CN201405271Y - High copy polishing grinding block - Google Patents
High copy polishing grinding block Download PDFInfo
- Publication number
- CN201405271Y CN201405271Y CN2009200559208U CN200920055920U CN201405271Y CN 201405271 Y CN201405271 Y CN 201405271Y CN 2009200559208 U CN2009200559208 U CN 2009200559208U CN 200920055920 U CN200920055920 U CN 200920055920U CN 201405271 Y CN201405271 Y CN 201405271Y
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- polishing
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- elastic
- layer
- elastic layer
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Abstract
A high copy polishing grinding block comprises polishing layers and elastic layers, wherein the polishing layers and the elastic layers are arranged on a clamping head, holes are arranged inside the elastic layers, grooves are disposed on the outside of the elastic layers, the polishing layers are arranged at the top end of the elastic layers; or the elastic layers are arranged in the shape of more than one columns, the polishing layers are arranged at the top end of the elastic layers; or the elastic layers are arranged in the shape of more than one columns, adjacent more than two column-shaped elastic layers form an elastic unit, and the polishing layers are disposed on the top of each elastic unit, the bottoms of the elastic layers are integrally connected or respectively connected withthe clamping head, and the holes are arranged transversely or vertically. The holes are arranged inside the elastic layers, the grooves are disposed on the outside of the elastic layers, or the elastic layers are arranged into the shape of bristles of a toothbrush, then the polishing layers are disposed at the top ends of the elastic layers, and accordingly the copy capacity of the high copy polishing grinding block in polishing is further improved, and the high copy polishing grinding block is enabled to be particularly suitable for to-be-polished articles with protrusions or sunk patterns on the surface and have high copy capacity.
Description
Technical field
The utility model relates to a kind of polishing abrading block of polishing abrading block, particularly a kind of high profiling.
Background technology
The glaze layer of common glaze for glazed tile is all thinner, and its thickness is generally at 0.3～0.4mm, and it is very bright that the glaze layer seems, as very flat, a bit as minute surface.But, place it in when using level measurement on the measuring table, the surface of glaze layer is not a pure water plane, the surface of glaze layer is most of uneven, its surperficial maximum difference of height is more than 0.8mm, when adopting common not profiling polishing abrading block to polish, if it is its surface finish is bright, the brick face minimum point of glaze for glazed tile also will be polished bright, then will throw and prune more than the 0.8mm, and glazed layer thickness is between 0.3～0.4mm, then the part glazed layer certainly will be penetrated by throwing, so the stain-proofing layer of glaze for glazed tile is also destroyed.Cut height less than 0.8mm if throw, then, most of low-lying or former state on the glaze for glazed tile, its glossiness is still very low.
At this situation, some manufacturer has done a little improvement, as disclosing a kind of improved Elastic abrasive body among the Chinese patent literature CN201015846Y, comprises grinding layer and gripper shoe, it is characterized in that being provided with elastic plate in the middle of grinding layer and the gripper shoe.Though this Elastic abrasive body can improve quality of finish to a certain extent,, its polishing effect is still not ideal enough.
The utility model content
The purpose of this utility model aims to provide a kind of polishing abrading block of simple and reasonable, high profiling that the profiling ability is high, to overcome weak point of the prior art.
Press the polishing abrading block of a kind of high profiling of this purpose design, comprise the polishing layer and the elastic layer that are arranged on the clamping head, it is characterized in that being provided with in the elastic layer hole, the arranged outside of elastic layer is fluted, and polishing layer is arranged on the top of elastic layer; Perhaps elastic layer is more than one column setting, and polishing layer is arranged on the top of elastic layer; Perhaps, elastic layer is more than one column setting, and the adjacent column elastic layer more than two constitutes a Flexible element, and the top of each Flexible element is provided with polishing layer.
The bottom of described elastic layer fuses or joins with clamping head respectively.
Described hole laterally or vertically is provided with.
Described polishing layer is whole or divides body structure.
The polishing abrading block will have high profiling, middle elastic layer must have high resiliency and morphotropism, because the polishing abrading block is contained on the bistrique of ceramic polishing machine, motion such as to rotate at a high speed and come the grinding-polishing glaze for glazed tile, the impulsive force that is subjected to is very big, elastic layer in the abrading block is necessary for the elastomer with certain resistance to tearing and mechanical strength, the impact failure that is subjected to when preventing the high speed grinding and polishing.So the elastomer with certain resistance to tearing and mechanical strength that will select for use, its high resiliency and morphotropism will be restricted.
The utility model is generally selected elastic layer such as soft rubber or the flexible plastic elastomer etc. with certain resistance to tearing and mechanical strength for use, and simultaneously by be provided with hole in elastic layer, the arranged outside of elastic layer is fluted; Perhaps elastic layer is more than one column setting; Perhaps, elastic layer is more than one column setting, and the adjacent column elastic layer more than two constitutes a Flexible element, perhaps elastic layer is arranged to as the bristle-like in the toothbrush, on the top of elastic layer polishing layer is set then, with its profiling ability in polishing of further raising.It is specially adapted to the polished object that the surface is provided with outstanding or depression figure line, has very high profiling ability.
Reach the polishing abrading block by the above and both had high resiliency and morphotropism is high profiling, have certain shock resistance destructiveness again.Now with this high profiling polishing abrading block grinding and polishing glaze for glazed tile, because the high profiling of the elastic layer in the middle of the abrading block, after most of uneven low-lying glazed tile surface is polished, the very high and luminosity of glossiness is quite consistent, and polishing abrading block high speed grinding and polishing when being subjected to clashing into, elastic layer etc. are not easy to be battered down.
Description of drawings
Fig. 1 is the utility model first example structure schematic diagram.
Fig. 2 is the plan structure schematic diagram of Fig. 1.
Fig. 3 is the structural representation after the utility model first embodiment removes polishing layer.
Fig. 4 is the structural representation after the utility model second embodiment removes polishing layer.
Fig. 5 is the structural representation after the utility model the 3rd embodiment removes polishing layer.
The specific embodiment
Below in conjunction with drawings and Examples the utility model is further described.
First embodiment
Referring to Fig. 1-Fig. 3, the polishing abrading block of this high profiling, comprise first elastic layer 1 and the polishing layer 3 that are arranged on the clamping head 2, be provided with hole 1.1 in first elastic layer 1, the arranged outside of first elastic layer 1 fluted 1.2, polishing layer 3 is arranged on the top of first elastic layer 1, and hole 1.1 is laterally or vertically setting.Polishing layer 3 is whole or divides body structure.
Second embodiment
Referring to Fig. 4, second elastic layer 11 is more than one column setting, and polishing layer is arranged on the top of second elastic layer 11, and polishing layer does not draw among the figure.The bottom of second elastic layer 11 fuses or joins with clamping head 2 respectively.
All the other are not stated part and see first embodiment, no longer repeat.
The 3rd embodiment
Referring to Fig. 5, the 3rd elastic layer 21 is more than one column setting, and the adjacent column elastic layer more than two constitutes a Flexible element, and the top of each Flexible element is provided with polishing layer, and polishing layer does not draw among the figure.
All the other are not stated part and see second embodiment, no longer repeat.
The above, it only is the utility model preferred embodiment, so can not limit the scope that the utility model is implemented with this, i.e. the equivalence of doing according to the utility model claim and description changes and decorates, and all should still belong in the scope that the utility model patent contains.
Claims (4)
1. the polishing abrading block of a high profiling comprises the polishing layer and the elastic layer that are arranged on the clamping head (2), it is characterized in that being provided with in the elastic layer hole (1.1), the arranged outside of elastic layer fluted (1.2), and polishing layer is arranged on the top of elastic layer; Perhaps elastic layer is more than one column setting, and polishing layer is arranged on the top of elastic layer; Perhaps, elastic layer is more than one column setting, and the adjacent column elastic layer more than two constitutes a Flexible element, and the top of each Flexible element is provided with polishing layer.
2. the polishing abrading block of high profiling according to claim 1, the bottom that it is characterized in that described elastic layer fuses or joins with clamping head respectively.
3. the polishing abrading block of high profiling according to claim 1 is characterized in that described hole laterally or vertically is provided with.
4. the polishing abrading block of high profiling according to claim 1 is characterized in that described polishing layer is whole or branch body structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200559208U CN201405271Y (en) | 2009-04-30 | 2009-04-30 | High copy polishing grinding block |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200559208U CN201405271Y (en) | 2009-04-30 | 2009-04-30 | High copy polishing grinding block |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201405271Y true CN201405271Y (en) | 2010-02-17 |
Family
ID=41676193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009200559208U Expired - Lifetime CN201405271Y (en) | 2009-04-30 | 2009-04-30 | High copy polishing grinding block |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201405271Y (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101966696A (en) * | 2010-09-17 | 2011-02-09 | 霍镰泉 | Polishing rubbing block for ceramic tile polishing equipment |
| CN101983842A (en) * | 2010-11-22 | 2011-03-09 | 杭州祥生砂光机制造有限公司 | Special de-burring abrasive belt abrasive slice |
| CN103495938A (en) * | 2013-10-16 | 2014-01-08 | 广东奔朗新材料股份有限公司 | Resin-metal composite type elastic grinding block and manufacturing mold and manufacturing method thereof |
| CN107088841A (en) * | 2017-04-27 | 2017-08-25 | 佛山市重远大机电有限公司 | A kind of Elastic abrasive body and its rubbing down method |
| CN108312078A (en) * | 2018-03-16 | 2018-07-24 | 广州金谷钻石工具有限公司 | A kind of metal-bonded diamond stone material rubbing down horseshoe block |
-
2009
- 2009-04-30 CN CN2009200559208U patent/CN201405271Y/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101966696A (en) * | 2010-09-17 | 2011-02-09 | 霍镰泉 | Polishing rubbing block for ceramic tile polishing equipment |
| CN101983842A (en) * | 2010-11-22 | 2011-03-09 | 杭州祥生砂光机制造有限公司 | Special de-burring abrasive belt abrasive slice |
| CN103495938A (en) * | 2013-10-16 | 2014-01-08 | 广东奔朗新材料股份有限公司 | Resin-metal composite type elastic grinding block and manufacturing mold and manufacturing method thereof |
| CN103495938B (en) * | 2013-10-16 | 2016-04-20 | 广东奔朗新材料股份有限公司 | The compound Elastic abrasive body of resin metallic and make mould and preparation method |
| CN107088841A (en) * | 2017-04-27 | 2017-08-25 | 佛山市重远大机电有限公司 | A kind of Elastic abrasive body and its rubbing down method |
| CN107088841B (en) * | 2017-04-27 | 2018-04-13 | 佛山市重一远大机电有限公司 | A kind of Elastic abrasive body and its rubbing down method |
| CN108312078A (en) * | 2018-03-16 | 2018-07-24 | 广州金谷钻石工具有限公司 | A kind of metal-bonded diamond stone material rubbing down horseshoe block |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20100217 |