CN201850135U - Hydrogen chloride gas drying device - Google Patents
Hydrogen chloride gas drying device Download PDFInfo
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- CN201850135U CN201850135U CN2011200514401U CN201120051440U CN201850135U CN 201850135 U CN201850135 U CN 201850135U CN 2011200514401 U CN2011200514401 U CN 2011200514401U CN 201120051440 U CN201120051440 U CN 201120051440U CN 201850135 U CN201850135 U CN 201850135U
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- tower body
- hydrogen chloride
- chloride gas
- chlorosilane
- refrigerant
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Abstract
The utility model provides a hydrogen chloride gas drying device, comprising a tower body (14), wherein the top of the tower body (14) is provided with a hydrogen chloride gas outlet (2), the bottom of the tower body (14) is provided with a chlorosilane liquid outlet (3), the tower body (14) is further provided with a hydrogen chloride gas outlet (1), a chlorosilane liquid inlet (4), a refrigerant inlet (6) and a refrigerant outlet (7), the hydrogen chloride gas inlet (1) is provided with a pipeline extending downward in the tower body (14), and the refrigerant inlet (6) and the refrigerant outlet (7) are arranged at the lower part of the tower body (14) and are communicated through an inner coiler (13). In the hydrogen chloride gas drying device provided by the utility model, water-containing hydrogen chloride comes into sufficient contact with chlorosilane, sprayed in from the chlorosilane liquid inlet (4), via the hydrogen chloride gas inlet (1) so that water content is subjected to reaction to generate hydrogen chloride. The hydrogen chloride gas drying device has a simple structure and a low cost, is convenient for production implementation, can meet a requirement on dehydration depth and can be used for separating the chlorosilane to obtain pure hydrogen chloride gas.
Description
Technical field
The utility model relates to a kind of gas drier, is specifically related to a kind of hydrogen chloride gas drying installation that hydrochloric acid takes off the suction hydrogen chloride gas moisture that produces that is used for removing.
Background technology
Along with the continuous consumption of fossil energy, the development and utilization to renewable energy source is constantly accelerated in countries in the world.Sun power has obtained the attention and the favor of various countries as a kind of cleaning, efficient, the huge energy.Under the positive policy in European various countries drove, solar-photovoltaic technology had obtained fast development, and then the raw material polysilicon demand of making photovoltaic cell is sharply increased.Making polysilicon needs high-quality trichlorosilane, and the product confrontation trichlorosilane output and the quality of hydrogenchloride have material impact.
At first, the hypervolia in the hydrogen chloride gas can reduce the yield of trichlorosilane in the fluidized-bed, and the production cost of trichlorosilane is risen; Also can increase the yield of silicon tetrachloride in the fluidized-bed simultaneously,, and have bigger toxicity, deal with very difficulty, and then increase the weight of the environmental protection pressure and the operation cost of production of polysilicon enterprise because silicon tetrachloride is the by product in the synthesizing trichlorosilane process.
Secondly, the hypervolia in the hydrogen chloride gas also can cause the hydrolysis of part chlorosilane, produces silicon-dioxide and is attached to the line clogging that causes synthesis system on the tube wall, and then have influence on the normal operation of production.
At present, industrially be used for the technology that moisture hydrogenchloride removes water and have: 1) method of cooling, promptly adopt graphite cooler cooling dehydration, owing to be subjected to the influence because of rope such as heat transfer efficiency, sealing, hydrogen chloride gas can only be cooled to about 45 ℃ or normal temperature, and this moment hydrogen chloride gas in water-content be about 0.3%-0.5%.If adopt metallic substance to make water cooler, cooling efficiency can be improved and pressure can be born, hydrogen chloride gas can be cooled to below 0 ℃, water-content can be reduced to 10 * 10 in the hydrogenchloride
-6Below.But this method must adopt corrosion resistant material to make water cooler, and the equipment cost costliness of for example Haas alloy, thereby use this method does not have practical value; 2) vitriol oil method promptly adopts the water in the vitriol oil absorbing hydrogen chloride, owing to be subjected to balance influence, the dehydration degree of depth is not dark, and water-content is 10 * 10 in the hydrogenchloride
-6More than, and the evaporation and concentrating process of dilute sulphuric acid is bothersome, and the corrosion of whole device is quite serious; 3) absorption method: because the polarity of hydrogenchloride is strong, the selection of sorbent material is difficulty relatively.
A kind of method of removing moisture in the de-chlorine hydride is disclosed among the Chinese patent CN101774543A, described method adopts the method for physical purification, the corrugation ceramic filling material of salt tolerant acid corrosion in dehydration tower, filling, by mass transfer, heat transfer the concentration of hydrogenchloride on every layer of column plate is increased gradually, finally reach required concentration at cat head, and obtain purified hydrogen chloride gas, and then advance heater heats and can supply with trichlorosilane synthetic furnace and use through the interchanger deep cooling.But this system energy consumption is higher, and system bulk is too huge, and the dehydration tower structure is very complicated, and equipment and materials is comparatively expensive, and operation, control is difficulty comparatively, and product purity can not effectively be guaranteed.
The utility model content
Technical problem to be solved in the utility model is at above shortcomings in the prior art, and a kind of hydrogen chloride gas drying installation is provided, and it is simple in structure, cost is low, be convenient to production implements, and can reach the requirement of the dehydration degree of depth.This device has effectively improved the average casting yield of the parallel-adder settle-out time and the trichlorosilane product of trichlorosilane synthesis system.
The technical scheme that solution the utility model technical problem is adopted is this hydrogen chloride gas drying installation hydrogen chloride gas drying installation, it comprises tower body, the tower body top is provided with the hydrogen chloride gas outlet, its bottom is provided with the chlorosilane liquid exit, also be provided with hydrogen chloride gas import, chlorosilane liquid inlet and refrigerant inlet and refrigerant exit on the tower body, described hydrogen chloride gas ingress is equiped with pipeline, described pipeline extends to following in tower body, described refrigerant inlet and refrigerant exit are located at the tower body bottom, are communicated with by inner coil pipe between refrigerant inlet and the refrigerant exit.
The pipeline of described hydrogen chloride gas import place installing feeds in the chlorosilane liquid of tower body bottom for making hydrogen chloride gas to the distance of extending down in tower body.
Preferably, circulation has a refrigerant in the described inner coil pipe, and the refrigerant that circulates in the described inner coil pipe can drop to 25--15 ℃ with the temperature of the chlorosilane of tower body bottom, to reduce the volatilization of chlorosilane as far as possible.
Preferably, described refrigerant adopts 25 ℃ recirculated water or-20 ℃ chilled brine.-20 ℃ of chilled brines of preferred employing are so that chlorosilane is lowered the temperature rapidly.
Between described chlorosilane liquid exit and the chlorosilane liquid inlet by circulation pumping system connectivity.
Wherein, described circulation pumping system can comprise canned-motor pump, and the input aperture of described canned-motor pump is communicated with the chlorosilane liquid exit by pipeline, and the delivery port of canned-motor pump is communicated with the chlorosilane liquid inlet by pipeline.
Further preferably, also include the strainer that is used to filter solid silica in the described circulation pumping system, described strainer is arranged on the pipeline between the input aperture of chlorosilane liquid exit and canned-motor pump.
Preferably, the liquid level of the chlorosilane of input is the 60-90% of tower body height in the described tower body, is preferably 70%-80%, and interior contained humidity of hydrogen chloride gas and chlorosilane are fully reacted.
Wherein, described chlorosilane adopts trichlorosilicane or silicon tetrachloride.The preferred silicon tetrachloride that adopts.
Preferably, the position near the tower body top also can be provided with scum dredger in the described tower body; The bottom of tower body certain height at interval is provided with two interface of the level gauge.
Described tower body top also can be provided with suspension ring, and tower body top also is provided with flange.
Moisture hydrogenchloride feeds in the chlorosilane through interior pipe, and contained humidity and chlorosilane react, and produces hydrogen chloride gas and silica dioxide granule, emits heat simultaneously; The bottom chlorosilane after external filter and canned-motor pump are transported to device top chlorosilane inlet, sprays processing by spraying device to the hydrogen chloride gas that rises through the refrigerant cooling once more; The hydrogen chloride gas that rises separates through the chlorosilane droplet that scum dredger will contain, and chlorosilane is separated can obtain purified hydrogen chloride gas, and the raw material that purified hydrogen chloride gas promptly can be used as trichlorosilane synthetic furnace uses.
The chlorosilane that adds from the effusive chlorosilane of chlorosilane liquid exit and chlorosilane ingress enters the hydrogen chloride gas drying tower by the chlorosilane liquid inlet again after through filter and canned-motor pump and recycles.Strainer can be removed silica dioxide granule.
The beneficial effects of the utility model are: device is simple, the cost cost is low, be convenient to produce and implement, and can reach the requirement of the dehydration degree of depth, this device can be removed hydrochloric acid and take off and inhale the moisture in the hydrogenchloride of producing, and speed of response is fast, obviously improves the working time of trichlorosilane synthetic furnace, the hydrogenchloride dehydrating effect is good, significantly improves the casting yield of trichlorosilane.
Description of drawings
Fig. 1 is the structural representation of hydrogen chloride gas drying installation in specific embodiment of the utility model;
Fig. 2 is the connection diagram of hydrogen chloride gas drying installation in the present embodiment.
Among the figure: the import of 1-hydrogen chloride gas; The outlet of 2-hydrogen chloride gas; 3-chlorosilane liquid exit; 4-chlorosilane liquid inlet; The 5-gondola water faucet; 6-refrigerant inlet; The 7-refrigerant exit; The 8-interface of the level gauge; The 9-interface of the level gauge; The 10-flange; The 11-scum dredger; The 12-suspension ring; The 13-inner coil pipe; The 14-tower body; The 15-strainer; The 16-canned-motor pump; The import of 17-chlorosilane.
Embodiment
For making those skilled in the art understand the technical solution of the utility model better, the utility model is described in further detail below in conjunction with accompanying drawing.
As shown in Figure 1, in the present embodiment, the hydrogen chloride gas drying installation comprises tower body 14, tower body 14 tops are provided with hydrogen chloride gas outlet 2, its bottom is provided with chlorosilane liquid exit 3, also be respectively equipped with hydrogen chloride gas import 1, chlorosilane liquid inlet 4 and refrigerant inlet 6 and refrigerant exit 7 on the tower body 14, described refrigerant inlet 6 and refrigerant exit 7 are located at the tower body bottom, are communicated with by inner coil pipe 13 between refrigerant inlet 6 and the refrigerant exit 7.
Cycling stream is connected with refrigerant in the inner coil pipe 13, and the refrigerant of circulation can drop to 25--15 ℃ with the temperature of the chlorosilane of tower body bottom in the inner coil pipe 13.In the present embodiment, described refrigerant adopts 25 ℃ recirculated water or-20 ℃ chilled brine.
Described hydrogen chloride gas import 1 place is equiped with pipeline, and to extending down, this pipeline feeds in the chlorosilane liquid of tower body bottom for making hydrogen chloride gas to the distance of extending down in tower body described pipeline in tower body.
Between described chlorosilane liquid exit 3 and the chlorosilane liquid inlet 4 by circulation pumping system connectivity.In the present embodiment, described circulation pumping system comprises canned-motor pump 16 and strainer 15, and the input aperture of described canned-motor pump 16 is communicated with chlorosilane liquid exit 3 by pipeline, and the delivery port of canned-motor pump 16 is communicated with chlorosilane liquid inlet 4 by pipeline.Strainer 15 is used to filter solid silica, and strainer 15 is arranged on the pipeline between the input aperture of chlorosilane liquid exit 3 and canned-motor pump 16.
In addition, the tower body top also is provided with suspension ring 12, and tower body top is provided with flange 10, and the position near the tower body top in the tower body 14 is provided with scum dredger 11, and the bottom of tower body 14 certain height at interval is provided with two interface of the level gauge, i.e. interface of the level gauge 8 and interface of the level gauge 9.
Scum dredger 11 lower ends are chlorosilane liquid inlet 4, be provided with pipeline in the chlorosilane liquid inlet 4, the end of described pipeline is connected with gondola water faucet 5, and the middle part of tower body 14 is hydrogen chloride gas import 1, in the chlorosilane liquid of hydrogen chloride gas at the bottom of hydrogen chloride gas import 1 feeds tower.
Chlorosilane can be selected trichlorosilane and silicon tetrachloride, preferably adopts silicon tetrachloride.
The liquid level of the chlorosilane of input is the 60-90% of tower body height in the preferred described tower body 14.
As shown in Figure 2, at first in tower body 14, inject the part chlorosilane, make tower body 14 interior liquid levels reach the 70%-80% of tower body height by chlorosilane import 17.Open canned-motor pump 16, make chlorosilane at tower body 14 internal recycle.
Feed refrigerant from refrigerant import 6, refrigerant is selected-20 ℃ chilled brine for use, makes the chlorosilane fluid temperature drop to-15 ℃ gradually.
The hydrogenchloride of moisture 300ppm is fed in the chlorosilane of tower body 14 bottoms through pipeline by hydrogen chloride gas import 1, and moisture and chlorosilane contained in the hydrogenchloride react, and generate hydrogen chloride gas and silica dioxide granule, emit heat simultaneously; Flow by the control refrigerant makes the temperature maintenance of chlorosilane about-15 ℃; The hydrogen chloride gas that rises is separated the chlorosilane droplet that is contained after scum dredger 11 foam removals, and the raw material that purified hydrogen chloride gas promptly can be used as trichlorosilane synthetic furnace uses.
After the cooling of the refrigerant of chlorosilane circulation in inner coil pipe 13 of tower body 14 bottoms, be transported to the chlorosilane liquid inlet 4 on device top again through filter 15 and canned-motor pump 16, the hydrogen chloride gas by 5 pairs of risings of gondola water faucet sprays processing once more; The chlorosilane that adds from chlorosilane liquid exit 3 effusive chlorosilanes and chlorosilane import 17 enters tower body 14 internal recycle by chlorosilane liquid inlet 4 again after through filter 15 and canned-motor pump 16 and uses.Solid silica in the chlorosilane effectively separates by strainer 15, and regularly strainer is cleared up.
By above detailed description to the utility model embodiment, can understand the utility model and can remove hydrochloric acid and take off and inhale the moisture in the hydrogenchloride of producing, the working time of obviously improving trichlorosilane synthetic furnace, significantly improve the casting yield of trichlorosilane.
Be understandable that above embodiment only is the illustrative embodiments that adopts for principle of the present utility model is described, yet the utility model is not limited thereto.For those skilled in the art, under the situation that does not break away from spirit of the present utility model and essence, can make various modification and improvement, these modification and improvement also are considered as protection domain of the present utility model.
Claims (10)
1. hydrogen chloride gas drying installation, it is characterized in that, comprise tower body (14), tower body (14) top is provided with hydrogen chloride gas outlet (2), its bottom is provided with chlorosilane liquid exit (3), also be provided with hydrogen chloride gas import (1) on the tower body (14), chlorosilane liquid inlet (4), and refrigerant inlet (6) and refrigerant exit (7), described hydrogen chloride gas import (1) locates to be equiped with pipeline, described pipeline extends to following in tower body, described refrigerant inlet (6) and refrigerant exit (7) are located at the tower body bottom, are communicated with by inner coil pipe (13) between refrigerant inlet (6) and the refrigerant exit (7).
2. drying installation according to claim 1 is characterized in that, the pipeline of described hydrogen chloride gas import (1) place installing feeds in the chlorosilane liquid of tower body bottom for making hydrogen chloride gas to the distance of extending down in tower body.
3. drying installation according to claim 2 is characterized in that, cycling stream is connected with refrigerant in the described inner coil pipe (13), and the refrigerant of circulation can drop to 25--15 ℃ with the temperature of the chlorosilane of tower body bottom in the described inner coil pipe (13).
4. drying installation according to claim 3 is characterized in that, described refrigerant adopts 25 ℃ recirculated water or-20 ℃ chilled brine.
5. drying installation according to claim 1 is characterized in that, between described chlorosilane liquid exit (3) and chlorosilane liquid inlet (4) by circulation pumping system connectivity.
6. drying installation according to claim 5, it is characterized in that, described circulation pumping system comprises canned-motor pump (16), the input aperture of described canned-motor pump (16) is communicated with chlorosilane liquid exit (3) by pipeline, and the delivery port of canned-motor pump (16) is communicated with chlorosilane liquid inlet (4) by pipeline.
7. drying installation according to claim 6, it is characterized in that, also include the strainer (15) that is used to filter solid silica in the described circulation pumping system, described strainer (15) is arranged on the pipeline between the input aperture of chlorosilane liquid exit (3) and canned-motor pump (16).
8. according to the described drying installation of one of claim 1-7, it is characterized in that the liquid level of the chlorosilane of input is the 60-90% of tower body height in the described tower body (14).
9. according to the described drying installation of one of claim 1-7, it is characterized in that described chlorosilane adopts trichlorosilicane or silicon tetrachloride.
10. according to the described drying installation of one of claim 1-7, it is characterized in that the position near the tower body top in the described tower body (14) is provided with scum dredger (11); The bottom of tower body (14) certain height at interval is provided with two interface of the level gauge, i.e. interface of the level gauge (8) and interface of the level gauge (9).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011200514401U CN201850135U (en) | 2011-03-01 | 2011-03-01 | Hydrogen chloride gas drying device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011200514401U CN201850135U (en) | 2011-03-01 | 2011-03-01 | Hydrogen chloride gas drying device |
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| CN201850135U true CN201850135U (en) | 2011-06-01 |
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| CN2011200514401U Expired - Fee Related CN201850135U (en) | 2011-03-01 | 2011-03-01 | Hydrogen chloride gas drying device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102417163A (en) * | 2011-07-28 | 2012-04-18 | 四川瑞能硅材料有限公司 | Improved Siemens method-HCL gas dehydration purifying method |
| CN114100328A (en) * | 2021-11-30 | 2022-03-01 | 安徽华塑股份有限公司 | Industrial hydrous hydrogen chloride gas dehydration device and dehydration method |
-
2011
- 2011-03-01 CN CN2011200514401U patent/CN201850135U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102417163A (en) * | 2011-07-28 | 2012-04-18 | 四川瑞能硅材料有限公司 | Improved Siemens method-HCL gas dehydration purifying method |
| CN114100328A (en) * | 2021-11-30 | 2022-03-01 | 安徽华塑股份有限公司 | Industrial hydrous hydrogen chloride gas dehydration device and dehydration method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: XINTE ENERGY CO., LTD. Free format text: FORMER NAME: TBEA XINJIANG SILICON INDUSTRY CO., LTD. |
|
| CP03 | Change of name, title or address |
Address after: 830011, room 716, Mustang building, No. 158, Kunming Road, the Xinjiang Uygur Autonomous Region, Urumqi Patentee after: Xinte Energy Co.,Ltd. Address before: 830011, Mustang business club No. 158, Kunming Road, 717, the Xinjiang Uygur Autonomous Region, Urumqi Patentee before: TBEA Xinjiang Silicon Industry Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110601 Termination date: 20200301 |