CN201659059U - Metal atomization plate - Google Patents
Metal atomization plate Download PDFInfo
- Publication number
- CN201659059U CN201659059U CN2010201699523U CN201020169952U CN201659059U CN 201659059 U CN201659059 U CN 201659059U CN 2010201699523 U CN2010201699523 U CN 2010201699523U CN 201020169952 U CN201020169952 U CN 201020169952U CN 201659059 U CN201659059 U CN 201659059U
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- metal atomization
- photoresist
- micrometers
- nickel
- aperture
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Abstract
The utility model discloses a metal atomization plate, which comprises a photoresist material and an electroformed nickel layer deposited on the surface and the periphery of the photoresist material by means of electroplating. The electroformed nickel layer is provided with pores. The metal atomization plate is characterized in that the aperture of each pore ranges from 2 micrometers to 10 micrometers, and the roundness error is 0.5 micrometer. The metal atomization plate is formed by means of special electroforming and deposition, leads the aperture of each of the pores to reach the aperture requirement of 2 micrometers to 10 micrometers, can atomize liquid particles reaching a diameter level lower than 5 micrometers, and also can meet service life of 2000 hours to 5000 hours.
Description
Technical field
The utility model relates to a kind of metal atomization sheet, belongs to the accurate five metals technical field of superelevation.
Background technology
Raising gradually along with living standards of the people, quality of life there has been higher requirement, continuous development along with medical skill, industry has proposed higher specification requirement to the performance of atomizer, the metal atomization sheet of tradition etching and processing stainless steel art production can not satisfy the technical specification of requirements at the higher level again, its processing stainless steel atomizing piece micro-pore diameter is greater than 20um, etch process has arrived the limit, can not satisfy the more processing request of micro hole, industry is needed the atomizing piece that a kind of micropore reaches 3～10um badly, satisfies the demand of expanding of domestic atomizer.
The utility model content
In order to overcome the deficiencies in the prior art, the purpose of this utility model is to provide a kind of high performance atomization device that can satisfy of extraordinary electro-deposition processing method production that utilizes that the manufacturing of micropore atomization sheet is required, reduces use cost, improves the metal atomization sheet in service life.
The utility model is achieved through the following technical solutions:
A kind of metal atomization sheet comprises that photoresist and electroplating deposition at photoresist surface and electroforming nickel dam all around, also have micropore on the electroforming nickel dam, it is characterized in that the aperture of described micropore is 1～3um, and deviation from circular from is 0.5um.
Further, above-mentioned photoresist is dry film, wet film or photoresist, and its thickness is 4～5um.
The material of above-mentioned electroforming nickel dam is the nickel billon, and its hardness is 450～550hv, and thickness is 0.020～0.060mm, and its material can be nickel cobalt (alloy) or nickel-phosphorus alloy.
The beneficial effects of the utility model are: the utility model forms by adopting extraordinary electroforming deposition process, it can make the aperture of self micropore reach the aperture requirement of 2～10um, can aerosolized liquid particles reach the following diameter level of 5um, and can satisfy the service life that the utlity model has 2000～5000 hours.
Description of drawings
Fig. 1 is the cross section enlarged diagram of the utility model one embodiment.
Main Reference numeral implication is among the figure:
1, photoresist 2, electroforming nickel dam 3, micropore
The specific embodiment
Below in conjunction with accompanying drawing, describe the specific embodiment of the present utility model in detail:
Fig. 1 is the cross section enlarged diagram of the utility model one embodiment.
As shown in Figure 1: the metal atomization sheet, comprise that photoresist 1 and electroplating deposition are at photoresist 1 surface and electroforming nickel dam 2 all around, also has micropore 3 on the electroforming nickel dam 2, the aperture of described micropore 3 is 2～10um, deviation from circular from is 0.5um, and above-mentioned photoresist 1 is dry film (photoresist also can be photoresist or wet film), the material of electroforming nickel dam then is the nickel billon, its hardness is 450～550hv, thickness is 0.020～0.060mm, and described nickel billon can be in nickel cobalt (alloy) or the nickel-phosphorus alloy any.
Production process of the present utility model is: after at first the inspection outward appearance being handled in 304 stainless steel substrate surface grindings, 304 stainless steel substrates are placed baking oven baking 30 minutes, temperature 70～80 degree; Adopt the way of photoresist printing, under 200～250 order serigraphys, photoresist on average is coated in above 304 corrosion resistant plates certain thickness photoresist, its thickness is got final product about 4～5um; After then the file of atomizing piece being designed, make the negative film light shield film of 2000DPI, on parallel ray machine, carry out the high accuracy exposure, the UV light energy is controlled at 3～5KW and gets final product, substrate after the exposure cleans in 1% developing machine, figure is rested on the substrate, and do figure size and visual examination, then substrate is put into nickel gold electrotyping bath and carried out extraordinary electroforming deposition process, atomization metal sheet on the substrate can be taken off after reaching needed thickness, put on the supersonic wave cleaning machine and clean, finish.
The utility model aperture is little, precision is high, long service life, and price is lower, has reduced use cost, satisfies the higher specification requirement of atomizer.
Below disclose the utility model with preferred embodiment, so it is not in order to restriction the utility model, and all employings are equal to replaces or technical scheme that the equivalent transformation mode is obtained, all drops within the protection domain of the present utility model.
Claims (6)
1. metal atomization sheet, comprise that photoresist (1) and electroplating deposition at photoresist (1) surface and electroforming nickel dam (2) all around, also have micropore (3) on the electroforming nickel dam (2), it is characterized in that, the aperture of described micropore (3) is 2～10um, and deviation from circular from is 0.5um.
2. metal atomization sheet according to claim 1 is characterized in that, described photoresist (1) is dry film, wet film or photoresist.
3. metal atomization sheet according to claim 1 is characterized in that, the thickness of described photoresist (1) is 4～5um.
4. metal atomization sheet according to claim 1 is characterized in that, the material of described electroforming nickel dam (2) is the nickel billon.
5. metal atomization sheet according to claim 4 is characterized in that, the hardness of described nickel billon is 450～550hv, and thickness is 0.020～0.060mm.
6. according to claim 4 or 5 described metal atomization sheets, it is characterized in that the material of described nickel billon is nickel cobalt (alloy) or nickel-phosphorus alloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201699523U CN201659059U (en) | 2010-04-23 | 2010-04-23 | Metal atomization plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201699523U CN201659059U (en) | 2010-04-23 | 2010-04-23 | Metal atomization plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201659059U true CN201659059U (en) | 2010-12-01 |
Family
ID=43229467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010201699523U Expired - Fee Related CN201659059U (en) | 2010-04-23 | 2010-04-23 | Metal atomization plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201659059U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102618899A (en) * | 2012-04-23 | 2012-08-01 | 中国矿业大学 | Method and device for preparing microtexture through laser photoetching assisted electrochemical deposition |
| WO2015180079A1 (en) * | 2014-05-28 | 2015-12-03 | 王长津 | Micropore atomization sheet and micropore atomization apparatus |
| WO2015180080A1 (en) * | 2014-05-28 | 2015-12-03 | 王长津 | Method for preparing micropore atomization sheet, micropore atomization sheet, and micropore atomization apparatus |
-
2010
- 2010-04-23 CN CN2010201699523U patent/CN201659059U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102618899A (en) * | 2012-04-23 | 2012-08-01 | 中国矿业大学 | Method and device for preparing microtexture through laser photoetching assisted electrochemical deposition |
| CN102618899B (en) * | 2012-04-23 | 2015-01-21 | 中国矿业大学 | Method and device for preparing microtexture through laser photoetching assisted electrochemical deposition |
| WO2015180079A1 (en) * | 2014-05-28 | 2015-12-03 | 王长津 | Micropore atomization sheet and micropore atomization apparatus |
| WO2015180080A1 (en) * | 2014-05-28 | 2015-12-03 | 王长津 | Method for preparing micropore atomization sheet, micropore atomization sheet, and micropore atomization apparatus |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101201 Termination date: 20180423 |