the thickness of megohmite insulant and precipitation membrane and the size of density.As long as the value of test incident angle, the thickness and the density of precipitation membrane just can derive out.
2, the Terahertz room temperature detector detector based on surface plasmon oscillations utilizes Kretschmann – Raether structure to constitute.The optical micromechanical minute angle measuring system of design has been improved optical readout device, has replaced photodetector, has improved the measuring accuracy of deflection angle.This micromechanics detector comprises (transverse magnetic) polarization light source of a TM polarization, by optical couping device (prism or optical grating construction), in sandwich construction excitating surface plasma communication mode.Photodetector detection of reflected light intensity.Sandwich construction is made up of metallic film (silver, gold) and incident radiation conduction absorption portion.(incident radiation conduction absorption portion is a twin lamella micro-cantilever, and last finishing coat is an absorption layer).The incident angle of light wave is fixing and optimization, can excitating surface plasma.Under the static schema, the absorption of terahertz electromagnetic wave incident radiation can improve the semi-girder temperature, and semi-girder is crooked in proportion.Cantilever bending changes the thickness that causes between cantilever lower surface and the metal film and changes, and causes the SPR angle to change.Therefore, the metallic film reflective light intensity of the launching efficiency of surface plasma and fixed angle is all relevant with the micro-cantilever deflection of beam.The power of incident radiation can obtain by the variation of determining the metallic film reflectivity.
Above-mentioned micro-optic optical lever read-out system goes for broad spectrum light source, by different reflection SPR angles, the terahertz emission wavelength that obtains measuring.This device can also be applicable to detector array, improves detection sensitivity, or constitutes the terahertz imaging system.But its structure is too complicated, and cost is too high, implements too trouble.
Summary of the invention
The purpose of this utility model provides that a kind of volume is little, cost is low, alignment precision is high, the free space micro-optic optical lever system of system stability, the nanoscale microdisplacement measurement being convenient to produce in enormous quantities.
For achieving the above object, the utility model is by the following technical solutions:
The utility model comprises semiconductor laser, and the laser that described semiconductor laser sends incides in the micro collimating lens, and the reflected light that micro collimating lens comes out is in semi-girder-mass system; The light beam that comes out from semi-girder-mass system is by mirror reflects, and its reflected light projects on the PSD photosensitive plate through waveguide interface; Be coated with the high-reflecting film layer on the described waveguide interface, and waveguide interface is connected with the treatment circuit plate.
Described semi-girder-mass system is made of the level crossing that is arranged in parallel.
Adopt the utility model of technique scheme, utilize micro-optic process technologies such as photoetching, etching, can develop the integrated free space optical lever micro-acceleration gauge in plane.With the integrated free space micro-optical systems that the micro-optic technology produces, it is little to have a volume, and cost is low, the alignment precision height, and system stability is convenient to advantages such as production in enormous quantities.
Description of drawings
Fig. 1 is an one-piece construction synoptic diagram of the present utility model.
Embodiment
As shown in Figure 1, the utility model was made of three stacked adding.Wherein the I layer comprises semiconductor laser LD, and the laser that semiconductor laser LD sends incides in the micro collimating lens 1, and the reflected light that micro collimating lens 1 comes out is in semi-girder-mass system; The light beam that comes out from semi-girder-mass system is reflected by catoptron 2, and its reflected light reflexes in the II layer.In the II layer, reflected light is coated with the surface reflection of high-reflecting film at first perpendicular to waveguide interface 3 incidents through waveguide, and light beam finally is vertically projected on the PSD photosurface 4.And the waveguide interface 3 of both sides is connected with the treatment circuit plate 5 of III layer.The 3rd layer is made of the treatment circuit that is integrated on silica-based, and it finishes functions such as power supply control, PSD signal Processing.
Above-mentioned semi-girder-mass system is made of the level crossing 6,7 that is arranged in parallel, and a surface of the semi-girder in semi-girder-mass microstructure is coated with high-reflecting film, the level crossing that formation can be swung.
The shape of optical waveguide and angle require design accurately.The process technology maturation of micro-optic optical waveguide, the machining precision height, the technology of realization is guaranteed.The 3rd layer is the treatment circuit that is integrated on silica-based, finishes functions such as power supply control, PSD signal Processing.
Light source in the micro-acceleration gauge is selected extremely important, can direct integrated LD chip.Light beam will pass through the lenticule shaping earlier.The DOE lens combination that miniature collimation lens can adopt the micro-optic technology making, lens diameter gets final product for big three times than beam diameter.If light beam adopts Conical Lenses to produce, beam diameter 200 μ m can transmit 10m.The effect of a catoptron that increases in the I layer is that 90 ° of rotations are carried out in the direction of propagation of light beam.Light beam changes the transmission of X-Z face into by the Y-Z planar transmission.The purpose of design is the size of balanced system in X, Y direction, helps system stability.
The substrate of II layer structure is selected the less optical waveguide material of refractive index for use.When mass is swung, cause that luminous point moves along Y direction at the II layer, the zone of the white that shows in the II layer of moving range.Green is a light path critical line up and down with blueness in the II layer.If optical lever level crossing group length is elected 2.5mm as, level crossing spacing 350
μM, spot diameter 200
μM, light beam reflection angle in the II layer is 30 °, and then system dimension can be controlled within 30mm * 20mm * 23mm.
Claims (2)
1. the free space micro-optic optical lever system of a nanoscale microdisplacement measurement, it is characterized in that: it comprises semiconductor laser (LD), the laser that described semiconductor laser (LD) sends incides in the micro collimating lens (1), and the reflected light that micro collimating lens (1) comes out is in semi-girder-mass system; The light beam that comes out from semi-girder-mass system is reflected by catoptron (2), and its reflected light projects on the PSD photosensitive plate (4) through waveguide interface (3); Described waveguide interface is coated with the high-reflecting film layer on (3), and waveguide interface (3) is connected with treatment circuit plate (5).
2. the free space micro-optic optical lever system of nanoscale microdisplacement measurement according to claim 1 is characterized in that: described semi-girder-mass system is made of the level crossing that is arranged in parallel (6,7).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010206657207U CN201903327U (en) | 2010-12-17 | 2010-12-17 | Free space micro optics optical lever system for nanoscale micro-displacement measurement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010206657207U CN201903327U (en) | 2010-12-17 | 2010-12-17 | Free space micro optics optical lever system for nanoscale micro-displacement measurement |
Publications (1)
Publication Number | Publication Date |
---|---|
CN201903327U true CN201903327U (en) | 2011-07-20 |
Family
ID=44273920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010206657207U Expired - Fee Related CN201903327U (en) | 2010-12-17 | 2010-12-17 | Free space micro optics optical lever system for nanoscale micro-displacement measurement |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN201903327U (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103604374A (en) * | 2013-11-25 | 2014-02-26 | 重庆川仪分析仪器有限公司 | Micro-displacement optical lever laser measurement system and magnetic mechanical oxygen sensor thereof |
CN105953905A (en) * | 2016-04-21 | 2016-09-21 | 大连理工大学 | Transient micro-vibration measurement device and method based on prism refracting signal amplification |
CN107607048A (en) * | 2017-09-20 | 2018-01-19 | 潍坊学院 | A kind of optical lever measurement apparatus |
CN115560682A (en) * | 2022-12-05 | 2023-01-03 | 上海拜安传感技术有限公司 | Displacement measuring device and manufacturing method thereof |
-
2010
- 2010-12-17 CN CN2010206657207U patent/CN201903327U/en not_active Expired - Fee Related
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103604374A (en) * | 2013-11-25 | 2014-02-26 | 重庆川仪分析仪器有限公司 | Micro-displacement optical lever laser measurement system and magnetic mechanical oxygen sensor thereof |
CN103604374B (en) * | 2013-11-25 | 2016-04-13 | 重庆川仪分析仪器有限公司 | Micrometric displacement optical lever laser measurement system and magnetic mechanical oxygen sensor thereof |
CN105953905A (en) * | 2016-04-21 | 2016-09-21 | 大连理工大学 | Transient micro-vibration measurement device and method based on prism refracting signal amplification |
CN105953905B (en) * | 2016-04-21 | 2019-01-08 | 大连理工大学 | A kind of micro- vibration measuring equipment of transient state and method based on the amplification of refraction by prism signal |
CN107607048A (en) * | 2017-09-20 | 2018-01-19 | 潍坊学院 | A kind of optical lever measurement apparatus |
CN107607048B (en) * | 2017-09-20 | 2019-12-03 | 潍坊学院 | A kind of optical lever measuring device |
CN115560682A (en) * | 2022-12-05 | 2023-01-03 | 上海拜安传感技术有限公司 | Displacement measuring device and manufacturing method thereof |
CN115560682B (en) * | 2022-12-05 | 2023-02-03 | 上海拜安传感技术有限公司 | Displacement measuring device and manufacturing method thereof |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5712705A (en) | Arrangement for analysis of substances at the surface of an optical sensor | |
CN110360935B (en) | In-plane displacement sensing unit and method based on simplified optical nano resonant cavity | |
CN107941154B (en) | Displacement measurement system and measurement method | |
CN110737033B (en) | Structure and method for realizing polarization interference based on super surface and application thereof | |
CN110836640B (en) | Out-of-plane displacement sensing unit and method based on near-field optical resonant cavity | |
CN201903327U (en) | Free space micro optics optical lever system for nanoscale micro-displacement measurement | |
CN102478389A (en) | Method for measuring thickness of metal film of lithographic mask | |
KR20020076297A (en) | Optical distance sensor | |
CN103884298A (en) | System and method for measuring metal surface roughness on basis of guiding mold | |
CN112415284A (en) | Portable microwave electric field measuring device based on rydberg atoms | |
CN108613949B (en) | Angle scanning refractive index sensor based on asymmetric metal cladding dielectric waveguide | |
CN104730868A (en) | Large-diameter diffraction grating exposure device and manufacture method of large-diameter diffraction grating | |
CN103075966B (en) | Displacement measurement system | |
US6198862B1 (en) | Optical position detector | |
CN111765853A (en) | High-resolution one-dimensional angle measurement laser sensor | |
CN106091954B (en) | Utilize the method for dielectric film control Otto structure hollow air gap thickness | |
KR101793831B1 (en) | Collimating optics for transmitting and receiving optical signal, and Displacement amount measuring system using laser interferometer | |
TW552401B (en) | Sensor head | |
CN108801173A (en) | Point-diffraction interference detecting system based on Nanowire Waveguides | |
CN109470659A (en) | This high-throughput ancient Hansen displacement type spr sensor | |
CN103969220B (en) | A kind of method detecting UV glue curing process dynamics optical characteristics | |
JP4545784B2 (en) | Reflective micro-optic interferometer type filter and its application equipment | |
CN217878071U (en) | Whispering gallery mode temperature sensor | |
CN109443241A (en) | A kind of high speed axial direction scanning confocal micro-measurement apparatus and method based on tuning fork driving | |
US20100149552A1 (en) | Optical metrology system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110720 Termination date: 20111217 |